Abstract: There are provided a solution applying portion 104 disposed opposite to the outer surface of the recording rotational drum 34 such that sliding on the outer surface of the drum is permitted and arranged to apply cleaning solution to the outer surface of the drum; and a scraping portion 108 disposed at a position more forward than the solution applying portion 104 in a direction in which the drum is rotated such that sliding on the outer surface of the drum is permitted and arranged to scrape the applied cleaning solution off the outer surface of the drum so that dust X is removed from the surface of the drum.

Abstract: A glass sheet washing machine with a broken glass removal system includes a support, a liquid container or reservoir, a pump, a liquid applicator, and a liquid permeable member. The support supports a glass sheet being washed. The liquid reservoir is positioned below the support. The pump is coupled to the liquid reservoir. The liquid applicator is coupled to the pump. The liquid applicator applies the liquid from the liquid reservoir to wash the glass sheet. Excess liquid falls into the reservoir. The liquid permeable member is positioned between the support and the liquid reservoir to catch pieces of glass to inhibit the pieces of broken glass from falling into the liquid reservoir and is moved to remove the pieces from the glass washing machine.

Abstract: A method of processing perforated gypsum boards is disclosed. When the gypsum boards have been perforated the following steps are performed while the boards are being moved individually along a path. The moving boards are sprayed with pressurized water which is directed towards the opposite surfaces of the boards so as to enter apertures or slots formed by the perforation of the boards, and then water is removed from the moving boards by blowing pressurized air against the boards and sucking water therefrom, wherein dust on the boards is entrained into the water and removed from the boards together with the water.

Abstract: A paper cleaning apparatus employs a paper buffing roll which has a lightweight hollow cylindrical core mounted between stub shafts. The stub shafts are mounted to bearings and the hollow core is arranged to be driven at approximately 3,450 to approximately 4,450 RPM. The surface of the cylindrical core is given a rough surface over which a wool cloth jacket is placed. The cloth sleeve is clamped in place by retaining end caps which fit over the stub shafts and clamp the sleeve against the ends of the hollow cylindrical core. The cloth sleeve is shrunk onto the surface of the cylindrical core with hot water or steam. The cloth sleeve is frayed to form a soft outer surface, with radially extending fibers.

Abstract: An apparatus for cleaning a semiconductor wafer includes a cleaning reaction chamber wherein the cleaning process is performed in a closed state, a wafer conveyor having wafer supporters for loading semiconductor onto a loading unit within the reaction chamber, at least one cleaning gas supply unit for supplying at least one cleaning solution in a vapor state into the reaction chamber, a water vaporizing unit for supplying vapor onto the semiconductor wafers, an ozone supply unit for supplying ozone gas into the reaction chamber, and a reaction gas exhaustion unit connected to the reaction chamber in order to exhaust the cleaning gas from the reaction chamber. The cleaning of the semiconductor wafers by adding cleaning gas and ozone gas into a reaction chamber easily removes any remaining photoresist that formed on the semiconductor wafers and any other contaminates from pre-processes.

Abstract: A method for treating a moving surface, such as a rotating roller (11) or a moving belt (42), according to which method surface treatment elements (12), such as metallic brushes (12), are pressed against the surface to clean and smooth it. The brushes are cleaned at the edge of the surface. The brushes are connected to an endless chain (16) on which the brushes are moved in a transverse direction by a moving means (17). The apparatus may be mounted in conjunction with a roller or belt or connected to it via a doctor frame (31) or some other supporting structure (47).

Abstract: The pickling process of the present invention is designed for pickling electrical steel strip in a continuous fashion and comprises at least one pickling tank equipped with at least one set of sprayers designed to spray the top and bottom surfaces of a steel strip with a solution comprised of hydrogen peroxide prior to and/or after the strip is immersed in a solution contained in a pickling tank. The set(s) of sprayers in each of the pickling tanks are located above the level of the pickle bath solution, rather than being located in separate spray tanks. Upon exiting the final pickling tank, the strip is brushed/scrubbed to loosen any residual scale to form a clean strip.

