Refractory Metal (i.e., Titanium(ti), Zirconium(zr), Hafnium(hf), Vanadium(v), Niobium(nb), Columbium(cb), Tantalum(ta), Chromium(cr), Molybdenum(mo), Tungsten(w)), Or Alloy Base Thereof Patents (Class 148/668)
  • Patent number: 11951530
    Abstract: A high-strength stainless steel rotor and a method for preparing the same, are provided. The high-strength stainless steel rotor, including the following element components by mass percentage: C: 0.03-0.050%, Cr: 14.90-15.80%, Ni: 5.00-5.70%, Cu: 2.20-2.80%, (Nb+Ta): 0.35-0.44%, Mo: 0.45-0.54%, V: 0.06-0.10%, Si: 0.20-0.60%, Mn: 0.40-0.80%, P?0.010%, S?0.010%, O?0.003%, and the balance of iron and inevitable impurities.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: April 9, 2024
    Assignee: CENTRAL IRON AND STEEL RESEARCH INSTITUTE
    Inventors: Zhenbao Liu, Jianxiong Liang, Xiaohui Wang, Yongqing Sun, Changjun Wang, Zhiyong Yang
  • Patent number: 11839919
    Abstract: Methodologies, systems, and devices are provided for producing metal spheroidal powder products. Dehydrogenated and spheroidized particles are prepared using a process including introducing a metal hydride feed material into a plasma torch. The metal hydride feed material is melted within a plasma in order to dehydrogenate and spheroidize the materials, forming dehydrogenated and spheroidized particles. The dehydrogenated and spheroidized particles are then exposed to an inert gas and cooled in order to solidify the particles into dehydrogenated and spheroidized particles. The particles are cooled within a chamber having an inert gas.
    Type: Grant
    Filed: September 7, 2021
    Date of Patent: December 12, 2023
    Assignee: 6K Inc.
    Inventors: Kamal Hadidi, Gregory M. Wrobel, Makhlouf Redjdal
  • Patent number: 11756703
    Abstract: A magnetic data cable includes a cable body and data connectors. The data connectors are respectively connected to two ends of the cable body. The cable body includes a cable core and a wrapping material layer wrapped around the cable core. At least one layer of the wrapping material layer is a magnetic material layer. When the magnetic data cable is wound into coils, each two adjacent coils arranged from top to bottom or each two adjacent coils arranged from left to right are magnetically attracted to each other by the magnetic material layer. Since the magnetic material layer is integrally distributed in the wrapping material layer, so the cable body 100 is magnetic and it is easy and simple to adjust a diameter of the coils by winding.
    Type: Grant
    Filed: April 18, 2023
    Date of Patent: September 12, 2023
    Inventor: Wenyong Yue
  • Patent number: 10961613
    Abstract: A method for controlling the microstructure and texture of tantalum is described. The method includes a first forging step for performing upset forging and come-back forging on a tantalum billet multiple times in different directions, the upset forging performed to press two surfaces of the tantalum billet in order to make the two surfaces close to each other and the come-back forging performed to restore the tantalum billet to a rectangular prism shape; and a second forging step for performing wedge forging and come-back forging on the tantalum billet multiple times in different directions, the wedge forging performed to press two edges located in a diagonal direction of the tantalum billet and parallel to each other in order to make the two edges close to each other, and the come-back forging performed to restore the tantalum billet to the rectangular prism shape.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: March 30, 2021
    Assignee: AGENCY FOR DEFENSE DEVELOPMENT
    Inventors: Seong Lee, Seongho Yang, Sungho Lee, Hyotae Jeong, Yuyeon Jo
  • Patent number: 10808273
    Abstract: The present disclosure relates to metal alloys for biosensors. An electrode is made from the metal alloy, which more specifically can be a nickel-based alloy. The alloy provides physical and electrical property advantages when compared with existing pure metal electrodes.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: October 20, 2020
    Assignee: Materion Corporation
    Inventors: Kevin V. Goodwin, Robert R. Newton, Ian S. Tribick, Ethan Fontaine
  • Patent number: 10808307
