Condition Of Coated Material Patents (Class 118/665)
  • Publication number: 20020187260
    Abstract: Microchip devices are provided with an inert and biocompatible conformal coating to mitigate adverse responses following device implantation in a patient, to contain and seal a drug or other material within the device, and/or to insulate the electrical connections to the device. The device can include: (1) a substrate having a plurality of reservoirs; (2) reservoir contents, such as a drug or biosensor, in the reservoirs; (3) reservoir caps covering the reservoirs to isolate the contents from environmental components outside the reservoirs; and (4) a conformal coating over the outer surface of at least a portion of the substrate other than the reservoir caps. The reservoir caps can be selectively disintegrated or permeabilized to expose the reservoir contents to environmental components. The conformal coating preferably comprises a vapor depositable polymeric material, such as parylene. Processes for controlling coating of the devices while facilitating reservoir cap exposure are provided.
    Type: Application
    Filed: May 30, 2002
    Publication date: December 12, 2002
    Inventors: Norman F. Sheppard, Christina M. Feakes
  • Publication number: 20020187654
    Abstract: A method of forming a high dielectric oxide film conventionally formed using a post formation oxygen anneal to reduce the leakage current of such film includes forming a high dielectric oxide film on a surface. The high dielectric oxide film has a dielectric constant greater than about 4 and includes a plurality of oxygen vacancies present during the formation of the film. The high dielectric oxide film is exposed during the formation thereof to an amount of atomic oxygen sufficient for reducing the number of oxygen vacancies and eliminating the post formation oxygen anneal of the high dielectric oxide film. Further, the amount of atomic oxygen used in the formation method may be controlled as a function of the amount of oxygen incorporated into the high dielectric oxide film during the formation thereof or be controlled as a function of the concentration of atomic oxygen in a process chamber in which the high dielectric oxide film is being formed.
    Type: Application
    Filed: August 7, 2002
    Publication date: December 12, 2002
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Scott J. DeBoer, Randhir P.S. Thakur
  • Publication number: 20020176928
    Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part.
    Type: Application
    Filed: May 23, 2002
    Publication date: November 28, 2002
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
  • Patent number: 6485571
    Abstract: A machine for one of manufacturing and processing a fiber web includes an input end which receives a fiber suspension or a fiber web. The input end includes a plurality of control modules, with each control module controlling at least one of a plurality of adjustable input parameters. A plurality of sensors are provided, with each sensor being configured to sense a physical characteristic of one of the fiber suspension and the fiber web and provide an output signal indicative thereof. A chemistry process controller is coupled with each sensor and each control module to define a closed loop control system. The chemistry process controller controls operation of each control module.
    Type: Grant
    Filed: July 20, 2000
    Date of Patent: November 26, 2002
    Assignee: Voith Sulzer Paper Technology North America, Inc.
    Inventor: Edwin X. Graf
  • Patent number: 6485782
    Abstract: A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a predetermined speed with no danger of producing a scratchpad. Alternatively, the width in the radius direction of a scratchpad is measured, and the rotation speed or the like of the wafer is controlled so that the width in the radius direction becomes not more than a predetermined value. Thereby, occurrence of the scratchpad is prevented or the degree thereof is decreased, thereby avoiding uncoating of the coating solution on the substrate and reducing the amount of the coating solution used.
    Type: Grant
    Filed: October 30, 2001
    Date of Patent: November 26, 2002
    Assignee: Tokyo Electron Limited
    Inventor: Hideyuki Takamori
  • Patent number: 6478875
    Abstract: An apparatus for performing in-situ curvature measurement of a substrate during a deposition process is provided which includes a clamp for retaining the substrate near one end while leaving the opposite end free. A plurality of displacement sensors are arranged in a spaced apart fashion along the length of the substrate and are directed to a surface of the substrate opposite a surface to be coated. Each sensor provides a signal to a computer corresponding to a position of the substrate relative to the sensor. The computer receives and stores data from the displacement sensors to determine a stress evolution during a deposition process and to determine a coating modulus based upon a resultant curvature of the substrate.
