Abstract: Electrodes are conveyed edgewise along a path. The electrodes can be supported by their bottom peripheral edge and can be maintained generally vertically. A plurality of wash nozzles are positioned adjacent to the path on opposing sides thereof. Wash spray from the nozzles is directed to impinge sides of the electrode. The nozzles can be arranged linearly to form a nozzle array angled so that the wash spray impinges an upper portion prior to a bottom portion of the electrode. Separate sections for rinsing or pre-washing can be provided within a washing chamber. Used water can be collected and recycled.

Abstract: A produce washer and method of washing produce or other items in a continuous motion washing machine is provided. The produce washer includes a basket, or other collector, that is positioned within a portion of the fluid flow path and sized and shaped to intercept items from a the fluid flow path while at the same time allowing the fluid to continue to flow through a perforated wall in the collector generally in the same circulatory flow path created by the washing machine. The method includes placing items within the wash tank; creating a fluid flow within the wash tank; intercepting one or more of the items from the fluid flow path by the collector; and allowing the fluid to continue flow through the perforated wall in the collector.

Abstract: A washing machine and a method of controlling the washing machine may be provided. The washing machine may include a drum in which laundry are provided and rotated. A laundry amount may be sensed. The drum may operate at a first speed so that a part of the laundry tumbles within the drum and another part of the laundry adheres to the drum or the drum operates at a second speed so that the laundry adheres to the drum according to the sensed laundry amount. Accordingly, at a time of a dehydration cycle, stability of the washing machine and a laundry balancing can be ensured.

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract: A cleaning composition includes a fatty acid salt constituting up to about 50% by weight of the composition, an anti-slip agent constituting up to about 20% by weight of the composition, a soil resistant agent constituting up to about 20% by weight of the composition and water. Methods of cleaning coated and uncoated surfaces, and particularly stone surfaces, are also provided.

Abstract: An apparatus for cleaning paint roller sleeves comprises an open top drum (2) having a base and side walls for holding a quantity of liquid; a detachable cover (3) for sealing said open top drum; and a removable section (11) comprising a plurality of vertical substantially cylindrical compartments (12) for receiving paint roller sleeves and having a central vertical substantially cylindrical compartment (14). The base of the removable section is positioned above the base of the drum.

Abstract: Polysilicon granules can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to rinse and heating the polysilicon granules. A slow drain can be open to remove the superheated liquid. A fast drain then can be open, preferably to atmosphere, to allow steam to vent through bottom. The fast drain can function as a drying process, vaporizing water droplets down the drain with the escaping steam.

Abstract: Device and method for preventing foreign matters from adhering in a dishwasher, the device including a circulating pump including a washing motor for providing a driving source to pump up washing water from a sump, an impeller designed to receive driving force from the washing motor and rotate for pumping the washing water from the sump to spray nozzles, and a disposer designed to receive driving force from the washing motor and rotate, for removing foreign matters introduced together with the washing water, sensing means for sensing a rotation speed of the washing motor, and a system control unit for controlling a rotation direction and/or speed of the washing motor according to the rotation speed sensed at the sensing means, thereby preventing the washing motor from being restricted by food remnants to improve product reliability by providing means for effective removal of the food remnants adhered to the washing motor.

Abstract: Provided is a method and system for stripping a resist film on a plurality of substrates in a resist removal system comprising a processing chamber coupled to a recirculation system comprising a recycle sub-system and a bypass sub-system. The recycle sub-system includes a recycle line, an inline heater, a ratio monitor and control system, and recirculation injection device. The bypass sub-system comprises a treatment liquid supply line, a first injection line, a mixing device, and a second injection line. The treatment liquid comprises a primary stripping chemical, secondary stripping chemical, tertiary stripping chemical, and one or more reactive products. One or more of the temperatures, concentrations, and/or flow rates of the recirculated treatment liquid and/or injected stripping chemicals are adjusted to meet a target strip rate and selectivity for strip over etch of silicon nitride or silicon oxide.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: A method for cleaning casino chips includes the step of providing a chip-cleaning system having an ultrasonic cleaning station with ultrasonic cleaning means. The method proceeds by taking a batch of chips to be cleaned out of service and cleaning the batch of chips at the ultrasonic cleaning station with the ultrasonic cleaning means. Preferably, the chip-cleaning system also includes a rinsing station, a coating station, and a drying station, and the method further comprises rinsing the batch of chips at the rinsing station, coating the batch of chips at the coating station, and drying the batch of chips at the drying station. A preferred chip-cleaning system includes a console with four tanks providing the above features, together with two foldable table-top extensions providing a chip staging area wing and a chip re-stacking area wing, and a counterbalancing arm for assisting an operator move the batch of chips between stations.

Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

Abstract: A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first chemical. The first spray chamber removes the outer region of the flux residue when the wafer is impinged upon by a first chemical spray in order to expose an inner region of the flux residue. The second immersion chamber softens the inner region of the flux residue when the wafer is immersed in a second chemical. The second spray chamber removes the inner region of the flux residue when the wafer is impinged upon by a second chemical spray in order to clean the wafer to a predetermined standard. The drying chamber dries the wafer.

Abstract: A dishwasher is provided that advantageously enables reduction of the amount of water required during the rinsing cycle in order to thereby minimize operational costs and to improve environmental compatibility. A water preparation system has a water preparation container which can receive at least one part of the rinsing liquid used during operation of the dishwasher. The impurities contained in the rinsing liquid are at least partially biodegraded during a water preparation phase with the aid of microorganisms. By preparing and recycling at least one part of the used rinsing water, it is possible to reduce the requirement for fresh water. This enables the burden on the environment to be reduced since at least one part of the water used during the rinsing process is biologically cleansed while it is still in the dishwasher and the requirement for fresh water for the dishwasher is thus reduced.

Abstract: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A substrate processing apparatus (1) includes a bath body (11), cover members (12), processing liquid nozzles (31) for ejecting an SPM liquid like a shower, and gas nozzles (32) for ejecting nitrogen gas. The processing liquid nozzles eject a processing liquid (91) onto substrates (9) from sidewalls (111) of the bath body (11). By ejecting gas toward lower surfaces of the cover members from the gas nozzles before the substrates are loaded into the bath body, it is possible to remove droplets of the processing liquid deposited on the lower surfaces of the cover members during the previous processing of the substrates or during a temperature control where the processing liquid is ejected from the processing liquid nozzles. It is thereby possible to prevent or reduce deposition of droplets of the processing liquid dropped onto the substrates immediately after being loaded into the bath body.

Abstract: A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes the steps of transporting said substrate subjected to the cleaning process from said cleaning processing part to a heating processing part and performing a heating process in said heating processing part on said substrate subjected to the cleaning process. A first interprocess time interval between the instant at which the exposure process of a substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant, and a second interprocess time interval between the instant at which the cleaning process of the substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant.

Abstract: A dispenser used when attached to an opening of a squeeze bottle to discharge a content liquid when inverted. The dispenser has a first channel to discharge a straight forward-moving liquid and a second channel to discharge a foaming liquid. The first channel has a first through channel connecting a first inlet for the content liquid to a first outlet. The second channel has a conduit that has an opening at an inner bottom of the bottle, extends to a foaming chamber, serves as an air supply channel, and has an inner diameter; the foaming chamber is connected to the conduit and mixes the content liquid with air to foam the content liquid; and a second through channel connecting the foaming chamber to a second outlet.

Abstract: The present invention relates to a sterilization and disinfection apparatus. In particular, the present invention relates to a sterilization and disinfection apparatus for surgical equipment. Thus preferred embodiments may have a number of advantages over the prior art which can include: reduced risk of spillage of the sterilization fluid outside the sterilization apparatus; reduced risk of contamination of the equipment after sterilization through inadvertent contact with the equipment by the user; economy of use of the sterilization fluid; improved convenience of transport and storage of sterilized equipment in the sterilization apparatus; automatic override procedure to reduce the risk of overexposure of the equipment to the sterilization fluid if the correct sterilization cycle is not followed; automatic control of contact time of the equipment with the sterilization fluid to avoid over processing and resultant damage; and data logging to provide traceability of the previous sterilization cycles used.

Abstract: The present invention relates generally to a method of soil remediation or bioremediation 10 generally comprising the steps of: 1. 12, treating contaminated soil with a chemical surfactant in a primary treatment stage; 2. 14, further treating the soil with an aliphatic or aromatic hydrocarbon; 3. 20, implementing final soil remediation processes where necessary until remediation criteria is achieved. The contaminated soil includes organic contaminants including, among other things, polycyclic aromatic hydrocarbons (PAH).

