Abstract: An ultrasonic cleaning apparatus with a cleaning reservoir having a plurality of chambers, which are selectably fillable with cleaning fluid. The chambers of the multi-chamber reservoir are fluidly interconnectable, the apparatus further comprising a fluid distribution pump and a controller for sequentially controlling a fluid flow between the chambers during an ultrasonic cleaning cycle. Such a multi-chamber reservoir has the advantage of reducing the total volume of fluid required to clean vessels in the reservoir, since the cleaning process can be performed in a staged or sequential procedure, and the cleaning and/or rinsing fluid reused in each chamber, allowing the apparatus to be more compact.

Abstract: Embodiments of a methods and cleaning systems for cleaning components for use in substrate processing equipment are provided herein. In some embodiments, a cleaning system includes a boiler having a heater configured to heat a fluid; a clean chamber fluidly coupled to the boiler via at least one of a gas line and a liquid line, wherein the clean chamber includes one or more fixtures in an interior volume therein for holding at least one component to be cleaned, and wherein the clean chamber includes a heater for heating the interior volume; and an expansion chamber fluidly coupled to the clean chamber via a release line for evacuating the clean chamber, wherein the release line includes a release valve to selectively open or close a flow path between the expansion chamber and the clean chamber, and wherein the expansion chamber includes a chiller and a vacuum port.

Abstract: A SPA bathtub and an operating unit therefore are provided. The operating unit includes a water circulation system including a diaphragm self-priming pump, a peristaltic pump, a water circulation pipeline, and a fluid switch assembly. The diaphragm self-priming pump operates before the peristaltic pump operates normally and stops operating after the peristaltic pump operates normally. During operation of the diaphragm self-priming pump, the fluid switch assembly is in a first operation state, so that water from the interior volume portion sequentially flows through the peristaltic pump, the diaphragm self-priming pump, the fluid switch assembly, and the water circulation pipeline and finally returns to the interior volume portion. During operation of the peristaltic pump, the fluid switch assembly is in a second operation state, so that the water sequentially flows through the peristaltic pump, the fluid switch assembly, and the water circulation pipeline and finally returns to the interior volume portion.

Abstract: An evaluation of the oil level of an aircraft engine tank from doses of oil delivered from another tank by a pump can be checked by comparing the evaluation of the volume provided by a sensor associated with the engine tank with an estimation of the volume extracted from the aircraft rank, either by another level sensor associated with this tank, or directly from the control of the pump. This comparison is made by a module capable of notifying staff of the need to check or maintain the device, and in particular to check if the sensor is operating correctly. Application to aeronautics, in particular to devices wherein a single aircraft tank supplies all the engine tanks.

Abstract: An automated, fieldable ion-selective sensor system for frequent detection of nutrients in soils or water is set forth. In one aspect, an integrated small form-factor housing includes a battery, processor, a fluid manipulation unit and reservoirs, and a chemical species detection cell. A flow-through sampling head can be connected to the detection cell and a waste reservoir by flexible tubing sealingly connected at opposite ends of the tube. In one aspect, improved performance of the ion-selective sensor includes adding an ion-to-electron transfer interlayer between an ion-selective membrane and its working electrode. In one aspect, the sensor is solid-state and uses printed polymeric composite of POT-MoS2. The use of a porous tube for a sampling head and fluid connection at opposite ends allows not only fluid to be removed from the head to the detection cell for measurement but also flow in an opposite direction and out to a waste reservoir to clean and reset for a next sample measurement.

Abstract: An apparatus and method for loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder, for turning the substrate holder to form a horizontal stack of vertically oriented substrates, and for lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. The technical effects achieved are: a top loading system for a vertical flow deposition reactor in which the substrates can be loaded with horizontal orientation, eliminating the need for flipping each substrate separately by flipping the whole substrate holder and minimizing a loading distance in a reactor cluster.

Abstract: A wafer dividing apparatus for dividing a wafer stuck to an adhesive tape and supported at an opening of a frame into individual chips along a scheduled division line is provided. The wafer dividing apparatus includes a cassette table movable upwardly and downwardly in a Z axis direction, a first carry-out/in unit that carries out the frame from the cassette placed on the cassette table or carry in the frame to the cassette, a first temporary receiving unit including a pair of first guide rails extending in the X axis direction and a guide rail opening/closing portion that increases the distance between the pair of first guide rails, a reversing unit including a holding portion that holds the frame and rotates by 180 degrees to reverse the front and back of the frame, and a transport unit that moves the reversed frame.