    Abstract: The present disclosure relates to a chromium-aluminum binary alloy with excellent corrosion resistance and a method of producing the same, and more particularly to a chromium-aluminum binary alloy with excellent corrosion resistance. The chromium-aluminum binary alloy may be easily produced and has ductility, thus being highly applicable as a coating material for a material requiring high-temperature corrosion resistance and wear resistance.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: October 20, 2020
    Assignee: Korea Atomic Energy Research Institute
    Inventors: Hyun Gil Kim, Il Hyun Kim, Yang-Il Jung, Dong Jun Park, Jung Hwan Park, Jeong-Yong Park, Yang-Hyun Koo
  • Patent number: 10366811
    Abstract: A parallel pair cable includes a pair of insulated wires arranged to be in contact with each other, parallel to each other and not twisted, a first resin tape wrapped around the pair of insulated wires, and a shield tape longitudinally folded on the outside of the first resin tape and comprising a metal layer.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: July 30, 2019
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventor: Yuto Kobayashi
  • Patent number: 9890452
    Abstract: Provided is a tantalum sputtering target, which is characterized that an average crystal grain size of the target is 50 ?m or more and 200 ?m or less, and variation of a crystal grain size in the target plane is 40% or higher and 60% or less. This invention aims to provide a tantalum sputtering target capable of improving the uniformity of the film thickness and reducing the variation of the resistance value (sheet resistance).
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: February 13, 2018
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Kotaro Nagatsu, Shinichiro Senda
  • Patent number: 9721693
    Abstract: A collimator for x-ray, gamma, or particle radiation has a plurality of collimator elements made of a tungsten-containing material to reduce scattered radiation. At least one collimator element consists of a tungsten alloy having a tungsten content of 72 to 98 wt.-%, which contains 1 to 14 wt.-% of at least one metal of the group Mo, Ta, Nb and 1 to 14 wt.-% of at least one metal of the group Fe, Ni, Co, Cu. The collimator also has very homogeneous absorption behavior at very thin wall thicknesses of the collimator elements.
    Type: Grant
    Filed: October 4, 2011
    Date of Patent: August 1, 2017
    Assignee: Plansee SE
    Inventors: Dirk Handtrack, Heinrich Kestler, Gerhard Leichtfried
  • Patent number: 9373804
    Abstract: Present invention relates to methods of preparing molybdenum oxide inks and molybdenum oxide films, and use of the molybdenum oxide films as hole-transporting layers in optoelectronic devices. The ink for forming a hybrid molybdenum (VI) oxide (MoO3) film on a substrate comprises an ammonium molybdate, at least one inorganic salt different from ammonium molybdate, and a solvent or a solvent mixture.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: June 21, 2016
    Assignee: Agency for Science, Technology and Research
    Inventors: Hongjun Liu, Wei Peng Goh, Jie Zhang, Ziyu Jin, Sing Yang Chiam
  • Patent number: 9133718
    Abstract: A turbine engine component (10) with a non-aluminide protective coating (14) containing silicon and chromium and a process for forming such non-aluminide protective coatings (14). The non-aluminide protective coating (14) is formed by applying a silicon-containing fluid composition to the turbine engine component (10) as a silicon-containing layer (20) and heating the silicon-containing layer (20) to a temperature effective to form the non-aluminide protective coating (14).
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: September 15, 2015
    Assignees: MT COATINGS, LLC, SIEMENS AKTIENGESELLSCHAFT
    Inventors: David C. Fairbourn, Paul Walker
  • Patent number: 8989339
    Abstract: Disclosed is a zirconium alloy material having high corrosion resistance regardless of thermal history during its manufacturing process. The zirconium alloy material is obtained by providing a zirconium alloy containing on the mass basis: 0.001% to 1.9% of Sn, 0.01% to 0.3% of Fe, 0.01% to 0.3% of Cr, 0.001% to 0.3% of Ni, 0.001% to 3.0% of Nb, 0.027% or less of C, 0.025% or less of N, 4.5% or less of Hf and 0.16% or less of O with the remainder being inevitable impurities and zirconium, being formed of a bulk alloy and a surface layer, in which the surface layer has a plastic strain of 3 or more or a Vickers hardness of 260 HV or more and an arithmetic mean surface roughness Ra of 0.2 ?m or less.
