Abstract: The substrate processing apparatus includes common piping which guides a processing liquid to a branching portion, supply piping which guides the processing liquid from the branching portion to a chemical liquid nozzle, return piping which guides the processing liquid from the branching portion, and a discharge valve which changes a flow rate of the processing liquid supplied from the common piping to the branching portion. The discharge valve makes a valve element stationary at a plurality of positions including a discharge execution position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate larger than a maximum value of a suction flow rate and a discharge stop position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate smaller than the maximum value of the suction flow rate.

Abstract: The substrate processing apparatus includes common piping which guides a processing liquid to a branching portion, supply piping which guides the processing liquid from the branching portion to a chemical liquid nozzle, return piping which guides the processing liquid from the branching portion, and a discharge valve which changes a flow rate of the processing liquid supplied from the common piping to the branching portion. The discharge valve makes a valve element stationary at a plurality of positions including a discharge execution position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate larger than a maximum value of a suction flow rate and a discharge stop position at which the processing liquid is supplied from the common piping to the branching portion at a flow rate smaller than the maximum value of the suction flow rate.

Abstract: A washing machine is provided. The washing machine may include a circulation hose, a water discharge hose, and a pump configured to selectively supply water to the circulation hose and the water discharge hose. The pump may include a pump motor that is reversible and rotatable in a first direction and second direction, an impeller rotated by the pump motor, and a pump housing to provide a space in which the impeller is accommodated. The pump housing may include a supply port, a circulation water discharge port coupled to a second end of the circulation hose, and a water discharge port coupled to the water discharge hose. The water discharge outlet and the circulation water outlet may be arranged in a circumferential direction and spaced apart from each other on a ring-shaped inner surface of the pump housing.

Abstract: A washing machine is provided. The washing machine may include a cabinet, an outer tub, an inner tub configured to receive laundry and provided in the outer tub so as to be rotatable about a substantially vertical axis, a circulation nozzle to spray water into the inner tub, a circulation hose to guide water from the outer tub to the circulation nozzle, and a pump including a pump motor having variable speeds and an impeller configured to move water from the circulation hose to the circulation nozzle as the impeller is rotated by the pump motor.

Abstract: A method for operating a laundry washing appliance having a washing chamber to wash laundry the method includes selecting a default washing temperature and/or a washing cycle having a default washing temperature; supplying a detergent to the washing chamber; and determining a type of the detergent which has been added. When the detergent is of a first type, then the method includes comparing the default washing temperature with a threshold temperature and if the default washing temperature is higher than the threshold temperature, then emitting a warning signal and/or changing said default washing temperature.

Abstract: An assembly includes a transducer and anti-flood device. The transducer receives, as an input, a pressure signal taken by a liquid held in a main container and includes a circuit, for providing, as an output, an electric control signal having a variable parameter representing the pressure signal. The anti-flood device includes a receptacle, a float and a sensor. The receptacle is arranged to receive and hold a part of liquid coming from the secondary container. The float is movably mounted in the receptacle and moves up to a height representing the level reached by the part of liquid. The sensor is configured to detect the height reached by the float and to transmit an electric level-indicating signal representing the height to the circuit. The circuit is designed to apply, to the variable parameter, a correction that is determined as a function of the level-indicating signal according to predetermined criteria.

Abstract: A warewash machine for washing wares includes a chamber for receiving wares, the chamber having at least one spray zone. A spray system is provided in the spray zone for spraying liquid onto wares for cleaning. A tank captures sprayed liquid that falls within the spray zone. The tank includes a primary recirculation path for delivering liquid from the tank to the spray system, and a secondary recirculation path for delivering water out of the tank and back into the tank, without spraying within the spray zone, in order promote mixing within the tank.

