Abstract: An Atmospheric-Pressure Plasma processing apparatus used for Atmospheric-Pressure Plasma processing of substrates, comprises a radio-frequency generator and two electrode plates disposed vertically and opposing each other. The two electrode plates have two surface opposing to each other, one of which is a flat surface, and the other is a stepped surface, such that a gap is provided between the two electrode plates and said gap comprising a narrower gap part at an upper side and a wider gap part at a lower side. The radio-frequency generator is connected to the two electrode plates, and applies radio-frequency signals to the two electrode plates so as to generate plasma within the gap.

Abstract: A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck.

Abstract: A system includes a bracket that is configured to support a photomask and is located at a first side of the photomask; an acoustic energy generator configured to generate acoustic energy, wherein the acoustic energy includes mechanical vibrations of a megasonic frequency and wavelength; and a fluid dispenser coupled to the acoustic energy generator such that the acoustic energy generated by the acoustic energy generator is received by the fluid dispenser to generate an acoustically agitated fluid stream directed at a second side of the photomask, wherein the first side of the photomask is opposite a second side of the photomask, and wherein the first side includes a pattern.

Abstract: A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NH4OH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.

Abstract: A grounding assembly for an ultraviolet water sanitizer with a power cable electrically connected to an ultraviolet lamp sanitizer within a metal chamber, a grounding wire portion of the power cable connected by ground connecting member within an interior chamber of a grounding assembly connected to the metal chamber so that the grounding wire is not exposed outside of the water sanitizer.

Abstract: A method for preparing a monocrystalline silicon substrate surface for a subsequent texturing step, the method comprising: removing contaminants from the surface by contacting the surface with a cleaning solution; etching the pre-cleaned surface with an aqueous solution comprising from 12 to 19% by weight, of KOH and/or NaOH; rinsing the etched surface with an aqueous medium at pH from 7 to 10; and contacting the rinsed etched surface with ozonated deionized water at pH from 2 to 4.5, thereby converting the rinsed etched surface into a prepared surface. A method for texturing the prepared surface is also provided.

Abstract: A media scrubbing system includes a pair of rotating brushes arranged to rotate in opposed directions and receive media between the rotating brushes so as to scrub downwards on opposed surfaces of the media. The system includes oscillating rollers for supporting the media between the brushes. The oscillating rollers are arranged to reciprocally move vertically so as to oscillate the media as the brushes are rotating.

Abstract: A method for etching a substrate and removing byproducts includes a) setting process parameters of a processing chamber for a selective dry etch process; b) setting process pressure of the processing chamber to a first predetermined pressure in a range from 1 Torr to 10 Torr for the selective dry etch process; c) selectively etching a first film material of a substrate relative to a second film material of the substrate in the processing chamber during a first period; d) lowering pressure in the processing chamber to a second predetermined pressure that is less than the first predetermined pressure by a factor greater than or equal to 4; and e) purging the processing chamber at the second predetermined pressure for a second period.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: There is provided a capacitive coupled electodeless plasma apparatus for processing a silicon substrate. The apparatus includes at least one inductive antenna driven by time-varying power sources for providing at least one electrostatic field; and a chamber for locating the silicon substrate. There is also provided a method for processing a silicon substrate using capacitively coupled electrodeless plasma.

Abstract: A method for efficiently decontaminating surfaces is provided comprising applying an indicator to a surface wherein the indicator provides an observable or machine readable response when a contamination is present on the surface, wherein the response is located relative to a location of the contamination; and decontaminating the location of the contamination, and optionally rechecking the location of the initial contamination post decontamination to ensure that the surface is free of contamination.

Abstract: Stripping structure strips insulation from ends of a plurality of leads of a lead bundle. Each lead includes a conductor member coated with the insulation. The structure includes a housing having wall structure defining a stripping chamber, an inlet in fluid communication with the stripping chamber, and an outlet in fluid communication with the stripping chamber. A cover has an opening for receiving an end of the lead bundle in a sealing manner so that the leads thereof are received in the stripping chamber. Chemical stripping solution is in communication with the inlet. When the lead bundle is received through the opening with the leads in the stripping chamber and when the chemical stripping solution is provided though inlet and in the stripping chamber, the chemical stripping solution strips the insulation from the conductor members, with the stripping solution along with stripped insulation exiting through the outlet.

