Abstract: A paster for the application of a film of water-containing adhesive to a running substrate of cigarette paper or the like automatically replaces the evaporated percentage of water when the substrate-processing machine is idle but the paster continues to circulate adhesive in order to prevent a rise in the viscosity of the then circulating and water releasing adhesive. The quantity of water in the circulating adhesive and other parameters (such as the temperature) of the adhesive are monitored by several sensors, and signals which are transmitted by such sensors are processed to regulate the admission of water in order to maintain the percentage of water, and hence the consistency, of the circulating adhesive within a range not appreciably departing from that when the paster is in actual use to apply one or more films of adhesive to the running substrate.

Abstract: An apparatus for direct or indirect application of liquid or pasty coating medium onto a traveling material web, notably of paper or cardboard, includes a paint curtain applicator mechanism and at least one sensor unit to register the flow quantity of the coating medium layer applied onto the material web and to provide a corresponding flow quantity signal. At least one regulation device regulates at least one manipulated variable of the paint curtain applicator mechanism upon which the flow quantity of the coating medium layer applied onto the material web depends. A control unit, which receives the flow quantity signal provided by the at least one sensor device, determines at least one face value for the at least one manipulated variable and controls the at least one regulation device on the basis of the at least one manipulated variable-face value.

Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a nozzle adapted to apply a predetermined volume of developer material on a photoresist material layer along a linear path having a length approximately equal to the diameter of the photoresist material layer. A movement system moves the nozzle to a first position offset from a central region of the photoresist material layer for applying a first predetermined volume of developer material to the photoresist material layer while the developer material is spin coated. The movement system also moves the nozzle to a second position offset from the central region for applying a second predetermined volume of developer material to the photoresist material layer while the developer is spin coated. The first position is located on an opposite side of the central region with respect to the second position.

Abstract: A method and assembly for coating a moving web of paper or paperboard by means of a coating mix jet which is directed to the surface of the web without mechanical support. The present invention is based on applying a desired amount of the coating mix to the web via a narrow-gap slit orifice, and by measuring the coat weight on the web, adjusting the position of at least one lip of the slit orifice to achieve the desired weight and cross-machine profile of the applied coat.

Abstract: A sensor and a method for determining the basis weight of a coating material containing latex on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.

Abstract: A sensor and a method for determining the coating weight of a coating material containing silicone on a substrate is described. The determined coating weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform weight.

Abstract: An apparatus and method for forming thin film aerogels on semiconductor substrates is disclosed. It has been found that in order to produce defect-free nanoporous dielectrics with a controllable high porosity, it is preferable to substantially limit evaporation and condensation of pore fluid in the wet gel thin film, e.g. during gelation, during aging, and at other points prior to obtaining a dried gel. The present invention simplifies the atmospheric control needed to prevent evaporation and condensation by restricting the atmosphere in contact with the wet gel thin film to an extremely small volume. In one embodiment, a substrate 26 is held between a substrate holder 36 and a parallel plate 22, such that a substantially sealed chamber 32 exists between substrate surface 28 and chamber surface 30. Preferably, the average clearance between surfaces 28 and 30 is less than 5 mm, or more preferably, less than 1 mm. Temperature control means 34 may optionally be used to control the temperature in chamber 32.

Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings.

Abstract: A method and apparatus for measuring the transfer efficiency during the electrostatic spraying of a coating material (e.g. powder coating) is provided. The transfer efficiency can be measured during the test cycle rather than measuring an average transfer efficiency for an electrostatic spray cycle. A cycle may include the initial time when the substrate is "uncoated or clean" and an end point of the test when electrical insulating effects caused by accumulated powder on the substrate lead to a reduction in the transfer efficiency. The method uses computer based calculation software and a computer. The computer is connected to load cells that measure weight changes of a target substrate and a vessel containing the coating material to be sprayed.

Abstract: Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.

