With Organic Treating Agent (e.g., Solvent, Surfactant, Or Reactant Yielding Soluble Product, Etc.) Patents (Class 134/22.19)
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Patent number: 6554005Abstract: A method for cleaning polyethylene terephthalate containers including contacting the PET container with an alkaline wash solution having a temperature ranging of less than about 60° C. is disclosed. The alkaline wash solution is formulated from a first concentrate, a second concentrate, an alkalinity source, and a balance of water. The first concentrate preferably has a first nonionic surfactant, a first builder, and acid in an amount effective to provide a phase stable solution. The second concentrate preferably has a second nonionic surfactant and a second builder. The first and second concentrate are present in the wash solution in a concentration ranging from about 0.3 wt. % to 2.0 wt. %. Preferably, the first nonionic surfactant has a cloud point ranging from about 5° C. to 60° C.Type: GrantFiled: September 25, 2000Date of Patent: April 29, 2003Assignee: Ecolab Inc.Inventors: Bruce R. Cords, Gerald K. Wichmann, Guang-Jong Jason Wei, David D. McSherry, Brandon L. Herdt, Arturo Valencia
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Patent number: 6555012Abstract: A composition and method particularly designed to treat blackwater deposit. In at least one example, a composition for use in removing and preventing buildup of blackwater deposits in blackwater collection/treatment systems. The composition includes in the range of about 2 to about 15 wt. % of acidic solubilizing agent; in the range of about 0.2 to about 8 wt. % of wetting agent; in the range of about 0 to about 1 wt. % corrosion inhibitor; and a solvent/carrier medium. Another aspect is a concentrated composition to be diluted before or during use, the concentrated composition comprising in the range of about 10 to about 70 wt. % of acidic solubilizing agent; in the range of about 1 to about 40 wt. % of wetting agent; in the range of about 0 to about 5 wt. % corrosion inhibitor; and a solvent. In another example, a method for removing and preventing buildup of blackwater deposit in a blackwater collection system.Type: GrantFiled: October 2, 2000Date of Patent: April 29, 2003Assignee: Ecolab Inc.Inventors: Peter J. Fernholz, Don Southworth, Victor F. Man
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Patent number: 6554912Abstract: Compositions for the removal of polymeric material from a substrate are provided where the compositions include a polyol compound selected from (C3-C20)alkanediols, substituted (C3—C20)alkanediols, (C3-C20)alkanetriols or substituted (C3-C20)alkanetriols, a glyco ether, at least 5% wt water based on the total weight of the composition, and a fluoride salt selected from ammonium fluoride, ammonium bifluoride, ammonium-tetramethylammonium bifluoride or mixtures thereof. Methods of removing polymeric material using these compositions are also provided.Type: GrantFiled: August 2, 2001Date of Patent: April 29, 2003Assignee: Shipley Company, L.L.C.Inventor: Javad J. Sahbari
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Patent number: 6554006Abstract: The present invention provides a method of removing copper oxide deposits from stator water cooling system piping material surfaces. The present invention disconnects the generator from the stator water cooling system, connects bridging piping to the stator water cooling system at the points from which the generator was disconnected to allow the stator water cooling system to operate without the generator, provides a sufficient amount of an aqueous solution of an agent which dissolves or removes copper oxide deposits from piping material surfaces for a time sufficient to dissolve or remove substantially all copper oxide deposits, and rinses the piping material surfaces with sufficient water until the output water from the rinsing of the piping material surfaces is essentially neutral.Type: GrantFiled: December 22, 2000Date of Patent: April 29, 2003Assignee: General Electric CompanyInventor: Raymond Grant Rowe
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Patent number: 6551414Abstract: Whenever a dishwasher is operated a given number of times or whenever a given number of days transpire, an apparatus performs a process that removes minerals deposits that have built-up inside the dishwasher. The process commences by rinsing the dishwasher interior with water and draining the rinse water. A mixture of water and a chemical that dissolves the minerals is introduced into the dishwasher and a pump circulates the mixture inside the dishwasher for a period of time. Next the mixture is drained out and the dishwasher interior is rinsed again with fresh water.Type: GrantFiled: January 19, 2001Date of Patent: April 22, 2003Assignee: U.S. Chemical CorporationInventor: Kurt A. Reichold
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Patent number: 6551411Abstract: A detergent composition useful for cleaning away a resin remaining in a molding machine after molding, comprising a thermoplastic resin, water and wollastonite.Type: GrantFiled: August 30, 2001Date of Patent: April 22, 2003Assignee: Asahi Kasei Kabushiki KaishaInventors: Mikihiko Ito, Noriko Yamauchi