Abstract: Provided are a method and apparatus for decontaminating personal protective equipment while it is being worn by a person. A booth having a plurality of internally-reflective surfaces defines an interior space with dimensions suitable for receiving a standing person wearing the personal protective equipment. A plurality of UVC light sources are arranged to emit UVC light into the booth, and are operational while the person wearing the personal protective equipment is within the interior space. A door is selectively closeable to enclose the interior space and interfere with UVC light escaping the interior of the booth into an ambient environment of the booth, and a controller is operable to selectively operate the UVC light sources while the person wearing the personal protective equipment is standing within the interior space.

Abstract: An ultrasonic wave washing unit may include a housing including a media inlet, a media outlet, and a bottom surface; a plurality of ultrasonic transducers disposed about and extending from the bottom surface; a support structure including a chair and sleeve, wherein the support structure is coaxially disposed within the housing within the plurality of ultrasonic transducers; wherein the chair is operable to hold an air filter and receive residue from the air filter when washed within the ultrasonic wave washing unit; and the sleeve is operable to engage with the air filter and secure the air filter within the chair.

Abstract: An alignment film drying system and a method for drying alignment films are proposed. The alignment film drying system is used for drying an alignment film coated on a substrate. The alignment film drying system includes a plurality of magnetrons. The alignment liquid is coated on one side of the substrate facing the plurality of magnetrons and is heated through electromagnetic radiation produced by the plurality of magnetrons. The dried alignment liquid forms an alignment film having a uniform thickness, which ensures that the display effect of LCDs is better.

Abstract: Degradation of reliability of a semiconductor device is prevented. An electrode pad included mainly of aluminum is formed over a main surface of a semiconductor wafer. Subsequently, a first insulating member and a second insulating member are formed over the main surface of the semiconductor wafer so as to cover the electrode pad, and thereafter an opening portion that exposes a surface of the electrode pad is formed in the first insulating member and the second insulating member by a dry etching method using an etching gas including a halogen-based gas. Thereafter, an oxide film with a thickness of 2 nm to 6 nm is formed over the exposed surface of the electrode pad by performing a heat treatment at 200° C. to 300° C. in an air atmosphere, and then the semiconductor wafer is stored.

Abstract: An apparatus for cleaning flat objects such as semiconductor wafers with a pulsed liquid jet emitted from a group of nozzles that may be installed on one or on both sides of the wafer installed in a vertically arranged rotating chuck. The apparatus is comprised of a series of individual processing units, such as a loading unit, cleaning units, drying unit, and an unloading unit arranged circumferentially around a universal industrial robot capable of reaching any of the units and transferring the wafers between the units. Drying is carried out in a horizontal position of the wafer and may combine spin-dry with chemical treatment for accelerating the drying process and for improving quality of the drying process. All units are located in a sealed enclosure with a controlled purity of the atmosphere inside the enclosure. Method of cleaning is also disclosed.

Abstract: A treatment fluid comprises: a liquid fluorinated compound; and at least one additive, wherein the additive: (A) comprises carbon and at least one fluorine functional group; and (B) is soluble or dispersible in the liquid fluorinated compound. A method of treating a portion of a well comprises: forming the treatment fluid; and introducing the treatment fluid into the well.

Abstract: A method for reducing or removing organic and/or inorganic contamination from a vacuum system of imaging and analytical devices, wherein at least a portion of the area of the inner surface of the vacuum space of the vacuum system is provided with a photocatalytic layer, at least a portion of this photocatalytic layer being cooled to a temperature in the range of 0 K to 280 K, whereby the photocatalytic layer is afterwards at least partially irradiated by electromagnetic radiation, which activates a photocatalytic reaction of the photocatalytic layer with the adsorbed gases of the atmosphere of the inner vacuum space of the vacuum system, where this reaction decomposes the contaminants, reducing their concentration and/or the concentration of water in the inner vacuum space of the vacuum system.

Abstract: An apparatus for recycling of fibers pre-impregnated with resin may include a container configured to receive a predetermined amount of solvent and a predetermined amount of fibers pre-impregnated with resin. The apparatus may also include an energy source configured to provide sound energy into the container in order to facilitate the removal of resin from the fibers, and a controller configured to control a frequency of the sound energy provided by the energy source into the container.