Abstract: In order to remove impurities, especially liquids (5) and/or particles (4) from surfaces of plate-shaped workpieces (2) contaminated or wetted with liquid (5), at least one wiping element (3) is provided which moves with respect to the surface (2a) the wiping element (3) to be cleaned and contacts this surface (2a). The wiping element (3) is cooled down so that the liquid (5) coming into contact with this wiping element (3) and bristles (8) preferably provided thereon assumes a higher viscosity or even solidifies and consequently remains adhered together with the particles (4) contained in the liquid (5) to the wiping element (3) or its bristles (8). This cleaning principle can be assisted and influenced by heating of the surface of workpiece (2) upstream of the wiping element or elements (3) in the feed direction.

Abstract: A method for removing a coating (14) from a portion of optical fiber (11) including the steps of mechanically removing the coating (14) from two portions of fiber (16a, 16b) of predetermined length and spaced each other of a predetermined distance, and then immersing the portion of fiber (17) interposed between the two considered portions (16a, 16b) in a liquid solvent (28) so as to chemically remove the coating (14) thereof; the two portions of fiber (16a, 16b) from where the coating (14) has been mechanically removed are held only partially dipped in the liquid solvent (28), so that the liquid solvent (28) is prevented from reaching the portions of the fiber (18a, 18b) outside the liquid solvent (28) by capillary action through the coating.

Abstract: A detergent composition useful for cleaning away a resin remaining in a molding machine after molding, comprising a thermoplastic resin, water and wollastonite.

Abstract: Apparatus including

Abstract: A cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The nozzle is driven in an oscillatory manner at a predetermined amplitude and frequency so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface. The surface is transported past the nozzle, and the cleaning occurs in an enclosed controlled environment.

Abstract: Apparatus for cleaning a surface, comprising brush means including a body (16) which carries bristles (17) engageable with the surface; means for effecting movement of the bristles relative to the surface, to provide an agitating cleaning action thereon; said bristle-carrying body further being provided with steam delivery means (20, 21) for applying steam to said surface in a region thereof engaged by said bristles. The apparatus may be for cleaning a conveyor belt (10), with the brush in the form of a drum (16) rotatable about an axis (18) parallel to the conveyor belt with the steam passing through the drum and emerging through peripheral apertures (21), the brush being disposed within a hood (15) with an extraction system for loosened dirt and water.

Abstract: A cleaning apparatus for cleaning solder paste off the bottom side of a printed circuit board stencil includes a container of cleaning solution therein and a blade holder that is movable between a wiping position and the container of cleaning solution. A wiping blade is mounted in the blade holder. The blade holder, with the blade mounted thereon, is reciprocated back and forth when in communication with a stencil to be cleaned. The blade is moved from the wiping position in communication with the stencil into the cleaning solution in the container. A pneumatic piston and rotary actuator provides controlled movement of the wiping blade. The wiping blade may be vibrated during wiping to improve removal of solder paste from the stencil and the cleaning solution may be ultrasonically vibrated to improve removal of solder paste from the wiping blade. The wiping blade may also be pulsed into a sponge to remove excess cleaning solution prior to the next cleaning cycle.

Abstract: Device and process for cleaning a circulating belt, the device using a cleaning device having at least one nozzle. The process includes feeding a pressurized fluid to the at least one nozzle, and subjecting the circulating belt to the pressurized fluid via the at least one nozzle. The pressurized fluid has a temperature in a range of between approximately 90° C. and approximately 160° C.

Abstract: A resist film removing composition used in the manufacture of a thin film circuit element having an organic insulation film which comprises 50 to 70% by weight of an alkanolamine having 3 or more carbon atoms, 20 to 30% by weight of a water-miscible solvent and 10 to 20% by weight of water. The resist film removing composition can easily remove a resist film remaining after etching, without swelling the organic insulation film.

