Abstract: Implantable medical devices made from a single beta phase Tantalum alloy utilizing Titanium as an alloying agent that are biocompatible, radiopaque and visible under x-ray and fluoroscopy, the alloy having mechanical properties that allow it to be machined by conventional, machining methods for forming the devices, and a method for making the alloy. The alloy is between approximately 10 percent and 25 percent Ti by weight and preferably has a density of 12 g/cm3 or greater.

Abstract: In a process of fabricating a stent composed primarily of niobium alloyed with a trace amount of zirconium, tantalum, or titanium for hardening, the stent is annealed under vacuum in a substantially oxygen-free environment. The vacuum is preferably maintained at pressure less than 10?4 millibars, oxygen-content less than about 80 parts per million, and the annealing temperature exceeds 400° C. for at least one hour, and is preferably kept in a range from about 1100-1200° C. for several hours. This may be followed by applying a surface layer of oxide, such as iridium oxide, with a thickness of 299-300 nm to the stent.

Abstract: High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about ?4.0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container.

Abstract: A method for producing a tantalum PVD component includes a minimum of three stages, each of which include a deformation step followed by a high-temperature anneal. The deformation occurs in air and at a component temperature less than or equal to 750° F. in at least one of the minimum of three stages. The anneal occurs at a component temperature of at least 2200° F. in at least the first two of the minimum of three stages. The tantalum component exhibits a uniform texture that is predominately {111}<uvw>. As an alternative, the deformation may occur at a component temperature of from 200° F. to 750° F. in at least the last stage of the minimum of three stages. The anneal may occur at a component temperature of from 1500° F. to 2800° F. in at least three of the minimum of three stages.

Abstract: A (Nb, Ti) phase in an Nb—Ti—Co alloy is composed of a granular structure. The Nb—Ti—Co alloy is preferably subjected to heat treatment at 800° C. or more so that the eutectic structure in the casted state can be changed to a granular structure. The Nb—Ti—Co alloy used there is preferably NbxTi(100-x-y)Coy, (x?70, 20?y?50 (mol %)). By properly predetermining the heating temperature and time, the resulting alloy exhibits improved hydrogen permeability in combination with a good hydrogen embrittlement resistance characteristic in the CoTi phase, making it possible to provide a practical hydrogen permeable membrane having an advantageously high performance.

Abstract: A high voltage capacitor anode for an implantable medical device is fabricated by sintering, anodizing and heat treating a pressed tantalum powder slug. The sintering may be performed at a temperature between approximately 1500° C. and approximately 1600° C. for a time between approximately 3 minutes and approximately 35 minutes; subsequent anodization may be performed by immersing the slug in an electrolyte at a temperature between approximately 15° C. and approximately 30° C. and then applying a voltage across the slug, the voltage being between approximately 175 Volts and approximately 375 Volts; subsequent heat treating may be performed at a temperature between approximately 400° C. and approximately 460° C. for a time between approximately 50 minutes and approximately 65 minutes. Following heat treating, the anode is reformed by a second anodization.

Abstract: In a Cr—Cu alloy that is formed by powder metallurgy and contains a Cu matrix and flattened Cr phases, the Cr content in the Cr—Cu alloy is more than 30% to 80% or less by mass, and the average aspect ratio of the flattened Cr phases is more than 1.0 and less than 100. The Cr—Cu alloy has a small thermal expansion coefficient in in-plane directions, a high thermal conductivity, and excellent processability. A method for producing the Cr—Cu alloy is also provided. A heat-release plate for semiconductors and a heat-release component for semiconductors, each utilizing the Cr—Cu alloy, are also provided.

Abstract: Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.

Abstract: High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about ?4.0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container.

Abstract: There are provided a high hardness, high corrosion resistance and high wear resistance alloy, wherein the alloy is an aging heat treated Cr(chromium)-Al(aluminum)-Ni(nickel)-base alloy, the proportion of a mixed phase of (? phase+?? phase+? phase) precipitated at grain boundaries of ? phase grains in a metal structure in the cross section of the alloy is not less than 95% in terms of area ratio, and the intensity ratio as measured by X-ray diffractometry of the alloy is not less than 50% and not more than 200% in terms of I?(110)/[I?(200)+I??(004)]×100, and a component comprising this alloy, a material for an alloy which can form this alloy, and a process for producing this alloy. The present invention can provide a Cr—Al—Ni-base alloy possessing excellent corrosion resistance, hardness, wear resistance, releasability, fatigue strength, and planishing property in a molding face, a component comprising this alloy, a material for an alloy which can form this alloy, and a process for producing this alloy.

