Electrostatic Field Or Electrical Discharge Patents (Class 204/164)
-
Patent number: 10629413Abstract: Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having multiple states. The pulsed signal is received by multiple radio frequency (RF) generators. When the pulsed signal having a first state is received, an RF signal having a pre-set power level is generated by a first RF generator and an RF signal having a pre-set power level is generated by a second RF generator. Moreover, when the pulsed signal having a second state is received, RF signals having pre-set power levels are generated by the first and second RF generators. Furthermore, when the pulsed signal having a third state is received, RF signals having pre-set power levels are generated by the first and second RF generators.Type: GrantFiled: July 26, 2016Date of Patent: April 21, 2020Assignee: Lam Research CorporationInventors: John C. Valcore, Jr., Bradford J. Lyndaker
-
Patent number: 10610849Abstract: The present invention relates to a device for generating cold plasma to be used in the process chemical industry, in particular for producing chemical substances, above all acids such as for example nitric acid and sulphuric acid. The invention also relates to reactors and plants involving said cold plasma generator device and to corresponding chemical processes based thereupon. The device and the associated method of the present invention allow producing with high efficiency several chemical substances, in particular acids. The invention also keeps the several advantages of using the cold plasma technology, in particular the one of not requiring catalysts and/or high reaction temperatures.Type: GrantFiled: April 10, 2014Date of Patent: April 7, 2020Assignee: Amlika Mercantile Private LimitedInventor: Aldo Mango
-
Patent number: 10559481Abstract: Provided are a plasma processing apparatus with a radio-frequency power supply supplying temporally modulated intermittent radio-frequency power which can be controlled with high precision in a wide repetition frequency band, and a plasma processing method using the plasma processing apparatus. A plasma processing apparatus includes: a vacuum vessel; a plasma generating section plasma in the vacuum vessel; a stage installed in the vacuum vessel and mounted with a sample; and a radio-frequency power supply applying temporally modulated intermittent radio-frequency power to the stage, wherein the radio-frequency power supply has two or more different frequency bands and temporally modulates the radio-frequency power by a repetition frequency which has the same range of analog signals used in each of the frequency band.Type: GrantFiled: February 29, 2016Date of Patent: February 11, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Michikazu Morimoto, Yasuo Ohgoshi, Yuuzou Oohirabaru, Tetsuo Ono
-
Patent number: 10549302Abstract: An operating method of a processing liquid supply apparatus which supplies a processing liquid to a substrate from a processing liquid supply path via a nozzle includes measuring a surface potential of a first electrode which is configured to be in contact with the processing liquid of the processing liquid supply path. The operating method further includes displaying the measured surface potential in the measuring of the surface potential of the first electrode.Type: GrantFiled: March 6, 2018Date of Patent: February 4, 2020Assignee: TOKYO ELECTRON LIMITEDInventor: Hitoshi Hashima
-
Patent number: 10543457Abstract: Systems, methods, and apparatus are contemplated in which a tube cell that produces a dielectric barrier discharge (DBD) is individually configured to minimize the mixing of unwanted byproducts of the generated plasma with an exhaust air stream. The tube cell generates a DBD within a tube cell, such that oxidants or radicals are generated in an environment substantially separated from the exhaust stream. The generated oxidants are directed to intersect with the exhaust stream to minimize the generation of unwanted byproducts. The tube cells are further shaped and arranged in tube cell arrays to alter the flow dynamics of the exhaust stream and the oxidant or radical streams, including mixing of the streams.Type: GrantFiled: October 18, 2018Date of Patent: January 28, 2020Assignee: ThrivalTech, LLCInventor: Garrett Hill
-