    Type: Grant
    Filed: November 8, 2011
    Date of Patent: March 24, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Ryo Ishibashi, Masahisa Inagaki, Hideo Soneda, Naoya Okizaki, Tomomi Nakamura, Yoshikazu Todaka, Hiroaki Azuma, Nozomu Adachi, Minoru Umemoto
  • Patent number: 8974611
    Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: March 10, 2015
    Assignee: Global Advanced Metals, USA, Inc.
    Inventors: Craig M. Carpenter, James D. Maguire, Jr.
  • Patent number: 8821658
    Abstract: A method of thermal forming of refractory alloy suture needles is disclosed. Needle blanks made from refractory alloys are used to form surgical needles, which are heated to a temperature above the ductile to brittle transition temperature but below the recrystallization temperature of the refractory alloy. The heated needle blanks are then mechanically formed into a surgical needle.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: September 2, 2014
    Assignee: Ethicon, Inc.
    Inventors: Frank R. Cichocki, Thomas Nering, David Demarest
  • Publication number: 20140242401
    Abstract: Provided is a tantalum sputtering target having a (200)-plane orientation ratio of 70% or less and a (222)-plane orientation ratio of 10% or more at the sputtering surface of the tantalum sputtering target. The sputter rate can be increased by controlling the crystalline orientation of the target, and thereby a film having an intended thickness can be formed in a short time to improve the throughput.
    Type: Application
    Filed: November 15, 2012
    Publication date: August 28, 2014
    Inventors: Shinichiro Senda, Kotaro Nagatsu
  • Patent number: 8778102
    Abstract: A method of stress relieving drilled surgical needles is disclosed. At least the metal about a drilled bore hole is heat treated to relieve stress without annealing.
    Type: Grant
    Filed: June 16, 2008
    Date of Patent: July 15, 2014
    Assignee: Ethicon, Inc.
    Inventor: Robert E. Maurer
  • Patent number: 8771439
    Abstract: The invention is directed to a method for producing a titanium aluminide intermetallic alloy composition having an improved wear resistance, the method comprising heating a titanium aluminide intermetallic alloy material in an oxygen-containing environment at a temperature and for a time sufficient to produce a top oxide layer and underlying oxygen-diffused layer, followed by removal of the top oxide layer such that the oxygen-diffused layer is exposed. The invention is also directed to the resulting oxygen-diffused titanium aluminide intermetallic alloy, as well as mechanical components or devices containing the improved alloy composition.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: July 8, 2014
    Assignee: UT-Battelle, LLC
    Inventors: Jun Qu, Hua-Tay Lin, Peter J. Blau, Vinod K. Sikka
  • Patent number: 8747633
    Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.
    Type: Grant
    Filed: May 14, 2012
    Date of Patent: June 10, 2014
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Nobuaki Nakashima, Yoshiki Orimoto
  • Patent number: 8702877
    Abstract: A cathodic member for electrochemical cells used in hypochlorite production comprises a zirconium plate coated with a zirconium oxide layer, which is particularly suitable for minimising the decomposition of the hypochlorite product while ensuring a prolonged lifetime. The coated zirconium plate can be used as the cathodic plate in a monopolar cell, or can be welded to a titanium plate for use in a bipolar configuration.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: April 22, 2014
    Assignee: Industrie de Nora S.p.A.