Abstract: A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is “a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.

Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.

Abstract: The invention relates to a method for producing high-performance Cr—Ti—V hydrogen storage alloys utilizing a thermit process, whereby residence of adversely affecting impurities is inhibited, addition of not less than 10 at % of Ti as an alloy component is realized, and thermal burden on the crucible used in the method is reduced. The method includes the steps of: (A) providing an alloy material (1) comprising a Cr oxide, a V oxide, and a reducing agent Al, and an alloy material (2) comprising Ti; (B) placing the alloy materials in a crucible for thermit reduction so that the alloy material (1) is placed above the alloy material (2); (C) igniting the alloy material (1) placed in step (B) and melting all metal elements contained in the alloy materials the with heat of the thermit reaction of the alloy material (1); and (D) making the alloy melt obtained in step (C) into an alloy.

Abstract: Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including the steps of forging and recrystallization annealing, and thereafter rolling, a tantalum ingot or billet having been subject to melting and casting, and forming a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target. As a result, evenness (uniformity) of the film is enhanced, and quality of the sputter deposition is improved.

Abstract: A method for producing a tantalum sputtering component includes a minimum of three stages each of which include a deformation step followed by an inert atmosphere high-temperature anneal. Temperatures of each of the anneal steps can be different from one another. A tantalum sputtering component includes a mean grain size of less than about 100 microns and a uniform texture throughout the component thickness. The uniform texture can be predominately {111}<uvw>.

Abstract: A wristwatch case (11) and a method of manufacturing the case, the wristwatch case comprising a wristwatch case body (1) made of titanium or stainless steel and a crown pipe (3) fixed to each other, wherein a stem hole (2) corresponding to the crown pipe (3) is formed in the wristwatch case body (1), a small diameter part is formed in the crown pipe (3), and a small diameter part corresponding to the a small diameter part of the crown pipe is formed in the stem hole (2), the method comprising the step of fitting the crown pipe (3) into the stem hole (2) in the wristwatch case body (1) to form a solid phase diffusion joining part at a portion where the small diameter parts thereof are fitted closely to each other, and to form a brazed connection part at a portion other than that where the small diameter parts are fitted closely to each other, whereby a watch external part having excellent corrosion resistance and waterproof and a large number of design variations can be provided.

Abstract: A method for producing predetermined internal stresses in a prosthetic device for implantation. The method includes first determining internal stresses which are preferred in prosthetics to instill a particular strength and longevity to the prosthetic. In particular, internal stresses may be used to increase the strength of smaller prosthetic devices. Additionally, once the preferred internal stresses are determined, the internal stresses can be cold worked into subsequent prosthetic devices to instill the same characteristics. Once parts are manufactured, internal stresses can be measured to validate manufacturing process and serve as verification for quality control purposes. Producing prosthetic devices, including predetermined internal stresses through work hardening the prosthetic devices, is described.

Abstract: One object of the present invention is to provide a production method for a nuclear fuel assembly support grid that improves the corrosion resistance of welded parts without impairing the characteristics of the support grid so as to be able adequately withstand highly efficient operation. In order to achieve the object, the present invention provide a production method for a nuclear fuel assembly support grid comprising the steps of: assembling a plurality of straps in a grid form; welding intersections of each strap; and carrying out annealing thereafter to precipitate an intermetallic compound on the welded parts.

Abstract: High purity niobium metals and alloys containing the same are described. The niobium metal preferably has a purity of at least 99.99% and more preferably at least 99.999%. In addition, niobium metal and alloys thereof are described, which either have a grain size of about 150 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 30 random, or an incremental log ratio of (111):(100) intensity of greater than about ?4.0, or any combination of these properties. Also described are articles and components made from the niobium metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity niobium metal which includes the step of reacting a salt-containing niobium and a metal salt along with at least one compound capable of reducing the salt-containing niobium to niobium and in a reaction container.

