Abstract: A pharmaceutical composition for modified release, comprising (1) (R)-2-(2-aminothiazol-4-yl)-4?-[2-[(2-hydroxy-2-phenylethyl)amino]ethyl]acetic acid anilide, or a pharmaceutically acceptable salt thereof, (2) at least one additive which ensures penetration of water into the pharmaceutical composition and which has a solubility such that the volume of water required for dissolving 1 g of the additive is 10 mL or less, and (3) a hydrogel-forming polymer having an average molecular weight of approximately 100,000 or more, or a viscosity of 12 mPa·s or more at a 5% aqueous solution at 25 C is disclosed.

Abstract: A method for depositing a silicon nitride film is provided to fill a recessed pattern formed in a surface of a substrate with a silicon nitride film. In the method, a first silicon nitride film is deposited in the recessed pattern formed in the surface of the substrate. The first silicon nitride film has a V-shaped cross section decreasing its film thickness upward from a bottom portion of the recessed pattern. A second silicon nitride film conformal to a surface shape of the first silicon nitride film is deposited.

Abstract: An object of the present invention is to provide a method for producing a maleimide block copolymer having an acrylic monomer-derived structural unit. Provided is a method for producing a block copolymer having a polymer block (A) containing an acrylate-derived structural unit and a polymer block (B) containing an N-substituted maleimide ring structure and a methacrylate-derived structural unit, the method comprising a polymerization step in which a nitroxide polymer (A1) having a polymer block (A) and an organophosphorus unit-containing nitroxide structure at an end of the polymer block (A) and a monomer (B1) containing a methacrylate and an N-substituted maleimide are polymerized in the presence of a thiol compound (C1).

Abstract: A pharmaceutical composition for modified release comprising (R)-2-(2-aminothiazol-4-yl)-4?-[2-[(2-hydroxy-2-phenylethyl)amino]ethyl]acetic acid anilide or a pharmaceutically acceptable salt thereof, and a carrier for a sustained release pharmaceutical composition, wherein a maximum blood drug concentration (Cmax) when administered in a fasted state is 400 ng/mL or less, is disclosed.

Abstract: A developer conveyance device includes a downward conveyance path in which a developer falls under gravity, a transverse conveyance path communicating with a lower end of the downward conveyance path and extending in a transverse direction intersecting with the downward conveyance path, a transport screw disposed in the transverse conveyance path, and a floating member. The transport screw is configured to rotate in a predetermined direction to transport the developer in the transverse direction. The floating member is configured to contact the transport screw rotating in the predetermined direction to float in the downward conveyance path.

Abstract: A developing device includes a developer bearer, a developer regulator, a developer supply passage, and a stopper. The developer bearer includes a magnetic field generator and is configured to bear a developer containing toner and magnetic carriers and conveys the developer to a developing area by rotation. A stopper is configured to prevent the developer blocked by the developer regulator from moving to a surface of the developer bearer, while securing a supply path for passing the developer in the developer supply passage to the developer bearer between the stopper and an upper end of a side wall of the developer supply passage that is opposite to the developing bearer. A width of the supply path in a direction perpendicular to a direction of a rotation axis of the developer bearer is in a range of 7% or more and less than 10% of a circumference of an outer diameter of the developing bearer.

Abstract: A developer conveyance device includes a downward conveyance path in which a developer falls under gravity, a transverse conveyance path communicating with a lower end of the downward conveyance path and extending in a transverse direction intersecting with the downward conveyance path, a transport screw disposed in the transverse conveyance path, and a floating member. The transport screw is configured to rotate in a predetermined direction to transport the developer in the transverse direction. The floating member is configured to contact the transport screw rotating in the predetermined direction to float in the downward conveyance path.

Abstract: A powder container is for use with an image forming apparatus, and the image forming apparatus includes a driving protrusion that is rotatable and that protrudes toward an upstream side in an insertion direction in which the powder container is inserted. The powder container includes a container body to store powder, a cap attached to the container body, and a transmitted structure provided on the cap to contact the driving protrusion. The transmitted structure extends outward from an outer circumference of the powder container. The cap is rotatable relative to the container body in a predetermined angular range. The rotation of the cap relative to the container body is restricted so that the container body rotates along with the rotation of the cap when the rotation of the cap exceeds the predetermined angular range.

Abstract: A film deposition method is provided for filling a recessed pattern formed in a surface of a substrate with a film. In the method, an adsorption blocking group is formed by adsorbing chlorine gas activated by plasma on a top surface of the substrate and an upper portion of the recessed pattern. A source gas that contains one of silicon and a metal, and chlorine, is adsorbed on a lower portion of the recessed pattern where the adsorption blocking group is not formed, by supplying the source gas to the surface of the substrate including the recessed pattern. A molecular layer of a nitride film produced by a reaction of the source gas and a nitriding gas is deposited on the lower portion of the trench by supplying the nitriding gas to the surface of the substrate including the recessed pattern.

Abstract: A pharmaceutical composition for modified release, comprising (1) (R)-2-(2-aminothiazol-4-yl)-4?-[2-[(2-hydroxy-2-phenylethyl)amino]ethyl]acetic acid anilide, or a pharmaceutically acceptable salt thereof, (2) at least one additive which ensures penetration of water into the pharmaceutical composition and which has a solubility such that the volume of water required for dissolving 1 g of the additive is 10 mL or less, and (3) a hydrogel-forming polymer having an average molecular weight of approximately 100,000 or more, or a viscosity of 12 mPa·s or more at a 5% aqueous solution at 25° C. is disclosed.