Abstract: The present disclosure relates to a dishmachine that includes at least two tanks and methods of using the tanks to isolate, substantially isolate, or incrementally isolate different chemistries from each other during a cycle. The disclosed dishmachine design and method allows for the use of two different, and potentially incompatible, reactive, or offsetting chemistries to be used in the same dishmachine cycle.

Abstract: A soap-dispensing faucet assembly for sinks includes a faucet that is configured to couple to a sink and a housing that is configured to couple to a surface below the sink. A nozzle, which is configured to spray water, is fluidically coupled to the faucet. A power module, a reservoir, and a pump are coupled to and positioned in the housing. The reservoir is configured to position fluids, such as liquid soap and liquid detergent. The pump is operationally coupled to the power module and is fluidically coupled to the reservoir. A tube is coupled to a front plate of the nozzle and extends from an opening in the front plate of the nozzle through the faucet. The tube is fluidically coupled to the pump. The pump is configured to motivate the fluids from the reservoir through the tube to be dispensed from the opening in the nozzle.

Abstract: Disclosed is a system for reducing germs by means of plasma. To this end, a piezoelectric transformer is associated with a dielectric film. The peripheral edge of the dielectric film encloses an area to be sterilized, a cavity being formed thereby. A high-voltage end of the piezoelectric transformer is facing a side of the dielectric film facing away from the cavity. The plasma is ignited within the cavity.

Abstract: A cleaning method is provided for on-site cleaning of equipment such as filling equipment that fills beverages, etc. into bottles, cans, and other containers, liquid treatment equipment for filling solutions, and pipe equipment for connecting said equipment, the method being able to increase significantly the cleanliness of portions in contact with the filling solution while shortening cleaning time and reducing the amount used of utilities such as cleaning solution, etc. In the cleaning method for on-site cleaning of the liquid pathways of equipment such as filling equipment (4) for filling beverages into bottles, cans and other containers, liquid-treatment equipment (3) for filling solutions, or pipe equipment (4p) that connects said equipment, liquid comprising nanobubbles is pumped into said equipment and is left undisturbed to soak for a prescribed period.

Abstract: A ballast water treatment system includes at least one UV-light reactor with at least one UV-lamp, an inlet line for ballast water to be treated connected to the reactor and an outlet line connected to the reactor. The system includes a cleaning system for periodic cleaning of the reactor, including a water inlet line connected to the reactor for supplying water, a container with concentrated CIP-liquid connected to the reactor, a CIP-liquid inlet line connecting the container to the reactor, a dosage pump arranged in the CIP-liquid inlet line for supplying a predetermined amount of concentrated CIP-liquid to the reactor to mix with the water, a circuit comprising the reactor and a pump arranged in the circuit for circulation of water mixed with the concentrated CIP-liquid.

Abstract: A dishwasher for treating dishes according to at least one automatic cycle of operation and including a tub having a bottom wall for at least partially defining a treating chamber in which dishes may be received for treatment, at least one sprayer provided on the bottom wall, and having at least one opening through which liquid is emitted into the treating chamber, and a recirculation circuit fluidly coupling the treating chamber to the at least one sprayer such that liquid emitted into the treating chamber may be directed back to the sprayer for recirculation.

Abstract: An automated support cleaning system comprising a tank disposed within a housing and configured to circulate an aqueous cleaning solution to remove a support structure from a three-dimensional model.

Abstract: A washing machine suitable to effect a washing treatment, thermo-disinfection and possible drying of objects, including a washing chamber in which the objects to be treated are disposed, and a washing circuit including a plurality of exit paths for a washing liquid to be distributed toward the objects to be treated. On the bottom of the washing chamber, in association with a corresponding discharge aperture, valve means to discharge the washing liquid are disposed, which are directly connected to a pipe that discharges directly into the sewerage system.

Abstract: An appliance for washing clothes includes a detergent storage tank and a drum. Between the detergent storage tank and the drum is a diverter valve which has a detergent inlet connected to the detergent storage tank, an air vent connected to ambient air, and a detergent outlet. The diverter valve has an energized state wherein the detergent inlet is open and the air vent is closed, and a de-energized state wherein the detergent inlet is closed and the air vent is open. The appliance also has a flow meter connected to the diverter valve and the drum.

