Abstract: A bicycle sprocket chain cleaning and lubrication apparatus allows a sprocket chain (3) to be cleaned while still mounted on the bicycle. The apparatus includes a includes a housing (10) for enclosing the sprocket chain on all sides consisting of mutually connectable upper half-shell (11) and lower half-shell (12) portions and a securement assembly which includes a mounting plate adapted to attach to a rear wheel quick disconnect of the bicycle. The housing is suspended from the sprocket chain and provides a funnel shaped solvent hopper (17), a hose connection (21) to a compressed air supply, and an air knife (23) adapted to direct high velocity air to impinge upon and thereby dry the sprocket chain.

Abstract: A method for assessing and guaranteeing the thermal hygiene efficiency in a multi-tank dishwasher in which there is at least one sensor that transmits a temperature inside at least one treatment zone to a machine control system, in particular to the control system of the multi-tank dishwasher, the method includes: detecting the temperature inside at least one of the treatment zones by the sensor; determining the heat input applied to the items to be cleaned in at least one of the treatment zones on the basis of the temperature determined; comparing the heat input in the at least one treatment zone with a predefined heat input; and, as a function of the result of the comparison of the heat input values, varying the transport speed of the items to be cleaned through the multi-tank dishwasher, or varying the temperature of at least one of the process parameters acting on the heat input values as a control variable in a control loop for at least one of the treatment zones.

Abstract: The invention relates to a device for protecting a display facility, comprising a protective element for covering an image surface of the display facility. As the protective element is designed to be transparent and the retaining means are provided for the exchangeable arrangement of the protective element in front of the image surface, a protective device is provided, which allows the image surface to be examined and is easy to operate.

Abstract: The invention relates to a reusable cleaning implement for cleaning and sanitizing a surface. More specifically, the cleaning implement is made of a tacky polymeric material and an antibacterial agent is distributed within the polymer. The adhesive and antibacterial properties of the cleaning implement are regenerated by contact with a cleansing agent.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: A method for cleaning a substrate is provided. The method includes providing foam to a surface of the substrate, brush scrubbing the surface of the substrate, providing pressure to the foam, and channeling the pressured foam to produce jammed foam, the channeling including channeling the pressured foam into a gap, the gap being defined by a space between a surface of a brush enclosure and the surface of the substrate. The brush scrubbing of the surface of the substrate and the channeling of the pressured foam across the surface of the substrate facilitate particle removal from the surface of the substrate.

Abstract: The present invention provides a washing apparatus which washes a web while conveying the web. The washing apparatus includes a squirting component which ejects fresh washing liquid at the web and a first washing tank which is disposed at an upstream side of a conveyance direction of the web relative to the squirting component. The first washing tank washes the web that is passing through the first washing tank, and takes in the washing liquid that has been ejected at the web by the squirting component.

Abstract: Methods for reducing or inhibiting deposition on or within press felts to increase the effective life of the press felt and reduce or eliminate the need for batch cleaning are disclosed. The methods disclosed treat press felt while paper is being produced with compositions containing at least one enzyme. Additionally, the enzymes can be applied in combination with other non-enzymatic felt conditioning products either by blending and applying at the same application point or by applying the enzyme and the non-enzymatic felt conditioning product at two different locations along the felt. The treatments are applied continuously or intermittently.

Abstract: A glass sheet washing machine with a broken glass removal system includes a support, a liquid container or reservoir, a pump, a liquid applicator, and a liquid permeable member. The support supports a glass sheet being washed. The liquid reservoir is positioned below the support. The pump is coupled to the liquid reservoir. The liquid applicator is coupled to the pump. The liquid applicator applies the liquid from the liquid reservoir to wash the glass sheet. Excess liquid falls into the reservoir. The liquid permeable member is positioned between the support and the liquid reservoir to catch pieces of glass to inhibit the pieces of broken glass from falling into the liquid reservoir and is moved to remove the pieces from the glass washing machine.