Abstract: A thin-film depositing apparatus of the present invention deposits a sputtered film on a substrate in a sputtering chamber, and removes the substrate having the sputtered film deposited thereon from the sputtering chamber via a load-lock chamber by a robot arm. As a system for controlling the sheet resistance of the sputtered film deposited on the substrate, a measuring device using an eddy current method is mounted in the proximity of a substrate outlet of the load-lock chamber and measures the sheet resistance of the sputtered film of the substrate removed from the substrate outlet. With this structure, it is possible to provide a thin-film depositing apparatus which stably measures the sheet resistance of a thin film deposited on a substrate and performs feedback of the measurement result to control the film deposition conditions so that a thin film to be deposited on a subsequent substrate has a desired thickness.

Abstract: The present invention provides a system and method for thermally curing polymeric coated substrates by effective drying of solvents used in the production of the coated component. A feedback system coupled to a heating apparatus is comprised of one or more gas sensors internal or external to the heating apparatus to provide monitoring of the quantity of solvent gases being generated. The present invention allows the curing process to be precisely controlled, where, for example, a predetermined concentration of solvent gases input to the gas sensor can trigger the heating process to be stopped or to provide for a controlled cool down period for curing of the photoresist substrate. A controller coupled between the gas sensor and the heating apparatus may also contain temperature and/or time controls for varying the output of the heating apparatus in response to indications from the gas sensor.

Abstract: An automotive vehicle body painting system can be equipped with a paint purge mechanism that includes a densitometer responsive to density changes in the fluid flowing through the mechanism. The densitometer can be used to selectively direct pure paint into a pure paint collection receptacle or a solvent-paint solution into a mixed paint collection receptacle. The system achieves a relatively high percentage recovery of pure paint that is purged from the painting system during each paint color change.

Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.

Abstract: A substrate processing apparatus has a simple structure in which the number of nozzles is reduced. In a mixer part, photoresist which is supplied from a photoresist supply through a lower arm portion of the nozzle arm is mixed with solvent which is supplied from a solvent supply through a pipe. Following this mixing, the photoresist and the solvent flow through an upper arm portion and are ejected from a nozzle toward a substrate. In the nozzle arm, a viscometer is disposed to the upper arm portion. The viscometer measures a viscosity of photoresist solution which is obtained by mixing in the mixer part. In accordance with the measurement from the viscometer, the quantity of solvent supplied from the solvent supply is controlled, thereby obtaining a photoresist solution having a desired viscosity.

Abstract: In order to improve the traveling and sliding properties of a yarn during its further processing, in particular for knitting, it is waxed during rewinding in cheese winding machines by passing it along a paraffin body. When the paraffin body is used up, the unwaxed yarn can cause yarn breaks or even needle breakages, which leads to production errors or lost production. At the winding stations, the drive of the friction drum is switched on and off at intervals to cause alternating acceleration phases with slippage between the friction drum and the bobbin and intervening slippage- free run-out phases to prevent pattern windings. The slippage is monitored over the course of the winding operation. If the slippage decreases in successive acceleration phases and remains at a low level, while the drive output of the friction drum remains unchanged, this is interpreted to indicate an outage of the paraffin application.

Abstract: A process gas delivery system incorporating a cleaning solution delivery subsystem for chemical vapor deposition. The system includes a slanted cleaning solution feed pipe for introducing a cleaning solution into the process gas delivery system and for disposal of waste cleaning solution from the process gas delivery system. Automatic determination of maintenance time may be accomplished by using an optical sensor provided on the process gas delivery pipe that detects the accumulation of the deposition material within the piping. The sensor may also be used to detect the cleaning solution residue inside the piping after cleaning and the liquid level during deposition.

Abstract: An apparatus and method for controlling the opening of a solenoid actuated valve in a sealant dispensing gun are disclosed. A proximity sensor is provided adjacent a portion of the needle valve stem in order to sense when the needle valve has reached its open position. A dispense timer is initiated when the proximity sensor indicates that the needle valve has reached its open position. In this manner, the needle valve may be maintained in its open position for the desired dispense time only without regard to the response time of the solenoid device. Also disclosed is an apparatus and method for adjusting the valve open limit of a sealant dispensing device which incorporates a solenoid or motor actuated valve open limit device. A flow sensor is located in-line with the sealant supply path of a dispensing gun in order to monitor the dispense weight during each valve open cycle. A moving average of the dispense rates may then be calculated and compared to predetermined limits.