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Patent number: 6550485Abstract: There is provided a method of efficiently removing polymer stuck to the inside and/or on the surface of packings of a distillation tower, when nitrogen-containing polymerizable monomers (for example, ethyleneimine) are distilled. Said method consists of washing the inside and/or packings of a distillation tower with an acidic liquid (for example, aqueous solution of acetic acid).Type: GrantFiled: September 21, 2001Date of Patent: April 22, 2003Assignee: Nippon Shokubai Co., Ltd.Inventors: Yoshihisa Oka, Kenichi Takematsu
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Patent number: 6550487Abstract: A cleaning unit (A) includes a movable cart (20) which carries a cleaning system for cleaning baked-on residues from walls (10) of a sterilizer chamber (12). The cleaning system includes a lid (80) which is mounted over an opening (82) to the chamber. In one embodiment, the door (232) of the chamber provides the lid. An articulating nozzle (124) extends from the lid into the interior of the chamber. Alkaline and acid cleaning solutions (180, 182), for removing organic and inorganic residues, respectively, from the chamber, are stored in two storage containers (52, 54) carried by the cart. A first pump (60), mounted on the cart, pumps first the alkaline, then the acid cleaning solution to the nozzle. A second pump (62), mounted on the cart, connects with a scavenge fitting (166) in the chamber to return the cleaning fluid to the respective storage container.Type: GrantFiled: March 9, 2000Date of Patent: April 22, 2003Assignee: Steris Inc.Inventors: Michael A. Duckett, John C. Bliley, Gerald J. Kielar, Sayed Sadiq Shah, Anthony W. Raymond
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Publication number: 20030064903Abstract: A composition for a cleaning-in-place system is described. The composition has a defoaming agent and a cleaning agent, and the composition is low foaming. The composition displays excellent cleaning and disinfecting properties on processing equipment such as the equipment found in breweries, dairy plants and carbonated beverage plants, even in the absence of carbon dioxide purging.Type: ApplicationFiled: September 13, 2001Publication date: April 3, 2003Applicant: Diversey LeverInventors: Michael Francis Coughlin, Charles Allen Crawford
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Patent number: 6530382Abstract: Methods for cleaning screw extruder, especially powder-coating extruders, include filling the extruder barrel with a gel purge formulation comprised of a high-boiling pyrrolidone or piperidone (lactam) solvent (most preferably N-methyl pyrrolidone (NMP)), thickened with 5-50 wt. % of a thermoplastic resin thickening agent, most preferably polystyrene (PS). Once the extruder barrel is filled with the gel purge formulation, the screws are stopped and the gel allowed to soak for between about 10 to about 30 minutes. The screws are then restarted and the gel is discharged from the extruder. Immediately after the gel purge formulation exits the machine, a small amount of a thermoplastic “rinse” polymer (e.g., polyethylene) may be added so as to remove any vestigial amount of the gel purge formulation therefrom.Type: GrantFiled: June 6, 2001Date of Patent: March 11, 2003Assignee: BASF CorporationInventor: Mark W. Waldrop
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Patent number: 6530386Abstract: A method for cleaning returnable bottles and similar containers used in the food industry. The method uses an enzymatic solution during the cleaning process. The cleaning results are at least as good as conventional methods, without requiring an increase in the duration of cleaning. The method substantially reduces bottle corrosion and waste water pollution compared to conventional methods.Type: GrantFiled: October 2, 2001Date of Patent: March 11, 2003Assignee: Henkel Ecolab GmbH & Co. OHGInventors: Siegfried Bragulla, Brian Glanville, Andreas Potthoff, Harald Kluschanzoff, Alfred Laufenberg
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Patent number: 6524392Abstract: Cleaning compositions which, as powder or as aqueous formulation based on sodium bicarbonate, sodium chloride and/or sugar, comprise a water-soluble polymeric polycarboxylate as dispersant with the exception of those formulations containing only sodium bicarbonate and polyaspartic acids and/or their salts, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces. A method for cleaning surfaces contaminated with deposits using these cleaning compositions.Type: GrantFiled: March 14, 2000Date of Patent: February 25, 2003Assignee: Bayer AktiengesellschaftInventors: Hans-Joachim Traenckner, Hartwig Wendt, Thomas Menzel
