Abstract: An antenna portion 46 retaining in a tip portion thereof antenna coils 49 configured to perform wireless communication with an IC card through an electromagnetic coupling is structured to be freely movable forward/backward between a protruding position above a lane and a retracted position in a unit. An antenna head portion 48 of the antenna unit 46 protrudes above the lane and the antenna coils 49 become close to a vehicle on the lane, so that a distance between the driver of a vehicle and the antenna coils 49 is shortened and the user can present an IC card 80 inside a communication distance of an antenna without any difficulty.

Abstract: An antenna portion 46 retaining in a tip portion thereof antenna coils 49 configured to perform wireless communication with an IC card through an electromagnetic coupling is structured to be freely movable forward/backward between a protruding position above a lane and a retracted position in an unit. An antenna head portion 48 of the antenna unit 46 protrudes above the lane and the antenna coils 49 become close to a vehicle on the lane, so that a distance between the driver of a vehicle and the antenna coils 49 is shortened and the user can present an IC card 80 inside a communication distance of an antenna without any difficulty.

Abstract: A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole.

Abstract: A method of detecting abnormalities in flow rate in pressure-type flow controller. The method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.

Abstract: A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.

Abstract: A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole.

Abstract: A card processing apparatus process the card having the magnetic layer containing two types magnetic material. The one of the magnetic materials increases coercive force once receiving a magnetic field as compared to coercive force prior to application of the magnetic field and changes to a substantially irreversible state. This apparatus records first data by applying a magnetic field so as to record the data on the magnetic layer of the card at a first azimuth angle in order to change the states of the two types magnetic materials of the magnetic layer. This apparatus also records second data by applying a magnetic field so as to record the data at a second azimuth angle different from the first azimuth angle in order to change the state of the first magnetic material of the area of the card which is recorded as the first data.

Abstract: A plasma processing method in which a high-frequency power is supplied to a processing chamber in which an object to be processed is mounted, thereby producing a plasma in the processing chamber, and the object is processed in an atmosphere of the plasma, wherein the high-frequency power is subjected to modulation by a low-frequency power. In one embodiment a plasma is produced in a processing chamber by using an electric power with a direction of current changed with passing of time, and the object to be processed is processed in an atmosphere of the plasma, wherein a power having a basic frequency is subjected to frequency modulation with a frequency equal to n-times (n=an integer) the basic frequency. In a plasma processing apparatus of the invention, while a process gas is supplied to a processing chamber via a first gas introducing hole formed in an electrode, an object to be processed, which is held on an opposed electrode, is subjected to plasma processing.

Abstract: A radio communication system is provided at an entrance gate of traffic facilities for radio communicating with a communication device carried by a vehicle. The system includes a first communication unit for transmitting first entrance data relative to the entrance gate of the traffic facilities to the communication device carried by the vehicle coming into the entrance gate, a discriminating unit for determining a vehicle type showing a kind of incoming vehicle, and a second communication unit, provided on an opposite side of the entrance gate from the first communication unit, along a direction of progress of the vehicle, for transmitting a second entrance data including data relative to the determined vehicle type to the communication device when the first communication unit transmits the first entrance data to the communication device.

Abstract: A magnetic medium processing apparatus includes a magnetism reading head for reading magnetic data recorded in a ticket, a peak value detector for detecting peak values of a signal output from the reading head, and a display for displaying the digital peak values detected by the peak value detector. Monitoring the state of reading by the reading head prevents unstable reading of magnetic data irrespective of whether the reading head is worn out.

Abstract: A plasma processing apparatus having a pair of electrodes which are installed alternately in parallel in a chamber and in which an object to be processed is placed at one electrode thereof, radiofrequency applying device for applying radiofrequency power between the pair of electrodes, cooling device for cooling the object, drying-gas introducing tube for supplying a drying gas into the chamber, and dropwise-condensation preventing member installed at a portion of the chamber so as to be in contact with the outer atmosphere. The apparatus can prevent dropwise condensation at the time of cooling and at the same time prevent the occurrence of radiofrequency leakage.

Abstract: Prior to plasma etching, a wafer is placed on conductive support pins which extend through an electrostatic chuck. The electrostatic chuck is disposed on a susceptor incorporating a cooling jacket. A potential for electrostatic attraction is applied to the electrostatic chuck. The support pins are lowered while they are grounded, thus placing the wafer on the electrostatic chuck. Subsequently, the support pins are retracted into the electrostatic chuck to release contact between the wafer and themselves. A heat medium gas is then supplied between the wafer and the electrostatic chuck to improve the heat transfer rate therebetween. A plasma is then generated in a process chamber, and the wafer is etched by using the plasma. Since the heat transfer rate between the wafer and the electrostatic chuck is improved before the generation of the plasma, damage to the wafer due to heat can be prevented, and the starting time required to start an etching process is shortened.

Abstract: A wafer mount is arranged in a process chamber of the plasma etching apparatus. The rim section of a susceptor which serves as a mount body is curved at a large curvature radius. An electrostatic chuck sheet is arranged on the top of the susceptor and its rim is curved downward along the curved rim section of the susceptor, departing from the marginal portion of a semiconductor wafer mounted thereon as it comes outward. The rim of the electrostatic chuck sheet can be thus shortened in the horizontal direction and this enables a conductive film in the electrostatic chuck sheet to be made longer in the same direction. The electrostatic and thermal connection of the wafer to the electrostatic chuck sheet can be thus enhanced.

Abstract: An etching device comprising a housing in which etching process is carried out, an electrode system having lower and upper electrodes opposed to each other used to generate plasma between these electrodes, while a semiconductor wafer is being placed on the lower electrode, a lifter system to move the lower electrode up and down, a high-frequency power source for applying current between these electrodes, a holder member located between the lower and upper electrodes to hold the wafer at a certain position between these electrodes, and a gas supply means for supplying reaction gases used to generate plasma, between the lower and upper electrodes.