Patent number: 10524341Abstract: An electrostatic dissipation device 10 can comprise an elongated enclosure 11 with a longitudinal axis 12. An x-ray source 13 can be oriented to emit x-rays 16 inside of and along the longitudinal axis 12. A fluid-flow device 14 can be oriented to cause fluid to flow across the x-ray source 13 then inside of and along the longitudinal axis 12, the fluid being ionized by the x-rays 16, forming ionized fluid, then out of the elongated enclosure through outlet opening(s) 15. The arrangement of the x-ray source 13 and the fluid-flow device 14 can allow (1) fluid from the fluid-flow device 14 to cool the x-ray source 13, and (2) ion generation along the length of the elongated enclosure 11.Type: GrantFiled: January 17, 2017Date of Patent: December 31, 2019Assignee: Moxtek, Inc.Inventors: Eric Miller, Steven West Wilson
-
Patent number: 10507608Abstract: The invention concerns polyamide moulding compound, in particular for producing heat-resistant moulded parts, having the following composition: (A) 20 to 79 wt. % of at least one partially aromatic polyamide in the form of a copolyamide which comprises 50 to 80 mol. % units formed by hexanediamine and terephthalic acid; (B) 1 to 15 wt. % of at least one impact-resistant modifier; (C) 20 to 60 wt. % of at least one carbon fibre; and (D) 0 to 5 wt. % of at least one additive, components (A) to (D) adding up to 100 wt. %.Type: GrantFiled: November 12, 2014Date of Patent: December 17, 2019Assignee: EMS-PATENT AGInventors: Nikolai Lamberts, Bernd Henkelmann, Philipp Harder
-
Patent number: 10504701Abstract: Disclosed is an apparatus and method of processing substrate, wherein the apparatus comprises a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the process chamber, and is rotated at a predetermined direction; a chamber lid confronting with the substrate supporter, the chamber lid for covering the process chamber; and a gas distributor having a plurality of gas distribution modules for distributing gas to the substrate, wherein the plurality of gas distribution modules are connected to the chamber lid, wherein each of the gas distribution modules includes a power source electrode and a ground electrode confronting each other, a plasma discharge space is formed between the power source electrode and the ground electrode, and the plasma discharge space is not overlapped with a thin film formation region of the substrate supported by the substrate supporter.Type: GrantFiled: July 31, 2017Date of Patent: December 10, 2019Assignee: JUSUNG ENGINEERING CO., LTD.Inventors: Jeung Hoon Han, Chul Joo Hwang, Seung Hoon Seo, Sang Don Lee
-
Patent number: 10494719Abstract: The disclosure relates to microwave cavity plasma reactor (MCPR) apparatus and associated tuning and process control methods that enable the microwave plasma assisted chemical vapor deposition (MPACVD) of a component such as diamond. Related methods enable the control of the microwave discharge position, size and shape, and enable efficient matching of the incident microwave power into the reactor prior to and during component deposition. Pre-deposition tuning processes provide a well matched reactor exhibiting a high plasma reactor coupling efficiency over a wide range of operating conditions, thus allowing operational input parameters to be modified during deposition while simultaneously maintaining the reactor in a well-matched state.Type: GrantFiled: May 22, 2015Date of Patent: December 3, 2019Assignee: BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITYInventors: Jes Asmussen, Jing Lu, Yajun Gu, Shreya Nad
-
Patent number: 10471647Abstract: This invention concerns a process for producing a printable film comprising: providing a web of film; at a first location subjecting at least a first surface of the film web to a modified atmosphere dielectric barrier discharge (MADBD) treatment; winding the film web onto a reel; transporting the wound film web to a second location; unwinding the film web from the reel; and subjecting the first surface of the film to corona treatment. The invention also concerns printed films obtainable by the process of the invention, and articles of packaging and/or labeling made from such films.Type: GrantFiled: September 27, 2012Date of Patent: November 12, 2019Assignee: INNOVIA FILMS LIMITEDInventors: Simon James Read, David Carruthers
-
Patent number: 10443117Abstract: A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank.Type: GrantFiled: June 3, 2016Date of Patent: October 15, 2019Assignee: IHI CorporationInventors: Norimitsu Kameya, Kenji Fuchigami
-
