Processing machine for electron beam lithography system
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Description
FIG. 1 is a front, top and right side elevational perspective view of a processing machine for electron beam lithography system showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left elevational view thereof;
FIG. 4 is a right elevational view thereof;
FIG. 5 is a top plan elevational view thereof;
FIG. 6 is a bottom plan elevational view thereof;
FIG. 7 is a rear elevational view thereof; and,
FIG. 8 is a rear, top and left side perspective view thereof.
Referenced Cited
U.S. Patent Documents
D179493 | January 1957 | Saekler |
D185069 | May 1959 | Crowle |
D210284 | February 1968 | Kerwin |
D237209 | October 1975 | Faraco, Jr. |
Patent History
Patent number: D352910
Type: Grant
Filed: Feb 8, 1993
Date of Patent: Nov 29, 1994
Assignee: Hitachi, Ltd. (Tokyo)
Inventors: Takashi Yamamoto (Kodaira), Tomoyuki Miyata (Kokubunji), Kazunori Hasimoto (Tachikawa), Mitsuru Ohnuma (Tokyo), Toshihiko Wada (Musashimurayama), Takashi Yamazaki (Katsuta), Hiroyuki Sakai (Ibaraki)
Primary Examiner: Alan P. Douglas
Assistant Examiner: Antoine D. Davis
Law Firm: Antonelli, Terry, Stout & Kraus
Application Number: 0/4,586
Type: Grant
Filed: Feb 8, 1993
Date of Patent: Nov 29, 1994
Assignee: Hitachi, Ltd. (Tokyo)
Inventors: Takashi Yamamoto (Kodaira), Tomoyuki Miyata (Kokubunji), Kazunori Hasimoto (Tachikawa), Mitsuru Ohnuma (Tokyo), Toshihiko Wada (Musashimurayama), Takashi Yamazaki (Katsuta), Hiroyuki Sakai (Ibaraki)
Primary Examiner: Alan P. Douglas
Assistant Examiner: Antoine D. Davis
Law Firm: Antonelli, Terry, Stout & Kraus
Application Number: 0/4,586
Classifications