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Patent number: 6524397Abstract: A method for removing an acidic deposit containing a sulfur compound, which comprises contacting the acidic deposit with an aqueous solution of an alkali metal carbonate and/or an alkali metal hydrogencarbonate to remove it.Type: GrantFiled: April 5, 2001Date of Patent: February 25, 2003Assignee: Asahi Glass Company, LimitedInventors: Shigeru Sakurai, Masaharu Emoto, Hachiro Hirano, Makoto Yoshida, Hiroaki Noda, Michihiro Kawano
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Publication number: 20030024548Abstract: A new method is provided to clean melamine deposits from tools and components that are used to form molds around and to therewith encapsulate BGA devices. The cleaning process applies a dummy BGA substrate as part of and during the cleaning procedure. This dummy BGA substrate replaces the conventionally used copper strips that shield areas of the molding tools during the cleaning cycle. The dummy copper strips require, during and as part of the melamine cleaning process, frequent cleaning, which adds considerable to the time and expense of the melamine cleaning process.Type: ApplicationFiled: September 6, 2002Publication date: February 6, 2003Applicant: ST ASSEMBLY TEST SERVICES PTE LTDInventor: Loreto Ycong Cantillep
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Patent number: 6514458Abstract: Method for removing microbial biofilm from surfaces in contact with an aqueous system is disclosed, which comprises adding to the system a treatment comprising low foaming, ethoxylated anionic surfactant composed of alkyl substituted carboxylated acid or salt thereof and polyoxyethylene-polyoxypropylene block copolymer.Type: GrantFiled: February 25, 2000Date of Patent: February 4, 2003Assignee: GE Betz, Inc.Inventors: Melvin H. Czechowski, Wilson K. Whitekettle
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Patent number: 6514352Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.Type: GrantFiled: October 9, 2001Date of Patent: February 4, 2003Assignees: Tokyo Electron Limited, Mitsubishi Gas Chemical Company Inc.Inventors: Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara, Yoshiya Kimura, Ryuji Sotoaka, Takuya Goto, Tetsuo Aoyama, Kojiro Abe
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Patent number: 6514350Abstract: This invention relates to a process for removing rust from metal surfaces. The process uses an aqueous solution of a benzoate.Type: GrantFiled: September 14, 2001Date of Patent: February 4, 2003Assignee: Ashland Inc.Inventors: Bruce L. Libutti, Joseph Mihelic
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Patent number: 6511613Abstract: The reaction of propargyl alcohol and iodine gives 2,3di-iodo-2-propen-1-ol, and it has been discovered that this compound is effective as an intermediate in a corrosion inhibitor for metals in acid media, particularly halogen acids. The compound provides iodine to the media in a stable form that does not appear to degrade over time.Type: GrantFiled: June 21, 2002Date of Patent: January 28, 2003Assignee: Baker Hughes IncorporatedInventors: Arthur Cizek, James A. Hackerott
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Publication number: 20030015219Abstract: A method for removing gross soils from a substrate during a multi-step cleaning process comprising the step of flushing the substrate with a pre-rinse solution prior to application of a cleaning solution and/or second rinse solution. The pre-rinse solution comprises water and a partially neutralized anionic polymer.Type: ApplicationFiled: April 20, 2001Publication date: January 23, 2003Inventors: Joseph I. Kravitz, Richard O. Ruhr, Andrew T. Gioino
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Patent number: 6506459Abstract: A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.Type: GrantFiled: December 20, 2001Date of Patent: January 14, 2003Assignee: 3M Innovative Properties CompanyInventors: Richard M. Flynn, Mark W. Grenfell, George G. I. Moore, John G. Owens
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Patent number: 6503337Abstract: A method for chemically removing hydrocarbons from oil contaminated material is described. The method comprises contacting the material containing the oil with a combinations of surfactants in an oil carrier similar to or identical to the oil to be removed. This process avoids the use of water. Therefore the process does not compromise the quality of the oil by having water as a contaminant and thus eliminating the possibility of oil contaminated water getting into the environment. In certain examples, when the process is used to remove oil from land based well bore cuttings, the processed well bore cuttings contain high levels of chlorides, which is an environmental problem. In such examples the method also includes contacting the well bore cuttings with a solution of dioctyl sodium sulfosuccinate in water to reduce the chloride concentration. An apparatus designed for this purpose is also described.Type: GrantFiled: December 13, 1999Date of Patent: January 7, 2003Assignee: BGR Oilfield Services, Inc.Inventor: Brian G. Roberts