    Type: Grant
    Filed: March 2, 2000
    Date of Patent: November 12, 2002
    Assignee: The Research Foundation of State University of New York
    Inventors: Sanjay Sampath, Jiri Matejicek
  • Patent number: 6475282
    Abstract: A control system for assisting in applying a uniform layer of liquid to a substrate. The control system monitors a fluid pump advantageously integrated directly with an extrusion head. The pump receives the material to be deposited from a remote reservoir and controls dispersion of fluid to the extrusion head. The pump dispense rate is controlled by hydraulic pressure selectively applied by a flow control motor. The control system ensures that a steady-state flow of the liquid is maintained while preventing transient perturbations during initial extrusion startup.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: November 5, 2002
    Assignee: FAStar, Ltd.
    Inventors: Ocie T. Snodgrass, Gregory M. Gibson, Carl W. Newquist
  • Publication number: 20020132039
    Abstract: The present invention relates to a process and an apparatus for detecting a fault in a flowing liquid sheet and in particular in a coating curtain. The process comprises the following steps: transmitting an electromagnetic beam to the sheet so as to irradiate approximately the entire width of the sheet in a direction approximately transverse to the sheet; recovering a beam reflected by the sheet by way of a collector; defining a reference position of the reflected beam on the collector; and noting the deviations of the reflected beam in relation to the previously defined reference position.
    Type: Application
    Filed: May 20, 2002
    Publication date: September 19, 2002
    Inventor: Jerome Emonot
  • Patent number: 6447836
    Abstract: The present invention relates to a method of and a device for optimizing at least one coating material at at least one point of a substrate surface to which the coating material is applied. The method, which is carried out with the corresponding device, comprises at least the following steps: a) applying said at least one coating material to said at least one point of the substrate surface, b) curing said at least one coating material at said at least one point of the substrate surface, and c) determining the state, especially the curing and/or yellowing and/or gloss, of said coating material at said at least one point of the substrate surface, possessed by said coating material as a consequence of steps a) and b).
    Type: Grant
    Filed: January 24, 2001
    Date of Patent: September 10, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Schrof, Dieter Horn, Reinhold Schwalm, Uwe Meisenburg, Andreas Pfau
  • Patent number: 6425988
    Abstract: A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: July 30, 2002
    Inventors: Claude Montcalm, James Allen Folta, Swie-In Tan, Ira Reiss
  • Publication number: 20020092473
    Abstract: An ion source for use in ion assisted deposition of films, has a ionisation region, a gas supply, supplying ionisable gas to the ionisation region, a gas excitation system causing ionisation of the gas, ion influencing means forming the ions into a current directed at a target, and an ion source controller controlling the ion source so as to intermittently produce the current.
    Type: Application
    Filed: August 9, 2001
    Publication date: July 18, 2002
    Inventor: Wayne G. Sainty
  • Patent number: 6419802
    Abstract: A system and method for controlling a circumferential deposition thickness distribution on a substrate includes a motor that rotates the substrate and a position sensor that senses a position of the substrate. At least one deposition thickness sensor senses the deposition thickness of the substrate at multiple positions on a circumference of a circle centered about an axis of rotation of the substrate. At least one controller drives a vapor source used to emit material for a deposition on a substrate. The at least one controller is coupled to the position sensor and the deposition thickness sensor. The controller synchronously varies an emission rate of material from the vapor source with respect to the position of the substrate to control the circumferential deposition thickness distribution.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: July 16, 2002
    Inventors: David Alan Baldwin, Todd Lanier Hylton
  • Patent number: 6402905
    Abstract: A system and method for controlling a deposition thickness distribution on a substrate includes a motor that rotates the substrate and at least one deposition thickness sensor that senses the deposition thickness on the rotating substrate at two or more radii. At least one actuator varies a shadow of a mask that is disposed over the rotating substrate, wherein the shadow has a surface area that is less than an unmasked surface area of the rotating substrate. A vapor source deposits material on the rotating substrate. A process controller is coupled to the thickness deposition sensor and the at least one actuator. In response to an output of the deposition thickness sensor, the process controller varies the shadow of the mask along a radius of the substrate to control the deposition thickness distribution.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: June 11, 2002
