Face mask

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a perspective view of an embodiment of a face mask showing the new design, shown in a flat closed position;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and

FIG. 8 is an exploded front elevation view thereof.

FIG. 9 is a perspective view of another embodiment of a face mask showing the new design, shown in a position of use;

FIG. 10 is a front elevation view thereof;

FIG. 11 is a rear elevation view thereof;

FIG. 12 is a right side elevation view thereof;

FIG. 13 is a left side elevation view thereof;

FIG. 14 is a top plan view thereof; and

FIG. 15 is a bottom plan view thereof.

FIG. 16 is a perspective view of yet another embodiment of a face mask showing the new design, shown in a position of use;

FIG. 17 is a front elevation view thereof;

FIG. 18 is a rear elevation view thereof;

FIG. 19 is a right side elevation view thereof;

FIG. 20 is a left side elevation view thereof;

FIG. 21 is a top plan view thereof; and,

FIG. 22 is a bottom plan view thereof.

The broken lines illustrate portions of the face mask that form no part of the claimed design.

Claims

We claim the ornamental design for a face mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D822195 July 3, 2018 Kwong
D837970 January 8, 2019 Henderson
D912801 March 9, 2021 Mills
D928304 August 17, 2021 Yu
D962421 August 30, 2022 Kim
D978330 February 14, 2023 Park
D983357 April 11, 2023 Choi
20210068478 March 11, 2021 Lee
20220008765 January 13, 2022 Park
20220030973 February 3, 2022 Floersheimer
20220061420 March 3, 2022 Lee
20220062674 March 3, 2022 Rosert
20220104562 April 7, 2022 Teng
Foreign Patent Documents
306287443 January 2015 CN
304813526 September 2018 CN
306095764 October 2020 CN
306152334 November 2020 CN
306516483 May 2021 CN
Other references
  • KF-94 (available Sep. 29, 2020 [online] ) Retrieved Nov. 18, 2023 from internet URL: https://www.amazon.com/20Packs-KF94-Protective-Individually-Certified/dp/B08KDGFD1D/ (Year: 2020).
  • 3M Aura™ 9300+Gen3 3M Aura 9320+Gen3 Disposable Face Mask, FFP2, RS Components Corporation. Retrieved from the internet on Jan. 28, 2022 from https://ph.rs-online.com/web/p/disposable-respirators/1812311 (3 pages).
  • 3M™ Aura™ Particulate Respirator 9205+, N95, 3M. Retrieved from the internet on Jan. 28, 2022 from https://www.3m.com/3M/en_US/p/d/ v101146024/ (8 pages).
  • Three Panel Respirator Mask, Skamex. Retrieved from the internet on Jan. 28, 2022 from https://www.skamex.com/three-panel-respirator-mask-ffp2 (4 pages).
  • CN Office Action dated Jul. 5, 2023 for CN Application No. 202230193714, 1 page(s).
  • English Translation of CN Office Action dated Jul. 5, 2023 for CN Application No. 202230193714, 1 page(s).
  • IN Office Action dated May 31, 2022 for IN Application No. 362193-001, 2 pages.
Patent History
Patent number: D1027166
Type: Grant
Filed: Oct 28, 2021
Date of Patent: May 14, 2024
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Sheng Zhou (Shanghai), Xiaojin Han (Shanghai), Hongbing Xiang (Shanghai), Weifeng Shen (Shanghai), Teicheng Qu (Shanghai), ZhaoXia Jin (Shanghai)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/813,375
Classifications
Current U.S. Class: Mask (D24/110.1)