Abstract: The present invention relates to high-purity zirconium or hafnium with minimal impurities, particularly where the content of alkali metal elements such as Na, K; radioactive elements such as U, Th; transitional metals or heavy metals or high melting point metal elements such as Fe, Ni, Co, Cr, Cu, Mo, Ta, V; and gas components such as C, O, etc. is extremely reduced, as well as to an inexpensive manufacturing method of such high-purity zirconium or hafnium, thereby reducing the impurities hindering the guarantee of the operational performance of semiconductors. The present invention further relates to an inexpensive and safe manufacturing method of high-purity zirconium or hafnium powder from hydrogenated high-purity zirconium or hafnium powder.

Abstract: When a chromium-iron-based alloy, preferably a chromium-iron-based alloy having a chromium content of about 60 to about 95 mass % is subjected to heat treatment at about 500 to about 1,300° C., and subsequently to grinding treatment by use of an impact mill, grindability of the chromium-iron-based alloy is improved, and running cost can be reduced. In addition, the resultant powdery thermal spraying material exhibits stable fluidity during spray coating, and thus a uniform coating can be formed.

Abstract: The invention concerns a method for making tubes designed for a nuclear fuel pencil case or guide tube which consists in forming a bar in a zirconium based alloy containing equally 0.3 to 0.25 wt. % of the total iron, of chromium or vanadium, 0.8 to 1.3 wt. % of niobium, less than 2000 ppm of tin, 500 to 2000 ppm of oxygen, less than 100 ppm of carbon, 5 to 30 ppm of sulphur and less than 50 ppm of silicon. The bar is soaked in water after being heated at a temperature between 1000° C. and 1200° C. A blank is spun after being heated at a temperature between 600° C. and 800° C. The blank is cold-rolled, in at least three of four passes, to obtain a tube with intermediate heat treatments between 560° C. and 620° C. and s final heat treatment is carried out between 560° C. and 620° C. in inert atmosphere or under vacuum.

Abstract: The present invention relates to a non-brittle silicide target for forming a gate oxide film made of MSi0.8-1.2 (M: Zr, Hf), and provides a non-brittle silicide target suitable for forming a ZrO2.SiO2 film or HfO2.SiO2 film that can be used as a high dielectric gate insulating film having properties to substitute an SiO2 film.

Abstract: In a process for producing a workpiece from a chromium alloy, consisting of: 32-37 % by weight chromium, 28-36 % by weight nickel, max. 2 % by weight manganese, max. 0.5 % by weight silicon, max. 0.1 % by weight aluminum, max. 0.03 % by weight carbon, max. 0.025 % by weight phosphorus, max. 0.01 % by weight sulfur, max. 2 % by weight molybdenum, max. 1 % by weight copper, 0.3-0.7 % by weight nitrogen, remainder iron and production-related admixtures and impurities, the workpiece is cold worked and, by means of the cold working, is brought to a yield strength of at least 1000 MPa (Rp0.2≧1000 MPa).

Abstract: A discharge wire usable in an electrification device includes a tungsten wire subjected to mirror finish processing and an oxidized layer formed by heating the surface of the tungsten wire at a temperature in the range 400 to 600° C., wherein the film has a thickness in the range of 0.01 to 0.3 &mgr;m.

Abstract: An additive to a flame reaction forms noncorrosive deposits on cooler metal surfaces, which deposits are more stable than Na2SO4 or K2SO4. By adding molybdenum salts to the flame, an alkali polymolybdate is produced on the cooler metal surface and corrosion is inhibited. Deposition appears to closely reflect the relative thermodynamic stabilities of these salts. The flame processes all chemical molybdenum salt precursors as equivalent sources of molybdenum. The level of molybdenum required is equal to 2 times or more that of the alkali on an atomic basis in the flame environment. The nature of the fuel purity and possible alkali reduction schemes invoked will control the actual quantity and mixing method of the additive. The additive may be directly mixed into the fuel or injected into the burned gas regions of the combustor.

Abstract: The present invention relates to a method for manufacturing zirconium-based alloys containing niobium with superior corrosion resistance for use in nuclear fuel rod claddings. The method of this invention comprises melting of the alloy, &bgr;-forging, &bgr;-quenching, hot-working, vacuum annealing, cold-working, intermediate annealing and final annealing, whereby the niobium concentration in the &agr;-Zr matrix decreases from the supersaturation state to the equilibrium state to improve the corrosion resistance of the alloy. Such zirconium-based alloys containing niobium are usefully applied to nuclear fuel rod cladding of the cores in light water reactors and heavy water reactors.