Abstract: The present invention relates to an apparatus and a method for generating a cloud of points (1A) representative of the real outer shape of a human transportation vehicle (1) located in a building (4) and for determining the position and orientation of said human transportation vehicle (1) in said building (4) and for determining the relative position and orientation of at least one movable work platform (2), the position and orientation of said human transportation vehicle (1) and the position and orientation of said movable work platform (2) being referenced with respect to at least one known building (4) reference point (R1), said apparatus being for preventing collisions between the movable work platform (2) and the human transportation vehicle (1), said apparatus comprising: at least one known building reference point (R1) being the origin point of a 6 degrees of freedom coordinate system and serving as a central common reference point, and at least one three-dimensional scanning means (3) for determin

Abstract: A processor receives solder paste information, where the solder paste information describes a solder paste used in assembly of a printed circuit board. A processor determines a minimum magnetic force required for removing the solder paste from the printed circuit board based on the solder paste information. A processor receives electromagnet information, where the electromagnet information describes an electromagnet used in cleaning of a misprint of the solder paste on the printed circuit board. A processor determines a minimum amount of power to provide the electromagnet to induce the minimum magnetic force in the electromagnet, where the determination of the amount of power is based on the electromagnet information and the minimum magnetic force. A processor adjusts an amount of power applied to the electromagnet to at least the determined minimum amount of power to clean the misprint of the solder paste from the printed circuit board.

Abstract: A MEMS device, e.g., a flexible MEMS pressure sensor, is formed by disposing a sacrificial layer, such as photoresist, on a substrate. A first flexible support layer is disposed on the substrate, and a first conductive layer is disposed over a portion of the first support layer. A liquid or gel separator, e.g., silicone oil, is disposed on an internal region of the first conductive layer. A second flexible support layer encapsulates the first conductive layer and the separator. A second conductive layer disposed over the second support layer at least partially overlaps the first conductive layer and forms a parallel plate capacitor. A third flexible support layer encapsulates the second conductive layer and second support layer. Soaking the sensor in hot water releases the sensor from the sacrificial layer.

Abstract: A substrate processing apparatus has a labyrinth around a processing liquid nozzle above a nozzle gap, and a seal gas is supplied to the labyrinth to seal the nozzle gap from an external space. Consequently, the entry of the atmosphere of the external space into a processing space through the nozzle gap can be suppressed. An opposing-member flange part of a top plate has a first uneven part on the upper surface, and a holder body of an opposing-member moving mechanism has a second uneven part on the lower surface. The labyrinth is formed by raised portions of one of the first and second uneven parts being disposed within recessed portions of the other of the first and second uneven parts with a gap therebetween only when the top plate is located at a second position (i.e., the processing space is created). This achieves flattening of the substrate processing apparatus.

Abstract: The disclosure relates to a device for cleaning electronic components and/or circuits. The cleaning device comprises a first vessel containing a liquid, a support for holding the electronic components and/or circuits, a fluid injection system including nozzles allowing the projection of jets of fluid to sweep the surface of the components, and a fluid mixer including a first inlet suitable for receiving a pressurized liquid, a second inlet suitable for receiving a pressurized gas, and an outlet designed to supply the injection system with two-phase fluid. The first inlet is coupled to the outlet by an inner duct, the second inlet is coupled to a pressurized gas supply and to an injector for injecting the gas into the inner duct.

Abstract: A microchip includes a reagent placement area to fix an anaerobic antibody therein. An inlet and outlet of the microchip that communicate with a channel having the reagent placement area are closed by thin plate sections and a sealing member. The sealing member is made from a silicone gel and possesses a self-repairing capability. To supply the reagent to the microchip, a fluid releasing unit having an aperture and a fluid recovering unit having an aperture are caused to penetrate the thin plate sections and the self-repairable sealing element, and enter a space including the reagent placement area. The free end of the fluid releasing unit is shaped like an injection needle, and the aperture serves as a fluid release opening. The free end of the fluid recovering unit is shaped like an injection needle, and the aperture serves as a fluid recovery opening.