Patent number: 10441608Abstract: This invention relates generally to novel methods and novel devices for the continuous manufacture of nanoparticles, microparticles and nanoparticle/liquid solution(s). The nanoparticles (and/or micron-sized particles) comprise a variety of possible compositions, sizes and shapes. The particles (e.g., nanoparticles) are caused to be present (e.g., created and/or the liquid is predisposed to their presence (e.g., conditioned)) in a liquid (e.g., water) by, for example, preferably utilizing at least one adjustable plasma (e.g., created by at least one AC and/or DC power source), which plasma communicates with at least a portion of a surface of the liquid. At least one subsequent and/or substantially simultaneous adjustable electrochemical processing technique is also preferred. Multiple adjustable plasmas and/or adjustable electrochemical processing techniques are preferred.Type: GrantFiled: June 30, 2016Date of Patent: October 15, 2019Assignee: Clene Nanomedicine, Inc.Inventors: David Kyle Pierce, Mark G. Mortenson, David A. Bryce
-
Patent number: 10428455Abstract: A method of treating a substrate, comprising providing a substrate having a generally sheet or planar form or a fiber or yarn form; providing a colorant to be set at the surface of the substrate; and subjecting the substrate and colorant to reactive species from a plasma generated by an atmospheric plasma apparatus until the colorant is set at the surface of the substrate. A method of setting a colorant on a substrate, comprising performing an etch operation, or plasma pre-treatment to change surface charge, on a substrate using a plasma, particularly a plasma generated at atmospheric conditions, to create a desired surface texture, or surface charge, at the surface of substrate; and depositing a colorant on the surface under plasma or non-plasma conditions; and allowing the colorant to set at the surface of the substrate.Type: GrantFiled: December 5, 2014Date of Patent: October 1, 2019Assignee: The North Face Apparel Corp.Inventors: Justin Lee Gladish, Mary-Ellen Smith, Graham C. Page
-
Patent number: 10388984Abstract: A method for producing a graphite powder for a negative electrode of a lithium ion secondary battery, including a process of graphitizing a mixture of a carbon raw material powder and a silicon carbide powder, wherein a 90% particle diameter in a volume-based cumulative particle size distribution by laser diffraction method, D90, is 1 to 40 ?m, a silicon carbide content in a total mass of a carbon raw material and silicon carbide (mass of silicon carbide/total mass of the carbon raw material and silicon carbide) is 1 to 35 mass %, the ratio of a 50% particle diameter in a volume-based cumulative particle size distribution by laser diffraction method, D50, of the carbon raw material powder to D50 of silicon carbide powder (D50 of the carbon raw material powder/D50 of silicon carbide powder) is 0.40 to 4.0.Type: GrantFiled: May 10, 2016Date of Patent: August 20, 2019Assignee: SHOWA DENKO K.KInventors: Yasuaki Wakizaka, Yoshikuni Sato, Daisuke Miyamoto
-
Patent number: 10342112Abstract: A linear flexible plasma generator having a function of cooling and temperature control. More efficient power control is possible, since a temperature of an electrode itself can be controlled in a state when plasma is discharged. In addition, since a temperature of the electrode surface can be decreased, use for the purposes of sterilization, neutralization, treatment, beauty treatment, and so on is possible.Type: GrantFiled: March 28, 2018Date of Patent: July 2, 2019Assignee: AGENCY FOR DEFENSE DEVELOPMENTInventor: Hee-Soo Jung
-
Patent number: 10294383Abstract: The invention provides articles and methods for making such articles including a substrate coated on at least one region thereof with a layer of nanocomposites nano-cellulose materials and nanoparticles.Type: GrantFiled: March 6, 2018Date of Patent: May 21, 2019Assignee: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.Inventors: Oded Shoseyov, Yossef Paltiel, Shira Yochelis, Sigal Baruch-Sharon, Yuval Nevo
-
Patent number: 10273349Abstract: Fibers for fiber-reinforced resin of the present invention are fibers for fiber-reinforced resin to which a sizing agent is adhered. The fibers are at least one selected from carbon fibers and glass fibers, and an ester bond (—COO—) generated by denaturation of the sizing agent is present on surfaces of the fibers. A method for producing the same according to the present invention includes: subjecting fibers to which a sizing agent is adhered to at least one treatment selected from the group consisting of ozone oxidation, ultraviolet irradiation at a wavelength of 400 nm or less, and a plasma treatment. The fibers are at least one selected from carbon fibers and glass fibers. Thus, it is possible to provide carbon fibers having enhanced wettability to a matrix resin and thereby allowing the matrix resin to be impregnated between the fibers easily.Type: GrantFiled: March 11, 2014Date of Patent: April 30, 2019Assignee: KURASHIKI BOSEKI KABUSHIKI KAISHAInventors: Masamichi Ito, Tadaharu Tanaka, Wataru Horimoto