Abstract: A system for descaling a water heating unit, said system comprising (so that the abstract is directed to the presently allowed apparatus, rather than a method): a pump; a descaling solution source; a plurality of valves; a programmable control module operatively coupled to said pump, said descaling solution source, and said valves, said programmable control module adapted to selectively receive a user-defined descaling operation start date and time, monitor for the advent of a descaling operation start date and time, and upon the advent of the descaling operation start date and time, automatically shut off via at least one valve, a supply of heated water, and automatically activate said pump; said pump adapted to automatically pump stored descaling solution, and further adapted to automatically rinse a water heating unit; and said programmable control module further adapted to cause said valves to discharge solution from said water heating unit, restore a supply of heated water, and return said water heating

Abstract: Disclosed is a substrate processing apparatus including a processing vessel in which a target substrate W is processed by using a high-pressure fluid in a supercritical state or a subcritical state, and pipes that are divided into a first pipe member and a second pipe member in a flowing direction of the fluid and circulate the fluid are connected to processing vessel. A connecting/disconnecting mechanism moves at least one of first and second pipe members between a connection position and a separation position of first pipe member and the second pipe member, and opening/closing valves are installed in each of first and second pipe members and are closed at the time of separating pipe members.

Abstract: Disclosed is a substrate liquid processing apparatus including: a first processing liquid supply mechanism provided with a first tank in which a processing liquid is stored and a first nozzle through which the processing liquid stored in the first tank is ejected, and configured to supply the processing liquid to a first surface of a substrate by the first nozzle; a second processing liquid supply mechanism provided with a second tank in which a processing liquid having the same composition as the processed liquid stored in the first tank is stored and a second nozzle through which the processed liquid stored in the second tank is ejected, and configured to supply the processed liquid to a second surface of the substrate by the second nozzle; a processing unit configured to perform processing on the substrate using the processed liquids supplied by the first nozzle and the second nozzle; and a recovery line configured to recover the processed liquids which are supplied to the substrate from the first nozzle a

Abstract: The liquid processing apparatus includes: a liquid supply mechanism; a supply line connected to the liquid supply mechanism, the supply line having a discharge opening for discharging a temperature-regulated liquid; a processing unit supporting the discharge opening of the supply line; a return line configured to return the liquid supplied to the supply line to the liquid supply mechanism; and a liquid-supply switching valve configured to switch between supply of the liquid, which is used in a processing of an object to be processed in the processing unit, and stoppage of the liquid supply. The liquid-supply switching valve is disposed on the supply line on a route of the liquid returning from the supply line to the liquid supply mechanism through the return line.

Abstract: A dishwasher (10) for the batch washing of wash items (20) comprises a wash chamber (24), which is arranged to accommodate wash items (20) and in which spray members ((34a-b)) for spraying out washing liquid and rinsing liquid are disposed; a wash tank (28), which is arranged to contain washing liquid which during a wash phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); a recirculating rinse tank (52), which is arranged to contain used rinsing liquid which during a rinse phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); members (62) for supplying final-rinse liquid which during a final-rinse phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); a collecting device (42, 46), which is arranged to collect liquid which has been sprayed out into the wash chamber (24) via the spray members ((34a-b)); and a pump (48), which is arranged to pump used rinsing liquid from the collecting device (42, 46) to the recirculating rinse

Abstract: The invention discloses a portable sterilizer for use when filling containers for transporting goods under aseptic conditions, which provides increased transport capacity, more flexible formats and connections for the containers, while facilitating handling of the goods, and which comprises a portable boiler, systems for pre-washing using chemicals and other means necessary for sanitizing all the parts thereof. For washing, it uses chemicals, circulation waters and the hot water (or any other liquid poured into said boiler) produced from the liquid phase inside said portable boiler. The device may include a pump for pressure washing with other types of cleaners, cold water, chemicals, etc.; For sterilizing, it uses the vapour phase of water or other liquids in said portable boiler, ultraviolet rays and/or another means of sterilization, and it is connected between the outlet of the pasteurization system of a production plant and the return lines of said pasteurizer.