    Assignee: 4 Wave, Inc
    Inventors: David Alan Baldwin, Todd Lanier Hylton
  • Patent number: 6376006
    Abstract: A system is disclosed for detecting or inspecting for a lining of a container closure that is formed of a sheet metal and has a panel on an inside surface of the closure. The panel of the closure has a lining formed thereon. The system according to the present invention includes a conveyor for moving plural closures longitudinally and substantially through the system, a color sensor that inspects the panel of each one of the closures on the conveyor for a predetermined color, and a separator that is capable of removing closures that lack the predetermined color. The system may include an oven downstream from the sensor to bake the lining. Thus, the system automatically identifies and removes the closure having the deficient color from the conveyor. A corresponding method for identifying and removing a closure having a deficient color is also disclosed.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: April 23, 2002
    Assignee: Crown Cork & Seal Technologies Corporation
    Inventors: Gerald M. Gresko, Daniel L. Brant
  • Publication number: 20020043280
    Abstract: A robot arm with a coating gun mounted on a distal end thereof houses therein a first color changing valve mechanism for supplying a base compound, an electropneumatic transducer, and a second color changing valve mechanism for supplying a hardener, which are successively arranged in the order named toward the coating gun. The base compound and the hardener supplied from these mechanisms controlled by the electropneumatic transducer can be mixed highly accurately at a desired mixing ratio, and applied to coat a workpiece with a high-quality coating layer.
    Type: Application
    Filed: August 22, 2001
    Publication date: April 18, 2002
    Inventors: Hiroshi Ochiai, Hiroyoshi Nozaki, Hidenori Taguchi, Shinobu Tokin
  • Patent number: 6374194
    Abstract: A particle formation diagnosing system monitors the condition of particle formation in each of reaction chambers 1 of a semiconductor device fabricating line on the basis of data provided by a pressure measuring device 2a, a temperature measuring device 2b and a differential mobility analyzer 3 combined with each reaction chamber 1. The operation record recording unit 4a of the computer system 4 records data on the relation between the values of the operation parameters of each reaction chamber 1 and the amount of particles formed in the reaction chamber. Then, the operating condition determining unit 4b determines the optimum values for the operation parameters of the reaction chamber which will reduce the possibility of particle formation to the least possible extent on the basis of the data recorded by the operation record recording unit 4a.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: April 16, 2002
    Assignee: The Institute of Physical and Chemical Research
    Inventor: Kazuo Takeuchi
  • Patent number: 6364953
    Abstract: A method for making an aerogel film includes the steps of performing a gelation reaction of a metal alkoxide on a substrate to prepare a substrate with a wet-gel film, and converting the wet-gel film into an aerogel film by a supercritical or sub-critical drying process of the substrate with the wet-gel film, wherein the degree of gelation of the wet-gel film is controlled to be a predetermined value at the start of the supercritical or sub-critical drying process. Aerogel films having uniform qualities are produced by the supercritical or sub-critical drying process in one lot.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: April 2, 2002
    Assignee: Kabushiki Kaisha Kobe Seiko Sho.
    Inventors: Nobuyuki Kawakami, Yoshito Fukumoto, Kenichi Inoue, Kohei Suzuki, Takashi Kinoshita, Katsuhiro Uehara
  • Patent number: 6343501
    Abstract: The system and the method are used to determine the process viscosity (&mgr;) of a fluid (22) in a film metering device (10) used to form a film (24) to be applied on a substrate (20), such as a paper web or any other suitable flexible materials. The apparent shear rate ({dot over (&ggr;)}) of the fluid, indicative of the flow field, may also be calculated. These parameters are calculated using a pressure profile representing the pressure of the fluid between a transfer roll (12) and a metering rod (30) which controls the thickness of the coating film (24). The torque (T) applied on the metering rod (30) is also measured and taken into account in the calculations. The system and method allow the process viscosity (&mgr;) to be easily and accurately determined during the operation of the film metering device (10) without the need of testing the fluid in an external device and attempting to extrapolate the results to the process.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: February 5, 2002
    Assignee: Polyvalor S.E.C.