Abstract: Described is the production of a metal article with fine metallurgical structure and texture by a process that includes forging and rolling and control of the forging and rolling conditions. Also described is a metal article with a minimum of statically crystallized grain size difference in grain size at any location of less than about ±3%, as well as a dispersion in orientation content ratio of textures of less than about ±4% at any location.

Abstract: An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for the wire is about 3 KSI for an unannealed wire at finish diameter and about 2 KSI for an annealed wire at finish diameter. Also described is a process of making a Ta—Si alloy which includes reducing a silicon-containing solid and a tantalum-containing solid into a liquid state and mixing the liquids to form a liquid blend and forming a solid alloy from the liquid blend. Another process of making a Ta—Si alloy is described which involves blending powders containing tantalum or an oxide thereof with powders containing silicon or a silicon-containing compound to form a blend and then reducing the blend to a liquid state and forming a solid alloy from the liquid state.

Abstract: Disclosed is a method for manufacturing a tube and a sheet of niobium-containing zirconium alloys for the high burn-up nuclear fuel. The method comprises melting Nb-added zirconium alloy to ingot; forging the ingot at &bgr; phase range; &bgr;-quenching the forged ingot after solution heat-treatment at 1015-1075° C.; hot-working the quenched ingot at 600-650° C.; cold-working the hot-worked ingot in three to five passes, with intermediate vacuum annealing; and final vacuum annealing the cold-worked ingot at 440-600° C., wherein temperatures of intermediate vacuum annealing and final vacuum annealing after &bgr;-quenching are changed so as to attain the condition under which precipitates in the alloy matrix are limited to an average diameter of 80 nm or smaller and the accumulated annealing parameter (&Sgr; A) is limited to 1.0×10−18 hr or lower.

Abstract: An alloy having a cube textured substrate is disclosed. The alloy includes two different metals. The alloy can be used as a substrate for a superconductor. Optionally, one or more buffer layers can be disposed between the substrate and the superconductor material. The alloy can be prepared using a process that includes rolling the alloy and annealing the alloy. The alloy can have a relatively large volume percent that is formed of grains with cube texture.

Abstract: Extruded tantalum billets and niobium billets are described having a substantially uniform grain size and preferably an average grain size of about 150 microns or less and more preferably an average grain size of about 100 microns or less. The extruded billet can then be forged or processed by other conventional techniques to form end use products such as sputtering targets. A process for making the extruded tantalum billets or niobium billets is also described and involves extruding a starting billet at a sufficient temperature and for a sufficient time to at least partially recrystallize the billet and form the extruded billet of the present invention.

Abstract: A high-capacity hydrogen storage alloy has a crystal structure containing a body-centered cubic structure as a single or main phase and made of a composition represented by the general formula TiaCrbMocFed, in which a is in a range of from 25 to 45% by atomic weight, b is in a range of from 30 to 65% by atomic weight, c is in a range of from 5 to 40% by atomic weight, and d is in a range of from 0 to 15% by atomic weight. In production of the alloy, a heat treatment is performed at a temperature in a range of from 1,200 to 1,500° C. for 1 minute to 24 hours and then cooling is performed at a speed equal to or higher than the cooling speed obtained by water cooling.

Abstract: A method for producing a tantalum sputtering component includes a minimum of three stages each of which include a deformation step followed by an inert atmosphere high-temperature anneal. Temperatures of each of the anneal steps can be different from one another. A tantalum sputtering component includes a mean grain size of less than about 100 microns and a uniform texture throughout the component thickness. The uniform texture can be predominately {111}<uvw>.

Abstract: A two-phase niobium-based silicide composite exhibits creep resistance at temperatures equal to or greater than 1150° C. The niobium-based silicide composite comprises at least silicon (Si) hafnium (Hf), titanium (Ti), and niobium (Nb). The concentration ratio of Nb:(Hf+Ti) is equal to or greater than about 1.4.

Abstract: A method (10) of forming sputtering target (11) from ingots of tantalum or niobium of requisite purity by the process of cutting the ingot to short lengths (12) and pressure working (14, 22, 30, 34) the ingot along alternating essentially orthogonal work axes. Intermediate anneals (18, 26, 38) are applied as necessary to establish a uniform texture thickness-wise and area-wide throughout the target, including the center. The uniform texture is a substantially constant mix of grains with orientation {100} and {111}, thereby improving sputtering performance by providing a more predictable sputter rate to control film thickness.