Abstract: A liquid processing apparatus is provided which can reduce the amount of liquids used and reduce the difference of the process level between objects to-be-processed. The liquid processing apparatus includes a main pipe, a liquid supply device, a main valve, a plurality of branch pipes, and a plurality of processing units. The liquid supply device includes a mixer, a first liquid supply pipe, and a second liquid source supplying a second liquid and supplies a mixed liquid prepared by mixing the first and second liquids in the mixer to one end of the main pipe. The main valve is configured to close the other end of the main pipe opposite to the liquid supply device when the object to-be-processed is processed in the processing unit.

Abstract: A method of removing material such as surface treatments, metal coatings, and other material layers from an edge region of a metal work piece where they could potentially contaminate a nearby weld. According to one embodiment, a scraper tool includes a body having a base portion and a tab portion, and several scraping elements attached to the base portion. During operation, the scraping elements scrape one or more surfaces of the edge region so that the depth to which the scraping element engage the metal work piece is generally affected by the amount of rotation of the scraper tool about a pivot axis.

Abstract: Provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes a housing providing a space for performing a process, and a plurality of support members vertically arranged in the housing at predetermined intervals to support edges of substrates, respectively.

Abstract: A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at 5 regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that 10 has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.

Abstract: A method of cleaning one or more air filter elements with a cleaning arrangement includes a rotatable basket for holding the one or more air filters, a spraying device for spraying cleaning fluid into the basket, and a driving unit for driving the basket into rotational motion. The method includes placing the one or more air filter elements in the basket, and performing at least three cleaning cycles. A cleaning cycle comprises the following steps. First the rotation of the basket is driven up to a rotational speed at which the one or more air filter elements have a speed greater than about 15 m/s, preferably greater than about 20 m/s. Then the rotation of the basket is brought back to a rotational speed at which the one or more air filter elements have a speed below about 2 m/s. In addition, the cleaning cycle includes spraying cleaning fluid into the basket during at least a portion of the cycle.

Abstract: An apparatus for cleaning substrates on a carrier, which has in the interior thereof a plurality of longitudinal passages, which run parallel to one another and are connected to the outside at the underside of the carrier via openings. There is provided a plurality of elongated pipes, which are arranged on a pipe holder and are connected in a fluid-conducting manner to a fluid supply. A centering template is provided, which encompasses the pipes and is displaceable in the longitudinal direction thereof between an attachment position in the end region of the pipes away from the pipe holder and a working position, which lies between the attachment position and the pipe holder. The centering template bears against the carrier, such that the pipes are then aligned exactly with the longitudinal passages.

Abstract: A method for cleaning a semiconductor wafer composed of silicon directly after a process of chemical mechanical polishing of the semiconductor wafer includes transferring the semiconductor wafer from a polishing plate to a first cleaning module and spraying both side surfaces of the semiconductor wafer with water at a pressure no greater than 1000 Pa at least once while transferring the semiconductor wafer. The semiconductor wafer is then cleaned between rotating rollers with water. The side surfaces of the semiconductor wafer are sprayed with an aqueous solution containing hydrogen fluoride and a surfactant at a pressure no greater than 70,000 Pa. Subsequently, the side surfaces are sprayed with water at a pressure no greater than 20,000 Pa. The wafer is then dipped into an aqueous alkaline cleaning solution, and then cleaned between rotating rollers with a supply of water. The semiconductor wafer is then sprayed with water and dried.

Abstract: A substrate processing apparatus includes liquid tanks, a conveyor mechanism that dips multiple semiconductor substrates, arranged with provision of spaces, collectively into liquids in the liquid tanks, and water vapor spray nozzles disposed in gaps between the multiple semiconductor substrates so as to face rear surfaces of the semiconductor substrates. Heated water vapor is sprayed out of the water vapor spray nozzles onto the respective rear surfaces of the multiple semiconductor substrates prior to dipping the semiconductor substrates into the liquid in the liquid tanks.

Abstract: A method and apparatus for providing multiple spray zones to different subportions of a silverware basket within the wash chamber of a dishwasher.