    Inventors: Olivier Reglat, Philippe A. Tanguy
  • Publication number: 20020011206
    Abstract: A cylindrical member is placed in a dead-end hole formed in a housing made of a material such as aluminum. A peripheral portion of the hole is pressed down to plastically deform the housing material and to supply the deformed material into a groove formed on an outer periphery of the cylindrical member. The cylindrical member is calked to the housing in this manner. To supply a proper amount of deformed material into the groove for obtaining a quality calking, an inflection point of a calking curve indicating a relation of a calking force and a calking stroke is detected during the calking process. After the inflection point is detected, the calking is performed by giving a predetermined calking stroke or by adding a predetermined calking force.
    Type: Application
    Filed: June 28, 2001
    Publication date: January 31, 2002
    Inventors: Yasuhiko Yamazaki, Akinori Nakayama, Minoru Watanabe, Shinya Mitani, Toshiharu Mizuno, Hidenobu Kajita
  • Patent number: 6338775
    Abstract: A thin film deposition apparatus and method are disclosed in this invention. The method includes a step of providing a vacuum chamber for containing a thin-film particle source for generating thin-film particles to deposit a thin-film on the substrates. The method further includes a step of containing a substrate holder in the vacuum chamber for holding a plurality of substrates having a thin-film deposition surface facing the thin-film particle source. The method further includes a step of providing a rotational means for rotating the substrate holder to rotate each of the substrates exposed to the thin-film particles for depositing a thin film thereon. And, the method further includes a step of providing a lateral moving means for laterally moving and controlling a duration of exposure time across a radial direction for each of the substrates for controlling thickness uniformity of the thin-film deposited on each of the substrates.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: January 15, 2002
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventor: Jiong Chen
  • Patent number: 6319317
    Abstract: A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a predetermined speed with no danger of producing a scratchpad. Alternatively, the width in the radius direction of a scratchpad is measured, and the rotation speed or the like of the wafer is controlled so that the width in the radius direction becomes not more than a predetermined value. Thereby, occurrence of the scratchpad is prevented or the degree thereof is decreased, thereby avoiding uncoating of the coating solution on the substrate and reducing the amount of the coating solution used.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: November 20, 2001
    Assignee: Tokyo Electron Limited
    Inventor: Hideyuki Takamori
  • Patent number: 6312523
    Abstract: The present invention relates to methods and apparatus for the controlled placement of a shear-thinnable polymer composition into a moving web. The controlled placement is preferably performed by applying the polymer composition onto a surface of a moving web, shear thinning the composition and placing it into the web, and curing the polymer composition. A preferred apparatus includes one or more process heads that has mounted thereto a rigid knife blade for engagement with the moving web. The knife blade is movable vertically and rotationally. The process head is also movable horizontally along the path of the moving web. A plurality of macro and micro tension zones are established and are monitored for controlling the apparatus and process.
    Type: Grant
    Filed: September 27, 1999
    Date of Patent: November 6, 2001
    Assignee: Nextec Applications, Inc.
    Inventors: James Michael Caldwell, George Schmermund
  • Patent number: 6270579
    Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a multiple tip nozzle and a movement system that moves the nozzle to an operating position above a central region of a photoresist material layer located on a substrate, and applies a volume of developer as the nozzle scan moves across a predetermined path. The movement system moves the nozzle in two dimensions by providing an arm that has a first arm member that is pivotable about a first rotational axis and a second arm member that is pivotable about a second rotational axis or is movable along a translational axis. The system also provides a measurement system that measures the thickness uniformity of the developed photoresist material layer disposed on a test wafer. The thickness uniformity data is used to reconfigure the predetermined path of the nozzle as the developer is applied.
    Type: Grant
    Filed: October 29, 1999
    Date of Patent: August 7, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur
  • Patent number: 6248174
    Abstract: An apparatus for direct or indirect application of liquid or pasty coating medium onto a traveling material web, notably of paper or cardboard, includes a paint curtain applicator mechanism and at least one sensor unit to register the flow quantity of the coating medium layer applied onto the material web and to provide a corresponding flow quantity signal. At least one regulation device regulates at least one manipulated variable of the paint curtain applicator mechanism upon which the flow quantity of the coating medium layer applied onto the material web depends. A control unit, which receives the flow quantity signal provided by the at least one sensor device, determines at least one face value for the at least one manipulated variable and controls the at least one regulation device on the basis of the at least one manipulated variable-face value.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: June 19, 2001
    Assignee: Voith Sulzer Papiertechnik Patent GmbH
    Inventor: Martin Kustermann
  • Patent number: 6183561
    Abstract: A sensor and a method for determining the basis weight of a coating material containing latex on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
    Type: Grant
    Filed: December 15, 1998
    Date of Patent: February 6, 2001
    Assignee: Honeywell International Inc
    Inventor: Edward Belotserkovsky
  • Patent number: 6179918
    Abstract: A sensor and a method for determining the coating weight of a coating material containing silicone on a substrate is described. The determined coating weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform weight.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: January 30, 2001
    Assignee: Honeywell International Inc.