Abstract: A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are introduced into the fluid film on the substrate surface. The ice crystals have a temperature that is lower than the temperature of the fluid such that the fluid changes the ice crystals into a gaseous state to form a pulse generated in the fluid film. The depth of penetration of the ice crystals into the fluid film is controlled such that the ice crystals do not strike the substrate surface. The substrate surface is cleaned with the pulse.

Abstract: The present invention relates to a process for pickling hot rolled, hot rolled & annealed, and cold rolled & annealed stainless steel strip in a continuous fashion. The process comprises a series of pre-pickling tanks and pickling tanks, and optionally includes a scrubber-brush tank, a de-smutting tank, a filtration unit and a heat exchanger.

Abstract: A self-cleaning web-threading apparatus for a web-fed printing press includes guide rails, a web leader, driver and a detergent supply. The guide rails define a web guideway along which a web is to be threaded through a printing press. The web leader travels along the web guideway in sliding engagement with the guide rails for threading the web through the press. The web leader is fabricated at least partially from a detergent-absorbent material for sliding contact with the guide rails. The driver drives the web leader along the web guideway. The detergent supply is disposed in a selected position on the web guideway for supplying a detergent to the web leader traveling along the web guideway to impregnate it with the detergent. The guide rails are cleaned by the detergent-impregnated web leader as it travels in sliding contact therewith.

Abstract: Systems and methods for prevention of condensation of ambient water vapor due to evaporation of frozen carbon dioxide particles used to clean data storage tapes. Various embodiments maintain conditions under which condensation cannot form in the ambient environment immediately surrounding a portion of a rigid surface on which the tape is maintained in thermodynamic contact and under tension (e.g., a metallic capstan around which the tape is wrapped).

Abstract: A method of applying a fluid to a brush is provided. The method includes outputting a flow of fluid from a shaft to an area between the shaft and a distributor where the flow of fluid is restricted by the distributor to generate a uniform pressure buildup inside of the distributor. The method further includes delivering the fluid from the area through at least one opening in the distributor to an outer surface of the distributor where the outer surface of the distributor abuts an inner surface of a housing. The method additionally includes dispensing the fluid from between the outer surface of the distributor and the inner surface of the housing to an outer surface of the housing through at least one perforation in the housing, the housing being attached to a brush. The method also includes applying the fluid through the brush where the fluid is received from the outer surface of the housing.

Abstract: The device sprays a mist of cleaning fluid onto the record medium—e.g., motion picture film—and wipes it off, preferably with a soft material such as velvet. Then, the film is dried with air, including thin air jets to spread the liquid evenly, and heated, ionized air. The device has a closed housing and air in the housing is evacuated and sent to a still to recover much of the cleaning liquid and prevent its escape into the atmosphere.

Abstract: A method of spraying a mist of cleaning fluid onto the record medium—e.g., motion picture film—and wiping it off, preferably with a soft material such as velvet. Then, the film is dried with air, including thin air jets to spread the liquid evenly, and heated, ionized air. The device has a closed housing and air in the housing is evacuated and sent to a still to recover much of the cleaning liquid and prevent its escape into the atmosphere.

Abstract: The invention is directed to a system for cleaning an apparatus like a paper making apparatus. The system sprays a thickened liquid composition that has a soil treating agent, and the system may be used at pressures which do not exceed 100 psi.

Abstract: An apparatus for spraying a liquid on the surface of assemblies that are moving through wash and rinse stations.

Abstract: A method for cleaning thin gauge metal foil strip material using a plurality of wiper (12, 16, 20) and solvent application (14, 18) stages. The solvent used in the solvent application stages is an aliphatic petroleum type which is applied using low pressure to avoid atomization or separation of solvent components. The wipers of a first wiping station are made of a solid bar of polymer impregnated fiber material. The wipers of the second wiping station are spaced apart blades of urethane-based elastomer material.

