With Organic Treating Agent (e.g., Solvent, Surfactant, Or Reactant Yielding Soluble Product, Etc.) Patents (Class 134/22.19)
  • Patent number: 6183649
    Abstract: Water-circulating systems are treated with an aqueous, alkaline composition comprising I) an organo-phosphorus chelating agent, II) an acrylate homopolymer, III) a salt of an acrylic copolymer, a portion of the repeating units of which contain sulfonate groups, IV) a molybdate salt, and V) a salt of a fused-ring aromatic triazole. This composition (which is formulated in accordance with a specific order of addition of the ingredients) is effective against white rust (corrosion of galvanized metal parts). When the water-circulating system is also fouled with a biofilm, it is preferred to introduce a biofilm remover having biocidal, surfactant, and chelating properties into the system, but the biofilm remover is introduced separately from the above-described composition.
    Type: Grant
    Filed: October 7, 1998
    Date of Patent: February 6, 2001
    Inventor: Michael W. Fontana
  • Patent number: 6179927
    Abstract: A method for decontaminating the copper surfaces (e.g. circuits) of an electronic card from copper salts which can be formed after the soldering of the electronic components onto the substrate employing a water free solution which comprises an alcohol and at least one neutral ammonium salt of an organic acid.
    Type: Grant
    Filed: May 30, 2000
    Date of Patent: January 30, 2001
    Assignee: International Business Machines Corporation
    Inventors: Vittorio Sirtori, Giovanni Cattaneo, Fabio Mauri
  • Patent number: 6176243
    Abstract: A non-hazardous, non-flammable, biodegradable composition for use in removal of paraffin accumulations in oilfield equipment may contain limonene, a glycol ether an ethoxylate(alcohol surfactant, an aliphatic alcohol having 1 to 4 carbon atoms or mixtures thereof, a non-hazardous and biodegradable organic acid, and, sufficient water as a carrier and comprising such a major weight component of the composition as to virtually eliminate a measurable flashpoint therefor. Preferably the aliphatic alcohol is one or methanol, ethanol, or admixtures thereof. Preferably the organic acid is one of acetic acid, citric acid, or formic acid. The glycol either is preferably ethylene glycol monopropyl ether.
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: January 23, 2001
    Inventor: Joe A. Blunk
  • Patent number: 6176937
    Abstract: Aqueous acidic solutions of hydrogen peroxide used for metal surface treatments suffer from an increased decomposition rate of the hydrogen peroxide, caused by the dissolved metals such as iron, copper or titanium. A method is provided wherein stabilization can be achieved by employing a combination of a) a hydroxybenzoic acid, preferably p-hydroxybenzoic acid; b) a hydrotropic sulphonic acid, preferably p-toluene sulphonic acid; and c) a hydrophobic alkaryl sulphonic acid, preferably dodecylbenzene sulphonic acid.
    Type: Grant
    Filed: March 20, 2000
    Date of Patent: January 23, 2001
    Assignee: Solvay Interox Limited
    Inventors: Sarah J. Colgan, Neil J. Sanders, Colin F. McDonogh
  • Patent number: 6171406
    Abstract: A method for removing a stain from a surface of a structure which includes the steps of spraying an aggregating agent comprising a cationic linear organic polymer onto the surface of such structure having a stain produced thereon, dissociating the stain particles by use of Coulomb force f generated between the stain particles and the aggregating agent, displacing slightly the stain particles along the surface of the structure to cause peeling thereof from the surface to be cleaned, and simultaneously, aggregating the same for cleaning. Another embodiment includes maintaining water permeability of a road by easily eliminating a stain adhering to the surfaces of granular aggregate particles forming a drainage-type pavement layer of a road without the use of various mechanical tools.
    Type: Grant
    Filed: September 8, 1999
    Date of Patent: January 9, 2001
    Assignee: Kabushiki Kaisha Hanogumi
    Inventor: Yoshio Otsuki
  • Patent number: 6170494
    Abstract: A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.
    Type: Grant
    Filed: February 22, 2000
    Date of Patent: January 9, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Vincent L. Marinaro, Eric Kent, Ted Wakamiya