Abstract: Deposition of contamination by deposits of resinous material on paper making equipment is undesirable. This invention prevents or retards such contamination by treating the equipment, especially the press felts with a composition containing a polyoxyalkylene. surfactant which contains units of ethylene oxide and a higher alkylene oxide.

Abstract: Provided is a method of cleaning a flexible substrate. The method includes the steps of: preparing a flexible substrate and detaching an impurity adhered to both surfaces of the flexible substrate using rotating first rollers disposed on the both surfaces of the flexible substrate; and removing the impurity by transferring the impurity from the first roller to a second roller using the rotating second roller having a relatively higher adhesion than the first roller.

Abstract: A glass sheet washing machine with a broken glass removal system includes a support, a liquid container or reservoir, a pump, a liquid applicator, and a liquid permeable member. The support supports a glass sheet being washed. The liquid reservoir is positioned below the support. The pump is coupled to the liquid reservoir. The liquid applicator is coupled to the pump. The liquid applicator applies the liquid from the liquid reservoir to wash the glass sheet. Excess liquid falls into the reservoir. The liquid permeable member is positioned between the support and the liquid reservoir to catch pieces of glass to inhibit the pieces of broken glass from falling into the liquid reservoir and is moved to remove the pieces from the glass washing machine.

Abstract: An apparatus may include a first support, a first cleaning material coupled to a first side of the first support, a second support rotatably coupled to the first support at a first edge of the second support, the second support defining a first opening disposed adjacent to a second edge of the second support opposite the first edge, a second cleaning material coupled to a first side of the second support, and a latch coupled to the first support, the latch to engage the first opening of the second support to maintain the first side of the first support in a substantially fixed relationship with respect to the first side of the second support.

Abstract: An apparatus and method for cleaning polymer film are provided and include a support assembly for supporting the polymer film to be cleaned, the support assembly being constructed and arranged to move the polymer film for cleaning, and at least one nozzle disposed adjacent the polymer film for providing CO2 to the polymer film for dislodging particulate matter from the polymer film and the at least one aperture, and for cleaning thereof.

Abstract: An apparatus and process for the dry removal of the scale from the surface of a metal product comprising at least one heating area that does not reduce the specific surface of the material to be treated and does not cause oxidation, at least one reducing area for performing the reaction between a specific reducing gas (normally hydrogen) and at least the scale, at least one cooling area for cooling the metal product, means for heating the metal product, means for heating the reducing gas, means for controlling the fluid dynamics of the boundary layer produced by the flow of said reducing gas over the surface of the metal product, means for removing the reaction products from the reducing gas after the reaction, means for cooling the metal product, and means for removing the reaction products from the treated surface of the metal product.

Abstract: A method of removing dust, dirt and the like from the surface of a paper substrate comprises the steps of transporting the paper substrate along a path of travel, and training the paper substrate over and in direct contact with at least a portion of the outer surface of a vacuum drum having openings therein. Suction is applied to the openings as the paper moves over the drum at a slightly different linear velocity from the surface velocity of the drum. Dust, dirt and the like are drawn away from one surface of the paper substrate through the openings of the drum as the paper substrate sweeps over the vacuum drum surface.

Abstract: A cart sanitizing system is disclosed for applying a sanitizing fluid to sanitize a shopping cart. A pressurized supply of sanitizing fluid is applied to the cart contained within a cart enclosure through a series of spray nozzles mounted along a spray arch. The pressurized sanitizing fluid is supplied to the spray arch from a pressure tank, which is fed with the supply of sanitizing fluid from a chemical make-down system. The chemical make-down system creates the sanitizing fluid, which preferably includes a sanitizing agent and a surfactant mixed within fresh water. The sanitizing fluid is created by a mixing device by flowing the fresh water over inlet tubes for both the sanitizing agent and the surfactant. The mixture of the surfactant and sanitizing agent allows the sanitizing fluid to be applied to the shopping carts and eliminates the requirement for drying.

