Abstract: A method for evaluating crystal defects in a silicon carbide single crystal wafer, the method including steps of: etching a silicon carbide single crystal wafer with melted KOH so that a size of an etch pit due to a threading edge dislocation is 10 to 50 ?m; obtaining microscopic images by automatic photographing at a plurality of positions on a surface of the silicon carbide single crystal wafer after the etching; determining presence or absence of a defect dense part in each of all the obtained microscopic images based on a continued length of the etch pit formed by the etching; and classifying all the obtained microscopic images into microscopic images having the defect dense part and microscopic images not having the defect dense part to evaluate a dense state of crystal defects in the silicon carbide single crystal wafer.

Abstract: An information processing apparatus (2000) detects an abnormal region (30) from a moving image frame (14). The abnormal region (30) is a region that is estimated to represent an abnormal part inside a body of a subject. The information processing apparatus (2000) generates and outputs output information based on the number of detected abnormal regions (30).

Abstract: A deposition method includes: forming an adsorption inhibiting region on an adsorption site formed on a substrate, by causing the adsorption site to adsorb adsorption inhibiting radicals by a predetermined amount; causing an area on the adsorption site, on which the adsorption inhibiting region is not formed, to adsorb a raw material gas; and depositing a film of a reaction product on the adsorption site by causing the raw material gas adsorbed on the adsorption site to react with a reactant gas activated by a plasma.

Abstract: A transmitter apparatus wherein a simple structure is used to successfully suppress the degradation of error rate performance that otherwise would be caused by fading or the like. There are included encoding parts that encode transport data; a mapping part that performs such a mapping that encoded data sequentially formed by the encoding parts are not successively included in the same symbol, thereby forming data symbols; and a symbol interleaver that interleaves the data symbols. In this way, a low computational complexity can be used to perform an interleaving process equivalent to a bit interleaving process to effectively improve the reception quality at a receiving end.

Abstract: A valve spring includes a nitrided layer, and a core portion that is further inward than the nitrided layer. A chemical composition of the core portion consists of, in mass %, C: 0.53 to 0.59%, Si: 2.51 to 2.90%, Mn: 0.70 to 0.85%, P: 0.020% or less, S: 0.020% or less, Cr: 1.40 to 1.70%, Mo: 0.17 to 0.53%, V: 0.23 to 0.33%, Ca: 0.0001 to 0.0050%, Cu: 0.050% or less, Ni: 0.050% or less, Al: 0.0050% or less, Ti: 0.050% or less, and N: 0.0070% or less, with the balance being Fe and impurities. In the core portion, a number density of V-based precipitates having a maximum diameter ranging from 2 to 10 nm is 500 to 8000 per ?m2, and in the core portion, a numerical proportion of Ca sulfides with respect to a total number of oxide-based inclusions and sulfide-based inclusions is 0.20% or less.

Abstract: An image forming apparatus includes a photosensitive drum, a developing device configured to supply toner onto the photosensitive drum, a transfer device configured to transfer the toner supplied onto the photosensitive drum onto a sheet, a spraying device configured to spray a fixing liquid toward the sheet onto which the toner has been transferred, the spraying device including a housing configured to accommodate the fixing liquid and nozzles configured to spray the fixing liquid inside the housing, and a collecting device configured to collect the fixing liquid sprayed from the nozzles and did not adhere to the sheet. The collecting device includes a collection tray configured to accommodate the fixing liquid, a collection pipe connected to the collection tray and configured to allow the fixing liquid in the collection tray to pass therethrough, and a collection pump configured to send the fixing liquid in the collection pipe toward the housing.

Abstract: An analysis apparatus includes: an anomaly classifying unit that classifies the type of an anomaly having occurred based on time-series sensing data in occurrence of anomaly received from a plurality of sensors and a learned model learned in advance; and an identifying unit that identifies a sensor having detected information corresponding to the cause of the anomaly classified by the anomaly classifying unit based on information corresponding to the sensing data and information corresponding to past data that is past sensing data stored in advance.

Abstract: A powder conveying device includes a drop conveyance passage, an intersecting conveyance passage, a conveying screw, and a floating member. Powder entering from an inflow port drops in the drop conveyance passage. The intersecting conveyance passage communicates with a lower end of the drop conveyance passage and extends in an intersecting direction that intersects the drop conveyance passage. The conveying screw is disposed in the intersecting conveyance passage and rotates in a specified direction to convey the powder in the intersecting direction. The floating member is movably installed in the drop conveyance passage and floats in the drop conveyance passage to move by contact with the conveying screw. The inflow port and the floating member interfere with each other to prevent the floating member from coming out of the inflow port of the drop conveyance passage.

Abstract: An image forming apparatus includes an image bearer; a nip forming member configured to form a transfer nip between the image bearer and the nip forming member; a nip pressure changer configured to change a nip pressure of the transfer nip; a transfer bias applier configured to apply, to the transfer nip, a transfer bias in which an AC component is superimposed on a DC component; and a DC component adjuster configured to adjust the DC component in the transfer bias, according to the nip pressure that is changed by the nip pressure changer.

Abstract: A pharmaceutical composition for modified release comprising (R)-2-(2-aminothiazol-4-yl)-4?-[2-[(2-hydroxy-2-phenylethyl)amino]ethyl]acetic acid anilide or a pharmaceutically acceptable salt thereof, and a carrier for a sustained release pharmaceutical composition, wherein a maximum blood drug concentration (Cmax) when administered in a fasted state is 400 ng/mL or less, is disclosed.

