Abstract: In accordance with an embodiment, a pattern inspection method includes applying a light to a substrate including an inspection target pattern in a plurality of optical conditions, detecting a reflected light from the substrate to acquire a pattern image for each of the optical conditions, outputting a gray value difference between the pattern image and a reference image for each of the optical conditions, and specifying a position of the defect in a stacking direction of the stacked film from a relation of the obtained gray value difference between the optical conditions. The pattern is formed by a stacked film, the optical conditions includes at least a first optical condition for detection of a defect on a surface of the stacked film.

Abstract: A signal processing unit (C1, C2, C3) for processing a light reception signal from an imaging element (12) at different magnifications is provided in a light receiving unit (102) in a displacement sensor (1). This sensor (1) measures a displacement by using light receiving amount data generated by the signal processing unit (C1) for each detection processing by a light projecting unit (101) and the light receiving unit (102), and further adjusts sensitivity for next detection processing. In sensitivity adjustment processing, when a peak value in the light receiving amount data generated by the signal processing unit (C1) approximates to 0, a peak value extracted by the signal processing unit (C2) to which higher magnification is applied is employed. Alternatively, when a peak value in the light receiving amount data generated by the signal processing unit (C1) is saturated, a peak value extracted by the signal processing unit (C3) to which 1-fold magnification is applied is employed.

Abstract: In a sensor system including a plurality of photoelectric sensor units, a light projecting period arbitrarily determined in each type is provided and mutual interference is prevented between identical types. The sensor system includes the plurality of sensor units coupled by a connector unit while a signal can be transmitted. Each of the sensor units retains type information thereof, and sets a unique identification number by transmitting the signal to each other. Each sensor unit operates after a delay time determined according to the identification number thereof elapses with a synchronous signal as a starting point. The synchronous signal is transmitted with a predetermined period from the sensor unit having a specific identification number in the plurality of sensor units. The delay time of each sensor unit is determined such that an operating period is matched with a predetermined period determined in each piece of the type information.

Abstract: The disclosure provides a photoelectric sensor that provides useful information to set measurement conditions. The photoelectric sensor includes a light emitting unit having a light emitting element configured to emit detection light toward a detection area, a light receiving unit having a light receiving element configured to receive the detection light from the detection area and to obtain a detection value corresponding to the amount of light received, and a display unit configured to display information about the detection value in the light receiving unit. When the detection value varies across a predetermined threshold, the display unit displays a transit time that is the time from when the detection value crosses the predetermined threshold until when it crosses the predetermined threshold again, and a variation amount of the detection value in the variation.

Abstract: A mobile terminal includes a detecting portion that detects a state of a user, a location information acquiring portion that acquires location information of a current location of the user, and a controlling portion configured to determine whether the user is in a drowsing state or a wakeful state, based on the state of the user detected by the detecting portion. If the controlling portion determines that the user is in a drowsing state, the controlling portion drives the location information acquiring portion so as to acquire the location information for the current location, and if the controlling portion determines that the user is in a wakeful state, the controlling portion stops the location information acquiring portion.

Abstract: A signal processing unit (C1, C2, C3) for processing a light reception signal from an imaging element (12) at different magnifications is provided in a light receiving unit (102) in a displacement sensor (1). This sensor (1) measures a displacement by using light receiving amount data generated by the signal processing unit (C1) for each detection processing by a light projecting unit (101) and the light receiving unit (102), and further adjusts sensitivity for next detection processing. In sensitivity adjustment processing, when a peak value in the light receiving amount data generated by the signal processing unit (C1) approximates to 0, a peak value extracted by the signal processing unit (C2) to which higher magnification is applied is employed. Alternatively, when a peak value in the light receiving amount data generated by the signal processing unit (C1) is saturated, a peak value extracted by the signal processing unit (C3) to which 1-fold magnification is applied is employed.