Abstract: A washing apparatus that easily washes off metal impurities from a porous metal substrate used as an electrode plate core for an alkaline battery. The washing apparatus includes a liquid bath container which holds a solution for washing off the metal impurities. A guide guides movement of the porous metal substrate in the solution held in the liquid bath container. The porous metal substrate is wound into a hoop in a coil-shaped manner, and the guide guides the movement of a sheet portion of the porous metal substrate unwound from the hoop. A winding mechanism winds the sheet portion after being fed through the liquid bath container.

Abstract: A wafer preparation method is provided for producing a wet region and then a corresponding dry region on the wafer. Brushing produces the wet region on the wafer. As the brushing moves in a selected scan operation across the wafer, a generating operation forms a meniscus that follows the brushing and dries the wet region. The generating operation produces the meniscus at least partially surrounding the wet region scrubbed by the scrubbing. The controlled meniscus is formed by applying fluid to the surface of the wafer and simultaneously removing the fluid. The scan operations may be selected so the brushing scrubs the wet region and then the meniscus forms the dry region where the scrubbing took place. The scan operations include a radial scan, a linear scan, a spiral scan and a raster scan.

Abstract: A glass sheet washing machine comprising a conveyor for moving a glass sheet along a path of travel at a controlled linear speed and a brush rotatable at a controlled rotational speed positioned along said path of travel such that said brush contacts the glass sheet moves along said path of travel wherein the linear speed of the conveyor and the rotational speed of the brush are variable and one of the linear speed and the rotational speed is dependent on any other of the linear speed and the rotational speed.

Abstract: A board terminal cleaning apparatus for cleaning a terminal portion by bringing a cleaning member in contact with the terminal portion of a board comprises a first support member that supports the cleaning member in a first position, a second support member that supports the cleaning member in a second position, a cleaning head that pressurizes part of the cleaning member supported between the first position and the second position by bringing the part in contact with the terminal portion of the board, a support member moving unit that moves the first support member and the second support member in the direction along the terminal portion, and a cleaning head moving unit that moves the cleaning head in the direction along the terminal portion at a second movement velocity different from the first movement velocity of the first support member and the second support member by the support member moving unit.

Abstract: An end effector for a transport robot arm for a wafer wet cleaning system has an arm with a chuck at an end of the arm to support a wafer. The chuck also includes a cavity to spray a bottom surface of the wafer with a cleaning fluid. At least two branches extend from the chuck away from the arm with a roller at the end of each branch to hold the wafer. A spray bar is coupled to the arm. The spray bar is configured to hold and spray a top surface of the wafer with the cleaning fluid.

Abstract: The present invention relates to a cleaning apparatus for printed circuit board. The cleaning apparatus includes a base, a clamping plate fixed to the base, at least one holding member, at least one cleaning roller, and a driving mechanism. The holding member is elastically supported on the base. The at least one cleaning roller is pivotably disposed on the at least one holding member respectively. The cleaning roller includes a cleaning layer attached to a surface of the cleaning roller. The clamping plate is opposite to and departs from the cleaning roller at a distance. The driving mechanism is coupled to the cleaning roller and configured for driving the cleaning roller to rotate. The cleaning apparatus can clean printed circuit board high efficiently.

Abstract: An apparatus for use in processing a substrate includes a brush enclosure extending over a length. The brush enclosure is configured to be disposed over a surface of the substrate and has an open region that is configured to be disposed in proximity to the substrate. The open region extends over the length of the brush enclosure and enables foam from within the brush enclosure to contact the surface of the substrate. A substrate cleaning system and method for cleaning a substrate are also described.

Abstract: An apparatus and method is provided for removing smudges (624) including oils and dust from portable electronic displays (110, 150, 200, 300, 334). The apparatus comprises a display device (600, 700, 800, 900) positioned within a housing (102, 104), having a surface (601) viewable through an opening in the housing (102, 104) and a susceptibility to receiving contaminants (624). Gradients are formed on the display device (600, 700, 800, 900) for providing a differential surface tension that causes the smudges (624) to migrate across the viewable surface of the display device (600, 700, 800, 900). The gradients may be, for example, thermal (604, 605), electrical (702, 708), optical (804), or surface wettability (904).

