Abstract: A contaminant-flushing machine for removing contaminants from a container, such as an engine transmission, air-conditioner coil, or transmission cooler, which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler, and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant-flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the pump. The flow reversals are repeated with a cycle of three (3) seconds in one direction followed by a flow in the other direction of one-fourth (¼) of a second, thereby creating an overall flow of fluid primarily in one reverse direction.

Abstract: According to one aspect of the invention, a semiconductor substrate, or wafer, processing apparatus is provided. The wafer processing apparatus may include a frame, a semiconductor substrate support, a dispense head connected to the frame to dispense a semiconductor processing fluid onto a substrate on the support, and a catch cup, having a top section and a mid-section, connected to the frame around the wafer support. A portion of an inner surface of the top section may not face towards, or face away from, a central axis of the semiconductor substrate. An upper surface of the mid-section may have substantially no horizontal portions.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, alone or in combination with the recirculation system, for draining liquid from the wash chamber when the drain is closed. A fill control system is provided to ensure that the dishwashing cycle is not started with liquid in the wash chamber and that the sink drain is properly closed. One or more sensors can be provided for enabling the fill control system. The sensors can be located within the drain above the location where the drain is plugged.

Abstract: A spray caddy (10) for storing and transporting chemicals and cleaning accessories and method of dispensing diluted liquid chemicals with improved efficiency. The spray caddy (10) comprises a container (11) and an elongate rigid tubular handle assembly (12) that extends through a first hole (32) and a second hole (34) in container (11). Hot (>180. degree. F.

Abstract: A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.

Abstract: A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed. The semiconductor substrate with the photoresist or the photoresist residue on a surface of the semiconductor substrate is placed within a pressure chamber. The pressure chamber is then pressurized. Supercritical carbon dioxide and a stripper chemical are introduced to the pressure chamber. The supercritical carbon dioxide and the stripper chemical are maintained in contact with the photoresist or the photoresist residue until the photoresist or the photoresist residue is removed from the semiconductor substrate. The pressure chamber is then flushed and vented.

Abstract: The present invention pertains to a system for cleaning wafers that includes specialized pressurization, process vessel, recirculation, chemical addition, depressurization, and recapture-recycle subsystems, as well as methods for implementing wafer cleaning using such a system. A solvent delivery mechanism converts a liquid-state sub-critical solution to a supercritical cleaning solution and introduces it into a process vessel that contains a wafer or wafers. The supercritical cleaning solution is recirculated through the process vessel by a recirculation system. An additive delivery system introduces chemical additives to the supercritical cleaning solution via the solvent delivery mechanism, the process vessel, or the recirculation system. Addition of chemical additives to the sub-critical solution may also be performed. The recirculation system provides efficient mixing of chemical additives, efficient cleaning, and process uniformity.

Abstract: A household dishwasher with a bulk wash aid dispenser for metering individual charges of wash aid from a bulk wash aid supply.

Abstract: A substrate treating apparatus for performing a predetermined treatment of substrates. The apparatus includes a holder for holding a plurality of substrates in erected posture, a treating tank for storing hot sulfuric acid at at least 140° C. for treating the substrates immersed therein, and a bubble supply device including a plurality of bubble generating members formed by sintering quartz particles and arranged in the treating tank for generating bubbles of ozone gas such that the bubbles of ozone gas partially overlap one another in a direction parallel to surfaces of the substrates.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: A dishwasher minimizes the backflow of water to a sump and the gathering of water in a drain passage, by constructing the drain passage using a valve installed at the vertical peak of a passage for preventing the backflow of water.

Abstract: A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.

Abstract: A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

Abstract: An exemplary cleaning apparatus for cleaning a system having a first fluid is provided, wherein the apparatus comprises a second fluid entering the system and cycling in the system with the first fluid for a predetermined period of time. The cleaning apparatus also comprises an air compressor and an air storage tank. The air compressor is capable of compressing air into air storage tank, and air storage tank is capable of delivering air to the system for purging the first and second fluids from the system after the predetermined period of time has expired. The cleaning apparatus further comprises an air regulator capable of regulating pressure of the air delivered to the system.

Abstract: To provide a cleaning processing method and a cleaning processing apparatus which can improve cleaning efficiency. The apparatus is structured to install processing units 11a-11d which provide more than one kind of chemical liquids out of a plurality of chemical liquids A-C for processing wafers W, and to enable the same kind of a processing liquid to be provided for at least two processing units, and, upon successively processing objects-to-be-processed which require their own processing sequences, to consecutively load each object-to-be-processed W to a processing unit which stores designated chemical liquid for a processing sequence of the object-to-be-processed.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. A basket with a sprayer is disposed within the wash chamber. A self-aligning coupling fluidly connects a liquid conduit to the sprayer when the basket is seated.

