Abstract: A method for ionizing and desorbing a sample for analysis includes energizing a first and second electrode to produce a glow discharge at atmospheric pressure. The method further includes supplying a carrier gas to at least a portion of the glow discharge to create effluents thereof. The method further includes conducting the effluents of the glow discharge to the sample to ionize and desorb the sample for analysis. An associated apparatus is also disclosed.

Abstract: A surface-modified member including a metal base, a surface modification layer formed on at least a part of a surface of the metal base, the surface modification layer containing a metal hydroxide, and at least one of a curable resin layer, an ink layer and a coating material layer which is provided on at least a portion of the surface modification layer. A method of modifying a surface of a metal member, including applying an energy to at least a part of the surface of the metal member to produce a metal hydroxide on the surface of the metal member.

Abstract: Disclosed is a method of treating, fly ash having an unacceptably high concentration of carbon, with ozone produced in situ by corona discharge. This method will allow high carbon-content fly ash to be used with air entrainment agents as an additive to cement. The corona discharge can be produced in the exhaust pipe with a venturi of various combustion systems. The device of this invention can be used in conjunction with a triboelectric carbon-fly ash separation system or in a conventional combustion system. The corona discharge is produced off of sharp-tipped metal devices. A venturi is used in the exhaust pipe in the exhaust pipe in conjunction with the sharp-tipped metal devices.

Abstract: A reactor, a plant, and a continuous, industrial process carried out therein for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride by treating the silicon tetrachloride or germanium tetrachloride to be purified, which is contaminated by at least one hydrogen-containing compound, by a cold plasma and isolating purified high-purity silicon tetrachloride or germanium tetrachloride from the resulting treated phase by fractional distillation. The treatment is carried out in a plasma reactor in which longitudinal axes of a dielectric, of a high-voltage electrode, and of a grounded, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.

Abstract: A process for reducing the poling field of congruent LiNbO3 and LiTaO3 crystal-based nonlinear optical devices and for the production of domain structures with precise reproducibility of the main parameters by depositing a thin layer of a stoichiometric LiNbO3 film on the Z-face of a congruent LiNbO3 or LiTaO3 wafer. A new domain nucleation, evolution and stabilization process is provided to afford a uniform, short period domain superstructure for the conversion of near infra-red light to near ultraviolet, blue and green light.

Abstract: A process for applying an oxidation resistant coating to an article includes the steps of mixing at least about 10% by volume to up to about 99% by volume of a slurry at least one silica based material having a viscosity of about 1×102 poise to about 1×107 poise at a temperature of about 1,292° F. (700° C.) to about 3,272° F. (1,800° C.) at least about 1% by volume to up to about 90% by volume of the slurry at least one oxygen scavenger, and a liquid medium to form the slurry; coating an article with the slurry to form a slurry coated article; and heat treating under an inert atmosphere the slurry coated article to form an article having at least one oxidation resistant coating layer containing the at least one oxygen scavenger.

Abstract: A coil is provided for use in a semiconductor processing system to generate a plasma with a magnetic field in a chamber. The coil comprises a first coil segment, a second coil segment and an internal balance capacitor. The first coils segment has a first end and a second end. The first end of the coil segment is adapted to connect to a power source. The second coil segment has a first and second end. The second end of the first coil segment is adapted to connect to an external balance capacitor. The internal balance capacitor is connected in series between the second end of the first coil segment and the first end of the second coil segment. The internal balance capacitor and the coil segments are adapted to provide a voltage peak along the first coil segment substantially aligned with a virtual ground along the second coil segment.

Abstract: A novel apparatus and method is disclosed for a plasmatron fuel converter (“plasmatron”) that efficiently uses electrical energy to produce hydrogen rich gas. The plasmatron has multiple decoupled gas flow apertures or channels for performing multiple functions including fuel atomization, wall protection, plasma shaping, and downstream mixing. In one aspect, the invention is a plasmatron fuel converter comprising a first electrode and a second electrode separated from the first electrode by an electrical insulator and disposed to create a gap with respect to the first electrode so as to form a discharge region adapted to receive a reactive mixture. A power supply is connected to the first and second electrodes and adapted to provide voltage and current sufficient to generate a plasma discharge within the discharge region. Fluid flows are established in the vicinity of the plasma discharge region by multiple decoupled flow establishing means.