    Inventor: Edward Belotserkovsky
  • Patent number: 6171642
    Abstract: In a method of direct or indirect application of a liquid or viscous coating medium onto a moving material web, specifically a paper or cardboard web, a layer of the coating medium is applied to the material web by use of an applicator unit. The coating result is then checked for deviations from the desired coating result. In the event that such deviations are detected, and in order to correct them, at least one applicator unit operating parameter is adjusted. The adjustment is made within a short time period, and with the material web running, from an initial operating parameter value that is in effect prior to detection of the deviation. Subsequently, the operating parameter is then reset to at least approximately the initial parameter value, whereby the adjustment and the subsequent resetting may be repeated if necessary.
    Type: Grant
    Filed: January 8, 1999
    Date of Patent: January 9, 2001
    Assignee: Voith Sulzer Papiertechnik Patent GmbH
    Inventor: Martin Kustermann
  • Patent number: 6128087
    Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings.
    Type: Grant
    Filed: May 8, 1998
    Date of Patent: October 3, 2000
    Inventors: William A. Meredith, Jr., Charles C. Gammans, Kelly R. Clayton, Erik J. Bjornard, Kim D. Powers
  • Patent number: 6086734
    Abstract: A thin-film depositing apparatus of the present invention deposits a sputtered film on a substrate in a sputtering chamber, and removes the substrate having the sputtered film deposited thereon from the sputtering chamber via a load-lock chamber by a robot arm. As a system for controlling the sheet resistance of the sputtered film deposited on the substrate, a measuring device using an eddy current method is mounted in the proximity of a substrate outlet of the load-lock chamber and measures the sheet resistance of the sputtered film of the substrate removed from the substrate outlet. With this structure, it is possible to provide a thin-film depositing apparatus which stably measures the sheet resistance of a thin film deposited on a substrate and performs feedback of the measurement result to control the film deposition conditions so that a thin film to be deposited on a subsequent substrate has a desired thickness.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: July 11, 2000
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshinori Harada
  • Patent number: 6074483
    Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: June 13, 2000
    Assignee: Honeywell-Measurex Corporation
    Inventors: Edward Belotserkovsky, John A. Dahlquist
  • Patent number: 6060124
    Abstract: There is provided a process of producing a prepreg in which a sheet-shaped fabric material as a reinforcing substrate is continuously provided, a thermosetting resin as a matrix resin in a molten state is supplied to the substrate, and the resin is heated, which process contains the steps of:(a) a first coating step in which the matrix resin is applied to one surface of the reinforcing substrate using a first die coater, and an amount of the matrix resin to be applied is equal to or larger than an amount of the matrix resin which the reinforcing substrate is able to contain in its total void as much as possible,(b) a first heating step in which the reinforcing substrate having the matrix resin is heated by a first non-contact type heating unit so that the matrix resin is impregnated into the inside of the reinforcing substrate, whereby a laminar composite made of the matrix resin and the reinforcing substrate is obtained,(c) a second coating step in which the matrix resin is further applied to at least one of
    Type: Grant
    Filed: August 6, 1997
    Date of Patent: May 9, 2000
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Naoto Ikegawa, Hiroshi Harada, Ryuichi Hamabe
  • Patent number: 6039806
    Abstract: The present invention provides for a system for the precision optical coating of substrates and a method of operating the system. The system has a vacuum chamber, a plasma source in the vacuum chamber, a plurality of e-beam evaporation units which generate a vapor of optical coating material in the vacuum chamber, and a plurality of stations, each station holding one substrate and rotating the substrate during deposition of the optical coating material upon the substrate. Each of the stations has an optical monitoring unit which monitors in situ the deposition of the optical coating material upon the corresponding substrate. With the described system, high production rates of precision optical elements, such as narrow bandpass optical filters, can be achieved.