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Patent number: 6497769Abstract: A method for removing radioactive contaminants from a given surface. An acidic solution having a pH of less than 3.0, and preferably less than 1.5, of a complex substituted keto-amine, and a mixture of a saturated and unsaturated lower alcohol (e.g. isopropyl alcohol and propargyl alcohol), and concentrated acid is applied to a contaminated surface. The solution is left on said surface for a time sufficient to remove the radioactive contaminants into the acidic solution and then removed. The acidic solution containing the radioactive contaminants is preferably neuralized by an alkaline material to a pH of between 5.5 and 9.0. Removal of thorium contamination from railcars is one useful application of the invention. The method of the present invention has the effect of removing substantially all of the radioactive contaminants from a previously contaminated surface.Type: GrantFiled: October 12, 2001Date of Patent: December 24, 2002Assignee: Bobolink, Inc.Inventor: Robert T. Martin
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Publication number: 20020187912Abstract: Methods for cleaning screw extruder, especially powder-coating extruders, include filling the extruder barrel with a gel purge formulation comprised of a high-boiling pyrrolidone or piperidone (lactam) solvent (most preferably N-methyl pyrrolidone (NMP)), thickened with 5-50 wt. % of a thermoplastic resin thickening agent, most preferably polystyrene (PS). Once the extruder barrel is filled with the gel purge formulation, the screws are stopped and the gel allowed to soak for between about 10 to about 30 minutes. The screws are then restarted and the gel is discharged from the extruder. Immediately after the gel purge formulation exits the machine, a small amount of a thermoplastic “rinse” polymer (e.g., polyethylene) may be added so as to remove any vestigial amount of the gel purge formulation therefrom.Type: ApplicationFiled: June 6, 2001Publication date: December 12, 2002Inventor: Mark W. Waldrop
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Publication number: 20020177538Abstract: Compositions for removing deposits from the interior surfaces of oil refining equipment are provided. The compositions include an organic oil-soluble or oil-miscible acid and a multi-polyether-headed surfactant (MPEHS). Methods of removing these deposits from the interior surfaces of oil refining equipment and removing mud deposits from the bottom of desalters, while the equipment is online, are also disclosed.Type: ApplicationFiled: March 15, 2001Publication date: November 28, 2002Applicant: Hercules IncorporatedInventors: Paul R. Hart, Michelle Moffitt
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Patent number: 6484733Abstract: Used deNOx or dedioxin catalytic converters are regenerated by washing the catalyst with a solution of surface-active substances in a liquid. At the same time, metal compounds are added for creating active centers.Type: GrantFiled: February 23, 2001Date of Patent: November 26, 2002Assignee: Integral Umwelt-und Anlangentechnik Gesellschaft m.b.HInventors: Richard Budin, Krzysztof Krotla, Hermann Rabitsch
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Patent number: 6485576Abstract: The present invention provides a method for removing a coating layer of SOG or photoresist from a wafer flat side on a wafer by first injecting a flow of a cleaning solution at the bottom surface of the wafer at a location adjacent to the edge of the wafer, and then rotating the wafer at a rotational speed sufficiently high so as to cause the cleaning solution being pulled from the bottom side to the top side of the wafer by flowing around the edge to remove the coating layer covering the unintended area on the top surface of the wafer.Type: GrantFiled: November 22, 1996Date of Patent: November 26, 2002Assignee: Taiwan SEmiconductor Manufacturing Co., Ltd.Inventors: Kuan-Chi Huang, Chi-Shen Lo
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Publication number: 20020173437Abstract: The present invention relates to methods for cleaning, rinsing, and/or antimicrobial treatment of medical carts, medical cages, and other medical instruments, devices or equipment. The method for cleaning employs a solid alkaline, for example a solid carbonate, cleaning composition for cleaning the medical cart, cage, instrument, device, or equipment. The method for rinsing employs a solid neutral or neutralizing rinse composition for rinsing the medical cart, cage, instrument, device, or equipment. The method for antimicrobial treatment employs a solid, for example a solid quaternary ammonium or solid halogen, antimicrobial composition, for antimicrobial treatment of the medical cart, cage, instrument, device, or equipment.Type: ApplicationFiled: March 23, 2001Publication date: November 21, 2002Inventors: Reid Rabon, Sally K. Swart, Denise Chandler, Terrence P. Everson
