Monolith processing system platform

- Applied Materials, Inc.
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Description

FIG. 1 is a top perspective view of a monolith processing system platform of the present invention;

FIG. 2 is a perspective view showing substantially the top of a monolith processing system platform of the present invention;

FIG. 3 is a perspective view showing substantially one side of a monolith processing system platform of the present invention;

FIG. 4 is a perspective view showing substantially another side of a monolith processing system platform of the present invention;

FIG. 5 is a perspective view showing substantially the back end of a monolith processing system platform of the present invention; and

FIG. 6 is a perspective view showing substantially the front end of a monolith processing system platform of the present invention; and,

FIG. 7 is a perspective view showing substantially the bottom of a monolith processing system platform of the present invention.

Claims

The ornamental design for a monolith processing system platform.

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Patent History
Patent number: D446506
Type: Grant
Filed: Nov 30, 1999
Date of Patent: Aug 14, 2001
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Avi Tepman (Cupertino, CA)
Primary Examiner: Brian N. Vinson
Attorney, Agent or Law Firm: Thomason, Moser & Patterson, L.L.P.
Application Number: 29/114,735
Classifications
Current U.S. Class: Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)
International Classification: 1303;