Abstract: A device for measuring oxidation-reduction potential at operating temperature and pressure in hot water systems is disclosed and claimed. The device includes a flow-through cell, an oxidation-reduction potential probe, a temperature detector, and an external pressure-balanced reference electrode assembly. Each component of the device works in conjunction with the other components and each has electrical connections that transmit signals to a controller. The controller calculates and determines adjustments to feedwater chemistry for the hot water system.

Abstract: A method for processing a workpiece in a plasma reactor chamber includes coupling RF power at a first VHF frequency f1 to a plasma via one of the electrodes of the chamber, and providing a center ground return path for RF current passing directly between the ceiling electrode and the workpiece support electrode for the frequency f1. The method further includes providing a variable height edge ground annular element and providing a ground return path through the edge ground annular element for the frequency f1. The method controls the uniformity of plasma ion density distribution by controlling the distance between the variable height edge ground annular element and one of: (a) height of ceiling electrode or (b) height of workpiece support electrode.

Abstract: Apparatus and methods for electrochemically processing microfeature wafers. The apparatus can have a vessel including a processing zone in which a microfeature wafer is positioned for electrochemical processing. The apparatus further includes at least one counter electrode in the vessel that can operate as an anode or a cathode depending upon the particular plating or electropolishing application. The apparatus further includes a supplementary electrode and a supplementary virtual electrode. The supplementary electrode is configured to operate independently from the counter electrode in the vessel, and it can be a thief electrode and/or a de-plating electrode depending upon the type of process. The supplementary electrode can further be used as another counter electrode during a portion of a plating cycle or polishing cycle.

Abstract: A plasma source having a plasma chamber with metal chamber walls contains a process gas. A dielectric window passes a RF signal into the plasma chamber. The RF signal excites and ionizes the process gas, thereby forming a plasma in the plasma chamber. A plasma chamber liner that is positioned inside the plasma chamber provides line-of-site shielding of the inside of the plasma chamber from metal sputtered by ions striking the metal walls of the plasma chamber.

Abstract: A microfluidic device comprising a first surface portion and a first sample retaining element, which have differing affinities to a fluid, and a method comprising supplying a sample to such a device. In some embodiments, the differing affinity is a result of plasma, ion embedding, surface charging, chemical, optical, electronic and/or electromagnetic treatment. Also, a microfluidic device comprising at least one microcapillary device having a sample retaining element, at least one surface of which exhibits hydrophobicity, hydrophilicity, electromagnetic force exertion and electrostatic force exertion. Also, a microfluidic device comprising a first element having a hydrophilic pattern comprising at least a first sample retaining element. Also, a method comprising supplying a sample to a channel between a first element and a second element, and inducing in the first element at least one hydrophilic pattern by electrets or by internal or external electrodes to provide a charged surface.

Abstract: An apparatus and method are disclosed for producing nanoparticles in a dense fluid medium. The method is based on the formation of nanoparticles from nanoparticle precursors in a dense fluid medium in which a plasma discharge is created between electrodes submerged in the dense fluid medium. The electrodes define a plasma discharge zone between opposing electrode discharge faces and further define an internal cavitation zone into which a cavitation gas is released, creating bubbles in the dense fluid medium. The result is the efficient production of nanoparticles using a high-frequency, high-voltage electric field to react dense-phase precursors in an atmospheric pressure, low temperature environment.

Abstract: The invention described herein includes a screen printing process for depositing carbon electrodes including a method for selectively removing components that degrade the electrochemical performance from the surface of said carbon electrodes. In one embodiment of the present invention, the process includes applying a corona treatment to the carbon electrodes.