Abstract: A processor receives solder paste information, where the solder paste information describes a solder paste used in assembly of a printed circuit board. A processor determines a minimum magnetic force required for removing the solder paste from the printed circuit board based on the solder paste information. A processor receives electromagnet information, where the electromagnet information describes an electromagnet used in cleaning of a misprint of the solder paste on the printed circuit board. A processor determines a minimum amount of power to provide the electromagnet to induce the minimum magnetic force in the electromagnet, where the determination of the amount of power is based on the electromagnet information and the minimum magnetic force. A processor adjusts an amount of power applied to the electromagnet to at least the determined minimum amount of power to clean the misprint of the solder paste from the printed circuit board.

Abstract: A method of processing a casting is described. The method comprises removing a mold from a cast metal part without cold working surfaces of the cast metal part and thermally treating the cast metal part. The method can further comprise finishing the surfaces of the cast metal part after thermally treating such that any cold working of the surfaces of the cast metal part occurs after thermally treating such that no recast layer is formed in the cast metal part.

Abstract: The conventional washing apparatus has a double-cup washing tank that joins and separates to let work be placed therein, with nozzles set on the inner cup to allow a passage between it and the outer cup for spent liquid and/or air. The work is cleaned by washing detergent spirally flowing along the periphery of the inner cup by suction power within the passage, and then dried. Suction is not generated within the inner cup, so the spiral flow is too weak to make the tornado effect. This invention though resolves the above issues by an encased washing apparatus having a capsule-shaped washing chamber that joins and separates, has nozzles thereon, has a work table within that rotates by a drive device, has a drain at the bottom, and is characterized by washing detergent, cleaning water and/or air swirling by negative pressure within the washing chamber and then discharging into a drain.

Abstract: The apparatus includes a rotary mechanism for holding a semiconductor wafer and rotating the same, a detection mechanism for detecting a positioning cutout portion formed in the wafer, and a wafer transfer mechanism for lifting the wafer from a wafer mounting portion of the rotary mechanism or mounting the wafer on the same. The wafer transfer mechanism has a movable holding portion for holding the wafer at a position just above the wafer mounting portion and is constituted such that the movable holding portion moves up or down while avoiding the wafer held by the rotary mechanism.

Abstract: The present disclosure provides an airplane ground deicing installation that minimizes the impact of deicing operations on the airport during icing conditions. The installation does not require alteration of a normal taxi pattern and can be performed as quickly as the average separation time between take-offs. The installation allows modification of its shape to adapt to the contour of almost all types of commercial passengers airplanes operating from major airports, and simultaneously deices large surfaces of the airplane. Deicing and anti-icing fluids are applied to airplane surfaces from nozzles positioned in close proximity to the airplane's surface.

Abstract: The present disclosure provides an airplane ground deicing installation that minimizes the impact of deicing operations on the airport during icing conditions. The installation does not require alteration of a normal taxi pattern and can be performed as quickly as the average separation time between take-offs. The installation allows modification of its shape to adapt to the contour of almost all types of commercial passengers airplanes operating from major airports, and simultaneously deices large surfaces of the airplane. Deicing and anti-icing fluids are applied to airplane surfaces from nozzles positioned in close proximity to the airplane's surface.

Abstract: A system and method for securing tokens to be cleaned includes a tray with a curved surface defining a channel extending along a first direction and spacers projecting from the curved surface into the channel. The spacers are disposed at regular intervals along the first direction. The curved surface also has at least one opening. The tokens may be inserted into the channel between adjacent spacers and the tray holding the tokens can be submerged into a cleaning liquid. Identical trays containing tokens can also be stacked and together submerged into the cleaning liquid. The tray holding the tokens can be placed on a drying surface that has a drainage hole, and wetness remaining on the tokens can be sucked through the hole in the channel and the drainage hole by a vacuum or blown through the hole in the channel and drainage hole by an air blower.

Abstract: An ironing apparatus includes an ironing die and an ironing punch, an injection port for injecting gas or liquid to the metal plate at a high pressure to remove substance adhered to the metal plate therefrom, a suction port for sucking the adhered substance removed from the metal plate, and a protrusion mount portion with a protrusion for preventing dispersion of the gas or the liquid. An ironing method for ironing the metal plate having the single surface or both surfaces coated with the organic resin film includes the steps of injecting the gas or the liquid from the injection port to the metal plate at the high pressure to remove the adhered substance from the metal plate, and sucking and collecting the adhered substance removed from the metal plate from the suction port. The adhered substance such as the hair may be removed by the aforementioned invention.