    Type: Grant
    Filed: April 20, 1998
    Date of Patent: March 21, 2000
    Assignee: E-Tek Dynamics, Inc.
    Inventors: Ming Zhou, Feng Qing Zhou, Jing-Jong Pan
  • Patent number: 6024797
    Abstract: A method and apparatus for applying a uniform coating to a moving paper web by utilizing a coating applicator with regional cross-machine zones from which coating quality or excess coating can be monitored and analyzed. As the coating conditions vary between regional zones, upstream liquid coating flow parameters can be varied for a particular region to render uniform coating profiles across the entire machine-direction of the web.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: February 15, 2000
    Assignee: Beloit Technologies, Inc.
    Inventors: Alfred C. Li, Rex A. Becker
  • Patent number: 6010740
    Abstract: An apparatus and method for controlling the opening of a solenoid actuated valve in a sealant dispensing gun are disclosed. A proximity sensor is provided adjacent a portion of the needle valve stem in order to sense when the needle valve has reached its open position. A dispense timer is initiated when the proximity sensor indicates that the needle valve has reached its open position. In this manner, the needle valve may be maintained in its open position for the desired dispense time only without regard to the response time of the solenoid device. Also disclosed is an apparatus and method for adjusting the valve open limit of a sealant dispensing device which incorporates a solenoid or motor actuated valve open limit device. A flow sensor is located in-line with the sealant supply path of a dispensing gun in order to monitor the dispense weight during each valve open cycle. A moving average of the dispense rates may then be calculated and compared to predetermined limits.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: January 4, 2000
    Assignee: Preferred Machining Corporation
    Inventors: Clinton W. Rutledge, Michael Godfrey, Ian J. Buckley, William W. Weil
  • Patent number: 6007629
    Abstract: A chemical supplied onto a substrate is contained in a chemical container. A chemical cooling unit keeps the chemical contained in the chemical container cooled to a proper temperature for storage. A chemical pressure-transferring portion causes the chemical to flow from the chemical container into a chemical introducing pipe. A chemical temperature controller portion changes the temperature of the chemical guided by the chemical introducing pipe to a proper temperature for application on a substrate. The chemical brought to the proper application temperature is guided to a chemical dispensing unit, which dispenses the chemical onto a substrate.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: December 28, 1999
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Masami Ohtani, Tadashi Sasaki
  • Patent number: 5976611
    Abstract: The present invention relates to an optical fiber coating method and an apparatus therefor which can form high quality coating layer on an optical fiber (12) by preventing non-concentricity of a coating resin (14) applied on the optical fiber (12) and admixing of bubble.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: November 2, 1999
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kaoru Okuno, Akira Inoue, Kazumasa Oishi, Kohei Kobayashi, Ichiro Tsuchiya
  • Patent number: 5964946
    Abstract: A bitumen-based waterproofing membrane is provided with an improved edge for sealing with a contiguous membrane to provide a membrane system with improved waterproofing characteristics. A bitumen-based reinforced membrane sheet is coated with granular material to protect the membrane sheet from ultraviolet rays. However, a section of the membrane sheet is first covered with a piece of protective tape which prevents any granular material from being deposited on the lateral section of exposed bitumen beneath the tape. The membrane sheets are then cut immediately prior to the tape or at the edge of the granular coating and then rolled up. Accordingly, the lateral section of bitumen which is covered by the protective tape is on the innermost part of the rolled-up membrane sheet. During installation, the tape is removed and the exposed bitumen or selvage section is disposed below an adjacent or contiguous membrane. Heat is then applied for an easy and effective seal between two adjacent membrane sheets.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: October 12, 1999
    Assignee: Polyglass, S.p.A
    Inventors: Luigi Zanchetta, Romano Zanchetta
  • Patent number: 5958137
    Abstract: The present invention relates to methods and apparatus for the controlled placement of a shear-thinnable polymer composition into a moving web. The controlled placement is preferably performed by applying the polymer composition onto a surface of a moving web, shear thinning the composition and placing it into the web, and curing the polymer composition. A preferred apparatus includes one or more process heads that has mounted thereto a rigid knife blade for engagement with the moving web. The knife blade is movable vertically and rotationally. The process head is also movable horizontally along the path of the moving web. A plurality of macro and micro tension zones are established and are monitored for controlling the apparatus and process.