Abstract: Methods of using a plasma generator to ash a work piece is provided. In an exemplary embodiment, the method includes flowing gas that has a gaseous component able to form plasma under conditions of radio-frequency energy excitation into the container. A proportion of the gas is directed to a first region of the container to form a higher gas density in the first region of the container and a corresponding lower gas density in a second region of the container. Sufficient energy is applied to the gas in at least the first region to excite a proportion of the gaseous component able to form plasma.

Abstract: A method and apparatus for detecting arcs in a plasma processing system is disclosed. In one embodiment the apparatus comprises an input to receive a measured value of a parameter related to power transfer from the RF power generator to a plasma load; arc detection circuitry that computes a dynamic boundary about the value of the parameter; and controller logic responsive to the arc detection circuitry, wherein the controller logic indicates an occurrence of an arc within the plasma load if a subsequent value of the parameter exceeds the dynamic boundary.

Abstract: The invention of present application relates to a method for enabling a hybrid carbon nanotube having an arbitrary composition ratio to be readily manufactured, and the hybrid carbon nanotube. A method for manufacturing a hybrid carbon nanotube, which comprises immersing a carbon nanotube having open pores in a solution having a dopant substance dissolved therein to effect a doping reaction, thereby preparing a hybrid carbon nanotube comprising a carbon nanotube and a dopant substance introduced therein.

Abstract: An upstream plasma boundary layer shielding system includes film cooling apertures disposed through a wall having cold and hot surfaces and angled in a downstream direction from a cold surface of the wall to an outer hot surface of the wall. A plasma generator located upstream of the film cooling apertures is used for producing a plasma extending downstream over the film cooling apertures. Each plasma generator includes inner and outer electrodes separated by a dielectric material disposed within a groove in the outer hot surface. The wall may be part of a hollow airfoil or an annular combustor or exhaust liner. A method for operating the upstream plasma boundary layer shielding system includes forming a plasma extending in the downstream direction over the film cooling apertures along the outer hot surface of the wall. The method may further include operating the plasma generator in steady state or unsteady modes.

Abstract: A system and method for the removal of metals such as mercury from a gas stream. The method involves contacting a gas stream containing the target metals with reactive chemical species generated in a plasma device. The metal to be removed is chemically converted into forms enabling capture in either conventional particulate removal devices or in a wet scrubber for the capture of a soluble chemical species.

Abstract: An electrolytic water purification system and method use provides a water filtration device with a plurality of electrolytic cells having anodes and cathodes specifically selected to remove contaminants from water. The device is capable of efficiently removing nearly all contaminants from water and is also capable of purifying the water by destroying micro-organisms which are in the water. Many minerals are removed from the purified water, and it is not necessary to add chemicals to the water during or after the purification process.

Abstract: Exposing sludge to underwater, high-intensity sparks, to increase cake solids, provide faster settling, and increase the rate of dewatering.

Abstract: A method and apparatus for application of electrostatic charges to compounds to change the physical characteristics of the compounds. The compound is located within a container, that can be sealed or open, in proximity to an electrode so that there is capacitive coupling between the electrode and the compound. A high frequency, high voltage signal is applied to the electrode for a time sufficient to increase negative ions in the compound, thus changing its physical characteristics. The method can increase the pH and decreases oxidation-reduction potential. A grounded platform is provided for use with a non-conductive container, and the entire apparatus can be provided in a housing enclosure to permit safe application of electrical potential to the compound being treated.

Abstract: A method and system for material processing employing extracting equivalent fluxes of positive and negative ions at two surfaces from an ion-ion plasma without substantially altering the plasma potential. The extraction is achieved by applying a continuously applied bias to the substrate being processed, in order to attract the ions to the substrate surface to facilitate materials processing such as etching, deposition and chemical modification at the surface. The continuously applied bias is applied via a power source coupled to the plate, also referred to as a stage or chuck, holding the substrate.

Abstract: Methods and apparatus for operating plasmas are described. The vessel receives an oxygen containing plasma to clean and/or condition the vessel. Some embodiments of the invention feature methods and apparatus for improving ignition properties of the plasmas.