Abstract: In a method for direct or indirect application of a liquid or pasty medium onto a traveling material web, notably of paper or cardboard, where during the application the cross profile (length profile) of the medium is modified under control and thereafter, in the direction of travel, the length profile (cross profile) of the previously applied medium is modified under control. Control of the cross profile and control of the length profile of the applied medium occur separately from one another in automatic control loops based on measurements of the applied profile. In addition is a pertaining apparatus with an applicator, an equalizer, a pertaining cross profile control loop, and a pertaining length profile control loop.

Abstract: The present invention relates to an optical fiber coating method and an apparatus therefor which can form high quality coating layer on an optical fiber (12) by preventing non-concentricity of a coating resin (14) applied on the optical fiber (12) and admixing of bubble.

Abstract: A bitumen-based waterproofing membrane is provided with an improved edge for sealing with a contiguous membrane to provide a membrane system with improved waterproofing characteristics. A bitumen-based reinforced membrane sheet is coated with granular material to protect the membrane sheet from ultraviolet rays. However, a section of the membrane sheet is first covered with a piece of protective tape which prevents any granular material from being deposited on the lateral section of exposed bitumen beneath the tape. The membrane sheets are then cut immediately prior to the tape or at the edge of the granular coating and then rolled up. Accordingly, the lateral section of bitumen which is covered by the protective tape is on the innermost part of the rolled-up membrane sheet. During installation, the tape is removed and the exposed bitumen or selvage section is disposed below an adjacent or contiguous membrane. Heat is then applied for an easy and effective seal between two adjacent membrane sheets.

Abstract: A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are hollow to receive cryogenic material and are in fluid communication with each other. Each isolation chamber has an interior and exterior portal which provide fluid communication between the isolation chambers and the space inside the MBE chamber. An effusion cell is mounted in the interior portal to direct a portion of effusion material through the interior portal in a beam toward a substrate in the MBE chamber. Another portion of the effusion material is directed along the inside of the isolation chamber toward a sensor which controls the effusion cell. The isolation chambers facilitate measurement and control of individual materials effused from separate cells even when those cells are operated simultaneously.

Abstract: A plant for preparing and feeding a coating composition to a coating head for paper or the like includes a plurality of hoppers, each hopper being intended to receive and deliver one ingredient of the composition. The plant further includes a premixer tank which is fed by the hoppers and mixes and homogenizes the formed composition and a homogenizing tank, fed by the premixer tank, having a high-speed stirrer for shearing the composition. A buffer capacity is directly and continuously fed by the homogenizing tank and connected to the coating head, wherein the buffer capacity preferably has a volume and an attached level detector for determining when the composition in the buffer capacity is below a predetermined level. A set of controllers attached to the level detector control the delivery of components from the plurality of hoppers.

Abstract: A spray booth includes an outer enclosure in which the temperature and humidity of a fluid (such as air) is not controlled and a fluid handling unit within this enclosure, which circulates and controls the temperature and humidity of a smaller volume of the same fluid (air) to develop an environment suitable for application of coatings to desired substrates. In use, fluid is drawn from the outer enclosure into the inner, fluid handling unit in order to clean and modify the temperature and humidity of the fluid being handled, conditioning it to be delivered to the region of limited size which is established for receiving the substrate to be coated.

Abstract: A wafer spin coating system, for coating a layer of photoresist on a wafer, includes a spin coating unit, a pumping unit and a sensing unit. A first controller in the spin coating unit controls the operation of a rotating device with the wafer mounted thereon. The first controller also outputs a photoresist pumping operation order. A second controller in the pumping unit receives the pumping operation order and outputs a pumping operation commencing signal and a valve operation signal that opens and closes a valve to control a gas feeding operation. The sensing unit receives the pumping operation commencing signal and the valve operation signal, and selectively outputs an abnormal status control signal to the first controller to stop the pumping operations if an abnormality is detected.

Abstract: An apparatus, system and method for controlling parameters attending the emission of a vaporized material from a source in a HV environment utilizes at least one shutter which is rotatably mounted over an exit opening through which vaporized material must exit the source. The shutter has a closure portion and is mounted adjacent the exit opening associated with the source for rotation about an axis so that by rotating the shutter about the rotation axis, the closure portion repeatedly covers and uncovers the exit opening in an intermittent fashion to prevent the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is covered by the closure portion and to permit the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is uncovered by the closure portion.