    Inventors: Carl W. Brown, Jr., Richard C. Carlson, Kenneth L. Hardee
  • Patent number: 8673820
    Abstract: A method of qualifying Niobium and/or other super conducting materials for the reliable fabrication of SCRF cavities, which will invariably deliver high accelerating fields including: identification of the best superconducting lower critical field (HC1) based on subjecting a sample of the superconducting material selectively to mechanical stress, annealing at various temperatures, various chemical treatments, post-chemical treatment baking/annealing; and identification of the best possible thermal conductivity of the material at said best superconducting lower critical field (HC1) to thereby qualify the superconducting material for the reliable fabrication of SCRF cavities adapted to deliver high accelerating fields.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: March 18, 2014
    Assignee: Department of Atomic Energy
    Inventors: Sindhunil Barman Roy, Vinod Chandra Sahni
  • Patent number: 8597443
    Abstract: A method of forming an article from an ?-? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ?-? titanium alloy.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: December 3, 2013
    Assignee: ATI Properties, Inc.
    Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
  • Patent number: 8597442
    Abstract: A method of forming an article from an ??? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ??? titanium alloy.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: December 3, 2013
    Assignee: ATI Properties, Inc.
    Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
  • Patent number: 8580053
    Abstract: A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is “a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: November 12, 2013
    Assignee: Ulvac, Inc.
    Inventors: Motonori Sato, Poong Kim, Manabu Ito, Tadashi Masuda
  • Patent number: 8557015
    Abstract: In a Cr—Cu alloy that is formed by powder metallurgy and contains a Cu matrix and flattened Cr phases, the Cr content in the Cr—Cu alloy is more than 30% to 80% or less by mass, and the average aspect ratio of the flattened Cr phases is more than 1.0 and less than 100. The Cr—Cu alloy has a small thermal expansion coefficient in in-plane directions, a high thermal conductivity, and excellent processibility. A method for producing the Cr—Cu alloy is also provided. A heat-release plate for semiconductors and a heat-release component for semiconductors, each utilizing the Cr—Cu alloy, are also provided.
    Type: Grant
    Filed: February 14, 2007
    Date of Patent: October 15, 2013
    Assignees: JFE Precision Corporation, JFE Steel Corporation
    Inventors: Hoshiaki Terao, Hiroki Ota, Hideaki Kobiki, Aya Uenosono
  • Patent number: 8500928
    Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: August 6, 2013
    Assignee: Global Advanced Metals, USA, Inc.
    Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
  • Patent number: 8444775
    Abstract: Shape Memory Alloy tube is protected from damage during drawing, caused by galling-type interaction between the tube and high-carbon dies, by forming an oxide surface layer. This invention protects the tube internal diameter from oxidation while allowing the tube outside diameter to be oxidized, by using an oxygen getter located within the tube during the oxidation step. The method yields a higher quality internal diameter and improves productivity.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: May 21, 2013
    Assignee: Johnson Matthey Public Limited Company
    Inventors: Edwin Alfred Crombie, III, William Andrew Hochella
  • Publication number: 20130096667
    Abstract: The present disclosure is directed to tantalum-alloy products, implantable medical devices that incorporate tantalum-alloy products such as stents or other implantable medical devices, methods of making and/or processing the tantalum-alloy products and implantable medical devices, and methods of using the implantable medical devices. In an embodiment, a stent includes a stent body having a plurality of struts. At least a portion of the stent body is made from a tantalum alloy. The tantalum alloy includes a tantalum content of about 77 weight % (“wt %”) to about 92 wt %, a niobium content of about 7 wt % to about 13 wt %, and a tungsten content of about 1 wt % to about 10 wt %. The tantalum alloy exhibits at least one mechanical property modified by heat treatment thereof, such as yield strength, ultimate tensile strength, or ductility.
    Type: Application
    Filed: October 12, 2011
    Publication date: April 18, 2013
    Applicant: ABBOTT CARDIOVASCULAR SYSTEMS, INC.