Abstract: There is an apparatus for cleaning a substrate mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber, the first chamber has solvent-dispensing nozzles; the solvent-dispensing nozzles wet the substrate surface with a solvent as the platen transports the substrate. The platen moves in a predetermined direction and at a predetermined scan velocity as it transports the substrate into a process chamber. The process chamber has a hot source at a predetermined height from the substrate surface; it provides heat energy directed toward the substrate surface, the heat energy evaporates the solvent dispensed on the substrate surface; the solvent evaporation removes particulates from the substrate surface, as the platen transports the substrate from the first chamber into the process chamber. Substrates cleaned may include precision photo-masks, or wafers.

Abstract: A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a contact and separation with/from tips of scrub materials of the brush being rotating, and controls a positioning of the brush by use of the measurement results. With the process as described above, it is possible to treat uniformly a surface to-be-cleaned for a large-sized substrate, with the cleaning brush. Consequently, it is possible to form a highly qualified transistor for liquid crystal display on the substrate having been cleaned, with enhancing yield.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: A belt conditioning method, apparatus and paper machine employing the method and apparatus are provided. The belt method and apparatus include multiple conditioning devices using chemicals to condition water impermeable surfaces of paper machine belts, such as transfer belts and prevent deposits from accumulating on the belts. In one embodiment, the belt supports a web at a first portion of the belt's loop and is separated from the web at a second portion. The conditioning apparatuses are placed in the second portion.

Abstract: A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface of the proximity head. The substrate is linearly moved under the proximity head. A single wafer cleaning system is also provided.

Abstract: An automatic air-blown cleaning apparatus for cleaning a liquid crystal display (LCD) component in an LCD assembly process. The automatic air-blown cleaning apparatus has an assembly station for receiving and assembling the liquid crystal display component, a conveying device for delivering the liquid crystal display component to the next assembly station, and an air filtering blower provided on the conveying device. The air filtering blower sends an air flow toward the liquid crystal display component to remove residual matter from the liquid crystal display component.

Abstract: Methods for reducing or inhibiting deposition on or within press felts to increase the effective life of the press felt and reduce or eliminate the need for batch cleaning are disclosed. The methods disclosed treat press felt while paper is being produced with compositions containing at least one enzyme. Additionally, the enzymes can be applied in combination with other non-enzymatic felt conditioning products either by blending and applying at the same application point or by applying the enzyme and the non-enzymatic felt conditioning product at two different locations along the felt. The treatments are applied continuously or intermittently.

Abstract: A conveyor cleaning system includes a treating region, a processing region, and a conveyor belt traveling from the treating region to the processing region. A distributor positioned across the treating region deposits a film of ozonated water on the conveyor belt. In the processing region, the conveyor belt is exposed to soiling agents such as grease and other animal matter. A high-pressure rinser may be positioned over the treating section such that the distributor is positioned between the high-pressure rinser and the processing region. Ozonated water may be generated by a system including first and second tanks. The first tank is filled with ozone gas and water. After a predetermined time, undissolved ozone gas is released. The contents of the first tank are then transferred to a second tank along with more ozone gas. After waiting a predetermined time period, undissolved ozone gas is released from the second tank.

Abstract: A glass sheet washing machine comprising a conveyor for moving a glass sheet along a path of travel at a controlled linear speed and a brush rotatable at a controlled rotational speed positioned along said path of travel such that said brush contacts the glass sheet moves along said path of travel wherein the linear speed of the conveyor and the rotational speed of the brush are variable and one of the linear speed and the rotational speed is dependent on any other of the linear speed and the rotational speed.