-
Patent number: 10269545Abstract: Methods for operating a plasma processing chamber are provided. One example method includes processing a substrate in the plasma processing chamber under vacuum. The processing of said substrate produces particulate residues that adhere to surfaces within an internal region of the plasma processing chamber. The method includes characterizing performance of the processing of the substrate and inspecting an internal region of the plasma processing chamber after processing said substrate without breaking said vacuum. The inspecting is configured to identify characteristics of said particulate residues on one or more surfaces of the internal region of the plasma processing chamber. The inspecting includes capturing optical data of said one or more surfaces. The method further includes generating a tool model to correlate the characterized performance of the processing of the substrate to the characterized particulate residues.Type: GrantFiled: July 21, 2017Date of Patent: April 23, 2019Assignee: Lam Research CorporationInventor: Richard Alan Gottscho
-
Patent number: 10266940Abstract: In some embodiments a method of depositing a metal-containing layer atop a substrate disposed in a physical vapor deposition (PVD) chamber includes: providing a plasma forming gas to a processing region of the PVD chamber; providing a first amount of RF power to a target assembly disposed opposite the substrate to form a plasma within the processing region of the PVD chamber; sputtering source material from the target assembly to deposit a metal-containing layer onto the substrate, wherein the source material is at a first erosion state; and tuning an auto capacitance tuner coupled to a substrate support while sputtering source material to maintain an ion energy at a surface of the substrate within a predetermined range as the target erodes from the first erosion state to a second erosion state.Type: GrantFiled: February 22, 2016Date of Patent: April 23, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Zhenbin Ge, Vivek Gupta, Adolph Miller Allen, Ryan Hanson
-
Patent number: 10260145Abstract: A film formation apparatus includes a chamber that is a sealed container in which a target formed of a film formation material is placed, and into which the workpiece is carried, a gas discharging unit discharging a gas in the sealed container for a predetermined time period after the workpiece is carried into the chamber to obtain a base pressure, and a sputter gas introducing unit introducing a sputter gas containing oxygen to the interior of the chamber having undergone the discharging and becoming the base pressure. The sputter gas introducing unit decreases an oxygen partial pressure in the sputter gas to be introduced in the chamber in accordance with an increase in the base pressure due to an increase of the film formation material sticking to the interior of the chamber.Type: GrantFiled: March 17, 2017Date of Patent: April 16, 2019Assignee: Shibaura Mechatronics CorporationInventor: Daisuke Ono
-
Patent number: 10211032Abstract: A microwave plasma source radiating a microwave in a chamber of a plasma processing apparatus to generate surface wave plasma includes a microwave output unit configured to generate and output a microwave, a microwave supply unit configured to transmit the microwave output from the microwave output unit, and a microwave radiation member configured as a ceiling wall of the chamber and configured to radiate the microwave supplied from the microwave supply unit into the chamber. The microwave supply unit includes microwave introduction mechanisms provided along a circumferential direction, thereby introducing the microwave to the microwave radiation member. The microwave radiation member includes slot antennas having slots through which the microwave is radiated and a microwave transmission member. The slots are provided to form a circular shape as a whole. The microwave transmission member provided to form a circular ring shape.Type: GrantFiled: December 10, 2014Date of Patent: February 19, 2019Assignee: TOKYO ELECTRON LIMITEDInventors: Tomohito Komatsu, Taro Ikeda, Yutaka Fujino
-
Patent number: 10137427Abstract: The present invention relates to a nanoparticle preparation device using laser, and more particularly, the nanoparticle preparation device using the laser wherein the nanoparticles prepared by irradiating the laser beam to the source material gas within the reaction chamber are recovered without being oxidized by blocking the air or moisture within the glove box in which the nitrogen atmosphere is maintained, and thus the nanoparticles are efficiently collected without oxidation.Type: GrantFiled: October 15, 2015Date of Patent: November 27, 2018Assignee: SHONANO CO., LTDInventor: Won Il Cho