    Inventors: Rainer Bregulla, Randolf von Oepen, Pamela A. Kramer-Brown, Austin M. Leach
  • Publication number: 20130092299
    Abstract: Embodiments of methods for vacuum heat treating refractory metal articles (e.g., implantable medical devices), and heat treating apparatuses for use in such methods are disclosed. Heat treating refractory metal articles under high vacuum (e.g., 10?6 Torr) may improve strength and ductility and remove material contaminants (e.g., oxygen or hydrogen) that may be absorbed during manufacturing processes. Heat treating methods include disposing a refractory metal article in a heat treating apparatus, drawing a vacuum therein, and moving the article to a heated zone in the furnace using a drive system that permits movement of the article while the vacuum is maintained in the apparatus. A heat treating apparatus may include an elongate furnace tube that may be sealed and placed under vacuum, a heating element disposed around at least a portion of the tube, and a drive system configured for moving articles disposed inside the furnace tube while under vacuum.
    Type: Application
    Filed: October 12, 2011
    Publication date: April 18, 2013
    Applicant: ABBOTT CARDIOVASCULAR SYSTEMS, INC.
    Inventors: Rainer Bregulla, Randolf Von Oepen
  • Patent number: 8382920
    Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: February 26, 2013
    Assignee: Global Advanced Metals, USA, Inc.
    Inventors: Craig M. Carpenter, James D. Maguire, Jr.
  • Patent number: 8366845
    Abstract: An apparatus for thermally treating a plurality of curved suture needles. The apparatus includes a conveyer for transferring the plurality of curved suture needles from a source of curved suture needles to a receiver, a housing positioned adjacent the conveyer, the housing having a first end, a second end, and an opening running from the first end to the second end, the opening aligned with the conveyer to enable the plurality of curved suture needles to pass therethrough, and a heat source located within the housing for heating the plurality of curved suture needles as the plurality of curved suture needles are transferred by the conveyer from the first end of the housing to the second end of the housing. Also provided is a process for thermally treating a plurality of curved suture needles to enhance the stiffness and yield moment of the curved suture needles. The curved suture needles so treated have a desirable combination of stiffness, strength and ductility.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: February 5, 2013
    Assignee: Ethicon, Inc.
    Inventors: Frank Richard Cichocki, Jr., David DeMarest, Gregory Hollin, Eugene D. Reynolds
  • Patent number: 8359732
    Abstract: A method of manufacturing an optimized sheet metal (1) of a zirconium based alloy is described, which optimized sheet metal (1) defines a sheet plane (BA). The method comprises the steps of providing a sheet metal (2) of a zirconium based. alloy, subjecting the sheet metal (2) to at least a preparing cold rolling and a final cold rolling, wherein the preparing cold rolling and the final cold rolling are both performed in a common rolling direction, and heat treating the sheet metal (1) between the preparing cold rolling and the final cold rolling so that the zirconium based alloy is partially re-crystallized. A method of manufacturing a spacer grid using an optimized sheet metal (1) according to the invention is also described.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: Westinghouse Electric Sweden AB
    Inventors: Lars Hallstadius, Mats Dahlbäck, John Bates, James Dougherty, Steven J. King, Robert J. Comstock
  • Patent number: 8349248
    Abstract: A metallic material is made from at least one refractory metal or an alloy based on at least one refractory metal. The metallic material has an oxygen content of about 1,000 to about 30,000 ?g/g and the oxygen is interstitial.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: January 8, 2013
    Assignee: Heraeus Precious Metals GmbH & Co. KG
    Inventors: Jens Trotzschel, Bernd Spaniol
  • Publication number: 20120267236
    Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.
    Type: Application
    Filed: May 14, 2012
    Publication date: October 25, 2012
    Inventors: Nobuaki NAKASHIMA, Yoshiki ORIMOTO
  • Patent number: 8262813
    Abstract: A process for providing a niobium wire and its use for connection to niobium or niobium oxide capacitors. The wire is enriched with oxygen and preferably has oxygen concentrations of about 3,000 to 30,000 ?g/g.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: September 11, 2012
    Assignee: Heraeus Materials Technology GmbH & Co. KG
    Inventor: Bernd Spaniol
  • Patent number: 8252126
    Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.
