Abstract: Combinatorial processing including rotation and movement within a region is described, including defining multiple regions of at least one substrate, processing the multiple regions of the at least one substrate in a combinatorial manner, rotating a head in one of the multiple regions to perform the processing, and repositioning the head relative to the one of the multiple regions while rotating the head during the processing.

Abstract: Combinatorial processing including stirring is described, including defining multiple regions of a substrate, processing the multiple regions of the substrate in a combinatorial manner, introducing a fluid into a first aperture at a first end of a body to dispense the fluid out of a second aperture at a second end of the body and into one of the multiple regions, and agitating the fluid using an impeller at a second end of the body to facilitate interaction of the fluid with a surface of the substrate.

Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.

Abstract: Organosulfur compounds suitable as protected thiol-containing reactive organic layer precursors, for example 3,5-dimethoxy-?,?-dimethylbenzyloxycarbonyl-3-mercaptopropyltriethoxysilane, are useful in methods of nanometer scale (nanoscale) patterning and fabrication of nanoscale structures on patterned surfaces. The compounds and methods enable the patternwise placement of nanoparticles, with nanometer resolution to form, for example, electrically conductive nanostructures.