Abstract: Provided is a method of manufacturing a magnetic recording mediums comprising employing a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and drying the substrates, the lifting and drying device including: a hanger mechanism that is inserted through the central hole of the substrates and supports a plurality of the substrates while being hung thereon; an elevation mechanism that elevates the hanger mechanism between a position where the substrates are immersed into the cleaning liquid inside the cleaning tank and a position where the substrates are lifted from the cleaning tank; and an ejection mechanism that is disposed in the cleaning tank and ejects the cleaning liquid from the downside of the hanger mechanism toward the substrate.

Abstract: Drying a microelectronic topography. At least some of the illustrative embodiments are methods that include placing a microelectronic topography inside a process chamber, providing a non-aqueous liquid to the process chamber until at least 90% of the volume of the process chamber contains the non-aqueous liquid, pressurizing the process chamber by way of a fluid different than the non-aqueous liquid, ceasing activity with respect to the process chamber until the non-aqueous liquid and fluid form a mixture that is substantially homogenous, venting the process chamber while simultaneously providing the fluid to the process chamber, and venting the process chamber in a manner which prevents formation of liquid in the process chamber.

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.

Abstract: A wafer separation apparatus improves wafer separation performance in separation and transfer and suppresses the occurrence of wafer breakage in separation and transfer, while remaining inexpensive and small. The apparatus includes: a cassette that vertically accommodates a large number of single wafers in intimate contact with each other, the cassette being at least vertically opened; a cassette support that removably supports the cassette, the cassette support being at least vertically opened; a hoisting unit that hoists and lowers the cassette support integrally with the cassette; a liquid bath that accommodates a liquid into which the cassette support is immersed integrally with the cassette when the hoisting unit descends; a nozzle in the inside of the liquid bath to issue micro bubbles from the underside of the cassette support toward a large number of the wafers; and a micro bubble generator that generates micro bubbles to be issued from the nozzle.

Abstract: A method of operating one or more back end circuits of a plasma processing system, comprising: prior to a front end module receiving one or more wafers to be processed, receiving preliminary data at a back end circuit, wherein the preliminary data indicates a recipe and a predetermined number, the predetermined number indicating a number of wafers to be processed; determining whether a plasma processing chamber is ready for processing; and if the chamber is ready for processing and via the back end circuit, selecting a load lock, based on the predetermined number, instructing the front end module to pull the one or more wafers into the load lock, enabling the chamber to process a first wafer of the one or more wafers according to the recipe, and subsequent to the processing of the first wafer, instructing the front end module to remove the first wafer from the chamber.

Abstract: Internal cleaning of inverted cans includes engaging a can's cylindrical wall with a wall-conforming vacuum or adhesive gripper, causing a spraying unit to travel axially in and out of the can's opening while the can is inverted on a circular conveyor, and using a supporting arm or bottom stop to subject the can to a counterforce against a flushing force from sprayed cleaning medium. This prevents the can from being pressed out of a receptacle in which it sits during cleaning.

Abstract: A wafer separation apparatus improves wafer separation performance in separation and transfer and suppresses the occurrence of wafer breakage in separation and transfer, while remaining inexpensive and small. The apparatus includes: a cassette that vertically accommodates a large number of single wafers in intimate contact with each other, the cassette being at least vertically opened; a cassette support that removably supports the cassette, the cassette support being at least vertically opened; a hoisting unit that hoists and lowers the cassette support integrally with the cassette; a liquid bath that accommodates a liquid into which the cassette support is immersed integrally with the cassette when the hoisting unit descends; a nozzle in the inside of the liquid bath to issue micro bubbles from the underside of the cassette support toward a large number of the wafers; and a micro bubble generator that generates micro bubbles to be issued from the nozzle.

Abstract: A method for manufacturing a disk drive device includes (a) assembling a sub assembly by assembling a bearing unit and a rotating body to a fixed body in a clean room, the rotating body being supported by the bearing unit in a freely rotatable manner to the fixed body, (b) cleaning the sub assembly by spraying a mixture of a cleaning liquid and a first gas to at least either one of the fixed body and the rotating body; and (c) enclosing the sub assembly using an enclosing member.