Abstract: A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.

Abstract: The present invention provides a microplasma jet generator capable of stably generating a microplasma jet in a microspace at atmospheric pressure with low electric power. The microplasma jet generator is driven with a VHF power supply to generate an inductively coupled microplasma jet and includes a substrate, a micro-antenna disposed on the substrate, and a discharge tube located close to the micro-antenna. The micro-antenna has a flat meandering shape with plural turns.

Abstract: Disclosed herein is a pumping line for a plasma dry etching device. The pumping line discharges charged ions or reactive byproducts generated after the etching process and includes a high frequency applying coil which circumferentially surrounds an outer wall of the pumping line, a high frequency generator connected to the high frequency applying coil, and a gas injecting port which injects a plasma reaction gas through one end of the pumping line to produce a plasma in the pumping line.

Abstract: A plasma processing apparatus includes a plasma processing chamber and a source of microwaves. The microwaves are introduced to the processing chamber by a slotted annular waveguide having inner and outer arc-shaped slots. The distance between the centerline of the inner and outer arc-shaped slots is set to be an even multiple of a half wavelength of a microwave surface wave propagating along a surface of a dielectric window of the chamber. A distance between the centerline of the outer arc-shaped slot and an outer periphery of the dielectric window is set to be an odd multiple of the half wavelength of the microwave surface wave.

Abstract: A plasma processing apparatus includes a high-frequency power supply applying a high-frequency power to at least any of plural electrodes; a direct-current power supply applying a direct-current voltage to at least any of the plural electrodes; a matching device provided between the electrode to which the high-frequency power is applied and the high-frequency power supply; and a control device controlling the high-frequency power supply such that the high-frequency power applied to the electrode is previously adjusted at a timing when the apply of the direct-current voltage to the electrode by the direct-current power supply is started or terminated, under a state in which the high-frequency power is applied to the electrode by the high-frequency power supply.

Abstract: A first RF voltage and a second RF voltage are applied to an RF electrode disposed opposite to an opposing electrode in a chamber of which the interior is evacuated under a predetermined vacuum condition from a first RF voltage applying device and a second RF voltage applying device, respectively. The second frequency of the second RF voltage is set to ½×n (n: integral number) of the first frequency of the first RF voltage through the phase control with a gate trigger device so that the first RF voltage is superimposed with the second RF voltage.

Abstract: Provided is a method for determining a zeta potential generated between a solid wall and a solution. The method includes (a) injecting an electrolyte solution into a first inlet of a T channel, which is provided with first and second inlet electrodes and a grounded outlet electrode, and a mixed solution of the electrolyte solution and a fluorescent dye into a second channel of the T channel and maintaining a steady-state of the two solutions; (b) applying a direct current electric field from the first and second electrodes to the outlet electrode to form an interface between the electrolyte solution and the mixed solution; (c) applying an alternating current electric field from one of the two inlet electrodes to the outlet electrode to oscillate the interface; and (d) measuring an amplitude of oscillation of the interface and determining the zeta potential from the standard relationship between the zeta potential and the amplitude.

Abstract: A system for exposing a target material to small particles. The system includes an exposure chamber that receives the target material. A stream of charged particles is directed via an inlet into the exposure chamber toward the target material. One or more electrodes are located relative to the target material and the inlet, and are electrically charged, so as to cause at least some of the charged particles to impact upon the target material. The system can be used to expose the target material to small, for example, nanoscale, particles in a gas environment.

Abstract: A method of manufacturing a liquid medium containing composite ultrafine particles comprises the steps of preparing a dispersion medium that is a liquid medium in which ultrafine particles of different materials from each other are dispersed, introducing the dispersion medium into first and second chambers, respectively, applying high frequency voltage to the chambers and exciting dispersion media, applying direct current voltage to each dispersion medium on the downstream side than the applying position of the high frequency voltage and electrifying these in different polarities from each other, and aggregating/bonding by means of excitation transfer as well as electrostatically aggregating ultrafine particles each other in the liquid medium in the crashing field by injecting the dispersion media electrified in different polarities from each other through two nozzle sections at a high speed, and crossing/crashing each other.

