Gas nozzle for substrate processing apparatus
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Claims
We claim the ornamental design for an gas nozzle for substrate processing apparatus, as shown (and described).
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Type: Grant
Filed: May 25, 2018
Date of Patent: Jul 7, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Yusaku Okajima (Tokyo), Toru Kagaya (Tokyo), Hiroaki Hiramatsu (Tokyo), Shinya Ebata (Tokyo)
Primary Examiner: Derrick E Holland
Assistant Examiner: Andrew Kerr
Application Number: 29/649,036