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Patent number: 6478033Abstract: The present invention is directed to methods for cleaning films and particulates from the compressor section and combustion contaminants from the combustion and turbine sections of a combustion turbine. Particulate films and contaminants adhering to the internal components of the compressor section of a turbine are readily removed by pumping a foamed cleaning solution such as a foamed, aqueous surfactant solution through the compressor section. Contaminants resulting from fuel combustion and deposited in the combustion and turbine sections are removed by pumping a second, foamed cleaning solution through those sections. The second solution typically comprises a foamed, aqueous acid solution optionally including a corrosion inhibitor. The compressor section must be isolated from such acid solutions, e.g. by pumping the foamed surfactant solution through the compressor section prior to and simultaneously with pumping the foamed acid solution through the combustion section.Type: GrantFiled: May 26, 2000Date of Patent: November 12, 2002Assignee: HydroChem Industrial Services, Inc.Inventor: Charles D. Foster
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Publication number: 20020162571Abstract: The present invention provides a planar clean method applicable to shallow trench isolation (STI) for cleaning a substrate having a STI region formed thereon and a high density plasma (HDP) oxide on the surface of the STI region. A buffer oxide etch cleaning solution is exploited and matched by a planar clean way to let the oxide losses of the surface of the silicon substrate and the STI corners match the height and shape of the HDP oxide in the STI region. Thereby, the phenomenon of wrap rounding at the STI corners, which influences growth of the next thermal oxide, can be avoided. The present invention can prevent the STI corners from generating parasitic device characteristics and enhance electric characteristics of the device.Type: ApplicationFiled: May 2, 2001Publication date: November 7, 2002Inventors: Chun Lien Su, Chun Chi Wang, Gen Da You
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Patent number: 6475295Abstract: A method for cleaning paint carrying parts of a paint shop, especially the paint lines, is described, wherein the paint carrying parts are rinsed with a liquid containing an organic solvent. In order to obtain particularly advantageous conditions, polyaspartic acid is mixed with the rinsing liquid.Type: GrantFiled: March 29, 2001Date of Patent: November 5, 2002Assignee: Aware Chemicals L.L.C.Inventors: Alfred Bohnes, Johannes Lindemann, Karl Manderscheid, Dirk Bohnes
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Patent number: 6468361Abstract: A new method is provided to clean melamine deposits from tools and components that are used to form molds around and to therewith encapsulate BGA devices. The cleaning process applies a dummy BGA substrate as part of and during the cleaning procedure. This dummy BGA substrate replaces the conventionally used copper strips that shield areas of the molding tools during the cleaning cycle. The dummy copper strips require, during and as part of the melamine cleaning process, frequent cleaning, which adds considerable to the time and expense of the melamine cleaning process.Type: GrantFiled: August 9, 2000Date of Patent: October 22, 2002Assignee: ST Assembly Test Service Ltd.Inventor: Loreto Ycong Cantillep
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Patent number: 6468472Abstract: A composition for cleaning and decontaminating medical devices such as dialyzers. A per-compound oxidant, for example, hydrogen peroxide (H2O2) and/or peracetic acid, is mixed with a buffer such as dipotassium hydrogen phosphate. The pH of the composition is between about 5-11. The composition effectively cleans the device, can achieve high level disinfection and sterilization of the device and is non-corrosive to plastics and adhesives used in the device.Type: GrantFiled: September 16, 1999Date of Patent: October 22, 2002Assignee: Metrex Research CorporationInventors: Zhi-Jian Yu, Stanley William Huth
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Patent number: 6468359Abstract: The invention relates to a method for cleaning a metallic or an enameled surface comprising flooding a metallic surface contaminated with deposits with a mixture comprising (i) water, (ii) chippings of woods selected from the group consisting of merantis, bongossis, mahoganies, sipos, khayas, lauans, and sapellis, and (iii) a member selected from the group consisting of polyaspartic acid, salts of polyaspartic acid, and polysuccinimide, and thereby cleaning the surface.Type: GrantFiled: March 16, 2001Date of Patent: October 22, 2002Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann
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Publication number: 20020144718Abstract: Paint residues may be removed from spraying equipment and the like by flushing with aqueous compositions containing alkoxylated aromatic alcohols wherein the aromatic ring moieties of such alcohols do not bear any alkyl substituent containing more than 4 carbon atoms. Preferably, the aqueous compositions also contain an alkanolamine or other base. The alkoxylated aromatic alcohols contain an average of at least about 2 oxyalkylene moieties (preferably, oxyethylene moieties) per molecule.Type: ApplicationFiled: December 20, 2001Publication date: October 10, 2002Inventor: Neil R. Wilson