Abstract: A system and method for cleaning mineral build-up from the water pipes of a building. The system is attached to in-flow and out-flow orifices of a building, and two circuits, one including a cleaning solution, and a second including a rinsing solution, are alternatingly circulated through the building's water pipe network.

Abstract: A flushing system for flushing away any coking material which may have built up in the bearing of a gas turbine. Three fluid tanks respectively contain a solvent for dissolving the coked material, a cleaner and a lubricant. By means of a three-way valve, one of the fluids is provided to a supply pump for delivery to the bearing housing via a quick disconnect coupling. Fluid is returned to the appropriate tank by means of a return pump, via a quick disconnect coupling and another three-way valve between the return pump and the tanks. The system includes respective filters for filtering the return fluids and the entire system may be carried on a wheeled cart for servicing the gas turbine.

Abstract: A method and system for reliably reducing the formation of particles upon wafers or substrates during wafer processes is disclosed. The method and system reduces residue contamination of a substrate material during wafer processes by pre-filling a pressure chamber to a first pressure P1 with a purified pre-fill prior to filling the pressure chamber with a primary bulk source at a second pressure P2. By pre-filling a chamber with purified pre-fill source at the first pressure P1 which is substantially equal to the bulk source pressure P2, the contaminants found in the bulk CO2 remain within the bulk CO2. Thus, this method and system reduces precipitation of contaminates caused by the depressurization of the bulk source during wafer processes and thereby reduces corresponding substrate material contamination.

Abstract: A method of removing a photoresist layer on a semiconductor wafer starts with placing the semiconductor wafer into a dry strip chamber. A dry stripping process is performed to remove the photoresist layer on the semiconductor wafer. The semiconductor wafer is then placed on a rotator of a wet clean chamber and horizontally rotated. A first cleaning process is performed to remove polymers and organic components on a surface of the semiconductor wafer. Then a second cleaning process is performed as well to remove polymers and particles on the surface of the semiconductor wafer. By performing a third cleaning process, a first cleaning solution employed in the first cleaning process and a second cleaning solution employed in the second cleaning process are removed from the surface of the semiconductor wafer. Finally, the semiconductor wafer is spun dry at the end of the method.

Abstract: An apparatus for cleaning a glass substrate for use in information recording medium, having improved detergency, includes a plurality of gas feeding pipes, provided in a cleaning tank storing therein a cleaning fluid, for feeding air into the cleaning tank to generate bubbles of air in the cleaning fluid in which a glass substrate is immersed. The bubbles are brought into contact with the glass substrate while stirring the cleaning fluid to effectively remove deposits on the surface of the glass substrate.

Abstract: A method and apparatus for chemical cleaning microfiltration and ultrafiltration membranes immersed in a tank involves backwashing a chemical cleaner through the membranes while the tank is empty of tank water. A backwash pump which drives the chemical cleaner is controlled by a speed controller which is in turn connected to a programmable logic control and, preferably pressure and flow indicators. The backwash pump is operated to supply the chemical cleaner to the membranes in pulses. The pressure of the pulses is high enough to reduce the relative size of pressure differentials between membranes or portions of membranes in varying places in the tank. The duration and frequency of the pulses is chosen to provide an appropriate contact time of the chemical, preferably without allowing the membranes to dry between pulses and without using excessive amounts of chemical.

Abstract: A method for cleaning the interior of a heat exchanger includes connecting the heat exchanger (25a-e) to a fluid supply (26) and fluid delivery system (24). Fluid flow is provided from the fluid supply (26) through the interior of the heat exchanger (25a) in a first direction. The fluid flow is pulsed a predetermined number of times to change the pressure within the heat exchanger. The fluid flow is then pulsed a plurality of times through the heat exchanger in a second direction.

Abstract: A contaminant flushing machine for removing contaminants from a container, such as an engine transmission or transmission cooler which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the filter and the pump.

Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

Abstract: A cleaning unit (A) includes a movable cart (20) which carries a cleaning system for cleaning baked-on residues from walls (10) of a sterilizer chamber (12). Alkaline and acid cleaning solutions (180, 182), for removing organic and inorganic residues, respectively, from the chamber, are stored in a multi-compartment container carried by the cart and having two storage compartments (52, 54). The alkaline and acid solutions are sequentially sprayed over the chamber walls and returned to their respective compartments. After cleaning is complete, a wall (200) which separates the two compartments is punctured. The two cleaning fluids are thereby mixed together to form a neutral or near neutral solution which is disposable in a sanitary sewer system without further treatment.