    Type: Grant
    Filed: November 3, 1997
    Date of Patent: September 28, 1999
    Assignee: Nextec Applications, Inc.
    Inventors: James Michael Caldwell, George Schmermund
  • Patent number: 5939130
    Abstract: A coating film forming method for forming a resist coating film on an upper surface of a wafer held by a spin chuck in a chamber includes (a) the step of keeping preliminary correlation data representing correlation between a wafer rotating speed and the thickness of the resist coating film formed on the wafer in the chamber, (b) the step of conveying the wafer into the chamber and holding the wafer by the spin chuck, (c) the step of pouring the resist liquid onto the wafer and spin-rotating the wafer to form a resist coating film on the upper surface of the wafer, (d) the step of detecting the thickness of the formed resist coating film by a sensor, (e) the step of detecting a rotating speed of the spin chuck by a sensor, and (f) the step of, on the basis of the detected film thickness and the preliminary correlation data, correcting a set rotating speed of the spin chuck to feedback-control a resist coating process for a next wafer.
    Type: Grant
    Filed: May 27, 1997
    Date of Patent: August 17, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Masatoshi Shiraishi, Yukio Kiba, Kunie Ogata
  • Patent number: 5938847
    Abstract: Disclosed herein is a method and an apparatus for applying a coating liquid to an object from a liquid-applying member at a first prescribed position, thereby forming a film on the object. Before the coating liquid at the first position, the coating liquid is applied at a second predetermined position. An impurity-detecting device detects the impurities contained in the coating liquid applied at the second position. A particle-counting device is provided, and a switching device is provided on a liquid-supplying pipe extending from a source of the coating liquid to the liquid-applying member. The switching device switches the supply of the coating liquid between the liquid-applying member and the impurity-detecting device. The impurities in the coating liquid can thereby monitored.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: August 17, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Masami Akimoto, Kazutoshi Yoshioka, Kazuo Sakamoto, Norio Semba
  • Patent number: 5922130
    Abstract: A spray booth includes an outer enclosure in which the temperature and humidity of a fluid (such as air) is not controlled and a fluid handling unit within this enclosure, which circulates and controls the temperature and humidity of a smaller volume of the same fluid (air) to develop an environment suitable for application of coatings to desired substrates. In use, fluid is drawn from the outer enclosure into the inner, fluid handling unit in order to clean and modify the temperature and humidity of the fluid being handled, conditioning it to be delivered to the region of limited size which is established for receiving the substrate to be coated.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: July 13, 1999
    Assignee: Sermatech International, Inc.
    Inventors: Mark F. Mosser, Bruce McMordie
  • Patent number: 5812062
    Abstract: The invention is directed to a piping system for a side wall vented mid-efficiency furnace. The piping system comprises a plurality of sections of steel pipe having a glass coated interior surface. The interior surface is continuous and resistant to corrosion. An electronic testing apparatus and a method for utilizing same in testing for flaws in the glass coating of pipes is also provided.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: September 22, 1998
    Assignee: Mid-Vent Inc.
    Inventor: Michael Lee Roberts
  • Patent number: 5807606
    Abstract: Applying adhesive in a desired pattern on a substrate by determining one or more inspection sites for monitoring adhesive deposition, applying adhesive to a substrate with a stencil or screen printer, viewing the inspection sites with a camera that generates image signals, and processing the image signals to determine if adhesive has been properly applied at the inspection sites.
    Type: Grant
    Filed: July 31, 1997
    Date of Patent: September 15, 1998
    Assignee: MPM Corporation
    Inventors: Douglas K. Mould, Joseph Renda, Jr., Steven W. Hall
  • Patent number: 5795394
    Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.