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Patent number: 6461442Abstract: A process including providing a hollow imaging drum having a first end, a second end, an outside surface, an inside surface and coating material on both the inside surface and the outside surface at at least the first end, simultaneously contacting the coating material on both the inside surface and the outside surface at the first end of the drum with resilient foam material, flowing liquid solvent for the coating material to the foam material where the foam material contacts the first end of the drum, the foam material being insoluble in the flowing solvent, producing relative movement between the foam material and the drum to simultaneously wipe both the inside surface and the outside surface of the first end of the drum with the foam material and solvent material and simultaneously remove coating material from the inside surface and the outside surface of the first end of the drum, and flowing the solvent away from the drum to carry away coating material removed from the inside surface and the outside surType: GrantFiled: November 29, 1999Date of Patent: October 8, 2002Assignee: Xerox CorporationInventors: Steven D. Bush, Michael J. Duggan, Kathryn A. Wallace, Henry T. Mastalski
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Patent number: 6461440Abstract: An article having a metallic surface treated with polymeric complexing agent is described. Particularly suitable polymeric complexing agents are phosphonoalkylated polyethyleneimines and/or carboxyalkylated polyethyleneimines and/or vinylimidazole polymers. As a rule, the treated metallic surface forms the total inner surface or a part of the inner surface of a process apparatus or of a container. The surface is protected by the treatment, in particular from the adhesion of polymer.Type: GrantFiled: March 31, 2000Date of Patent: October 8, 2002Assignee: BASF AktiengesellschaftInventors: Heinz Friedrich Sutoris, Gerhard Wagenblast, Jürgen Schröder, Harald Keller, Rainer Rahm, Jürgen Decker, Thomas Jaworek, Volker Schliephake
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Patent number: 6457480Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.Type: GrantFiled: June 27, 2001Date of Patent: October 1, 2002Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6454869Abstract: A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.Type: GrantFiled: June 27, 2001Date of Patent: September 24, 2002Assignee: International Business Machines CorporationInventors: John Michael Cotte, Dario L. Goldfarb, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6450182Abstract: The present invention cleans contaminants from pipes. The first step may be pulling a vacuum on the pipe to be cleaned. The pipe is then filled with a solvent, which is preferably a fluorocarbon solvent. After the pipe is filled with solvent, a cleaning solution is pumped at a high velocity through the pipe. The cleaning solution preferably comprises the fluorocarbon solvent, and a fluorosurfactant. The pipe is then rinsed with solvent. A particle counter is used to determine whether the solvent rinse contains an acceptably low number of particles. The solvent is then blown out of the pipe by a gas, such as dry air. A vacuum is then pulled on the pipe. Subsequently, a hot dry gas is pumped through the pipe to evaporate and remove any remaining solvent. The gas is preferably hot, dry air. The gas exiting from the pipe is then checked to confirm that it contains an acceptably low level of solvent vapor.Type: GrantFiled: April 10, 2001Date of Patent: September 17, 2002Assignee: Versar, Inc.Inventors: Gregory M. Fillipi, Bobby E. Walls, Kenneth Magerus, Jerry L. Gore
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Patent number: 6447616Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing thiourea.Type: GrantFiled: August 31, 2000Date of Patent: September 10, 2002Assignee: The Ford Meter Box CompanyInventors: Edward L. Cote, Andrew D. Wenzel
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Patent number: 6432210Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.Type: GrantFiled: February 28, 2001Date of Patent: August 13, 2002Assignee: The Ford Meter Box Company, Inc.Inventors: Edward L. Cote, Andrew D. Wenzel, Lance E. Agness
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Patent number: 6428628Abstract: A paint-removing method comprises the steps of putting dimethyl sulfoxide into a tank, raising the dimethyl sulfoxide at a temperature of approximately 35° C. to 189° C. in the tank; and soaking a member to be removed of paint into the dimethyl sulfoxide in the tank. The dimethyl sulfoxide is applying or blowing to a member to be removed of paint.Type: GrantFiled: August 22, 2000Date of Patent: August 6, 2002Inventor: Masao Umemoto