Abstract: A method and a device (50) for removing fragments and/or particles from containers, such as in particular glass tubes (5), provides means for adjusting the electrostatic force (40) in the tubes (5) and means for removing (60) of the fragments. The means for removing (60) can comprise a jet of fluid, of measured speed, put in the containers (5) by a nozzle (2), whereas the means for adjusting the electrostatic force (40) can comprise an element (1) for putting an electrically conducting fluid (8) with a measured resistivity in the containers (5). This way, the fluid (8), for example ionized air, acts in order to reduce and/or eliminate the electrostatic charge, and therefore the electrostatic force, between the fragments (30) and the surface of the containers, assisting the removal by means of jets of fluid or by suction means.

Abstract: An apparatus comprising a frame and a pressure sensitive adhesive applied to at least a portion of the frame, where the pressure sensitive adhesive is arranged to bond a pre-strained film to the frame is disclosed. A method of making the apparatus also is disclosed. Also disclosed is a method of preparing a stretch frame for manufacturing electroactive polymer devices thereon.

Abstract: An apparatus that passes vibrational energy across a mechanical structure lacking a perforation. The disclosed apparatus and method provide the ability to transfer work (rotary or linear motion) across pressure or thermal barriers or in a sterile environment without generating contaminants; the presence of reflectors in the solid barrier to enhance the efficiency of the energy/power transmission, and the ability to produce a bi-directional driving mechanism using a plurality of different mode resonances, such as a fundamental frequency resonance and a higher frequency resonance. In some instances, a plane within the mechanical structure lacking a perforation is a nodal plane of the vibrational energy field.

Abstract: A nozzle cleaning device and a method of using the same are disclosed. The nozzle cleaning device has a cavity and a sealed chamber formed therein. The sealed chamber is provided with a cleaning tank, motors, driving bearings connected to the motors, rotation shafts connected to the driving bearings, a cleaning block fitted on the rotation shafts disposed above carrier portions, a heating means, and an ultrasonic wave device, so as to thoroughly clean nozzle portions which the mechanical procedure cannot clean, achieving a better cleaning effect, and being easier to use.

Abstract: Provided is a method for cleaning an ion implanted resist layer or a substrate after an ashing process. A duty cycle for turning on and turning off flows of a treatment liquid using two or more nozzles is generated. The substrate is exposed to the treatment liquid comprising a first treatment chemical, the first treatment chemical with a first film thickness, temperature, total flow rate, and first composition. A portion of a surface of the substrate is concurrently irradiated with UV light while controlling the selected plurality of cleaning operating variables in order to achieve the two or more cleaning objectives. The cleaning operating variables comprise two or more of the first temperature, first composition, first film thickness, UV wavelength, UV power, first process time, first rotation speed, duty cycle, and percentage of residue removal are optimized to achieve the two or more cleaning objectives.

Abstract: Provided are a method and apparatus for cleaning organic materials accumulated on a mask used in a process of depositing organic materials. The apparatus includes a plasma generating unit, a cleaning chamber connected to the plasma generating unit and accommodating the mask therein, a gas injection port disposed within the cleaning chamber configured to inject the plasma, and a cooling device disposed on a first surface of the mask opposite to an opposite surface of the mask facing the gas injection port.

Abstract: The present invention relates to a cleaning method and a cleaning apparatus for a mask. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened, the cleaning productivity is increased and the probability of material residue is decreased.

Abstract: The present invention is based upon the discovery that the level of adhesion between steel reinforcing elements and rubber products, such as conveyor belts, in which they are embedded can be significantly reduced by heating the steel reinforcing elements by induction heating to break down the level of bonding between the steel reinforcing elements and the rubber in the article. The present invention more specifically discloses a method for recovering steel reinforcements from a conveyor belt carcass having steel reinforcements which are bonded to the carcass of the conveyor belt, said method comprising (1) heating the steel reinforcements in the conveyor belt by induction heating to a temperature which is sufficient to substantially breakdown bonding between the steel reinforcements and the carcass of the conveyor belt and (2) applying a mechanical force to the steel reinforcements which is sufficient to separate the steel reinforcements from the conveyor belt carcass.

Abstract: The present invention provides a dredged soil transport system including a pipe module wound with a coil applying an electromagnetic field to an internally flowing dredged soil and including a plurality of pipelines, a pump module configured to provide a transport pressure for transport of dredged soil to the pipe module, database stored with flow information on flow velocity and flow form in response to physical properties of liquefied unit, and a control module communicating with the pipe module, the pump module and the database wiredly and wirelessly and applying, to the coil, a current of waveform matching to a flow waveform of the dredged soil transported inside the pipeline, and a control method thereof.

