Patents by Inventor Yusuke Fukui

Yusuke Fukui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080160346
    Abstract: Disclosed is a PDP and a manufacturing method therefor having improved display performance even if the PDP is of a fine-cell structure. The PDP has a protective layer that is composed of an MgO film layer and an MgO particle layer made of MgO particles. The MgO particles are formed by burning an MgO precursor and satisfy that a/b?1.2, where a denotes a spectrum integral value in a wavelength region of a CL spectrum from 650 nm to 900 nm, exclusive of 900 nm, and b denotes a spectrum integral value of a wavelength region of the CL spectrum from 300 nm to 550 nm, exclusive of 550 nm. The MgO particles have many high energy levels in the energy band and thus emission of initial electrons is caused more easily, which leads to suppress discharge delay and also to suppress temperature dependence of the discharge delay.
    Type: Application
    Filed: December 27, 2007
    Publication date: July 3, 2008
    Inventors: Masaharu Terauchi, Yusuke Fukui, Takuji Tsujita, Michiko Okafuji, Mikihiko Nishitani
  • Publication number: 20050011596
    Abstract: The present invention provides a biomedical superelastic Ti-based alloy containing 5 to 40 at % of Nb that is an element for stabilizing ?-phase of Ti, and containing Ti and unavoidable impurities as the residual part. Further, the present invention provides a biomedical superelastic Ti-based alloy with a composition having 5 to 40 at % of Nb, one or more elements selected from among 10 at % or less of Mo, 15 at % or less of Al, 10 at % or less of Ge, 10 at % or less of Ga, and 15 at % of less of In, 30 at % or less of the sum total of one or more elements selected from among Mo, Al, Ge, Ga, and In, 60 at % or less of the sum total of Nb and one or more elements selected from among Mo, Al, Ge, Ga, and In, and Ti and unavoidable impurities as the residual part.
    Type: Application
    Filed: October 30, 2003
    Publication date: January 20, 2005
    Inventors: Toyonobu Tanaka, Hiroshi Horikawa, Shuichi Miyazaki, Hideki Hosoda, Yusuke Fukui, Satoru Hashimoto, Yoshinori Omatsu