Upper electrode for manufacturing semiconductors

- Tokyo Electron Limited
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Description

FIG. 1 is a front elevational view of an upper electrode for manufacturing semiconductors showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a front elevational view thereof, showing the electrode in an opened state;

FIG. 8 is a rear elevational view thereof, showing the electrode in an opened state;

FIG. 9 is a top plan view thereof, showing the electrode in an opened state;

FIG. 10 is a bottom plan view thereof, showing the electrode in an opened state;

FIG. 11 is a right side elevational view thereof, showing the electrode in an opened state;

FIG. 12 is a left side elevational view thereof, showing the electrode in an opened state; and,

FIG. 13 is a reduced front elevational view thereof, showing the electrode in an opened state, with the broken-line disclosure being for illustrative purposes only and forming no part of the claimed design.

Referenced Cited
U.S. Patent Documents
4857689 August 15, 1989 Lee
5314574 May 24, 1994 Takahashi
5320218 June 14, 1994 Yamashita et al.
Patent History
Patent number: D412513
Type: Grant
Filed: Jul 28, 1997
Date of Patent: Aug 3, 1999
Assignee: Tokyo Electron Limited (Tokyo-To)
Inventor: Jun Ooyabu (Yamanashi-Ken)
Primary Examiner: Brian N. Vinson
Law Firm: Ladas & Parry
Application Number: 0/74,109
Classifications
Current U.S. Class: Heat Treatment, Welding Or Brazing (D15/144)
International Classification: 1501;