Abstract: Magnetic apparatuses and systems for shaping parts are described. One or more magnets can be used to direct a magnetically responsive fluid having magnetically responsive particles around surfaces of a part. The magnetically responsive fluid can include abrasive particles that follow movement of the magnetically responsive fluid across surfaces of the part and remove material from the part until the part takes on a desired shape. The magnetic apparatuses can be configured to provide a rough cut, similar to machining process, and/or a fine cut, similar to polishing or buffing process, to the part.

Abstract: Methods of increasing the solubility of a base in supercritical carbon dioxide include forming a complex of a Lewis acid and the base, and dissolving the complex in supercritical carbon dioxide. The Lewis acid is soluble in supercritical carbon dioxide, and the base is substantially insoluble in supercritical carbon dioxide. Methods for increasing the solubility of water in supercritical carbon dioxide include dissolving an acid or a base in supercritical carbon dioxide to form a solution and dissolving water in the solution. The acid or the base is formulated to interact with water to solubilize the water in the supercritical carbon dioxide. Some compositions include supercritical carbon dioxide, a hydrolysable metallic compound, and at least one of an acid and a base. Some compositions include an alkoxide and at least one of an acid and a base.

Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

Abstract: Systems for sterilization of demineralized bone matrices are provided.

Abstract: Certain embodiments provide a marking apparatus that including a determination section configured to determine the type of a medium on which an image is formed with decolorable image forming material, a recording section configured to record a mark indicating the decolored times of the image on the medium on which the image is formed with the decolorable image forming material, and a change section configured to change a recording method of the mark recorded by the recording section according to the determination result of the medium determined by the determination section.

Abstract: The method of the invention is characterized in that in the first phase the device installation is filled with processed liquid product, yielding a low pressure zone and then the processed liquid product is introduced under high pressure into the cavitation process, where moving at a rate of not less than 3 m/s and under pressure of not less than 20 bar is introduced to the cavitation and rotation location of the separated streams of the processed liquid product, which rotating in the further part, in the longitudinal axis of the cavitator, move in the opposite directions, resulting in differential pressure leading to cavitation process with effects characteristic for sterilization and homogenization with heterogeneous parameters, wherein in the next phase a separation takes place into a liquid product, which has a particle size larger than 600 nm and a liquid product which has a particle size smaller than 600 nm, wherein the liquid product of larger particle size is directed to cooling and complementary cavi

Abstract: Provided is a centrifuge that preferably performs processes such as dispersion of a material to be processed while enhancing convenience for users. A centrifuge 1 of the present invention includes an ultrasonic wave generation source 10 that generates ultrasonic waves and a storage container 20 that stores a material to be processed M. The centrifuge 1 of the present invention also includes a rotation mechanism 30. The rotation mechanism 30 rotates the storage container 20 around a rotation axis L tilted relative to a virtual line V extended in a vertical direction in such a manner that the ultrasonic waves from the ultrasonic wave generation source 10 are constantly applicable to the material to be processed M.

Abstract: Provided is a substrate treating apparatus including a housing; a plurality of opening-and-closing members configured to provide a driving force for opening and closing the housing; a fluid storing member supplying a fluid to the opening-and-closing members; and a fluid distribution unit connected to the fluid storing member via a supply conduit to distribute the fluid supplied from the fluid storing member to the opening-and-closing members. The fluid distribution unit includes a distribution conduit diverging from the supply conduit and connected to a corresponding one of the opening-and-closing members; and a fluid distribution member provided at a junction between the supply conduit and the distribution conduit.

Abstract: Disclosed is a substrate processing apparatus (a substrate processing method, and a computer readable storage medium having a substrate processing program stored therein) of cleaning an etched substrate with a polymer removing liquid, in which any of isopropyl alcohol vapor, water vapor, deionized water and isopropyl alcohol, ammonia water, and ammonia water and isopropyl alcohol is supplied to the substrate before the substrate is cleaned with the polymer removing liquid.

Abstract: A hard film whose composition formula satisfies M1-a-bCaNb, in which M is at least one element selected from Ti, Cr and Al, or is the element and at least one element selected from Group 4 elements except for Ti, Group 5 elements, Group 6 elements except for Cr, Si, Y, and rare earth elements. Atomic ratios of M, C and N satisfy: 0.01?a?0.50; 0.10?b?0.50; and 0<1-a-b. A ratio y of C-to-C bonding to all C bonding in the film is 0.20 or more.