-
Patent number: 10105673Abstract: A treatment liquid production device includes a first tank; a first plasma generating device that includes a first pair of electrodes and a first power supply, the first power supply applying a voltage between the first pair of electrodes, the first plasma generating device generating plasma in a liquid in the first tank; a second tank; a second plasma generating device that includes a second pair of electrodes and a second power supply, the second power supply applying a voltage between the second pair of electrodes, the second plasma generating device generating plasma in a liquid in the second tank; and a controller operative to produce a first treatment liquid having a high initial oxidizing power during a first period and a second treatment liquid having a high remaining oxidizing power during a second period which is longer than the first period.Type: GrantFiled: May 28, 2015Date of Patent: October 23, 2018Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Katsumi Imada, Mariko Miyashita, Yoshiko Miyamoto
-
Patent number: 10101087Abstract: A method and process system of comprehensively utilizing high-temperature slag balls exiting a rotary kiln in a kiln process for producing phosphoric acid, comprising a rotary kiln, a cooling device and a dryer for composite green pellets in a kiln process for producing phosphoric acid, wherein the cooling device comprises at least two cooling stages; the high-temperature slag balls are first conveyed to the cooling device, then the cooling device carries slag balls successively to multiple cooling stages by the movement of a trolley, each cooling stage introduces cold air for cooling, a part of the hot air after cooling is sent to the cavity of the rotary kiln, and the other part thereof is sent to the dryer for composite green pellets in the kiln process for producing phosphoric acid for drying.Type: GrantFiled: December 3, 2015Date of Patent: October 16, 2018Assignee: SICHUAN KO CHANG TECHNOLOGY CO., LTD.Inventors: Yonghe Hou, Jiabin Wang, Shenghui Lei, Jing Li
-
Patent number: 10103123Abstract: Various embodiments provide a semiconductor device, including a final metal layer having a top side and at least one sidewall; and a passivation layer disposed over at least part of at least one of the top side and the at least one sidewall of the final metal layer; wherein the passivation layer has a substantially uniform thickness.Type: GrantFiled: March 10, 2017Date of Patent: October 16, 2018Assignee: Infineon Technologies AGInventors: Michael Rogalli, Wolfgang Lehnert
-
Patent number: 10058895Abstract: A technique relates sorting entities. The entities are introduced into a nanopillar array. The entities include a first population and a second population, and the nanopillar array includes nanopillars arranged to have a gap separating one from another. The nanopillars are ordered to have an array angle relative to a fluid flow direction. The entities are sorted through the nanopillar array by transporting the first population of the entities less than a predetermined size in a first direction and by transporting the second population of the entities at least the predetermined size in a second direction different from the first direction. The nanopillar array is configured to employ the gap with a gap size less than 300 nanometers in order to sort the entities having a sub-100 nanometer size.Type: GrantFiled: April 27, 2015Date of Patent: August 28, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Yann A. Astier, Joshua T. Smith, Gustavo A. Stolovitzky, Chao Wang, Benjamin H. Wunsch
-
Patent number: 10052404Abstract: The invention provides a biocompatible component having a surface intended for contact with living tissue, wherein the surface comprises particles of metal oxide, said particles having an average particle size of less than 100 nm.Type: GrantFiled: May 10, 2012Date of Patent: August 21, 2018Assignee: Dentsply Sirona Inc.Inventors: Elisabet Ahlberg, Ingela Mattisson, Johanna Löberg
-
Patent number: 10046989Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.Type: GrantFiled: April 23, 2015Date of Patent: August 14, 2018Assignee: Advanced Diamond Technologies, Inc.Inventors: Ian Wakefield Wylie, Prabhu U. Arumugam, Hongjun Zeng, John Arthur Carlisle
-