Abstract: Applying adhesive in a desired pattern on a substrate by determining one or more inspection sites for monitoring adhesive deposition, applying adhesive to a substrate with a stencil or screen printer, viewing the inspection sites with a camera that generates image signals, and processing the image signals to determine if adhesive has been properly applied at the inspection sites.

Abstract: A system for producing three dimensional components by bonding together successive layers of a porous material with droplets of a binder material. A binder printhead has an array of nozzles which controllably supply jets of binder material droplets to the layers of porous material. The printhead is scanned in a raster scan fashion over each layer of porous material along a first scan axis in one direction to provide first fast scanning paths of droplets. The printhead is then moved laterally of such one direction and is then moved along the fast-scan axis in the opposite direction to provide second fast scanning paths of droplets which are interlaced with the first scanning paths. The supply of the droplets to the porous material can be controlled so as to control the overlapping thereof to produce various desired surface and interior characteristics of the components.

Abstract: A sensor and a method for determining the basis weight of a coating material containing CaCO.sub.3 on a substrate is described. The determined basis weight is insensitive to changes in the amount of substrate material underlying the coating. Signals from the sensor may be used in the control of a coating mechanism to provide a coating having a uniform basis weight.

Abstract: A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are hollow to receive cryogenic material and are in fluid communication with each other. Each isolation chamber has an interior and exterior portal which provide fluid communication between the isolation chambers and the space inside the MBE chamber. An effusion cell is mounted in the interior portal to direct a portion of effusion material through the interior portal in a beam toward a substrate in the MBE chamber. Another portion of the effusion material is directed along the inside of the isolation chamber toward a sensor which controls the effusion cell. The isolation chambers facilitate measurement and control of individual materials effused from separate cells even when those cells are operated simultaneously.

Abstract: An apparatus is provided for coating a surface of a plate-like material, or substrate, specifically a semiconductor wafer, with a coating material. The apparatus includes a plurality of self-controlled removable modules including a coating assembly, at least one thermal conditioning module, and a substrate handling device, and a host controller. The coating assembly is used to dispense coating material from a coating source onto the surface of the substrate material positioned in the coating assembly. The material handling device is positioned to access and move substrates between the coating assembly, the at least one thermal conditioning module and other modules included in the apparatus. The host controller provides substrate thermal conditioning, coating and handling information to the corresponding modules and tracks the location of each substrate in the apparatus.

Abstract: A coating apparatus for detecting the presence of contaminants carried by a liquid a is that is applied as a coating on a workpiece. A tube guides the liquid along a flow path to the workpiece. A light source illuminates the liquid along the flow path with an optical fiber or other light carrier, and light is scattered by any contaminants present in the liquid. Light scattered by the contaminant particles is more intense than light scattered by the other liquid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. The coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable and rotated to receive a coating of the liquid.

Abstract: A system for evaluating the reflectance of an object (e.g., a CRT) that is coated with an anti-reflective coating material is disclosed. The quality and/or uniformity of the coating is evaluated by a reflectometer. The reflectometer is positioned relative to the object by non-contact sensors. Reflectance data gathered by the reflectometer is analyzed to determine to what extent the actual coating differs from the optimal (i.e., ideal) coating. A feedback system modifies the coating process for subsequent objects in an attempt to fine-tune the coating process and achieve optimal anti-reflective coatings for later objects passing through the system.

Abstract: A printing apparatus includes a loading section for guiding wiring boards into the apparatus, a printing section equipped with a mask for printing a conductive material onto each of the wiring boards, a position detecting device for detecting a position of the wiring board held by the holding device, an alignment section for positionally correcting the mask or wiring board held by the holding device on the basis of an output signal from the position detecting device, and a transfer device having holding device for holding the wiring boards and turning to transfer the holding device and stop the holding device at the loading, printing, and alignment sections at the same time so that loading, printing, and alignment operations are simultaneously performed.

Abstract: The present invention relates to coating and printing methods for the deposition of aqueous compositions. The composition may be adapted to any method without the need to change its chemical content. Viscosity is determined and adjusted by raising and lowering the temperature. High gloss value, increased film integrity and enhanced mar resistance result.