Abstract: A transfer device includes a transfer roller and a transfer counter roller. The transfer roller has an elastic layer, contacts with and separates from an image bearer including a belt-shaped elastic body, and nips a recording medium with the image bearer. The transfer counter roller has an elastic layer, is disposed facing the transfer roller, and nips the image bearer with the transfer roller. The transfer counter roller or the transfer roller is applied with a bias to transfer the toner image. Each of the elastic layers of the transfer roller and the transfer counter roller has an Asker C hardness of 75 or less. A difference in thickness between the elastic layers of the transfer roller and the transfer counter roller is ±3% or less.

Abstract: A biasing force adjusting device includes a roller, a roller holder, a first biasing member, and a second biasing member. The roller faces a mover. The roller holder holds the roller and is displaceable with respect to the mover. The first biasing member applies a first biasing force to the roller holder to press the roller against the mover. The second biasing member applies a second biasing force greater than the first biasing force to the roller holder to press the roller against the mover.

Abstract: A cleaning device cleans a discharge wire that discharges electric charge onto a discharge target. The cleaning device moves in a longitudinal direction oldie discharge wire. The cleaning device includes a first contact portion that contacts and cleans the discharge wire and a second contact portion that contacts and cleans the discharge wire. When the first contact portion and the second contact portion clean the discharge wire, the first contact portion and the second contact portion sandwich the discharge wire in a discharge direction in which the discharge wire discharges the electric charge onto the discharge target. The discharge direction is parallel to a radial direction of the discharge wire.

Abstract: An image forming apparatus includes an image bearer; a nip forming member configured to form a transfer nip between the image bearer and the nip forming member; a nip pressure changer configured to change a nip pressure of the transfer nip; a transfer bias applier configured to apply, to the transfer nip, a transfer bias in which an AC component is superimposed on a DC component; and a DC component adjuster configured to adjust the DC component in the transfer bias, according to the nip pressure that is changed by the nip pressure changer.

Abstract: A film deposition method is provided. In the method, chlorine gas is activated in a plasma generator, and an adsorption inhibitor group is formed by adsorbing the activated chlorine gas on a surface of a substrate in a processing chamber. A source gas containing chlorine and one of silicon and a metal is adsorbed on a region without the adsorption inhibitor group of the surface of the substrate, and a nitride film is deposited by supplying a nitriding gas to the surface of the substrate and causing the nitriding gas to react with the source gas. The substrate on which the nitride film is deposited is carried out of the processing chamber, and an inside of the plasma generator is purged with activated oxygen gas.

Abstract: A developing device includes a developer bearer, a developer regulator, a developer supply passage, and a stopper. The developer bearer includes a magnetic field generator and is configured to bear a developer containing toner and magnetic carriers and conveys the developer to a developing area by rotation. A stopper prevents the developer blocked by the developer regulator from moving to a surface of the developer bearer, while securing a supply path for passing the developer in the developer supply passage to the developer bearer between the stopper and an upper end of a side wall of the developer supply passage that is opposite to the developing bearer. A width of the supply path in a direction perpendicular to a direction of a rotation axis of the developer bearer is in a range of 7%-10% of a circumference of an outer diameter of the developing bearer.

Abstract: A cleaning device cleans a discharge wire that discharges electric charge onto a discharge target. The cleaning device moves in a longitudinal direction oldie discharge wire. The cleaning device includes a first contact portion that contacts and cleans the discharge wire and a second contact portion that contacts and cleans the discharge wire. When the first contact portion and the second contact portion clean the discharge wire, the first contact portion and the second contact portion sandwich the discharge wire in a discharge direction in which the discharge wire discharges the electric charge onto the discharge target. The discharge direction is parallel to a radial direction of the discharge wire.

Abstract: A deposition method includes forming a nitride film on a surface of a substrate; and performing, after the depositing, plasma purging supplying a noble gas activated as a plasma. The forming of the nitride film includes a) forming adsorption inhibitors on the surface of the substrate, by supplying a chlorine gas activated by a plasma and by causing the activated chlorine gas to be adsorbed on the surface of the substrate; b) causing a raw material gas, containing silicon and chlorine or a metal and chlorine, to be adsorbed on a region in the surface of the substrate on which the adsorption inhibitors are not present, by supplying the raw material gas on the surface of the substrate; and c) depositing the nitride film on the surface of the substrate, by supplying a nitriding gas to cause the raw material gas to be reacted with the nitriding gas.

Abstract: A pharmaceutical composition for modified release, comprising (1) (R)-2-(2-aminothiazol-4-yl)-4?-[2-[(2-hydroxy-2-phenylethyl)amino]ethyl]acetic acid anilide, or a pharmaceutically acceptable salt thereof, (2) at least one additive which ensures penetration of water into the pharmaceutical composition and which has a solubility such that the volume of water required for dissolving 1 g of the additive is 10 mL or less, and (3) a hydrogel-forming polymer having an average molecular weight of approximately 100,000 or more, or a viscosity of 12 mPa·s or more at a 5% aqueous solution at 25 C is disclosed.

Abstract: A method for depositing a silicon nitride film is provided to fill a recessed pattern formed in a surface of a substrate with a silicon nitride film. In the method, a first silicon nitride film is deposited in the recessed pattern formed in the surface of the substrate. The first silicon nitride film has a V-shaped cross section decreasing its film thickness upward from a bottom portion of the recessed pattern. A second silicon nitride film conformal to a surface shape of the first silicon nitride film is deposited.