Dielectric window for plasma processing device

- Tokyo Electron Limited
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Description

FIG. 1 is a perspective view of a dielectric window for plasma processing device showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a cross-sectional view taken along line 6-6 of FIG. 2.

The broken lines are shown for illustrative purposes only and form no part of the claimed design.

Claims

The ornamental design for a dielectric window for plasma processing device, as shown and described.

Referenced Cited
U.S. Patent Documents
4391034 July 5, 1983 Stuby
6280563 August 28, 2001 Baldwin et al.
7694651 April 13, 2010 Vikharev et al.
20010007302 July 12, 2001 Hong
20060110546 May 25, 2006 Vikharev et al.
20080102538 May 1, 2008 Chang et al.
20090068934 March 12, 2009 Hong et al.
20090314434 December 24, 2009 Song et al.
20100230273 September 16, 2010 Kawamata
Other references
  • Korean Office Action—Korean Application No. 30-2010-0033996 issued on Nov. 7, 2011.
Patent History
Patent number: D672377
Type: Grant
Filed: Sep 10, 2010
Date of Patent: Dec 11, 2012
Assignee: Tokyo Electron Limited
Inventors: Wataru Yoshikawa (Amagasaki), Naoki Matsumoto (Amagasaki), Jun Yoshikawa (Amagasaki)
Primary Examiner: Patricia Palasik
Attorney: Cantor Colburn LLP
Application Number: 29/369,650
Classifications
Current U.S. Class: Element Or Attachment (D15/138)