Abstract: A dishwasher includes a washing compartment having a boundary wall with a base, spray devices inside the washing compartment, and a hydraulic circuit with a distributor which subdivides a washing liquor flow into two partial flows which are each routed to the spray devices, wherein the distributor is integrated in the base.

Abstract: An apparatus and method for regenerating spent ion exchange resin and recovering regenerant fluid is described. A regeneration system has a regeneration vat, a regeneration solution tank, a regenerant recovery tank, a chemical dispenser, a solids separator, a pH adjuster and a pump. The regeneration vat holds the spent resin and is connected to the regeneration solution tank to allow transfer of regenerant solution into the regeneration vat. Spent regenerant fluid travels to the regenerant recovery tank, where it is treated with chemicals provided from the chemical dispenser. The solids separator receives the treated regenerant liquid and separates precipitate flocs from the treated regenerant liquid. The concentration of chloride ions in the separated regenerant solution can be adjusted by the pH adjuster to form fresh regenerant solution. The pump pumps the fresh regenerant solution to the regenerant solution tank to regenerate additional spent cation exchange resin.

Abstract: Provided is a method and system for stripping an ion implanted resist or performing a post-ash clean using a single substrate tool. Cleaning objectives and cleaning operating variables are selected for optimization. The first step immerses the substrate in a first treatment chemical, while concurrently irradiating the substrate with UV light, the process completed in a first process time, a first flow rate, and a first rotation speed of the substrate. The second step dispenses onto the substrate a second treatment chemical at a second temperature and a second composition, the second treatment chemical dispensed at a dispense temperature, and completed in a second process time and a second rotation speed. The two or more selected cleaning operating variables comprise UV wavelength, UV power, first concentration, first rotation speed, first flow rate, second process time, second rotation speed, percentage of residue removal, and dispense temperature.

Abstract: A dishwasher for treating dishes according to at least one cycle of operation and having a tub at least partially defining a treating chamber and defining an access opening, a sprayer providing a spray of liquid into the treating chamber, a liquid recirculation system defining a recirculation flow path for recirculating the sprayed liquid from the treating chamber to the sprayer, and an air supply system having a conduit configured to function as an overflow conduit.

Abstract: A system, apparatus, and method for home brewing equipment including a basin for holding a cleaning solution and a support assembly mountable in the basin, the support assembly sized and configured to support a container in an upside down position and above the cleaning solution. A plumbing assembly may be coupled to the basin to receive cleaning solution from the basin and the plumbing assembly may be coupled to at least one channel configured to extend into the body of the container. The plumbing assembly may include a pump so that when the pump is activated pressurized cleaning solution is released from the channel inside the container against the inner walls of the container so that the inside of the container is sanitized. The basin may have support elements defining footprints for supporting at least two different sizes of containers.

Abstract: Systems, apparatus and methods are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide a reclaim approach that prevents the evaporation of chemical solvents used to process wafers using proximity heads, by confining hot liquid solvents used to form fluid menisci on the wafer surface with cold liquid solvents of the same chemical composition.

Abstract: Disclosed is a substrate processing apparatus capable of decreasing the frequency of shutdown of the apparatus due to lack of processing liquid in a processing liquid supply unit, as well as efficiently using the processing liquid to improve a yield ratio. The substrate processing apparatus includes a plurality of liquid processing units to conduct liquid processing of substrates a substrate carrying unit to carry the substrates in and out of the liquid processing units, a processing liquid supply unit to supply the liquid processing units with processing liquid, and a level gauge to detect an amount of the processing liquid remaining in the processing liquid reservoir of the processing liquid supply unit. The carry of the substrates in the liquid processing units is suspended when the level gauge detects that the amount of the processing liquid remaining in the processing liquid reservoir is below a predetermined threshold.