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Patent number: 6425406Abstract: Disclosed herein are methods of cleaning toilet basins and urinals. Cleaning components are applied to the interior surfaces of these basins other than through the flush water, without scrubbing. They are allowed to be in contact with the surface of the basin for at least one-half hour before normal use of the toilet/urinal. Preferred methods for applying the cleaning compositions are with a spray bottle or an aerosol can, with application occurring on a daily, overnight basis.Type: GrantFiled: September 14, 1999Date of Patent: July 30, 2002Assignee: S. C. Johnson & Son, Inc.Inventors: Michael E. Klinkhammer, Timothy I. Moodycliffe, Virginia M. Hempel
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Patent number: 6425956Abstract: A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical fluid including supercritical, carbon dioxide and a co-solvent, and a surfactant.Type: GrantFiled: January 5, 2001Date of Patent: July 30, 2002Assignee: International Business Machines CorporationInventors: John Michael Cotte, Donald J. Delehanty, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
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Patent number: 6418946Abstract: An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.Type: GrantFiled: January 5, 2001Date of Patent: July 16, 2002Assignee: Advanced Micro Devices, Inc.Inventors: Vincent L. Marinaro, Eric Kent, Ted Wakamiya
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Publication number: 20020088477Abstract: A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical fluid including supercritical carbon dioxide and a co-solvent, and a surfactant.Type: ApplicationFiled: January 5, 2001Publication date: July 11, 2002Applicant: International Business Machines CorporationInventors: John Michael Cotte, Donald J. Delehanty, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
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Patent number: 6403551Abstract: An apparatus, method, and composition provide a long-term, solid cartridge made of cleaning cleaning agents mixed at an equilibrium concentration with a solubility limiting agent for controlling an equilibrium concentration of the composition in a solvent, such as water, for example. In use, the cleaning agents are dissolved only to a predetermined concentration needed for a single dose of a cleaning appliance, such as a clothes washing machine, for example. The apparatus may be configured to cyclically expose the solid cartridge to the solvent. A dosing amount of the solvent dissolves a pre-determined concentration of cleaning agents, controlled by the solubility limiting agent. The apparatus discharges the dose of cleaning agent to a cleaning appliance, and readies itself again by dissolving a dose of cleaning agent from a surface of the solid cartridge into the solvent.Type: GrantFiled: November 10, 1999Date of Patent: June 11, 2002Assignee: Eco-Safe, L.L.C.Inventor: Eddie Lee Caruthers, Jr.
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Patent number: 6402853Abstract: Equipment used in the processing of plastic, such as molds and extrusion screws, is cleaned of plastic residue by a combination of thermal cycling and agitation without impact cleaning. A chamber can be heated by an electric radiant heater and cooled by the introduction of liquid nitrogen. A fixture in the chamber receives the equipment to be cleaned and is agitated by a drive motor. The chamber is heated and cooled in the following cycle in which the drive motor agitates the fixture: first to 250-300° F., then to −315° F., then cycled between −50° F. and −10° F., then to 150° F., then to −200° F., to 100° F., then to ambient temperature. The chamber is controlled by a computer that prompts the operator for the kind of plastic to be cleaned off of the equipment and then controls the heating and cooling automatically.Type: GrantFiled: October 3, 2000Date of Patent: June 11, 2002Assignee: SPN Tech LLCInventor: J. Drake Carlisle
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Patent number: 6401731Abstract: The decontamination of PCB-containing transformers to obtain treated transformers containing less than 50 parts per million (ppm) polychlorinated biphenyls (PCB) can be achieved using a method wherein the transformer is initially drained of all PCBs; then the core/coil assembly is removed. The internal surfaces of the transformer are then cleaned using a solvent. Finally, a new core/coil assembly is installed. The method is simple and can be completed within a substantially shorter period of time than methods known in the art.Type: GrantFiled: January 19, 1999Date of Patent: June 11, 2002Inventor: William Robertson
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Publication number: 20020066465Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and a fluorine compound to flow on a surface of a material to be treated at a bigh speed to thereby clean the above surface. according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.Type: ApplicationFiled: October 9, 2001Publication date: June 6, 2002Inventors: Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara, Yoshiya Kimura, Ryuji Sotoaka, Takuya Goto, Tetsuo Aoyama, Kojiro Abe