Abstract: In a process for producing a workpiece from a chromium alloy, consisting of:  32-37 % by weight chromium,  28-36 % by weight nickel, max. 2 % by weight manganese, max. 0.5 % by weight silicon, max. 0.1 % by weight aluminum, max. 0.03 % by weight carbon, max. 0.025 % by weight phosphorus, max. 0.01 % by weight sulfur, max. 2 % by weight molybdenum, max. 1 % by weight copper, 0.3-0.7 % by weight nitrogen, remainder iron and production-related admixtures and impurities, the workpiece is cold worked and, by means of the cold working, is brought to a yield strength of at least 1000 MPa (Rp≧1000 MPa).

Abstract: The objective of the present invention is to provide a forging method realized in a way to improve workability in machining, by turning the metallographical structure of products subject to impact load to a fine ferrite-perlite structure, without adopting the method of quenching and tempering, to obtain, as strength, a yield point (YP value) exceeding that obtained by the method of quenching and tempering, and making the tensile strength (TS) smaller compared with the method of quenching and tempering.

Abstract: A Cu-containing Nb3Al multifilamentary superconductive wire having a multifilamentary (superfine multi-core structure that a large number of micro-complex cores each obtained by complexing a Cu—Al alloy containing Cu in an amount of more than 0.2 at. % and at most 10 at. % in Nb are embedded in Nb, Ta, an Nb alloy or a Ta alloy as a matrix, wherein in the micro-complex cores, an A15 phase compound structure is formed by rapid heating at a temperature of 1,700° C. or more for 2 seconds or less and quenching to approximately room temperature, and further additionally heat-treated at a temperature of 650 to 900° C. This superconductive wire has high Jc in a low magnetic field, can be applied to all magnetic fields of 29 T or less, and is excellent in Jc characteristics in a high magnetic field in comparison with an Nb3Al wire.

Abstract: High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4.0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container.

Abstract: An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for the wire is about 3 KSI for an unannealed wire at finish diameter and about 2 KSI for an annealed wire at finish diameter. Also described is a process of making a Ta—Si alloy which includes reducing a silicon-containing solid and a tantalum-containing solid into a liquid state and mixing the liquids to form a liquid blend and forming a solid alloy from the liquid blend. Another process of making a Ta—Si alloy is described which involves blending powders containing tantalum or an oxide thereof with powders containing silicon or a silicon-containing compound to form a blend and then reducing the blend to a liquid state and forming a solid alloy from the liquid state.

Abstract: An alpha-beta titanium-base alloy is heat treated to improve its dwell fatigue properties while retaining a good balance of mechanical properties. The heat treatment includes first heating the alpha-beta titanium-base alloy to a first heat-treatment temperature in a first range of from about 70° F. below a beta transus temperature of the alpha-beta titanium-base alloy to the beta transus temperature of the alpha-beta titanium-base alloy, and quenching the alpha-beta titanium-base alloy at a rate of greater than about 200° F. per minute. The alpha-beta titanium-base alloy is second heated to a second heat-treatment temperature in a second range of from about 100° F. to about 400° F. below the beta transus temperature of the alpha-beta titanium-base alloy, and thereafter cooling the alpha-beta titanium-base alloy to ambient temperature at a rate of from about 10° F. per minute to about 200° F. per minute.

Abstract: A monolithic refractory depositing system capable of improving working environment and working efficiency and of spraying a material in a uniform thickness is provided. The monolithic refractory depositing system is capable of carrying out both a spraying process and a casting process.

Abstract: A high-strength amorphous alloy represented by the general formula: XaMbAlcTd (wherein X is at least one element selected between Zr and Hf; M is at least one element selected from the group consisting of Ni, Cu, Fe, Co and Mn; T is at least one element having a positive enthalpy of mixing with at least one of the above-mentioned X, M and Al; and a, b, c and d are atomic percentages, provided that 25≦a≦85, 5≦b ≦70, 0<c≦35 and 0<d≦15) and having a structure comprising at least having an amorphous phase. The amorphous alloy is produced by preparing an amorphous alloy having the above-mentioned composition and containing at least an amorphous phase, and heat-treating the alloy in the temperature range from the first exothermic reaction-starting temperature (Tx1: crystallization temperature) thereof to the second exothermic reaction-starting temperature (Tx2) thereof to decompose the amorphous phase into a mixed phase structure consisting of an amorphous phase and a microcrystalline phase.