Abstract: A method for validating pre-process adjustments to a wafer cleaning system includes the operations of (a) making pre-process adjustments to a wafer cleaning system, (b) loading a substantially transparent wafer into the wafer cleaning system, and (c) observing the substantially transparent wafer as the substantially transparent wafer moves along a wafer transfer path in the wafer cleaning system. In the event undesirable contact between the substantially transparent wafer and components of the wafer cleaning system is observed, the method further includes (d) making adjustments to the wafer cleaning system formulated to avoid undesirable contact between semiconductor wafers to be processed and components of the wafer cleaning system, and (e) repeating operations (b) through (d) until the substantially transparent wafer moves along the wafer transfer path without undesirable contact with components of the wafer cleaning system.

Abstract: A process and apparatus for cleaning a transport belt of a machine for the production or processing a web. The apparatus includes at least one nozzle device composed of a rotatable nozzle head having at least one cleaning nozzle, a transport device including a crosspiece extending substantially crosswise to a transport belt travel direction, in which the at least one nozzle device is coupled to the transport device and adapted for displacement along the crosspiece. A traversing speed of the nozzle device is very low and falls within a range of between approximately 1 mm/min and 10 mm/min. Alternatively, the at least one nozzle is positionable in a plurality of cleaning positions that are successively arranged crosswise to the transport belt, and the at least one nozzle is held stationary in each respective cleaning position for a predefined time period.

Abstract: A sheeter device capable of producing a full-width continuous sheet of masa. A series of ultrasonic horns are placed in close proximity to a sheeter roller, thereby scraping the sheeted dough from the roller. The ultrasonic vibration precludes the buildup of dough on the horns. The invention eliminates the need for sheeter wires and their accompanying plastic bands while increasing the dough throughput of the sheeter.

Abstract: Method and apparatus for cleaning a moving surface, for example a roller, wire or conveyor belt. The surface is cleaned by a doctor blade having several separate blades which move in a direction transverse to the surface to be cleaned so that the blades can be serviced and repaired during operation of the moving surface.

Abstract: Guide rollers in a web-fed rotary printing press are cleaned by a web of material that is provided with signal information, such as a bar code or a punch code. The retrievable signal information is used by one or more signal reading devices that are used to apply cleaning agent to the web and to create a speed differential between the guide roller and the material web.

Abstract: A cleaning apparatus of the present invention includes a roll brush for scrubbing the surface of the substrate, and an ultrasonic nozzle for blowing an aqueous cleaning solution against the surface of the substrate and generating an ultrasonic wave, wherein the roll brush and the ultrasonic nozzle are provided so as to oppose one another so that the substrate can be set in between. With the synergetic effects of brush scrubbing cleaning, ultrasonic cleaning and shower-cleaning, the precision cleaning of the upper surface of the substrate can be performed at a sufficient level of cleanliness. Moreover, in a state where the substrate to be cleaned is set, the roll brush can be cleaned automatically by the ultrasonic nozzle, and it is therefore possible to maintain the roll brush at high level of cleanliness without requiring maintenance operations.

Abstract: An apparatus is disclosed for the cleaning of solubly marked laminated sheets. A laminated sheet is fed over a cleaning surface along which are disposed a plurality of solvent-carrying wipers. The solvent-carrying wipers will wipe the markings from the sheet and the sheet feeder will then deposit the wiped sheet at the other end of the apparatus. Drying means could wipe excess solvent from the sheet following its passage over the wipers. The device will be of particular assistance in the gaming industry, where reusable gaming cards might be substituted for disposable paper cards currently employed for substantial economic savings.

