Semi-panel image for a cap
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Description
FIG. 1 is a rear perspective view of semi-panel image for a cap showing my new design;
FIG. 2 is a rear elevational view of FIG. 1;
FIG. 3 is a reduced right side elevational view of FIG. 1: the left side is a mirror image; and,
FIG. 4 is a reduced top plan view of FIG. 1.
The broken line showing of a part of the crown and the visor is for illustrative purposes only and forms no part of the claimed design, and the broken line shown in the solid line on the part of the crown represents stitching.
Claims
The ornamental design for semi-panel image for a cap, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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D405239 | February 9, 1999 | Kostinko |
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D452768 | January 8, 2002 | Park |
D453610 | February 19, 2002 | Lee |
6345395 | February 12, 2002 | Chilton |
D455539 | April 16, 2002 | Kates |
D459860 | July 9, 2002 | Bussell |
D460604 | July 23, 2002 | Sullivan, Jr. |
D474002 | May 6, 2003 | Park |
- Hat, marked as A, Supreme Hats Mfg. Co., p. 281, Hong Kong Enterprise catalog, vol. 5, 1983.
Patent History
Patent number: D493025
Type: Grant
Filed: Jan 17, 2003
Date of Patent: Jul 20, 2004
Assignee: Dada Corp. (Seoul)
Inventor: Boo Yl Park (Seoul)
Primary Examiner: Stacia Cadmus
Assistant Examiner: Mimosa De
Application Number: 29/174,386
Type: Grant
Filed: Jan 17, 2003
Date of Patent: Jul 20, 2004
Assignee: Dada Corp. (Seoul)
Inventor: Boo Yl Park (Seoul)
Primary Examiner: Stacia Cadmus
Assistant Examiner: Mimosa De
Application Number: 29/174,386
Classifications
Current U.S. Class:
D2/882
International Classification: 0203;
International Classification: 0203;