Patents by Inventor Zachary Fresco
Zachary Fresco has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150104360Abstract: A reactor assembly having a plurality of reaction chambers defined therein is provided. The reactor assembly includes a fluid flow module that provides a pressurized control flow of fluid from an open container. In another embodiment, the reactor block includes a plurality of passageways defined over a surface of a substrate to accommodate the combinatorial processing in order to obtain multiple data points from a single substrate.Type: ApplicationFiled: December 17, 2014Publication date: April 16, 2015Inventors: Zachary Fresco, Rich Endo
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Patent number: 8969257Abstract: A reactor assembly having a plurality of reaction chambers defined therein is provided. The reactor assembly includes a fluid flow module that provides a pressurized control flow of fluid from an open container. In another embodiment, the reactor block includes a plurality of passageways defined over a surface of a substrate to accommodate the combinatorial processing in order to obtain multiple data points from a single substrate.Type: GrantFiled: March 6, 2008Date of Patent: March 3, 2015Assignee: Intermolecular, Inc.Inventors: Zachary Fresco, Rich Endo
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Publication number: 20140166840Abstract: A substrate carrier is provided. The substrate carrier includes a base for supporting a substrate. A plurality of support tabs is affixed to a surface of the base. The plurality of support tabs have a cavity defined within an inner region of each support tab of the plurality of support tabs. A plurality of protrusions extends from the surface of the base, wherein one of the plurality of protrusions mates with one cavity to support one of the plurality of support tabs. A film is deposited over the surface of the base, surfaces of the plurality of support tabs and surfaces of the plurality of protrusions.Type: ApplicationFiled: December 14, 2012Publication date: June 19, 2014Applicant: INTERMOLECULAR, INC.Inventors: Wayne R. French, Kent Riley Child, Alonzo T. Collins, Jay B. Dedontney, Richard R. Endo, Aaron T. Francis, Zachary Fresco, Edward L. Haywood, Ashley David Lacey, Monica Sawkar Mathur, James Tsung, Danny Wang, Kenneth A. Williams, Maosheng Zhao
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Patent number: 8707897Abstract: A reactor assembly having a plurality of reaction chambers defined therein is provided. The reactor assembly includes conductive leads that mate with contacts disposed on a substrate being combinatorially processed. The conductive leads may be disposed within walls of the reactor assembly so that one end of the lead mates with the contacts on the substrate or anywhere on the surface of a conductive blanket substrate, while the other end of the lead enables communication with an external monitoring or control device.Type: GrantFiled: March 6, 2008Date of Patent: April 29, 2014Assignee: Intermolecular, Inc.Inventors: Greg Lim, Gauray Vorma, John Schmidt, Kurt Weiner, Zachary Fresco
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Patent number: 8657966Abstract: Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.Type: GrantFiled: August 12, 2009Date of Patent: February 25, 2014Assignee: Intermolecular, Inc.Inventors: Nikhil D. Kalyankar, Chi-I Lang, Zachary Fresco
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Patent number: 8580344Abstract: This disclosure provides methods, devices and systems for using a stamp to enhance selectivity between surface layers of a substrate, and to facilitate functionalizing selected layers. An array of flat stamps may be used to concurrently stamp multiple regions of a substrate to transfer one or more substances to the topmost layer or layers of the substrate. If desired, the affected regions of the substrate may be isolated from each other through the use of a reactor plate that, when clamped to the substrate's surface, forms reaction wells in the area of stamping. The stamp area can, if desired, be configured for stamping the substrate after the reactor plate has been fitted, with the individual stamps sized and arranged in a manner that permits stamping within each reaction well.Type: GrantFiled: March 16, 2009Date of Patent: November 12, 2013Assignee: Intermolecular, Inc.Inventors: Nikhil D. Kalyankar, Zachary Fresco, Chi-I Lang
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Patent number: 8575021Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.Type: GrantFiled: March 14, 2013Date of Patent: November 5, 2013Assignee: Intermolecular, Inc.Inventors: Thomas R. Boussie, Tony P. Chiang, Anh Duong, Zachary Fresco, Nitin Kumar, Chi-I Lang, Sandra G. Malhotra, Jinhong Tong