Abstract: A method of cleaning a head of a printer when the printer is in a normally-engaged position is disclosed. A step of the method includes providing a base a material with a leading end and trailing end. Another step includes providing an abrasive cleaning sheet which has distal and proximal ends. The abrasive cleaning sheet is located proximate to the leading end of the base material. At least the proximal end of the abrasive cleaning sheet is adhered to the base material. The next method step includes feeding the base material into a printing path of a printer and then moving the base material at least partially through the printer so the abrasive cleaning sheet contacts at least a head of the printer.

Abstract: A method of removing iron oxide scale from processed sheet metal comprises the steps of: providing a surface conditioning apparatus; and conditioning a surface of the processed sheet metal with the surface conditioning apparatus. In general, the iron oxide scale generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the processed sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. The surface conditioning apparatus has at least one surface conditioning member. The step of conditioning the surface of the processed sheet metal includes bringing the at least one surface conditioning member into engagement with the surface of the sheet metal.

Abstract: A system for removing dust, dirt and like from the surface of a flexible paper substrate and accurately positioning same comprises a transport assembly for conveying the paper substrate along a path of travel. The transport assembly includes a rotating vacuum drum having an outer surface over which the paper substrate is trained in the direction of drum rotation as it moves along the path of travel. Openings are provided in the outer surface of the vacuum drum, and a suction source is connected to those openings so that dust, dirt and the like on the surface of the paper substrate are drawn away by the suction as the paper substrate moves along the path of travel over the drum. The linear speed of the paper substrate is slightly more or less than the surface velocity of the vacuum drum so that the paper sweeps across the drum surface during the cleaning process.

Abstract: Where a thin film formed on a glass substrate is etched with a solution containing a fluoride, insoluble residues formed by the reaction of the solution with glass substrate components adhere to the back of the substrate to cause etching non-uniformity called roller marks. So, a solution is supplied directly to supporting members for supporting the glass substrate, or concentratedly to a region where the substrate and the supporting members come into contact and from a position opposite to the transporting direction of the substrate, or to both the supporting members and regions where the substrate and the supporting members come into contact. This enables the roller marks to be kept from forming, consequently making it possible to improve display quality of display devices.

Abstract: Device and process for cleaning a circulating belt, the device using a cleaning device having at least one nozzle. The process includes feeding a pressurized fluid to the at least one nozzle, and subjecting the circulating belt to the pressurized fluid via the at least one nozzle. The pressurized fluid has a temperature in a range of between approximately 90° C. and approximately 160° C.

Abstract: A method of removing iron oxide scale from sheet metal and galvanizing the sheet metal includes bonding galvanizing zinc to a wustite layer of the sheet metal. The iron oxide scale on the sheet metal generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. Conditioning the surface of the sheet metal includes bringing a surface conditioning member into engagement with the surface of the sheet metal in a manner to remove substantially all of the hematite and magnetite layers from the surface, and in a manner to remove some but not all of the wustite layer from the surface. The portion of the wustite layer that remains bonded to the base metal substrate of the sheet metal protects the surface from oxidation until the surface is galvanized.

Abstract: A method of removing iron oxide scale and coating sheet metal bonds a pre-paint to a wustite layer of the sheet metal. The iron oxide scale on the sheet metal generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. Conditioning the surface of the sheet metal includes bringing a surface conditioning member into engagement with the surface of the sheet metal in a manner to remove substantially all of the hematite and magnetite layers from the surface, and in a manner to remove some but not all of the wustite layer from the surface. The portion of the wustite layer that remains bonded to the base metal substrate of the sheet metal protects the surface from oxidation until the surface is coated.

Abstract: A method of removing iron oxide scale and cold reducing sheet metal leaves a wustite layer on the sheet metal. The iron oxide scale on the sheet metal generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. Conditioning the surface of the sheet metal includes bringing a surface conditioning member into engagement with the surface of the sheet metal in a manner to remove substantially all of the hematite and magnetite layers from the surface, and in a manner to remove some but not all of the wustite layer from the surface. The portion of the wustite layer that remains bonded to the base metal substrate of the sheet metal protects the surface from oxidation, even after subsequent cold reduction of the sheet metal.