Abstract: A water chlorinating device having a vessel (2) in turn having a bottom portion (6) for containing water; a grille (10) located over the bottom portion and for supporting a solid chemical chlorinating substance (11); a spray device (13) for directing at least one water jet on to the grille (10); and a mixing nozzle (29) located inside the bottom portion (6), at the bottom of the vessel (2), and for agitating the water in the bottom portion (6) by means of a water jet.

Abstract: A water guide of a dishwasher checks the flow of water draining from the dishwasher. The water guide includes a drain passage having one end communicating with an outer atmosphere and another end communicating with a sump for receiving washing water, at least part of the drain passage being routed via a point higher than a water level in the sump, and a valve assembly, disposed above the drain passage, for selectively introducing external air into the drain passage.

Abstract: Multi-tank dishwashers are used, in particular, industrially, in order to clean items which are to be washed. The invention relates to a multi-tank dishwasher which is provided with a washing area. The washing area comprises at least one rinsing water storage tank, at least one filter housing, at least one fine filter and at least one backwash device. In the normal mode, a filter wall of the at least one fine filter is cross flown in the direction from a waste water chamber to a pure water chamber. In order to clean the fine filter, the multi-tank dishwasher can be operated in a backwashing mode, without interrupting the washing process. In said backwashing mode, a cross-flow of the at least one filter wall of the rinsing water is reversed by using a backwash pump and a waste water pump. Dirt particles, which are located on the inner side of the filter wall, are rinsed off and are removed by the waste water pump in the waste water outlet.

Abstract: In order to produce a cleaning device comprising a flood chamber for accommodating a workpiece requiring cleaning and a flooding device for flooding the flood chamber with a liquid cleaning agent which is of simple construction and the flood chamber of which can be rapidly filled and emptied again, it is proposed that the flood chamber be connectable to a cleaning agent reservoir and that the flooding device comprise a blower for reducing the pressure in the flood chamber so that cleaning agent is sucked into the flood chamber from the cleaning agent reservoir due to the reduced pressure in the flood chamber.

Abstract: In a first aspect, a method for cleaning a semiconductor fabrication chamber component having an orifice is provided. The method includes (A) placing the component into a bath having a cleaning solution; (B) flowing a fluid into the orifice thereby maintaining at least a first portion of the orifice free from cleaning solution while the cleaning solution cleans the component; and (C) withdrawing the fluid from the orifice such that cleaning solution enters into the first portion of the orifice and cleans the first portion of the orifice. Numerous other aspects are also provided.

Abstract: A deaeration device for bubbling dissolved air in the cleaning liquid by cavitation is connected on a cleaning-liquid circulation path so as to bubble the dissolved air in the cleaning liquid flowing through the cleaning-liquid circulation path by the deaeration device, and the bubbled dissolved air flows back to the cleaning tank together with the cleaning liquid so that the bubbled dissolved air is ejected from the liquid surface of the cleaning tank to the outside of the tank. Moreover, a propeller-type pump is used as the circulating pump, and the dissolved air concentration of the cleaning liquid is controlled within a range of 2.5 to 3.5 mg/l.

Abstract: A dishwasher includes a tub, a steam generator for generating steam, a water supply passage for supplying washing water to the steam generator, a release valve having a steam passage along which the steam generated by the steam generator is supplied to the tub, and a condensed water passage connected to the water supply passage to allow water condensed by the steam to fall to the water supply passage.

Abstract: Embodiments of the invention provide a dipper well to clean smallwares, such as spoons, measuring cups, and ice-cream scoops. The dipper well can include a basin and a recirculation system. The recirculation system can draw a fluid from the basin. The recirculation system can include a filter to reduce contaminants in the fluid before the fluid is recycled back into the basin.