Abstract: An apparatus for depositing particles onto a wafer comprises a particle generator; particle size controller connected to an output terminal of the particle generator, a first transmitting tube connected to an output of the particle size controller; a second and a third transmitter connected to an output terminal of the first transmitting tube; a first counter connected to an output terminal of the second transmitting tube; a particle depositor connected to an output terminal of the third transmitter; a second counter connected to the particle depositor; and a power supplier connected to the particle depositor. The apparatus and a method for depositing the particles onto the wafer provide a wafer on which particles of known size and kind are deposited. Also, the particles of a different kind and size are deposited on the same wafer.

Abstract: In a printing apparatus and method, printing material is printed on to-be-printed circuit boards in a predetermined pattern and a printing state of the material is inspected. The apparatus includes the following devices. A board supporting device has a rotary body supporting a plurality of board-fixed tables to which the boards are secured, and turns the rotary body together with the board-fixed tables intermittently at predetermined angular intervals so as to stop the board-fixed tables at each of a fixing, recognizing, printing, and inspecting position. A board feed device feeds the boards to the board-fixed tables arranged at the fixing position. A board discharge device discharges the boards from the board-fixed tables arranged at the fixing position. A recognizing device recognizes fixed positions of the boards relative to the board-fixed tables at the recognizing position. A printing device prints the printing material on the boards at the printing position.

Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.

Abstract: A sensing system for a print development system of a printing system in which a print is developed with developer material and development of the print varies as a function of both a first parameter and a second parameter is provided. The development system includes a capacitance and the sensing system, which measures a first value varying as a function of the first parameter and a second value varying as a function of the second parameter, includes a sensing subsystem for measuring an output by reference to the capacitance; and a signal development subsystem, responsive to the sensing system, for developing, from the output, both a first signal and a second signal with the first signal corresponding to the first value and the second signal corresponding to the second value.

Abstract: A process and apparatus for manufacturing MOS devices are disclosed. The process comprises the step of controlling a first clearance linear speed (1st CLSs) X which is the flows of an oxidizing and an annealing gases defined as ratios of the flow rates thereof to the area of a clearance between a semiconductor wafer and the interior surface of the tube of a heat treating furnace to be at least 30 cm/min while the semiconductor wafer is oxidized and annealed. The process comprises the step of controlling a second clearance linear speed (2nd CLS) Y which is a flow of the annealing gas defined as a ratio of the flow rate thereof to the area of the clearance to be at least 100 cm/min while the semiconductor wafer is taken out of the tube. The process comprises the step of controlling a relation between the 1st CLSs X and the 2nd CLS Y so that Y.gtoreq.-2.5 X+275. The process and the apparatus reduce and control the fixed-charge density in the oxide film of a MOS device with a high repeatability.

Abstract: An apparatus and method for detecting the edge of a light sensitive photographic emulsion on a support is described. The method and apparatus include a pair of collimated infrared light sources for illuminating each edge of the support at an angle of incidence of greater than 0.degree. to about 45.degree.. Positioned above the edges of the support are a pair of CCD cameras. Light scattered by the support and emulsion is detected by the CCD cameras and the edges of the emulsion and the edges of the support are detectable. Signal means are used to generate a signal corresponding to the position of the emulsion on the support. A conventional guider receives the signal and positions the support accordingly.

Abstract: An apparatus for dispersingly delivering a vapor-phase source reagent material containing a deposition species, to a substrate for deposition of such species thereon. The apparatus includes a disperser housing having a front wall with an array of discharge openings therein for discharging vapor-phase source reagent material from the housing interior volume onto a wafer or other substrate article mounted in vapor-receiving relationship to the disperser housing front wall. The front wall includes interior heat transfer passages arranged in a manifolded conformation for highly efficient temperature stabilization of the vapor discharged from the housing discharge openings, to produce highly uniform thickness deposited films on the substrate.