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Patent number: 8551252Abstract: Methods for removing residual particles from a substrate are presented including: receiving the substrate including the residual particles; and functionalizing the residual particles with functionalizing molecules, wherein the functionalizing molecules selectively attach with a surface the residual particles, where the functionalizing molecules impart a changed chemical characteristic to the residual particles, and where the changed chemical characteristic facilitates removal of the residual particles from the substrate. In some embodiments, methods further include: before functionalizing, cleaning the substrate, where the cleaning leaves residual particles adhered with a surface of the substrate, and where the residual particles are hydrophilic; and if the surface of the substrate is hydrophobic, performing the functionalizing.Type: GrantFiled: April 3, 2008Date of Patent: October 8, 2013Assignee: Intermolecular, Inc.Inventor: Zachary Fresco
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Patent number: 8551560Abstract: Methods for improving selective deposition of a capping layer on a patterned substrate are presented, the method including: receiving the patterned substrate, the patterned substrate including a conductive region and a dielectric region; forming a molecular masking layer (MML) on the dielectric region; preparing an electroless (ELESS) plating bath, where the ELESS plating bath includes: a cobalt (Co) ion source: a complexing agent: a buffer: a tungsten (W) ion source: and a reducing agent; and reacting the patterned substrate with the ELESS plating bath for an ELESS period at an ELESS temperature and an ELESS pH so that the capping layer is selectively formed on the conductive region. In some embodiments, methods further include a pH adjuster for adjusting the ELESS pH to a range of approximately 9.0 pH to 9.2 pH. In some embodiments, the pH adjuster is tetramethylammonium hydroxide (TMAH). In some embodiments, the MML is hydrophilic.Type: GrantFiled: May 22, 2009Date of Patent: October 8, 2013Assignee: Intermolecular, Inc.Inventors: Jinhong Tong, Zhi-Wen Sun, Chi-I Lang, Nitin Kumar, Bob Kong, Zachary Fresco
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Patent number: 8426970Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.Type: GrantFiled: December 28, 2010Date of Patent: April 23, 2013Assignee: Intermolecular, Inc.Inventors: Zachary Fresco, Chi-I Lang, Sandra G. Malhotra, Tony P. Chiang, Thomas R. Boussie, Nitin Kumar, Jinhong Tong, Anh Duong
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Publication number: 20120001320Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.Type: ApplicationFiled: December 28, 2010Publication date: January 5, 2012Inventors: Zachary Fresco, Chi-I Lang, Sandra G. Malhotra, Tony P. Chiang, Thomas R. Boussie, Nitin Kumar, Jinhong Tong, Anh Duong
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Publication number: 20110199853Abstract: Combinatorial processing including stirring is described, including defining multiple regions of a substrate, processing the multiple regions of the substrate in a combinatorial manner, introducing a fluid into a first aperture at a first end of a body to dispense the fluid out of a second aperture at a second end of the body and into one of the multiple regions, and agitating the fluid using an impeller at a second end of the body to facilitate interaction of the fluid with a surface of the substrate.Type: ApplicationFiled: April 28, 2011Publication date: August 18, 2011Applicant: INTERMOLECULAR, INC.Inventors: Zachary Fresco, Nitin Kumar
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Publication number: 20110146727Abstract: Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.Type: ApplicationFiled: August 12, 2009Publication date: June 23, 2011Inventors: Nikhil D. Kalyankar, Chi-I Lang, Zachary Fresco
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Patent number: 7960313Abstract: Combinatorial processing including stirring is described, including defining multiple regions of a substrate, processing the multiple regions of the substrate in a combinatorial manner, introducing a fluid into a first aperture at a first end of a body to dispense the fluid out of a second aperture at a second end of the body and into one of the multiple regions, and agitating the fluid using an impeller at a second end of the body to facilitate interaction of the fluid with a surface of the substrate.Type: GrantFiled: June 14, 2007Date of Patent: June 14, 2011Assignee: Intermolecular, Inc.Inventors: Zachary Fresco, Nitin Kumar