Abstract: A water treatment device is provided, which has a reverse osmosis device with a raw water supply line, with a pure water discharge line and with a concentrate outflow. The raw water supply line is connected to a mixing device which is designed to set the mixing temperature of the raw water delivered to the reverse osmosis device. The mixing device has a hot water inflow and a cold water inflow.

Abstract: A component recovery system, configured to refurbish components, includes a fluid feed tank, a refurbishment compartment having a fluid delivery element, a waste tank, fluid lines connecting the fluid feed tank to the fluid delivery element and the refurbishment compartment to the waste tank, and pumps for delivering fluid through the fluid lines. The component recovery system removes field contaminants, coatings and bonding compounds from components.

Abstract: A dishwashing machine comprising a washing station having a wash water tank, a plurality of wash water dispensing nozzles, a recirculation pump adapted to circulate the wash water from the tank to the nozzles; and a hydraulic filling container communicating with the recirculation pump via a first and a second conduit respectively connected to a delivery conduit and to a suction conduit of the pump itself.

Abstract: A contaminant-flushing machine for removing contaminants from a container, such as an engine transmission, air-conditioner coil, or transmission cooler, which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler, and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant-flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the pump. The flow reversals are repeated with a cycle of three (3) seconds in one direction followed by a flow in the other direction of one-fourth (¼) of a second, thereby creating an overall flow of fluid primarily in one reverse direction.

Abstract: A system is provided for cleaning wafers that includes specialized pressurization, process vessel, recirculation, chemical addition, depressurization, and recapture-recycle subsystems. A solvent delivery mechanism converts a liquid-state sub-critical solution to a supercritical cleaning solution and introduces it into a process vessel that contains a wafer or wafers. The supercritical cleaning solution is recirculated through the process vessel by a recirculation system. An additive delivery system introduces chemical additives to the supercritical cleaning solution via the solvent delivery mechanism, the process vessel, or the recirculation system. Addition of chemical additives to the sub-critical solution may also be performed. The recirculation system provides efficient mixing of chemical additives, efficient cleaning, and process uniformity. A depressurization system provides dilution and removal of cleaning solutions under supercritical conditions.

Abstract: An emission control device, such as a filter, is regenerated by exposure to plasma. Plasma breaks down carbon-based residues, such as soot, to enable the filter to be easily cleaned and regenerated without subjecting the filter to heat-related stress associated with thermal regeneration methods. Secondary plasma generation is used to overcome impediments caused by the presence of a metallic housing and/or metal-containing materials such as a washcoat or mesh in the filter.

Abstract: A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

Abstract: A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably supportable on a container having an inner surface to be cleaned. When removably supported on a container, the mount supports the spray head in a position within the container where the spray head can coat the inner surface of the container with mist.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, alone or in combination with the recirculation system, for draining liquid from the wash chamber when the drain is closed. A fill control system is provided to ensure that the dishwashing cycle is not started with liquid in the wash chamber and that the sink drain is properly closed. One or more sensors can be provided for enabling the fill control system. The sensors can be located within the drain above the location where the drain is plugged.

Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.

Abstract: A system for equalizing pressure in a washing chamber in response to changes in pressure inside washing chamber. Gate elements are operable between open and closed positions to regulate pressure conditions inside the washing chamber.

Abstract: A cleaning solution for paper making equipment includes a stabilized source of peroxide in combination with a glycol ether solvent system and an alcohol ethoxylate. The peroxide system can be hydrogen peroxide stabilized with a phosphonate such as HEDP. The glycol solvent system may be a propylene glycol ether such as dipropylene glycol methylether or tripropylene glycol methylether. This solution can be formulated with a pH from about 4 to about 12. This is used by recirculating it through a paper making equipment during a shut down procedure.

Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.