Patent number: 10035192Abstract: This invention relates generally to novel methods and novel devices for the continuous manufacture of nanoparticles, microparticles and nanoparticle/liquid solution(s) (e.g., colloids). The nanoparticles (and/or micron-sized particles) comprise a variety of possible compositions, sizes and shapes. The particles (e.g., nanoparticles) are caused to be present (e.g., created and/or the liquid is predisposed to their presence (e.g., conditioned)) in a liquid (e.g., water) by, for example, preferably utilizing at least one adjustable plasma (e.g., created by at least one AC and/or DC power source), which plasma communicates with at least a portion of a surface of the liquid. At least one subsequent and/or substantially simultaneous adjustable electrochemical processing technique is also preferred. Multiple adjustable plasmas and/or adjustable electrochemical processing techniques are preferred. Processing enhancers can be utilized alone or with a plasma. Semicontinuous and batch processes can also be utilized.Type: GrantFiled: August 25, 2014Date of Patent: July 31, 2018Assignee: Clene Nanomedicine, Inc.Inventors: David Kyle Pierce, Mark Gordon Mortenson, David Andrew Bryce, Adam Robert Dorfman, Mikhail Merzliakov, Arthur Maxwell Grace
-
Patent number: 10037832Abstract: The separation of single-walled carbon nanotubes (SWNTs), by electronic type using centrifugation of compositions of SWNTs and surface active block copolymers in density gradient media.Type: GrantFiled: May 18, 2015Date of Patent: July 31, 2018Assignee: Northwestern UniversityInventors: Mark C. Hersam, Alexander L. Antaris, Alexander A. Green
-
Patent number: 10036990Abstract: An image forming system includes: an image forming unit that forms a toner image on a sheet; a post-processing unit that performs post-processing to the sheet; a conveying unit that conveys the sheet from the image forming unit to the post-processing unit; a discharge member that is arranged between the image forming unit and the post-processing unit in a sheet conveying direction, and discharges static electricity from the sheet conveyed by the conveying unit; a voltage applying unit that applies to the discharge member a discharge voltage for discharging static electricity from the sheet; and a control unit that accelerates a conveying speed of the sheet when the discharge voltage is applied by the voltage applying unit, and controls the conveying unit to vary acceleration timing for accelerating the conveying speed of the sheet in accordance with a type of the post-processing.Type: GrantFiled: November 17, 2016Date of Patent: July 31, 2018Assignee: KONICA MINOLTA, INC.Inventor: Yuki Adachi
-
Patent number: 10023470Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.Type: GrantFiled: April 25, 2016Date of Patent: July 17, 2018Assignee: EVONIK DEGUSSA GMBHInventors: Imad Moussallem, Juergen Erwin Lang, Hartwig Rauleder, Martin Trocha, Nicole Brausch
-
Patent number: 10000709Abstract: A hydrocarbon resource processing device may include a radio frequency (RF) source and an RF applicator coupled to the RF source. The RF applicator may include a base member being electrically conductive, and first and second elongate members being electrically conductive and having proximal ends coupled to the base member and extending outwardly therefrom in a generally parallel spaced apart relation. The first and second elongate members may have distal ends configured to receive the hydrocarbon resource therebetween. In another embodiment, the RF applicator may include an enclosure being electrically conductive and having a passageway therethrough to accommodate a flow of the hydrocarbon resource and a divider being electrically conductive and positioned within the enclosure.Type: GrantFiled: June 2, 2016Date of Patent: June 19, 2018Assignee: HARRIS CORPORATIONInventor: Francis Eugene Parsche
-
Patent number: 9984860Abstract: An apparatus and methods to increase and direct the spatial volume of atmospheric pressure plasma jets. One or more additional gas flows is introduced to intersect the plasma jet. As the plasma jet interacts with these additional gas flows, the direction of propagation of the plasma jet is altered, the plasma expands into the volume defined by the additional gas flow, and the volume and effective surface area of the plasma jet increases accordingly, while the power increase needed to drive the increase in plasma volume scales sub-linearly with the increase in volume.Type: GrantFiled: October 27, 2017Date of Patent: May 29, 2018Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Scott G. Walton, David R. Boris, Tzvetelina Petrova, Eric D. Gillman
-