Abstract: For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

Abstract: An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that are substantially equal to the pressure of an adjacent environment. In a preferred embodiment, the processing chamber is pressurized and vented with a source of high purity dry gas that is diffused into the chamber through a diffuser to pressurize the processing chamber after processing of the wafer is completed. A chamber equalization port between the processing chamber and the adjacent environment is opened to maintain the pressure within the chamber at or slightly above the pressure of the adjacent environment, and the chamber valve is then opened. The wafer can then be removed from the processing chamber, and a new wafer can be inserted. The chamber is then sealed by closing the chamber valve and the equalization port, and the atmosphere within the processing chamber is evacuated to a desired level.

Abstract: A method of cleaning a web of photo film during manufacturing, wherein the web of photo film is transported in its lengthwise direction, and a cleaning tape made of felt is pressed onto an entire area or a side portion of a surface of the photo film or a side edge of the photo film, while the photo film and the cleaning tape are transported in opposite directions.

Abstract: A method and apparatus for removing dust from a base film effectively so that electrostatic charges of the base film are reduced while the cleaning effect is kept high. After a cleaning solvent is applied onto one surface of a base film by a precoater, a rod member is pressed against the base film while the cleaning solvent remains on the base film, so that deposits on the base film are separated and scraped together with the cleaning solvent from the base film by the rod member. Just after the deposits are scraped from the base member, a solvent, of the same kind as the cleaning solvent or a mixture of a solvent of the same kind as the cleaning solvent and an additive mixed thereto, is applied onto the base film while the surface of the base film coated with the cleaning solvent is not exposed to an atmospheric air space.

Abstract: The device sprays a mist of cleaning fluid onto the record medium—e.g., motion picture film—and wipes it off, preferably with a soft material such as velvet. Then, the film is dried with air, including thin air jets to spread the liquid evenly, and heated, ionized air. The device has a closed housing and air in the housing is evacuated and sent to a still to recover much of the cleaning liquid and prevent its escape into the atmosphere.

Abstract: A sheet cleaning apparatus having sets of cleaning rollers, wherein the rollers are integrated into a removable cartridge structure. Couplers are provided at roller shaft ends to connect to the roller drive. The cartridge is received in a slide carriage, permitting the cartridge to be readily removed from the apparatus by sliding the carriage out, and lifting the cartridge out from the slide carriage. With this arrangement, the down time for the sheet cleaning apparatus is minimized, since the sheet cleaning apparatus can be provided with two cartridges, and the cartridge needing maintenance can simply be quickly removed and replaced with a fresh cartridge. The production line can quickly be put back into operation, and the removed cartridge can be serviced off line for subsequent use.

Abstract: A rigging cable cleaning device primarily, although not exclusively, adapted for use on sailboat rigging cables, such as main sail cables, lanyard cables, and the like. The rigging cable cleaning device comprises an outer flexible fabric cover and an inner cleaning pad which can be folded or wrapped about a sailboat rigging cable. Holes with grommets are located on the ends of the outer fabric cover for receiving a releasable locking mechanism to thereby hold the cable cleaning device on a rigging cable. In this way, the device can be physically moved up and down or along the cable for cleaning same. The cleaning pad is removably attached to the inner surface of the fabric cover so that one type of cleaning pad can be substituted for another.

Abstract: A process for cleaning a web having a first major surface and a second major surface on opposite sides of the web, the process including transporting the web while maintaining at least a first rotatable contact cleaner roll in rolling contact with the first major surface to clean the first major surface; interrupting the transporting of the web; rolling the first rotatable contact cleaner roll against the first major surface in at least a first direction while the transport of the web remains interrupted; and rolling the first rotatable contact cleaner roll against the first major surface in the opposite direction while transport of the web remains interrupted.

Abstract: In a method and an apparatus for removing an image forming substance such as toner from an image holding member such as a transfer paper sheet, the toner on the transfer paper sheet is heated to be melted or softened. An offset belt having adhesive force stronger than that between the transfer paper sheet and the toner comes in contact with the toner. The toner is separated and removed from the transfer paper sheet when the offset belt and the transfer paper sheet are separated from each other. Heating of the toner is maintained until the transfer paper sheet is separated from the offset belt. The transfer paper sheet is separated from the offset belt before the toner is cooled and solidified. A toner heating maintaining device is constructed by using a heating-supporting member having a heater therein and arranged such that the transfer paper sheet and the offset belt are supported between the heating-supporting member and a heating roller.