Abstract: A method and system for electrically wounding and/or monitoring cell activity in vitro. The invention comprises methods and systems for wounding and/or monitoring cells that place a cell culture on a well that has an exposed electrode. The cell culture can then be wounded and/or monitored using the electrode.

Abstract: This invention relates to a fuel reforming apparatus for producing a carbon-monoxide free reformed fuel gas comprising hydrogen. More particularly, this invention relates to nonthermal plasma reactors for removing carbon monoxide from a reformed fuel gas produced from a fuel containing bonded atoms of hydrogen exiting a reformer. More particularly, this invention relates to nonthermal plasma reactors for reforming a fuel containing bonded atoms of hydrogen into a reformed fuel gas. This invention relates further to hydrogen-oxygen fuel cells, which comprise a fuel reformer for reforming a fuel into a reformed fuel gas comprising hydrogen, a carbon monoxide remover for removing carbon monoxide in the reformed fuel gas and supplying the reformed fuel gas to the fuel cell.

Abstract: A process reduces SOx emissions in a flue gas stream by adding a wet collector plate section to an existing electrostatic precipitator (ESP) or by converting the last field of an existing ESP to wet operation. To achieve the conversion, the last field or fields of an existing dry ESP are removed and replaced with components made from materials suitable for operation in a wet environment. After the ESP contains wet operation, ammonia is added to the flue gas stream while it is progressing through the collection plates in the ESP.

Abstract: The invention is directed to devices and methods that allow for simultaneous multiple biochip analysis. The method of analyzing the plurality of biochips includes inserting a first biochp into a first station of an analysis device, inserting a second biochip into a second station of the analysis device, wherein each of the first and second biochips include a substrate, the substrates including an array of detection electrodes, each electrode including a different capture binding ligand, a different target analyte, and a label, and a plurality of electrical contracts, detecting current as an indication of the presence of the labels on the first biochip, and detecting current as an indication of the presence of the labels on the first second biochip. The devices and method may be used with multiple cartridges comprising biochips comprising arrays, such as nucleic acid arrays, and allow for high throughput analysis of samples.

Abstract: A method and apparatus for forming a chemical hydride is described and which includes a pseudo-plasma-electrolysis reactor which is operable to receive a solution capable of forming a chemical hydride and which further includes a cathode and a movable anode, and wherein the anode is moved into and out of fluidic, ohmic electrical contact with the solution capable of forming a chemical hydride and which further, when energized produces an oxygen plasma which facilitates the formation of a chemical hydride in the solution.

Abstract: A pulsed gliding arc discharge (PGD) reactor includes an ignition coil driven by a pulse generator which is connected to a pair of divergent electrodes fixed by a reactor housing with a fluid inlet and outlet. Hydrogen peroxide and dye degradation can be carried out with a PGD reactor according to the invention with efficiencies that are more than two orders of magnitude greater than a conventional ACG reactor based on the calculated specific energy yield.

Abstract: A novel plasma reactor is provided that includes a discharge chamber with dimensional characteristics and configuration of dielectric and electrodes that optimize efficiency based on the characteristics of the corona discharge streamers generated. Upon application of a pulsed high voltage potential, the discharge chamber enables formation of plasma where surface streamers play a greater role in the overall energy density of the discharge chamber than gas streamers. The formation of gas streamers is constrained. Because surface streamers have a higher energy density, the present invention is able to achieve improved energy efficiency while preserving effectiveness for gas treatment.

Abstract: A method is provided, the method comprising operating a field emitter array (FEA) to generate at least one of a high electric field and a high electron flux, and exposing the field emitter array (FEA) to at least one gas. The method further comprises generating at least one radical species from the at least one gas exposed to the at least one of the high electric field and the high electron flux.

