Electrode for a semiconductor processing apparatus

Description

FIG. 1 is a front elevational view of an electrode for a semiconductor processing apparatus showing my new design;

FIG. 2 is a right side elevational view thereof; a left side elevational view being a mirror image thereof;

FIG. 3 is a top plan view thereof; a bottom plan view being a mirror image thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is an enlarged cross-sectional view taken along line 5--5 of FIG. 1; and,

FIG. 6 is an enlarged cross-sectional view taken along line 6--6 of FIG. 1.

Referenced Cited
Foreign Patent Documents
60-116126 June 1985 JPX
60-169257 November 1985 JPX
60-221578 November 1985 JPX
61-171128 August 1986 JPX
62-60875 March 1987 JPX
62-252942 November 1987 JPX
62-281427 December 1987 JPX
325510 April 1991 JPX
920077 October 1992 JPX
Patent History
Patent number: D363464
Type: Grant
Filed: Feb 26, 1993
Date of Patent: Oct 24, 1995
Assignee: Tokyo Electron Yamanashi Limited (Nirasaki)
Inventor: Kazuo Fukasawa (Nirasaki)
Primary Examiner: Joel Sincavage
Law Firm: Oblon, Spivak, McClelland, Maier & Neustadt
Application Number: 0/5,246