    Type: Grant
    Filed: May 4, 2005
    Date of Patent: August 28, 2012
    Assignee: Global Advanced Metals, USA, Inc.
    Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
  • Patent number: 8252130
    Abstract: Surface processing of titanium alloy members for aerospace equipment imparts high wear resistance, lubricity and high fatigue strength. The method includes an oxygen diffusion step for causing oxygen to diffuse and penetrate in solid solution form into a surface of a titanium alloy member under an oxygen-containing gas atmosphere and a particle bombardment step for bombarding the surface of the titanium alloy member with an airflow containing particles. The aerospace equipment can include a flap rail member and slat rail member for aircraft.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: August 28, 2012
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Kazuyuki Oguri, Takashi Kimura, Takahiro Sekigawa, Takayuki Takahashi
  • Patent number: 8241441
    Abstract: An apparatus for thermally treating and coloring a plurality of curved suture needles. The apparatus includes a conveyer for transferring the plurality of curved suture needles from a source of curved suture needles to a receiver, a housing positioned adjacent the conveyer, the housing having a first end, a second end, and an opening running from the first end to the second end, the opening aligned with the conveyer to enable the plurality of curved suture needles to pass therethrough, a heat source located within the housing for heating the plurality of curved suture needles as the plurality of curved suture needles are transferred by the conveyer from the first end of the housing to the second end of the housing and a system for providing a gas mixture containing a fractional concentration of oxygen to oxidize and colorize the surfaces of the plurality of curved suture needles as the plurality of suture needles pass through the housing.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: August 14, 2012
    Assignee: Ethicon, Inc.
    Inventors: Frank Richard Cichocki, Jr., David Demarest, Gregory Hollin, Eugene D. Reynolds
  • Patent number: 8231745
    Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: July 31, 2012
    Assignee: Global Advanced Metals, USA, Inc.
    Inventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
  • Patent number: 8172960
    Abstract: Provided is a tantalum sputtering target manufactured by working a molten and cast tantalum ingot or billet through forging, annealing and rolling, wherein the structure of the tantalum target comprises a non-recrystallized structure. The tantalum sputtering target having a high deposition speed and excellent uniformity of film, producing less arcings and particles and having excellent film forming properties, and the method capable of stably manufacturing the target can be provided by improving and devising plastic working steps such as forging and rolling, and the heat treatment step.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: May 8, 2012
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Kunihiro Oda, Atsushi Hukushima
  • Patent number: 8128765
    Abstract: Niobium cavities are fabricated by the drawing and ironing of as cast niobium ingot slices rather than from cold rolled niobium sheet. This method results in the production of niobium cavities having a minimum of grain boundaries at a significantly reduced cost as compared to the production of such structures from cold rolled sheet.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: March 6, 2012
    Assignee: Jefferson Science Associates, LLC
    Inventors: Ganapati Rao Myneni, Peter Kneisel, Tadeu Cameiro
  • Patent number: 8062440
    Abstract: A hafnium alloy target containing either or both of Zr and Ti in a gross amount of 100 wtppm-10 wt % in Hf, wherein the average crystal grain size is 1-100 ?m, the impurities of Fe, Cr and Ni are respectively 1 wtppm or less, and the habit plane ratio of the plane {002} and three planes {103}, {014} and {015} lying within 35° from {002} is 55% or greater, and the variation in the total sum of the intensity ratios of these four planes depending on locations is 20% or less. As a result, obtained is a hafnium alloy target having favorable deposition property and deposition speed, which generates few particles, and which is suitable for forming a high dielectric gate insulation film such as HfO or HfON film, and the manufacturing method thereof.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: November 22, 2011
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Takeo Okabe, Shuichi Irumata, Yasuhiro Yamakoshi, Hirohito Miyashita, Ryo Suzuki
  • Publication number: 20110265921
    Abstract: A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is “a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.