Abstract: A method for depositing a silicon nitride film is provided. In the method, an adsorption blocking region is formed such that a chlorine-containing gas conformally adsorbs on a surface of a substrate by adsorbing chlorine radicals on the surface of the substrate. A source gas that contains silicon and chlorine is adsorbed on the adsorption blocking region adsorbed on the surface of the substrate. A silicon nitride film is deposited on the surface of the substrate by supplying a nitriding gas activated by plasma to the source gas adsorbed on the surface of the substrate.

Abstract: An object of the present invention is to provide a method for producing a maleimide block copolymer having an acrylic monomer-derived structural unit. Provided is a method for producing a block copolymer having a polymer block (A) containing an acrylate-derived structural unit and a polymer block (B) containing an N-substituted maleimide ring structure and a methacrylate-derived structural unit, the method comprising a polymerization step in which a nitroxide polymer (A1) having a polymer block (A) and an organophosphorus unit-containing nitroxide structure at an end of the polymer block (A) and a monomer (B1) containing a methacrylate and an N-substituted maleimide are polymerized in the presence of a thiol compound (C1).

Abstract: A deposition method includes forming a nitride film on a surface of a substrate; and performing, after the depositing, plasma purging supplying a noble gas activated as a plasma. The forming of the nitride film includes a) forming adsorption inhibitors on the surface of the substrate, by supplying a chlorine gas activated by a plasma and by causing the activated chlorine gas to be adsorbed on the surface of the substrate; b) causing a raw material gas, containing silicon and chlorine or a metal and chlorine, to be adsorbed on a region in the surface of the substrate on which the adsorption inhibitors are not present, by supplying the raw material gas on the surface of the substrate; and c) depositing the nitride film on the surface of the substrate, by supplying a nitriding gas to cause the raw material gas to be reacted with the nitriding gas.

Abstract: A film deposition method is provided. In the method, chlorine gas is activated in a plasma generator, and an adsorption inhibitor group is formed by adsorbing the activated chlorine gas on a surface of a substrate in a processing chamber. A source gas containing chlorine and one of silicon and a metal is adsorbed on a region without the adsorption inhibitor group of the surface of the substrate, and a nitride film is deposited by supplying a nitriding gas to the surface of the substrate and causing the nitriding gas to react with the source gas. The substrate on which the nitride film is deposited is carried out of the processing chamber, and an inside of the plasma generator is purged with activated oxygen gas.

Abstract: A powder container is for use with an image forming apparatus, and the image forming apparatus includes a driving protrusion that is rotatable and that protrudes toward an upstream side in an insertion direction in which the powder container is inserted. The powder container includes a container body to store powder, a cap attached to the container body, and a transmitted structure provided on the cap to contact the driving protrusion. The transmitted structure extends outward from an outer circumference of the powder container. The cap is rotatable relative to the container body in a predetermined angular range. The rotation of the cap relative to the container body is restricted so that the container body rotates along with the rotation of the cap when the rotation of the cap exceeds the predetermined angular range.

Abstract: A cleaning device includes a brush roller configured to contact an image bearer while rotating to remove toner adhering to an image bearer, a bias applying device configured to apply a bias to the brush roller, and control circuitry configured to causes the bias applying device to apply a first bias in a first period from when the brush roller is new to when a cumulative travel distance or a cumulative rotation time of the brush roller reaches a predetermined value, and to apply a second bias in a second period after the first period. The first bias sends a first current through the brush roller, and the second bias sends a second current through the brush roller. The absolute value of the first current is smaller than the absolute value of the second current.

Abstract: An inkjet ink including: a stilbene-based compound represented by General Formula (1) below; where in the General Formula (1), R1 and R3 each independently represent, for example, an alkyl group including 1 to 20 carbon atoms, an alkenyl group including 1 to 20 carbon atoms, a phenyl group, or a naphthyl group.

Abstract: A method for depositing a silicon nitride film is provided to fill a recessed pattern formed in a surface of a substrate. In the method, a first adsorption blocking region is formed by adsorbing first chlorine radicals such that an amount of adsorption increases upward from a bottom portion of the recessed pattern. A source gas that contains silicon and chlorine adsorbs on an adsorption site where the first adsorption site is not formed. A molecular layer of a silicon nitride film is deposited so as to have a V-shaped cross section. A second adsorption blocking region is formed by adsorbing second chlorine radicals on the molecular layer of the silicon nitride film. The molecular layer of the silicon nitride film is modified by nitriding the molecular layer while removing the second adsorption blocking region.

Abstract: A powder container is for use with an image forming apparatus, and the image forming apparatus includes a driving protrusion that is rotatable and that protrudes toward an upstream side in an insertion direction in which the powder container is inserted. The powder container includes a container body to store powder, a cap attached to the container body, and a transmitted structure provided on the cap to contact the driving protrusion. The transmitted structure extends outward from an outer circumference of the powder container. The cap is rotatable relative to the container body in a predetermined angular range. The rotation of the cap relative to the container body is restricted so that the container body rotates along with the rotation of the cap when the rotation of the cap exceeds the predetermined angular range.

Abstract: A film deposition method for depositing a silicon nitride film of selectively depositing on a flat surface of a substrate between minute recesses including a chlorine radical adsorbing step of supplying a chlorine containing gas that is activated onto a front surface of the substrate to cause the chlorine radical to be adsorbed entirely on the front surface of the substrate, a nitriding step of supplying a nitriding gas that is activated onto the substrate on which the chlorine radical adsorbs, causing the chlorine radical adsorbing on the flat surface, and nitride the flat surface from among the front surface of the substrate so as to form a silicon adsorption site, and a raw gas adsorbing step of supplying a raw gas that contains silicon and chlorine onto the substrate so as to cause the raw gas to adsorb onto the silicon adsorption site.