Abstract: A system for electrostatic application of conductive coating liquid has a grounded primary supply of conductive coating liquid, an electrostatic spray device and a system for delivering coating liquid from the primary supply to the spray device while maintaining a high voltage at the spray device electrically isolated from the primary supply. The delivery system includes one or more electrical insulation devices, each of which has a cylinder comprising an insulative conduit having a liquid inlet and a liquid outlet. The cylinders of the electrical insulation devices are connected via their inlets and outlets between the primary supply and the spray device to deliver coating liquid from the primary supply to the spray device.

Abstract: A dual component mixing system for coating comprises a first tank containing a main agent, a second tank containing a hardening agent diluted with thinner, a mixer which mixes the main agent and the hardening agent and supplies the mixture to a manually operated coating gun, a main agent line connecting the mixer and the first tank, a hardening agent line connecting the mixer and the second tank, a flow meter disposed within the main agent line, a flow meter and a flow regulating valve disposed within the hardening agent line, and a feedback control device which receives signals from the flow meters and controls the flow regulating valve so that the amount of hardening agent is a predetermined ratio with respect to the amount of main agent. The dual component mixing system according to the present invention provides an adequate control of the main agent/hardening agent ratio regardless of the differences among individuals manipulating the coating gun.

Abstract: Disclosed herein is an apparatus for manufacturing an oxide superconducting film employing laser ablation method. This apparatus has a thin film forming chamber having a laser-transparent laser entrance window, a target being provided in the thin film forming chamber and containing components of an oxide superconductor, a laser beam source for irradiating the target with a laser beam from the exterior of the thin film forming chamber through the laser entrance window, and apparatus for controlling power of the laser beam which is applied to the target for preventing the power of the laser beam, being applied to the target, from reduction by contamination of the entrance window caused by scattered particles. According to the present invention, it is possible to form an oxide superconducting film having high and uniform characteristics even if a long time is required for film formation, thereby attaining a remarkable effect in improvement of superconductivity of a large area oxide superconducting film.

Abstract: A dispensing apparatus for delivering a silica coating solution in a fixed quantity from a liquid container to a surface of a substrate to form a silica film thereon. The liquid container storing the silica coating solution is connected to a diaphragm pump through a suction pipe. The diaphragm pump is connected to a nozzle through a delivery pipe. The coating solution in the liquid container is supplied to the nozzle by sucking and delivering action of the diaphragm pump. The coating solution is discharged from the nozzle to a surface of a substrate supported by a spin chuck of a spin coating apparatus.

Abstract: A system for detecting the presence of an object, it shape, length, size, etc., and if a heating material such as a hot melt adhesive applied to the object is applied to given places, or in the proper amount is accomplished by an infrared detection system which is not influenced by external disturbances. A radiant energy detection sensor is placed opposite a radiant energy source, and an object is moved between the radiant energy source and radiant energy detection sensor.

Abstract: In accordance with the present invention a toner concentration and temperature sensing apparatus is provided for use with a developer container adapted to retain a quantity of developer material, the developer material including varying concentrations of magnetic carrier material and toner material. The toner sensing apparatus includes a micro controller device for controlling a sensing head to selectively generate a magnetic field within the developer container according to a first set of parameters stored in the micro controller. A preselected portion of the developer material is compressed by the magnetic field and a signal is generated across the sensing device and determining the resistance thereof. The signal across the sensing device varies as a function of the concentration of the toner. The micro controller converts the observed signal into a toner concentration value based on a second set of stored parameters.

Abstract: A developing device for use in an image forming apparatus comprising a toner hopper containing toner, a developing roller for developing an electrophotographic latent image formed on a surface of a photosensitive member using the toner contained in the toner hopper, a toner feed mechanism for conveying the toner contained in the toner hopper to the developing roller, and a regulator for regulating the conveyance of the toner by the feed mechanism from the toner hopper to the developing roller.

Abstract: In the method described, a compound substantially in the form of a paste is fed by means of a pump from a storage container (1) to a metering device (3) which determines the amount of paste to be applied to a workpiece (B). From the metering device, the paste is fed to a spray head (S) where it is .[.mixed with.]. .Iadd.swirled by .Iaddend.compressed air from a cylinder (4) or other suitable supply and sprayed on to the workpiece (B). The amount of compressed air supplied to the paste for spraying purposes is controlled by means of a control unit (6) in such a way that a strip of substantially constant width is applied to the workpiece (B).