Abstract: A supply tube isolation system for use with a chemical delivery system includes a feedback tube connected between the manifold and each of the supply tubes connected between the chemical supply containers and the chemical pumps of the chemical delivery system. A controllable valve means is provided at or near the junction of the feedback tube and the supply tube so as to effectively segment the supply tube into first and second portions, where the first supply tube portion is that which is connected between the valve means and the manifold, and the second tube portion is that which is connected between the valve means and the chemical supply container. During delivery of the chemical to one or more destinations within the delivery system, the valve means is positioned so as to close the feedback tube and connect the first and second portions of the supply tube.

Abstract: A pipeline-cleaning method and device thereof is built and applied by firstly forming a sealing circuit including a pipeline pending cleaning, a pressure control device, and two units of pipeline-cleaning device A, A′. A storage tank filled with rigid granules in each pipeline-cleaning device A, A′ is provided with a filter net unit at its lower portion and a filter unit at its upper portion. When cleaning, a pressurized liquid is supplied by the pressure control device to drive the granules circulating the circuit and thereby remove dirt and sediment deposited on the pipe wall by collision and rubbing of the granules to the pipeline inner wall.

Abstract: A system for cleaning a reticle. There is provided a clean chamber and a reticle having a pair of opposing edges and a pair of opposing surfaces which is to be cleaned disposed in the clean chamber. A gas inert to the reticle is directed in a direction tangential to each of the surfaces of the reticle and along one the edge of the reticle. The gas is exhausted from a location spaced from the other of the pair of opposing edges and remote form the one edge. An optional monitor monitors the particles in the exhausted gas. The gas is preferably applied in pulses which have a pulse length of from about 0.05 second to about 1 second and a pulse repetition rate of from about 0.5/second to about 40/second. The gas is preferably ionized and preferably is applied at a pressure of from about 20 psi to about 120 psi. The stepper chamber is vibrationally isolated from the blow-off chamber.

Abstract: A filtration process for filtering water with immersed microfiltration or ultrafiltration membranes in a batch mode includes repeated cycles comprising the steps of filling the tank to a level above the membranes, withdrawing permeate through the membranes, aerating the membranes to dislodge solids from the membranes and backwashing the membranes while draining the tank. The backwashing steps involve backwashings with a cleaning chemical interspersed with backwashings with permeate. The backwashings with a cleaning chemical follow a regimen of maintenance cleaning chosen to maintain acceptable permeability of the membranes or to reduce the rate of decline in permeability of membranes 24 over extended periods of time.

Abstract: A contaminant flushing machine for removing contaminants from a container, such as an engine transmission or transmission cooler which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the pump.

Abstract: A method and device for cleaning vertically suspended lamellar blinds in collapsed state, is provided having a supply unit with a moveable supply container and functional elements for generating a fluid stream as well as a suspended spay device which is supported by the lamellae and comprises a spray head and a jacket foil enclosing the lamellar blind. The supply container is designed to be used separately with a washing solution or a rinse solution and is equipped with a pump, a pressurized line leading to the spray head and a return line. The pressurized line comprises a dual manifold disposed at the top and the return line has a connection at the top as well as a connection at the bottom.

Abstract: An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide fluid communication between a reservoir containing the treatment liquid and a treatment chamber housing the workpiece. A heater is disposed to heat the workpiece, either directly or indirectly. Preferably, the workpiece is heated by heating the treatment liquid that is supplied to the workpiece. One or more nozzles accept the treatment liquid from the liquid supply line and spray it onto the surface of the workpiece while an ozone generator provides ozone into an environment containing the workpiece.

Abstract: The present invention relates to a piping cleaning device for cleaning the inside of the piping installed in building, residence, fountain, structure, etc., in a piping system for transferring liquids such as clean water, cooling water, solution, chemical solution, water liquid, liquid raw material, etc.

Abstract: A contaminant flushing machine for removing contaminants from a container, such as an engine transmission or transmission cooler which includes hoses for coupling to the transmission cooler and a pump for circulating fluid through the hoses and the transmission cooler and a fluid filter having a reduced tendency towards causing vaporization of the fluid. Also included in the contaminant flushing machine is an automatic aeration system for injecting air into the circulating fluid at predetermined intervals. Additionally, a reverse flow piping circuit is included to permit automatic and electric manipulation of the flow direction of fluid through said transmission cooler while at the same time not altering the direction of flow of fluid through the pump.

Abstract: Provided are a method and apparatus for measuring particles in a liquid sample. The method involves introducing a liquid sample into a heat exchanger, thereby cooling the sample to a predetermined temperature. A particle measurement is performed on the cooled sample by introducing the cooled sample into a particle detector. The method and apparatus in accordance with the invention effectively suppress bubbles present in a liquid chemical sample being measured, thereby allowing for accurate particle measurements. The invention has particular applicability in the semiconductor and pharmaceutical manufacturing industries.