Abstract: A sheet for shielding a room, conductive cables, magnetic recording media, inside shield rooms and other objects, from the effects of a magnetic field. The sheet is used as a magnetic shield by wrapping it around the objects or areas which need shielding from the effects of a magnetic field. The sheet is composed of a flexible magnetic shielding sheet of less than 100 &mgr;m thick and is made from alloys which have magnetic shielding capability such as alloys of Fe—Ni series and the like. The Fe—Ni series alloy contains 30 to 85 wt % Ni and also at least either one kind of Mo or Cu in the content of less than 8 wt %. Other than these, alloys of Fe—Cr—Al series and Fe—Co—V series are included. The magnetic shielding sheet 1 may also include an adhesive layer, film, or paper, laminated on at least one surface of the sheet.

Abstract: To be able to satisfactorily bright-anneal metals having a high affinity to oxygen in a hood-type furnace or the like under a protective gas, a rather pure inert gas such as argon, neon or helium, which is mixed with not more than 50 vol-% of a reducing gas, for instance hydrogen, is used as protective gas in cooperation with an oxygen binder, preferably titanium.

Abstract: A process for treating substantially pure tantalum includes plastically deformed a billet, such as by side-forging or side-rolling, to reduce a first dimension of the billet transverse to the centerline, preferably by about 70% to about 85%. The billet is then upset, such as by upset forging or upset rolling, to reduce a second dimension of the billet transverse to the first dimension (for example, a second dimension lying parallel to the centerline), preferably by about 90% to about 99%. In accordance with an especially preferred process, the upsetting of the billet is followed by rolling along a plane normal to the second dimension. It has been found that billets prepared in accordance with the invention have grain sizes no greater than about 25 &mgr;m and predominantly <222> textures relative to their rolling planes, so that targets machined from such billets in such a way that their sputtering surfaces correspond with these rolling planes will have the same predominant <222> textures.

Abstract: A method of imparting high strength, high ductility, and high fracture toughness to a refractory metal alloy workpiece includes: (i) subjecting the workpiece to at least one pass that reduces the initial cross-sectional area of said workpiece, (ii) annealing the workpiece subsequent to the at least one pass, and (iii) subjecting the workpiece to a final working step comprising at least one pass conducted at a temperature between ambient and 300.degree. C., the final working step further reducing the cross-sectional area of the workpiece such that the total reduction in the initial cross-sectional area of the workpiece is approximately 40%-75% and the final cold working is 0.30 to 0.75 of the total reduction in cross-sectional area. The resulting article has a tensile yield strength of approximately 170-200 Ksi, a tensile elongation of approximately 12%-17%, and a Charpy 10 mm Smooth Bar impact toughness of approximately 100 ft.-lb. to 240 ft.-lb.

Abstract: Modern brake rotors require enhanced resistance to thermal stress in order to withstand vigorous operating conditions. A brake rotor manufactured from (.alpha.+.beta.) titanium alloy will fulfill the thermal stress requirements when an equiaxed grain structure is imposed on the alloy. The equiaxed grains can preferably range from 300 .mu.m to 3 mm in size. The equiaxed grain structure is attained by heat treating the brake rotor at the .beta. phase transformation temperature, followed by quenching. When Ti-6Al-4V titanium alloy is used to form the brake rotor, .beta. phase transformation temperature is 1000.degree. C. the heat treatment temperature range is 986-1200.degree. C. The preferable heat treatment for Ti-6Al-4V alloy is 1050.degree. C. for 2 hours.

Abstract: A method of imparting high strength, high ductility, and high fracture toughness to a refractory metal alloy workpiece includes: (i) subjecting the workpiece to at least one pass that reduces the initial cross-sectional area of said workpiece, (ii) annealing the workpiece subsequent to the at least one pass, and (iii) subjecting the workpiece to a final working step comprising at least one pass conducted at a temperature between ambient and 300.degree. C., the final working step further reducing the cross-sectional area of the workpiece such that the total reduction in the initial cross-sectional area of the workpiece is approximately 40%-75% and the final cold working is 0.30 to 0.75 of the total reduction in cross-sectional area. The resulting article has a tensile yield strength of approximately 170-200 Ksi, a tensile elongation of approximately 12%-17%, and a Charpy 10 mm Smooth Bar impact toughness of approximately 100 ft.-lb. to 240 ft.-lb.