Abstract: A method of repetitively using a sheet or similar toner image carrier produced from an image forming apparatus, and a toner applicable thereto. A toner forming an image on the toner image carrier is removed to erase the image. The toner image carrier is implemented as a synthetic sheet. Use is made of a toner whose adhering force to the sheet is weaker than the adhering force of a conventional toner.

Abstract: In a method for removing toner or similar substance deposited on a recording sheet or similar sheet, projections are formed on a back-up member and located at portions on which the rear of a separating member slide. While a sheet is passed through a pressing portion in contact with the separating member, the projections raise the rear of the separating member toward the surface of the sheet carrying the toner. Hence, even solitary particles of the substance adjoining relatively thick and large masses of the substance can contact the front of the separating member. Hence, the solitary particles are prevented from remaining on the sheet.

Abstract: A method of washing a blind including the steps of contracting the blind while inserting offset ring-like portions of a coil-spring-like spacer formed of a wire having a specified diameter between adjacent louvers. The blind is then placed in a washing bath in a state where a gap, corresponding to the diameter of the wire, is formed between adjacent louvers. The blind is then placed on a fine particle layer of a mixed material. A vibration generator is driven to apply a vibration to the mixed material through the washing bath so that the fine particles in the mixed material are liquefied. The blind is then sunk into the fine particle layer due to its own weight through the liquefaction. The dirty materials deposited on the surfaces of the louvers are removed by the brushing action of the fine particles, which move in contact with the surfaces of the louvers.

Abstract: A plastic film or sheet, wherein upon immersing a test piece of the plastic film or sheet in ultrapure water, extracting pure water from near the surface of the test piece and evaluating the cleanliness of a resulting bag based on the concentration (number) of fine particles 0.3 .mu.m or greater in size dispersed in the extracted ultrapure water, the measured concentration is no greater than 5 per ml. The process comprises steps of immersing and running a plastic film or sheet (1) in ultrapure water (4) in a clean room (16), and further spraying and washing the film or sheet (1) with ultrapure water after the film or sheet (1) is drawn out, followed by drying, destaticization, cutting and heat sealing.

Abstract: A pickling plant for a steel strip and a method for controlling the pickling plant, including monitoring at least one quantity of state represented by thickness, width and quantity of scale of the steel strip, and at least one quantity of state of operation of a plant represented by concentration, quantity and temperature of acid supplied into a pickling tank of the pickling plant, line speed of the steel strip, and temperature of the steel strip immediately before entering the pickling tank calculating on the basis of values of said quantity of state and quantity of state of operation, at least one of concentration distribution of acid, concentration distribution of iron and descaling rate at optional plural positions, and on the basis of the calculating the optimum quantity of state for operation of the plant is determined.

Abstract: An elongated fluid applicator is used to manually apply a fluid such as a lubricant or a cleaning fluid to the belt and/or belt supporting surface of an exercise treadmill. The applicator is optionally included in a kit containing one or more desired fluids, and at least one treadmill belt tension adjusting device.

Abstract: A method for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.

Abstract: A method of cleaning a silicon material using a polyvinyl acetal sponge material. The sponge material is purified by an extracting process which includes alternating exposure of the sponge material to acid and oxidizing solutions. The extracting process permits residual amounts of calcium, zinc, sulfate, arsenic, barium, cadmium, chloride, chromium, copper, iron, lead, manganese, magnesium, mercury, nitrate, potassium, selenium, silica, silver and sodium to be 2 ppm or less. Following the extracting process, the silicon material is contacted with the sponge material to thereby clean the silicon material.