    Type: Grant
    Filed: June 2, 1997
    Date of Patent: August 18, 1998
    Assignee: Honeywell-Measurex
    Inventors: Edward Belotserkovsky, John A. Dahlquist
  • Patent number: 5776251
    Abstract: In a duplex type coating apparatus, a left-right pair of dies and are disposed on opposite sides of a carrying path of a web, the dies and are each made up of an upper member and a lower member, a tip part of the lower member projects further toward the carrying path than a tip part of the upper member, and coating liquid discharge passages are inclined in the direction of the carrying path of the web. As a result, because the same amount of coating liquid is discharged from each of the dies and coated onto each side of the web, it is possible to carry out coating at the same coating thickness and in the same position on both sides of the web.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: July 7, 1998
    Assignee: Hirano Tecseed Co., Ltd.
    Inventors: Nobuaki Irie, Takao Ishida, Akiyoshi Hashimoto, Yasutomi Yoshimura
  • Patent number: 5772861
    Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.
    Type: Grant
    Filed: October 16, 1995
    Date of Patent: June 30, 1998
    Assignee: Viratec Thin Films, Inc.
    Inventors: William A. Meredith, Jr., Charles C. Gammans, Kelly R. Clayton, Erik J. Bjornard, Kim D. Powers
  • Patent number: 5746832
    Abstract: An apparatus for depositing particles onto a wafer comprises a particle generator; particle size controller connected to an output terminal of the particle generator, a first transmitting tube connected to an output of the particle size controller; a second and a third transmitter connected to an output terminal of the first transmitting tube; a first counter connected to an output terminal of the second transmitting tube; a particle depositor connected to an output terminal of the third transmitter; a second counter connected to the particle depositor; and a power supplier connected to the particle depositor. The apparatus and a method for depositing the particles onto the wafer provide a wafer on which particles of known size and kind are deposited. Also, the particles of a different kind and size are deposited on the same wafer.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: May 5, 1998
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-ki Chae, Byung-seol Ahn, Sang-kyu Hahm, Jong-soo Kim
  • Patent number: 5746833
    Abstract: An apparatus for continuously applying a coating to a running web, includes an elastic doctor blade having first and second ends, a frontal ride adapted to be oriented towards the web and a reverse side opposite the frontal aide and adapted to be oriented away from the web. The apparatus further has a clamping device firmly holding the doctor blade by engagement therewith in a zone of the first end. The clamping device positions the doctor blade for contacting the web at the second end along a scraping line. The apparatus also has an inflatable actuator engaging the reverse side of the doctor blade between the clamping device and the first and of the doctor blade. The actuator has a pressurized state in which a surface portion of the actuator is enlarged by an inflating fluid towards the reverse side of the doctor blade for pressing it against the web. A fluid pressure source is connected to the in inflatable actuator.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: May 5, 1998
    Assignee: TZN Forschungs- und Entwicklungszentrum Unterluss GmbH
    Inventor: Norbert Gerhardt
  • Patent number: 5725671
    Abstract: An apparatus for manufacturing an ABC.sub.2 chalcopyrite film (wherein A represents Cu or Ag, B represents In, Ga or Al, C represents S, Se or Te) includes a substrate holder, a substrate heater, a supply source for supplying elements A, B or C onto the substrate and for controlling the supply process, and a monitor for monitoring an electrical or optical property of the thin film layer deposited on the substrate. The electrical or optical property of the thin film layer abruptly changes at a first time point when the A/B ratio in the thin film layer changes from an element A-excessive state to the stoichiometric composition ratio of the ABC.sub.2. The electrical or optical property of the thin film layer demonstrates a stable value at a second time point when the A/B ratio becomes an element-B excessive state. Deposition is terminated at the second time point.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: March 10, 1998
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mikihiko Nishitani, Takayuki Negami, Takahiro Wada
  • Patent number: 5712489
    Abstract: A system for detecting web flutter of a web leaving a nip utilizes a proximity of sensor preferably a plurality of proximity sensors arranged transversely of the web to locally measure the distance between the web and the sensors at a distance no greater close to the nip so that the proximity sensor determines roll the web is following leaving the nip in each area sensed by each detector so that this information may be used to monitor or control the coating system.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: January 27, 1998
    Assignee: MacMillan Bloedel Limited
    Inventors: David Richard Elvidge, Ronald Ewald Greb, Malcolm Kenneth Smith