Abstract: Disclosed is a novel method for steam reforming, by which selectivity to carbon monoxide is high, which is free from various side reactions, which may be carried out at a lower temperature and at a lower pressure than the conventional methods, and which may be carried out even if a catalyst is not used. In the method of the present invention, direct current pulse discharge is performed in a mixed gas containing a gaseous chain hydrocarbon and water vapor so as to react the chain hydrocarbon and the water vapor, thereby generating hydrogen and carbon monoxide.

Abstract: The nitric oxide (NO) and nitrogen dioxide (NO2) content of lean-burn engine exhaust is beneficially prepared for selective catalytic reduction (SCR) of these oxides to nitrogen by two sidestream additions to the exhaust. An ozone-containing air stream is added to the exhaust to affect oxidation of NO to NO2. And a hydrocarbon(s) fuel constituent is added to a second humidified ozone-containing air stream and that mixture subjected to UV radiation. Strongly oxidizing hydroxyl radicals are formed by interaction of ozone, water, and UV radiation for reaction with the hydrocarbon. The resulting partially oxidized hydrocarbons (Pox) are added to the exhaust, providing effective reduction materials for the SCR of NO2 to nitrogen and water.

Abstract: A device for treating a substance containing at least one undesirable organism, using a pulsed electrical field. The device includes at least one treatment zone of the substance located within a passage zone associated with the substance. Each treatment zone is only partially located within the associated passage zone. The device also includes a mechanism to create movement for displacing each treatment zone of the substance in the entire associated passage zone.

Abstract: The subject invention pertains to a method of spark processing silicon and resulting materials. The subject invention also relates to electroluminescent devices incorporating the materials produced by the subject method. The subject method for spark-processing can enhance the EL output, as compared with conventional spark-processed (sp) silicon. The enhancement of EL output can be due, at least in part, to increasing the light emitting area. The subject method can smooth the sp surface, so as to allow more complete coverage of the sp area with a continuous, semitransparent, conducting film. The smoothening of the sp surface can be accomplished by, for example, introducing into the spark plasma a volatile liquid, such as methanol, ethanol, acetone, in which particles can be suspended and/or in which a heavy ion salt is dissolved. The particles preferably float in the volatile liquid, rather than settle quickly. In a specific embodiment, silicon particles in the range of about 0.

Abstract: A reverse osmosis system is subject to long periods of non-use in which water stands inside. A hollow-cylindrical spiral-wound type reverse osmosis membrane is disposed inside a cylindrical pressure vessel. An electrostatic-field generator is disposed inside the pressure vessel. A high voltage direct current source powers the electrostatic-field generator and a voltage gradient is constantly produced inside the volume of the pressure vessel. Such gradients cut through the fabric of the reverse osmosis membrane layers. The voltage to the electrostatic-field generator is kept on at all times, and prevents biofouling, even during lay-up periods. Current flow through the electrostatic-field generator is insignificant because it acts as a high-Z capacitor.

Abstract: This invention is to a process and system for controlling solids distribution in a gas-solids reactor. Solids distribution is controlled by controlling electrical charges between solid particles flowing between conductive surfaces within a gas-solids reactor. The electrical charges are controlled by conventional means such as by grounding the opposing conductive surfaces, or by applying a voltage to one of the opposing conductive surfaces.

Abstract: The present invention is a method of increasing particle surface area and decreasing the concentration of over-sized particles in a process for making metal oxide particles, particularly nanoparticle TiO2, in an inlet-fed, plug flow, plasma reactor by vapor phase reaction of titanium tetrachloride and oxygen in the presence of a source of hydrogen to form titanium dioxide particles.

Abstract: In the field of transformation of material there is a device for producing a plasma, a method for ionizing material using the device, uses of the inventive method and production processes using the device. The device includes a resonant chamber, an acoustic chamber provided with an acoustic device and a soliton chamber for receiving the treated material coming from the resonant chamber while simultaneously generating a recycling of outside air. The soliton chamber defines, with a pulsating suction member adjacent to the output of the soliton chamber, a space producing ionized material.