Abstract: In one embodiment, a pattern inspection apparatus includes a light source configured to generate light, and a condenser configured to shape the light into a line beam to illuminate a wafer with the line beam. The apparatus further includes a spectrometer configured to disperse the line beam reflected from the wafer. The apparatus further includes a two-dimensional detector configured to detect the line beam dispersed by the spectrometer, and output a signal including spectrum information of the line beam. The apparatus further includes a comparison unit configured to compare the spectrum information obtained from corresponding places of a repetitive pattern on the wafer with each other, and a determination unit configured to determine whether the wafer includes a defect, based on a comparison result of the spectrum information.

Abstract: Teaching processing using a model of a workpiece is performed by accepting at least one input of a target value for a response time and a tolerance value for a detection error as a parameter representing a condition for a displacement sensor to operate. A CPU during teaching processing determines a maximum exposure time while it causes repeated detection processing by a light projecting unit and a light receiving unit, calculates variation in measurement data of an amount of displacement, and derives the number of pieces of data of moving average calculation suitable for a value for the input parameter as a result of operation processing using the maximum exposure time and variation in measurement data. This number of pieces of data is registered in a memory and used for moving average calculation in a normal operation mode.

Abstract: In accordance with an embodiment, a pattern inspection method includes: applying a light generated from a light source to the same region of a substrate in which an inspection target pattern is formed; guiding, imaging and then detecting a reflected light from the substrate, and acquiring a detection signal for each of a plurality of different wavelengths; and adding the detection signals of the different wavelengths in association with an incident position of an imaging surface to generate added image data including information on a wavelength and signal intensity, judging, by the added image data, whether the inspection target pattern has any defect, and when judging that the inspection target pattern has a defect, detecting the position of the defect in a direction perpendicular to the substrate.

Abstract: In accordance with an embodiment, a pattern inspection apparatus includes a stage supporting a substrate with a pattern, a light source irradiating the substrate with light, a detection unit, an optical system, a focus position change unit, a control unit, and a determination unit. The detection unit detects reflected light from the substrate. The optical system leads the light from the light source to the substrate and leads the reflected light to the detection unit. The focus position change unit changes a focus position of the light to the substrate in a direction vertical to the surface of the substrate. The control unit associates the movement of the stage with the light irradiation and controls the stage drive unit and the focus position change unit, thereby changing the focus position. The determination unit determines presence/absence of a defect of the pattern based on the signal from the determination unit.

Abstract: In accordance with an embodiment, a pattern inspection apparatus includes a beam splitter, a polarization controller, a phase controller, a wave front distribution controller, and a detector. The beam splitter generates signal light and reference light from light emitted from a light source. The signal light is reflected light from a pattern on a subject to be inspected. The polarization controller is configured to control the polarization angle and polarization phase of the reference light. The phase controller is configured to control the phase of the reference light. The wave front distribution controller is configured to control a wave front distribution of the reference light. The detector is configured to detect light resulting from interference caused by superposing the signal light and the reference light on each other.

Abstract: A method of manufacturing a color filter, includes forming a colored coated film on a substrate using a colored composition containing a pigment, a monomer having an ethylenic unsaturated double bond and photo-polymerization initiator, irradiating a filter segment-forming region or a black matrix-forming region of the colored coated film with an excimer laser beam having a wavelength of 308 nm (XeCL) at a dosage sufficient to achieve a cumulative light exposure of 1-150 mJ/cm2, thereby curing the irradiated region, removing uncured portions of the colored coated film to form the filter segment or the black matrix, and repeating the above-described steps plural times, thereby forming filter segments of at least two colors and/or a black matrix.

Abstract: A game device includes a player's character controller operative to control the movement of a player's character on a map, a non-player character controller operative to cause, of those non-player characters located on the map, non-player characters located within a predetermined range from the position of the player's character to join a procession following the player's character, and to move the non-player characters belonging to the procession to the position previously occupied by the player's character to allow the non-player characters to follow the player's character, and a procession controller operative to increase, upon receipt of a predetermined control input, the speed at which the non-player characters belonging to the procession to move to the position previously occupied by the player's character and to gather the non-player characters near the player's character.