Abstract: Method of cleaning containers, in particular bottles of glass or plastics, in a cleaning module with a cleaning machine where at least one cleaning medium is allowed to act on the containers transported through the cleaning machine, and with an inspection unit, including determining at least one control parameter with respect to the degree of soiling of the cleaned bottles, detecting the degree of soiling of the cleaned bottles, evaluating the detected degree of soiling of the cleaned bottles in view of the at least one control parameter with respect to the degree of soiling, returning bottles evaluated to exhibit an excessive degree of soiling to the inlet of the cleaning machine, and automatically controlling the cleaning parameters of the cleaning machine if the number of returned bottles, based on the number of cleaned bottles, exceeds a predetermined target value or target range.

Abstract: The present invention relates to a method of reducing type IV rubber allergy of synthetic rubber latex products caused by chemical residues remaining after manufacture of the synthetic rubber products by reducing levels of chemical residues found for said products, said method comprising the steps of: subjecting said products to a wash in a strong alkaline solution to remove the chemical residues remaining after manufacture of the rubber latex products, and a system for reducing type IV allergenicity of synthetic rubber products caused by chemical residues remaining after manufacture of the synthetic rubber latex products by reducing residual levels of chemical residues found for said products, and a product, such as a glove, manufactured from synthetic rubber latex processed in accordance with the method and/or using the system.

Abstract: The invention relates to a beverage preparation machine comprising an apparatus for frothing or heating milk, which apparatus is connected via a milk suction hose to a milk container, and a cleaning apparatus for cleaning the milk suction hose and the apparatus for frothing or heating milk by means of a flushing fluid. The milk can be sucked from the milk container into the apparatus for frothing or heating milk by means of a vacuum which can be generated in the apparatus for frothing or heating milk.

Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.

Abstract: A method includes generating a solvent-containing vapor that contains a solvent. The solvent-containing vapor is conducted to a package assembly to clean the package assembly. The solvent-containing vapor condenses to form a liquid on a surface of the package assembly, and flows off from the surface of the package assembly.

Abstract: A method for cleaning a substrate processing chamber, including processing a batch of substrates within a processing chamber defining one or more processing regions. Processing the batch of substrates may be executed in a sub-routine having various sub-steps including processing a substrate from the batch within the processing chamber, removing the substrate from the processing chamber, introducing ozone into the processing chamber, and exposing the chamber to ultraviolet light for less than one minute. The substrate batch processing sub-steps may be repeated until the last substrate in the batch is processed. After processing the last substrate in the batch, the method includes removing the last substrate from the processing chamber, introducing ozone into the processing chamber; and exposing the processing chamber to ultraviolet light for three to fifteen minutes.

Abstract: A produce washer and method of washing produce or other items in a continuous motion washing machine is provided. The produce washer includes a basket, or other collector, that is positioned within a portion of the fluid flow path and sized and shaped to intercept items from a the fluid flow path while at the same time allowing the fluid to continue to flow through a perforated wall in the collector generally in the same circulatory flow path created by the washing machine. The method includes placing items within the wash tank; creating a fluid flow within the wash tank; intercepting one or more of the items from the fluid flow path by the collector; and allowing the fluid to continue flow through the perforated wall in the collector.

Abstract: Methods, devices, and systems for manufacturing ophthalmic lenses are described in which lens bodies are placed in cavities of lens carriers that are fluidly connected to reservoirs, flow ducts and sub-cavity base channels that provide enhanced washing and wet processing of the lenses.

Abstract: A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated.

Abstract: Silicon plates can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to clean and rinse the silicon plates after being saw from a silicon block. A slow drain can be open to remove the superheated liquid. A fast drain then can be open, preferably to atmosphere, to allow steam to vent through bottom. The fast drain can function as a drying process, vaporizing water droplets down the drain with the escaping steam.

Abstract: A system and method for control of water content in a strip bath. The method to control water content in a solvent bath used for cleaning of semiconductor parts in the back end of semiconductor manufacturing requires addition of water to replace evaporated water. This is done by periodically adjusting a conductivity setpoint at least in part based on the elapsed chemical bathlife and at least in part based on the number of semiconductor parts that have been processed in the bath. The conductivity of the strip bath solution is then continuously measured (as by using an electrodeless conductivity probe). Water is added (as by a DI water injection system) into the bath solution whenever the solvent conductivity falls below the conductivity set point.