Abstract: An automatic dishwashing agent includes builder(s), enzyme(s) and a) a nonionic surfactant A of the general formula R1O(AlkO)xM(OAlk)yOR2, in which R1 and R2 mutually independently denote a branched or unbranched, saturated or unsaturated, optionally hydroxylated alkyl residue with 4 to 22 carbon atoms; Alk denotes a branched or unbranched alkyl residue with 2 to 4 carbon atoms; x and y mutually independently denote values between 1 and 70; and M denotes an alkyl residue from the group CH2, CHR3, CR3R4, CH2CHR3 and CHR3CHR4, with R3 and R4 mutually independently denoting a branched or unbranched, saturated or unsaturated alkyl residue with 1 to 18 carbon atoms; b) a nonionic surfactant B which differs from the nonionic surfactant A; and c) an anionic copolymer C. The agent imparts an improved drying and rinsing result.

Abstract: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A method of perfuming in automatic dishwashing comprising the step of providing a first perfume into an automatic dishwashing machine wherein the first perfume is capable of generating a second perfume comprising from about 0.001% to about 10% by weight thereof of a sulphurous compound.

Abstract: A method for sterilizing a plastic bottle in an aseptic filling system according to which at least an inner surface or an outer surface of a bottle is sterilized by injecting a heated sterilizing fluid at 65° C.-90° C. while maintaining internal pressure of the bottle at 1 kPa-20 kPa.

Abstract: A dishwasher is provided that permits the efficient and economical cleaning and drying of the items to be washed in the washing container, whilst reducing the associated energy consumption. To achieve this, in addition to the washing container, the inventive dishwasher also comprises a sorption column, which is connected to the washing container to form an air-conductive link and contains a material that can be reversibly dehydrated, said sorption column being used at least partially to dry the washed items. The thermal energy that is applied in the desorption of the sorption column is used at least partially to heat the rinsing water and/or the washed items in the washing container.

Abstract: One embodiment of the present invention includes an apparatus for washing a product with a fluid. The tank may receive a plurality of product, such as fruits and vegetables, into the fluid and be configured to receive a moving conveyor, having a first end, a second end, a first section, and a second section. The conveyor may have a plurality of protruding panels being structured and arranged on the conveyor to push the product through the fluid in the tank and to lift the product from the fluid in the tank to the second end of the conveyor. At least one first nozzle may be positioned substantially above the conveyor and configured to deliver the fluid onto the product as the product is pushed by the plurality of panels. The fluid delivered from the at least one first nozzle may rotate the product in the fluid in the tank.

Abstract: An apparatus for processing semiconductor wafers includes at least a wet bench and an automatic handling system of a wafer carrier removably connected thereto. The wet bench includes a first processing tank, a second processing tank and a third processing tank, separated from one another, each processing tank being dedicated to a different chemical, as well as a special cleaning and drying tank for processing the automatic handling system when the wafer carrier has been removed.

Abstract: A cleaning apparatus for cleaning measuring probes (18) of a gas turbine engine (1). The invention further relates to a method for cleaning measuring probes (18) of an gas turbine engine (1). The apparatus comprises distribution means (30) comprising a plurality of supply means (31, 32, 33), each comprising connection means (33) arranged for connection to a probe (18), and each supply means (31, 32, 33) being arranged to, when connected to a probe (18), distribute pressurized cleaning liquid to said measuring probe (18), wherein a substantially simultaneous cleaning of probes connected to said distribution means (30) via said supply means (31, 32, 33) can be obtained.

Abstract: To provide a cleaning method which makes it possible to reduce alkaline component mixing in an ozone cleaning solution, thereby preventing impairment of cleaning ability of ozone. In the cleaning method, before chuck members retain another workpiece having previously been dipped in an ozone cleaning solution in an ozone cleaning tank, alkaline component attached to part of transfer arms and the chuck members is removed by cleaning, thereby preventing the alkaline component from mixing into the ozone cleaning solution.

Abstract: A method for treating objects with at least one treatment agent in a household device includes the step of operating a first part of an identification system to identify data of a second part of the identification system, the data of the second part of the identification system comprising information on a dosing device operable to dose the treatment agent, and the data of the second part of the identification system being associated with a packaging for the dosing device. The method also includes the further step of adapting a treatment of objects by the household device or a dosing of the treatment agent based upon the identified data.