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Patent number: 7902064Abstract: A layer to enhance nucleation of a substrate is described, including a method to form the layer, the method including obtaining a substrate comprising a patterned feature comprising a dielectric region and a conductive region, selectively forming a self-aligned monolayer (SAM) on the dielectric region of the substrate to enhance nucleation process of a first precursor, and depositing the first precursor on the substrate, the precursor to adsorb on the SAM.Type: GrantFiled: May 15, 2008Date of Patent: March 8, 2011Assignee: Intermolecular, Inc.Inventors: Tony Chiang, Chi-I Lang, Zachary Fresco
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Patent number: 7879710Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.Type: GrantFiled: December 29, 2006Date of Patent: February 1, 2011Assignee: Intermolecular, Inc.Inventors: Zachary Fresco, Chi-I Lang, Sandra G. Malhotra, Tony P. Chiang, Thomas R. Boussie, Nitin Kumar, Jinhong Tong, Anh Duong
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Patent number: 7785172Abstract: Combinatorial processing including rotation and movement within a region is described, including defining multiple regions of at least one substrate, processing the multiple regions of the at least one substrate in a combinatorial manner, rotating a head in one of the multiple regions to perform the processing, and repositioning the head relative to the one of the multiple regions while rotating the head during the processing.Type: GrantFiled: August 14, 2007Date of Patent: August 31, 2010Assignee: Intermolecular, Inc.Inventors: Peter Satitpunwaycha, Richard Endo, Zachary Fresco, Nitin Kumar
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Publication number: 20090291275Abstract: Methods for improving selective deposition of a capping layer on a patterned substrate are presented, the method including: receiving the patterned substrate, the patterned substrate including a conductive region and a dielectric region; forming a molecular masking layer (MML) on the dielectric region; preparing an electroless (ELESS) plating bath, where the ELESS plating bath includes: a cobalt (Co) ion source: a complexing agent: a buffer: a tungsten (W) ion source: and a reducing agent; and reacting the patterned substrate with the ELESS plating bath for an ELESS period at an ELESS temperature and an ELESS pH so that the capping layer is selectively formed on the conductive region. In some embodiments, methods further include a pH adjuster for adjusting the ELESS pH to a range of approximately 9.0 pH to 9.2 pH. In some embodiments, the pH adjuster is tetramethylammonium hydroxide (TMAH). In some embodiments, the MML is hydrophilic.Type: ApplicationFiled: May 22, 2009Publication date: November 26, 2009Inventors: Jinhong Tong, Zhi-Wen Sun, Chi-I Lang, Nitin Kumar, Bob Kong, Zachary Fresco
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Publication number: 20090250078Abstract: Methods for removing residual particles from a substrate are presented including: receiving the substrate including the residual particles; and functionalizing the residual particles with functionalizing molecules, wherein the functionalizing molecules selectively attach with a surface the residual particles, where the functionalizing molecules impart a changed chemical characteristic to the residual particles, and where the changed chemical characteristic facilitates removal of the residual particles from the substrate. In some embodiments, methods further include: before functionalizing, cleaning the substrate, where the cleaning leaves residual particles adhered with a surface of the substrate, and where the residual particles are hydrophilic; and if the surface of the substrate is hydrophobic, performing the functionalizing.Type: ApplicationFiled: April 3, 2008Publication date: October 8, 2009Inventor: Zachary Fresco
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Publication number: 20090232966Abstract: This disclosure provides methods, devices and systems for using a stamp to enhance selectivity between surface layers of a substrate, and to facilitate functionalizing selected layers. An array of flat stamps may be used to concurrently stamp multiple regions of a substrate to transfer one or more substances to the topmost layer or layers of the substrate. If desired, the affected regions of the substrate may be isolated from each other through the use of a reactor plate that, when clamped to the substrate's surface, forms reaction wells in the area of stamping. The stamp area can, if desired, be configured for stamping the substrate after the reactor plate has been fitted, with the individual stamps sized and arranged in a manner that permits stamping within each reaction well.Type: ApplicationFiled: March 16, 2009Publication date: September 17, 2009Inventors: Nikhil D. Kalyankar, Zachary Fresco, Chi-I Lang