Abstract: A dash silencer has a lamination structure of a first layer, an intermediate layer, and a second layer. The intermediate layer is formed as a non-air permeable thin-membrane layer. The second layer is formed as a perforated layer having a plurality of opening portions.

Abstract: The present invention is a pattern forming method of forming a pattern on a substrate using a block copolymer, the pattern forming method including the steps of: forming a film of a block copolymer containing at least two kinds of polymers on the substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with ultraviolet light in an atmosphere of an inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the ultraviolet light.

Abstract: According to one embodiment, an electrostatic chuck cleaner cleaning an adsorption face of an electrostatic chuck capable of attracting a reticle, and the cleaner includes: a plurality of substrates; adhesive layers provided on a major surface of each of the substrates, the adhesive layers being pressed against the adsorption face; and conductive layers provided on the major surface of each of the substrates, and the conductive layers being provided in a region other than a region where the adhesive layer being provided. The adhesive layers provided on the major surface of each of the substrates are disposed in different regions, and the entire adsorption face is pressed by the adhesive layers when the adhesive layers of the substrates are pressed against the adsorption face.

Abstract: Methods, systems, apparatus, devices and computer program products automatically package an object, such as, for example, whole muscle meat pieces, in a covering material, such as, for example, sheared casing and/or netting. The devices include an automated compression assembly with an electric drive motor and a pusher assembly with an electric motor, preferably each electric motor is a servo-motor. The systems/apparatus devices can include a programmably adjustable index and/or speed profile for the compression and/or pusher assembly.

Abstract: A method includes etching a low-k dielectric layer on a wafer to form an opening in the low-k dielectric layer. An amount of a detrimental substance in the wafer is measured to obtain a measurement result. Process conditions for baking the wafer are determined in response to the measurement result. The wafer is baked using the determined process conditions.

Abstract: A method for operating semiconductor manufacturing equipment is provided. The method includes forming a conductive thin film on an inner side surface of a reaction chamber and on a substrate in the reaction chamber, the conductive thin film including a first conductive material, and forming a particle preventive layer on the inner side surface of the reaction chamber in which the conductive thin film is formed.

Abstract: A plasma processing method of performing a plasma process, using a plasma processing apparatus that includes a process chamber including a chromium (Cr) containing member and a mounting table placed in the process chamber, on a substrate on the mounting table, includes etching the substrate by plasma generated by a first gas containing bromine; after the etched substrate is carried out, forming a protection film by plasma generated by a second gas containing a CxFy gas (x?1, y?4) and an inert gas; and evacuating a reaction product containing chromium generated in the etching.

Abstract: A system to measure the internal state of a bundle of tubes by injecting a signal into each tube of the bundle, receiving reflections from the tube due to anomalies within the tube, then analyzing the reflections to determine the type or characteristics about the anomalies. The analyzed information is stored in database to be used for statistical processing. Further, the device can be used in the performance of a cleaning process by conducting an initial assessment of the tubes in a bundle of tubes, comparing the stored data and estimating the number of cleaning cycles that will be required, and re-conducting the evaluation of the state of the tubes after every cleaning cycle or after every few cleaning cycles.

Abstract: A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.

Abstract: Embodiments of systems and methods of etching material from the surface of a wafer are provided. In one representative embodiment, an apparatus comprises a fluid reservoir configured to receive a fluid including an etchant and one or more wafers in a cassette. The apparatus can further comprise a roller member in the fluid reservoir to frictionally engage the one or more wafers and to displace the one or more wafers with respect to a bottom portion of the cassette when the cassette is in the fluid reservoir. The apparatus can further comprise a motor outside the fluid reservoir and magnetically coupled to the roller member such that activation of the motor causes corresponding rotation of the roller member, and thereby rotation of the one or more wafers when the roller member is in frictional engagement with the one or more wafers.

Abstract: Cladding and remanufacturing a machine component includes directing cleaning and welding beams split from an incident laser beam toward the machine component, and moving the machine component relative the cleaning and welding beams such that the welding beam trails behind the cleaning beam along a common travel path. A surface of the machine component is decontaminated by the cleaning beam, while a cladding material is melted via the welding beam such that upon solidifying the cladding material forms a coating metallurgically bonded to base material and previously deposited cladding material of the machine component.