Abstract: A washing machine suitable to effect a washing treatment, thermo-disinfection and possible drying of objects, including a washing chamber in which the objects to be treated are disposed, and a washing circuit including a plurality of exit paths for a washing liquid to be distributed toward the objects to be treated. On the bottom of the washing chamber, in association with a corresponding discharge aperture, valve means to discharge the washing liquid are disposed, which are directly connected to a pipe that discharges directly into the sewerage system.

Abstract: Disclosed is a portable and self contained washing and sanitizing apparatus. The apparatus finds particular application in washing small baby items such as bottles, nipples, teething rings or toys. The apparatus includes three primary components: a container for housing the items to be washed; a water reservoir for storing and collecting wash water; and a housing for interconnecting the container and reservoir.

Abstract: Solar wafer clean systems, methods and apparatus capable of receiving wafer combs that have been treated with a wire-saw cutting device and providing final clean solar wafers while the wafers are on the beam (before or without any pre-cleaning) are disclosed. Embodiments of methods and apparatus produce clean solar wafers while attached to the beam without the need for a pre-clean step or tool. As such certain of the embodiments provide efficient and cost-effective cleaning of solar wafers on the beam that is also economically viable on a commercial scale.

Abstract: A method for cleaning articles in a CO2 cleaning machine includes placing the articles in a cleaning chamber of the CO2 cleaning machine, contacting the articles with dense phase carbon dioxide and an antimicrobial agent, and neutralising the antimicrobial agent inside the CO2 cleaning machine.

Abstract: The present invention provides a composition. The composition comprises zinc and bismuth. The composition is for use in the protection of glassware in an automatic dishwashing process from detrimental effects caused by exposure to aluminum.

Abstract: A refresh washing machine including a plurality of spray nozzles to spray air into a clothes receiving compartment of a cabinet, a plurality of opening and closing valves to open and close the spray nozzles, and a controller to open at least one of the opening and closing valves and close the other opening and closing valves so that air is sequentially sprayed from the spray nozzles.

Abstract: Methods are provided for descaling metallic component devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a nonionic surfactant and rinsed again with purified water.

Abstract: A resist removing device 1 functions to remove a resist from a substrate while preventing occurrence of popping phenomenon and at the same time attains reduction in cost of energy for the resist removing and has a simplified constitution. The resist removing device 1 is equipped with a chamber 2 for containing therein a substrate 16 (for example, a substrate having a high-doze ion implanted resist), and with a pressure below the atmospheric pressure, the chamber 2 is fed with ozone gas, unsaturated hydrocarbons and water vapor. The ozone gas may be an ultra-high concentrated ozone gas that is produced by subjecting an ozone containing gas to a liquefaction-separation with the aid of a vapor pressure difference and then vaporizing the liquefied ozone. For cleaning the substrate 16 thus treated, it is preferable to use ultra-pure water. The chamber 2 is equipped with a susceptor 15 for holding the substrate 16. The susceptor 15 is heated to a temperature of 100° C. or below.

Abstract: Disclosed are a flow-through washing method and a flow-through washing apparatus which efficiently remove dust adhering to the surface of a substrate and prevent dust from adhering to the surface of the substrate again after washing. The flow-through washing method runs washing liquid (L) inside a washing tank (2) in the lateral direction, and applies an ultrasonic vibration to the washing liquid (L) in a state in which an object (W) to be washed is immersed in this washing liquid (L), whilst washing this object (W). By regulating the flow rate of the washing liquid (L) flowing in any of the feed ports (3) and/or discharge ports (5) of a plurality of feed ports (3) which feed the washing liquid (L) to the washing tank (2) and plurality of discharge ports (5) which discharge washing liquid (L) from the washing tank (2), the washing liquid (L) inside the washing tank (2) can be set so as to run in a laminar flow state.

Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

Abstract: An embodiment in accordance with the present invention provides a blower and a method for landscaping and lawn maintenance. The blower includes an outer housing having an inner chamber, the outer housing defining at least one discharge port and an impeller disposed within the inner chamber of the housing. The impeller has a first side surface and a second side surface, wherein a first plurality of blades are mounted to the first side surface and a second plurality of blades are mounted to the second side surface. The second plurality of blades are a mirror image of the first plurality of blades. Air or other fluid is expelled through the discharge ports and can be directed using discharge tubes in order to redistribute debris or fluid.