Abstract: An apparatus and method of removing scale from the surfaces of processed sheet metal employs high pressure jets of water directed from nozzles positioned in close proximity to the sheet metal surfaces.

Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

Abstract: An improved method and system for cleaning a cylinder of a printing press. One method involves soaking a strip of cleaning fabric on a press with a low volatility organic compound solvent. Excess solvent, if any, is removed to place the strip of cleaning fabric in functional equilibrium with the solvent. The cleaning fabric is then used to clean a cylinder. Alternatively, the strip of cleaning fabric is soaked on site by contacting the strip of cleaning fabric with the solvent and wrapping the strip of cleaning fabric into a cleaning fabric supply roll. The cleaning fabric is then brought in engagement with a printing press having a cylinder to be cleaned without disposing a sleeve around the fabric roll and without substantially disturbing the distribution of the solvent in the fabric roll and detrimentally affecting the cleaning ability of the fabric.

Abstract: The invention relates to a method and a device for treating surfaces of metallic strip material (1), especially for pickling rolled material, in a treatment channel (2), with a pickling medium (3) containing acid. Jets (4) are set in the direction in which the strip is transported (5) at the entrance to the channel (2a) and in the opposite direction that in which the strip is transported at the exit of the channel (2b). The aim of the invention is to produce a closed liquid film with some turbulence on the surface of the strip. Said film should be maintained as far as the exit (2b) of the channel. To this end, additional jets (4) between the channel entrance (2a) and the channel exit (2b) are oriented in the opposite direction to the direction in which the strip is transported (5) and the pickling medium (3) is further delayed in flowing out at the channel exit (2b) by mechanical resistance devices (7) situated in the path of the transport channel (6).

Abstract: A method of cleaning a surface from ferrous particles, in a magnetic resonance apparatus in which a first magnetic field is applied in a first direction in an interrogation zone for creating a net magnetisation within a sample located within the interrogation zone and an alternating magnetic field is applied in a second direction in the interrogation zone for temporarily changing the net magnetisation of the sample located within the interrogation zone, with monitoring of energy emitted by the sample as the net magnetisation of the sample returns to its original state and generating an output signal having a characteristic which is proportional to the energy emitted; the method including disposing in effective proximity to the surface to be cleaned, a permanent magnet cleaning device, the magnet cleaning device being located outside the interrogation zone.

Abstract: In accordance with the invention, the polymeric coating is removed from a coated optical fiber by disposing the fiber within a non-oxidizing environment and applying sufficient heat to volatilize at least a portion of the polymeric coating. The result is that the coating material bursts from the fiber, yielding a clean glass surface virtually free of surface flaws. In a preferred embodiment the non-oxidizing environment is inert gas and the heat is provided by resistive filament heaters.

Abstract: The present disclosure also relates to a method for cleaning and decontaminating the internal working components of a piece of electronic equipment along a predetermined media path which includes the steps of: 1) providing a base material having first and second surfaces, the base material having a cleaning substrate disposed on the first surface and an adhesive substrate disposed on the second surface; 2) inserting the base material into the electronic equipment along the predetermined media path; and 3) moving the base material through the predetermined media path such that the cleaning substrate cleans and polishes at least one internal working component of the electronic equipment and the adhesive substrate decontaminates at least one internal working component of the electronic equipment.

Abstract: The devices and methods of the art do not readily allow moistening of, removing gas bubbles from and/or increasing the transfer of material in through bores and/or pocket holes in printed circuit boards (PCB). Considerable problems are presented by the treatment of very narrow bores with high aspect ratios in particular. To overcome this problem a method was found that involves the following stages: the printed circuit boards PCB are passed through a processing plant on a horizontal conveying path and in one conveying plane 2 by means of transportation means 13, 14 and are thereby brought to contact a liquid for treatment, wherein mechanical pulses are directly transmitted to the printed circuit boards PCB via the transportation means 13, 14 and/or via the liquid for treatment by means of pulse generating means 50.