Abstract: An image processing technology for displaying a real object and a virtual object associated with each other is provided. An image analysis apparatus according to the present invention changes a motion pattern of the virtual object depending on the actual movement of the real object. The change detector 110 detects temporal state change in the motion pattern of the real object captured by an imaging apparatus and the display controller 120 reads a motion pattern from the motion pattern storage 122 based on the event generated by the state change of an image. The display pattern controller 122 controls display mode of the virtual object using the read motion pattern.

Abstract: Disclosed is a coloring composition including a pigment, a transparent resin, a monomer having an ethylenic unsaturated double bond, and a photo-polymerization initiator, wherein a ratio (M/P) of weight (M) of the monomer having an ethylenic unsaturated double bond to weight (P) of the transparent resin is confined to a range of 0.12 to 1.35, and the coloring composition is adapted to be employed in a manufacturing method of a color filter including coating a surface of a substrate with the coloring composition, irradiating a filter segment-forming region or a black matrix-forming region of the coated coloring composition film with a laser beam having a wavelength of 340 nm to 380 nm, thereby curing the irradiated region, and removing uncured portion of the coated coloring composition film to form the filter segment or the black matrix.

Abstract: A cyan-colored composition for a color filter contains a phthalocyanine blue pigment comprising either of C.I. Pigment Blue 15:3 and C.I. Pigment Blue 15:4, or both, a phthalocyanine green pigment comprising C.I. Pigment Green 7, and a pigment carrier consisting of a transparent resin, a precursor of the resin or a mixture thereof. A color filter includes a red-colored filter segment, a green-colored filter segment, a blue-colored filter segment, and a cyan-colored filter segment or a yellow-colored filter segment.

Abstract: In a measurement apparatus, higher-quality measurement is realized in measurement of measurement object displacement or imaging of a two-dimensional image. In a controller, a light receiving signal of a photodiode is supplied to a displacement measuring unit of a sensor head in order to measure a height of a measurement object, and the height of a surface of the measurement object is measured based on the light receiving signal. Then, in the controller, image obtaining timing is determined based on the height of the measurement object. Specifically, a focus adjustment value corresponding to the computed height of the measurement object is obtained from the table, and an image obtaining signal is transmitted to an imaging device at the timing the focus adjustment value is realized. Therefore, a length between two points on the measurement object is computed from the thus obtained image based on the height of the measurement object.

Abstract: A red-colored film in which when an elliptically polarized light is incident on the film in a direction 45° aslant from a normal line direction with respect to a surface of the film, a light transmitted through the film has an average amplitude transmittance ratio (av. tan ?) in a wavelength region of 575 to 635 nm, which satisfies the following equation (1): 0.960<av. tan ?<1.040??(1). A red-colored composition contains a red pigment A having a BET specific surface area in the range from 90 to 140 m2/g, a red pigment B having a BET specific surface area in the range from 70 to 85 m2/g, and a pigment carrier formed of a transparent resin, a precursor of the transparent resin or a mixture of the tarns parent resin and precursor thereof. A color filter has the red-colored film as a red color filter segment. The liquid crystal display device includes the color filter.

Abstract: An image processing apparatus that can determine an optimal registration color according to an acquired image is provided. An image processing unit 6 receives a sample image from an imaging unit 2 and acquires a hue with respect to each of pixels arranged two-dimensionally that constitute the sample image and calculates a hue histogram. A control unit 4 extracts a candidate color based on the hue at a maximum point in the hue histogram received from the image processing unit 6. At the same time, the control unit 4 determines a hue threshold value in order to define the range of the color regarded as the candidate color. Furthermore, the control unit 4 extracts all pixels that satisfy the hue threshold value of the candidate color and acquires the value and chroma of the extracted pixel and sets the maximum value and the minimum value in the acquired value and chroma to a value threshold value and a chroma threshold value.

Abstract: An image taken by an imaging device is displayed on a display unit. When a confirmation instruction is inputted through an input unit, image teaching is performed while the image displayed on the display unit is set to a setting object image. A measurement item which is of a candidate of a measurement process including specification of a reference position is displayed as the measurement process to accept selection. Specification of cutout area which constitutes one measurement target region is accepted, a measurement point including a local region or a feature point which is used for the measurement is automatically set in the measurement target region based on pieces of information on the set measurement process and reference position.