    Type: Application
    Filed: July 13, 2011
    Publication date: November 3, 2011
    Applicant: ULVAC, INC.
    Inventors: Motonori SATO, Poong Kim, Manabu Ito, Tadashi Masuda
  • Patent number: 8048240
    Abstract: A method of forming an article from an ??? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ??? titanium alloy.
    Type: Grant
    Filed: May 7, 2007
    Date of Patent: November 1, 2011
    Assignee: ATI Properties, Inc.
    Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
  • Patent number: 7998287
    Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
    Type: Grant
    Filed: February 10, 2005
    Date of Patent: August 16, 2011
    Assignee: Cabot Corporation
    Inventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
  • Patent number: 7959830
    Abstract: This invention discloses novel nanocomposite material structures which are strong, highly conductive, and fatigue-resistant. It also discloses novel fabrication techniques to obtain such structures. The new nanocomposite materials comprise a high-conductivity base metal, such as copper, incorporating high-conductivity dispersoid particles that simultaneously minimize field enhancements, maintain good thermal conductivity, and enhance mechanical strength. The use of metal nanoparticles with electrical conductivity comparable to that of the base automatically removes the regions of higher RF field and enhanced current density. Additionally, conductive nanoparticles will reduce the surface's sensitivity to arc or sputtering damage. If the surface is sputtered away to uncover the nanoparticles, their properties will not be dramatically different from the base surface.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: June 14, 2011
    Assignee: The Regents of the University of California
    Inventor: Sungho Jin
  • Patent number: 7927435
    Abstract: Methods for producing zirconium strips that demonstrate improved formability are disclosed. The zirconium strips of the present disclosure have a purity and crystalline microstructure suitable for improved formability, for example, in the manufacture of certain articles such as panels for plate heat exchangers and high performance tower packing components. Other embodiments disclosed herein relate to formed substantially pure zirconium strip, articles of manufacture produced from the substantially pure zirconium strip, and methods for making the articles of manufacture.
    Type: Grant
    Filed: September 30, 2009
    Date of Patent: April 19, 2011
    Assignee: ATI Properties, Inc.
    Inventor: Craig M. Eucken
  • Patent number: 7794554
    Abstract: Refractory metal products, such as tantalum, can be rejuvenated after metal consumption in selected zones by filling the zones with powder and simultaneously applying focused radiant energy to the powder.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: September 14, 2010
    Assignee: H.C. Starck Inc.
    Inventors: Paul R. Aimone, Prabhat Kumar, Peter R. Jepson, Henning Uhlenhut, Howard V. Goldberg, Steven A. Miller
  • Patent number: 7740717
    Abstract: Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including the steps of forging and recrystallization annealing, and thereafter rolling, a tantalum ingot or billet having been subject to melting and casting, and forming a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target. As a result, evenness (uniformity) of the film is enhanced, and quality of the sputter deposition is improved.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: June 22, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Kunihiro Oda
  • Patent number: 7731810
    Abstract: A nanocomposite comprising a plurality of nanoparticles dispersed in a molybdenum-based matrix, and an x-ray tube component formed from such a nanocomposite. The nanocomposite contains volume fraction of nanoparticle dispersoids in a range from about 2 volume percent to about 20 volume percent. A method of making such molybdenum-based nanocomposites is also disclosed.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: June 8, 2010
    Assignee: General Electric Company
    Inventors: Pazhayannur Ramanathan Subramanian, Judson Sloan Marte, Paul Leonard Dupree
  • Patent number: 7699948
    Abstract: A manufacturing method of a Ta sputtering target in which a Ta ingot or billet formed by melting and casting is subject to forging, annealing, rolling processing and the like to prepare a sputtering target, wherein the ingot or billet is forged and thereafter subject to recrystallization annealing at a temperature of 1373K to 1673K. As a result of improving and devising the forging process and heat treatment process, the crystal grain diameter can be made fine and uniform, and a method of stably manufacturing a Ta sputtering target superior in characteristics can be obtained thereby.
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: April 20, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Kunihiro Oda