Patents by Inventor Yung-Chun Lee

Yung-Chun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150378252
    Abstract: A method for manufacturing a photomask is provided. The method includes providing a flexible substrate, forming a plurality of microstructures on the flexible substrate, coating the flexible substrate with a shading material to form a shading layer on the substrate, and solidifying the shading layer which is a single layer.
    Type: Application
    Filed: June 29, 2015
    Publication date: December 31, 2015
    Inventors: Yung-Chun LEE, Chun-Ying WU, Heng HSIEH, Yi-Ta HSIEH, Jhih-Nan YAN
  • Patent number: 9212345
    Abstract: A system for producing a tissue-engineered material includes a hollow member and a mechanical stimulating unit. The hollow member is adapted to be implanted in a peritoneal cavity, and is to be positioned in the peritoneal cavity in a manner that a part of the hollow member contacts an inner wall surface of the peritoneal cavity for enabling formation of a biological tissue that encapsulates the hollow member. The mechanical stimulation unit is coupled to the hollow member and configured to provide a periodic mechanical stimulus to the biological tissue by periodically causing the hollow member to expand and contract. A method for producing the aforesaid tissue-engineered material is also disclosed.
    Type: Grant
    Filed: August 5, 2013
    Date of Patent: December 15, 2015
    Assignee: National Cheng Kung University
    Inventors: How-Ran Guo, Chao-Lin Chen, Jin-Jia Hu, Yung-Chun Lee, Chung-Jen Chung
  • Patent number: 9075311
    Abstract: A manufacturing method of microstructure comprises steps of: a motion determination step which determines the motion of a substrate relative to at least a photomask; a microlens determination step which determines the profile of a microlens unit on the substrate; an analysis step which calculates the feature of the photomask according to the motion of the substrate and the profile of the microlens unit by using a numerical analysis method; a production step which produces the photomask according to the feature of the photomask; driving the substrate to do the motion determined in the motion determination step, and meanwhile making a laser light illuminate the substrate through the photomask to manufacture the microlens unit on the substrate by the superposition effect of the laser light; and performing a photolithography process by using the microlens unit to produce a microstructure on a photoresist substrate.
    Type: Grant
    Filed: March 26, 2013
    Date of Patent: July 7, 2015
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun Lee, Chi-Cheng Chiu, Chih-Hao Chang, Ching-Yun Lu
  • Publication number: 20140295354
    Abstract: A manufacturing method of microstructure comprises steps of: a motion determination step which determines the motion of a substrate relative to at least a photomask; a microlens determination step which determines the profile of a microlens unit on the substrate; an analysis step which calculates the feature of the photomask according to the motion of the substrate and the profile of the microlens unit by using a numerical analysis method; a production step which produces the photomask according to the feature of the photomask; driving the substrate to do the motion determined in the motion determination step, and meanwhile making a laser light illuminate the substrate through the photomask to manufacture the microlens unit on the substrate by the superposition effect of the laser light; and performing a photolithography process by using the microlens unit to produce a microstructure on a photoresist substrate.
    Type: Application
    Filed: March 26, 2013
    Publication date: October 2, 2014
    Applicant: National Cheng Kung University
    Inventors: Yung-Chun LEE, Chi-Cheng CHIU, Chih-Hao CHANG, Ching-Yun LU
  • Publication number: 20140120619
    Abstract: A system for producing a tissue-engineered material includes a hollow member and a mechanical stimulating unit. The hollow member is adapted to be implanted in a peritoneal cavity, and is to be positioned in the peritoneal cavity in a manner that a part of the hollow member contacts an inner wall surface of the peritoneal cavity for enabling formation of a biological tissue that encapsulates the hollow member. The mechanical stimulation unit is coupled to the hollow member and configured to provide a periodic mechanical stimulus to the biological tissue by periodically causing the hollow member to expand and contract. A method for producing the aforesaid tissue-engineered material is also disclosed.
    Type: Application
    Filed: August 5, 2013
    Publication date: May 1, 2014
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: How-Ran GUO, Chao-Lin CHEN, Jin-Jia HU, Yung-Chun LEE, Chung-Jen CHUNG
  • Patent number: 8617658
    Abstract: This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 ?m gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: December 31, 2013
    Assignee: National Cheng Kung University
    Inventors: Yung-Chun Lee, Chuan-Hsiang Lee, Shou-Chi Cho
  • Publication number: 20110236584
    Abstract: This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 ?m gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.