Abstract: In a substrate processing method according to the present invention, a cleaning liquid nozzle supplies a rinsing liquid to a central portion of a substrate and thereafter moves from a position corresponding to the central portion of the substrate to a position corresponding to a peripheral, edge portion thereof while supplying the rinsing liquid before stopping at the position corresponding to the peripheral edge portion. Next, a drying liquid nozzle moves from the position corresponding to the peripheral edge portion to the position corresponding to the central portion while supplying a drying liquid. Then, the drying liquid nozzle is kept stationary at the position corresponding to the central portion for a predetermined period of time while supplying the drying liquid. Thereafter, a gas nozzle moves from the position corresponding to the central portion to the position corresponding to the peripheral edge portion while supplying an inert gas.

Abstract: Substrates for solar cells are prepared by the reverse of the standard RCA clean. The substrates are first cleaned in RCA-2 solution and then in RCA-1 solution. A pyramids rounding step using HF/HNO3 solution is inserted between the two RCA clean procedures. This solves all the issues relating to surface contaminations and sharp areas. It also avoids the stain layer on the surface to some extent by RCA-1 treatment. A thin layer of amorphous or micro-crystalline intrinsic silicon may be deposited to passivate the surface.

Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

Abstract: A cleaning apparatus is provided. The apparatus includes a casing that defines an inlet opening on a first surface thereof and an outlet opening on a second surface thereof. An elongate path is formed therebetween for receiving an article to be cleaned. A sanitizing device is carried by the casing in proximity to the path for sanitizing the article to be cleaned. A first roller is carried by the casing and extends into the path. The first roller is configured to rotate in the direction of the path to thereby translate the article to be cleaned from the inlet opening to the outlet opening.

Abstract: An alkaline detergent composition for hard surface comprises an alkaline agent (component A), a nonionic surfactant (component B), a chelating agent (component C), water (component D), at least one carboxylic acid compound (component E) selected from the group consisting of compounds represented by general formula (1) and general formula (2), and at least one anionic surfactant (component F) selected from the group consisting of surfactants represented by general formula (3) and salts thereof. Therein, the content ratio [component E (weight %)/component B (weight %)] is 1/1.5-15/1, the content ratio [component F (weight %)/component B (weight %)] is 10/1-1/5, and the pH at 25° C. is 12 or greater.

Abstract: A method of introducing treatment fluid into containers to remove contaminants therefrom in a container filling plant, and an arrangement therefor. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. §1.72(b). As stated in 37 C.F.R. §1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims. Therefore, any statements made relating to the abstract are not intended to limit the claims in any manner and should not be interpreted as limiting the claims in any manner.

Abstract: Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.

Abstract: A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).

Abstract: A semiconductor apparatus includes a first tank configured to accommodate a first fluid. A second tank is configured to receive overflow of the first fluid into an upper portion of the second tank and to accommodate a second fluid. A cycling system including a first conduit is configured between the first tank and the second tank. The first conduit has an end substantially below a surface of the second fluid. A fluid providing system including a second conduit is fluidly coupled to the second tank and configured to provide the second fluid into the second tank. The second conduit has an end substantially below the surface of the second fluid. An overflow system is coupled to the second tank and configured to remove an upper portion of the second fluid when the surface of the second fluid is substantially equal to or higher than a pre-determined level.

Abstract: A method and apparatus for wetting the surface of a workpiece is disclosed. The apparatus includes a chamber with a vacuum port and a fluid port and a workpiece holder including a body, a ring, and a port. The body includes a surface and defines a cavity extending from the surface. The ring is adapted to retain the workpiece on the surface of body over the cavity. The ring forms a fluid seal relative to the workpiece and to the workpiece holder. The port is defined in the body and in communication with the cavity. The port affects pressure in the cavity to minimize a pressure differential between the front and back surfaces of the workpiece. The fluid port is in communication with the chamber. The fluid port delivers a fluid (e.g., a substantially degassed fluid) to wet the front surface of the workpiece during operation of the chamber at a reduced pressure relative to atmosphere.