    Type: Application
    Filed: March 26, 2010
    Publication date: September 29, 2011
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: YUNG-CHUN LEE, CHUAN-HSIANG LEE, SHOU-CHI CHO
  • Patent number: 7955545
    Abstract: A nano-imprinting process is described, comprising: providing a substrate including an imprinting material layer covering a surface of the substrate; providing a mold including protruding features set on a surface of the mold covered with an anti-adhesion layer; forming a transferring material layer on a top surface of each protruding feature; embedding the transferring material layer into a first portion of the imprinting material layer; removing the mold and separating the mold and the transferring material layer simultaneously to transfer the transferring material layer into the first portion of the imprinting material layer and to expose a second portion of the imprinting material layer; using the transferring material layer as a mask to remove the second portion of the imprinting material layer and a portion of the substrate; and removing the first portion of the imprinting material layer and the transferring material layer.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: June 7, 2011
    Assignee: National Cheng Kung University
    Inventors: Yung-Chun Lee, Fei-Bin Hsiao, Cheng-Yu Chiu
  • Publication number: 20100193469
    Abstract: A method for manufacturing a micro/nano three-dimensional structure including the following steps is described. A mold is provided, and a pattern structure including a plurality of convex portions and concave portions is set in the mold. A transfer material layer including a first portion on the convex portions and a second portion on the concave portions is formed. A flexible substrate is disposed on the mold and contacts with the first portion of the transfer material layer. A heating step is performed to partially heat the flexible substrate through the first portion. A pressure is applied on the flexible substrate to adhere or press the first portion to the flexible substrate. The mold is removed. An etching step is performed on the flexible substrate by using the first portion of the transfer material layer as a mask to form a micro/nano three-dimensional structure in the flexible substrate.
    Type: Application
    Filed: February 4, 2010
    Publication date: August 5, 2010
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun LEE, Chun-Hung CHEN, Te-Hui YU
  • Publication number: 20100170870
    Abstract: An imprint process of a thermosetting material is described, comprising: providing a mold including pattern structures, wherein convex portions and concave portions of the pattern structures are covered with a transferred material layer; providing a substrate, wherein a thermosetting material layer and a sacrificial layer cover the substrate in sequence; performing an imprint step to transfer the transferred material layer on the convex portions onto a first portion of the sacrificial layer; etching a second portion of the sacrificial layer and the underlying thermosetting material layer by using the transferred material layer as a mask; and performing a wet stripping step by using a stripper to completely etch the sacrificial layer and the overlying transferred material layer, wherein the stripper has a first etching rate and a second etching rate to the thermosetting material layer and the sacrificial layer respectively, and a ratio of the second etching rate to the first etching rate is greater than or equ
    Type: Application
    Filed: August 18, 2009
    Publication date: July 8, 2010
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun LEE, Cheng-Yu CHIU, Chung-Yi LEE
  • Publication number: 20090311629
    Abstract: A method for manufacturing a roller mold is described, including the following steps. A body is provided, wherein the body is a cylinder. A photoresist layer is formed to completely cover a cambered surface of the body. A mold including a pattern structure including a convex portion and a concave portion is provided, and the convex portion and the concave portion are covered with a transferred pattern layer. The mold is pressed on the photoresist layer. The body is rolled to transfer the transferred pattern layer on the convex portion onto the photoresist layer. The mold is removed. An UV light exposure step is performed on an exposed portion of the photoresist layer to transfer a pattern of the transferred pattern layer to the photoresist layer. The exposed portion of the photoresist layer is removed to expose a portion of the cambered surface of the body. A structure layer is formed on the portion of the cambered surface and the transferred pattern layer.
    Type: Application
    Filed: June 12, 2009
    Publication date: December 17, 2009
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun LEE, Cheng-Yu CHIU
  • Publication number: 20080296803
    Abstract: A nano-imprinting process is described, comprising: providing a substrate including an imprinting material layer covering a surface of the substrate; providing a mold including protruding features set on a surface of the mold covered with an anti-adhesion layer; forming a transferring material layer on a top surface of each protruding feature; embedding the transferring material layer into a first portion of the imprinting material layer; removing the mold and separating the mold and the transferring material layer simultaneously to transfer the transferring material layer into the first portion of the imprinting material layer and to expose a second portion of the imprinting material layer; using the transferring material layer as a mask to remove the second portion of the imprinting material layer and a portion of the substrate; and removing the first portion of the imprinting material layer and the transferring material layer.
    Type: Application
    Filed: August 31, 2007
    Publication date: December 4, 2008
    Applicant: National Cheng Kung University
    Inventors: Yung-Chun Lee, Fei-Bin Hsiao, Cheng-Yu Chiu
  • Publication number: 20080217819
    Abstract: A micro/nano-pattern film contact transfer process is described, comprising: providing a mold, wherein an imprinting pattern is set in a first surface of the mold; forming a release layer on the first surface of the mold and a transfer material layer on the release layer; providing a substrate; placing the mold on a first surface of the substrate, wherein the first surface of the mold is opposite to the first surface of the substrate; applying a pre-pressed force on the substrate from a second surface opposite to the first surface of the substrate; providing a heating source to heat the transfer material layer to produce an adhesion effect between a portion of the transfer material layer contacting with the first surface of the substrate and the substrate; and removing the mold, wherein the contacting portion of the transfer material layer is transferred onto the first surface of the substrate.
    Type: Application
    Filed: July 19, 2007
    Publication date: September 11, 2008
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun Lee, Chuan-Pu Liu, Fei-Bin Hsiao, Chun-Hung Chen, Cheng-Yu Chiu