Patent number: 9975147Abstract: A technique relates sorting entities. The entities are introduced into a nanopillar array. The entities include a first population and a second population, and the nanopillar array includes nanopillars arranged to have a gap separating one from another. The nanopillars are ordered to have an array angle relative to a fluid flow direction. The entities are sorted through the nanopillar array by transporting the first population of the entities less than a predetermined size in a first direction and by transporting the second population of the entities at least the predetermined size in a second direction different from the first direction. The nanopillar array is configured to employ the gap with a gap size less than 300 nanometers in order to sort the entities having a sub-100 nanometer size.Type: GrantFiled: June 24, 2015Date of Patent: May 22, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Yann A. Astier, Joshua T. Smith, Gustavo A. Stolovitzky, Chao Wang, Benjamin H. Wunsch
-
Patent number: 9943871Abstract: An electrode rod 71 serving as a first electrode is provided to be in contact with a flow path member and a processing liquid of a processing liquid supply path 2. If the processing liquid is flown in the processing liquid supply path 2, static electricity is generated by friction so that the processing liquid and the flow path member is electrically charged. By allowing the electrode rod 71 to be closely contacted with the flow path member, the amount of electric charges corresponding to the sum of the charge amounts of the processing liquid and the flow path member is measured as a surface potential of the first electrode by a surface potential measuring unit 77. The measured surface potential is displayed on a display unit 201.Type: GrantFiled: September 26, 2016Date of Patent: April 17, 2018Assignee: TOKYO ELECTRON LIMITEDInventor: Hitoshi Hashima
-
Patent number: 9942986Abstract: Components may have substrates with metal traces that form mating contacts. The components may be bonded together using anisotropic conductive adhesive bonding techniques. During bonding, conductive particles may be concentrated over the contacts by application of magnetic or electric fields or by using a template transfer process. Gaps between the contacts may be at least partially free of conductive particles to help isolate adjacent contacts. Polymer between the substrates may attach the substrates together. The conductive particles may be embedded in the polymer and crushed or melted to short opposing contacts together.Type: GrantFiled: January 6, 2017Date of Patent: April 10, 2018Assignee: Apple Inc.Inventors: Koohee Han, Hui Chen, Kuo-Hua Sung, Cyrus Y. Liu, To C. Tan
-
Patent number: 9932258Abstract: An apparatus and process for making glass and glass gobs on demand. A sheet of molten glass is provided in a staging section. The sheet of molten glass is held within the staging section when there is no demand for glass articles. When there is a demand for production of glass articles, a portion of the sheet of molten glass is flowed into a gob forming section.Type: GrantFiled: April 17, 2014Date of Patent: April 3, 2018Assignee: Owens-Brockway Glass Container Inc.Inventor: Terence J Clark
-
Patent number: 9926420Abstract: Hydrophilic fluoroplastic substrates and methods of making hydrophilic fluoroplastic substrates from 4-acryloylmorpholine are disclosed.Type: GrantFiled: June 4, 2014Date of Patent: March 27, 2018Assignee: 3M Innovative Properties CompanyInventors: Robert S. Clough, Wenli Wang
-
Patent number: 9926195Abstract: The present teachings provide methods for providing populations of single-walled carbon nanotubes that are substantially monodisperse in terms of diameter, electronic type, and/or chirality. Also provided are single-walled carbon nanotube populations provided thereby and articles of manufacture including such populations.Type: GrantFiled: December 3, 2010Date of Patent: March 27, 2018Assignee: Northwestern UniversityInventors: Michael S. Arnold, Mark C. Hersam, Samuel I. Stupp
-
Patent number: 9922851Abstract: A wafer bonding method includes placing a top wafer on a top bonding framework including a plurality of outlet holes around a periphery of the top bonding framework. A bottom wafer is placed on a bottom bonding framework that includes a plurality of inlet holes around a periphery of the bottom bonding framework. The top bonding framework is in overlapping relation to the bottom bonding framework such that a gap exist between the top wafer and the bottom wafer. A gas stream is circulated through the gap between the top wafer and the bottom wafer entering the gap through one or more of the plurality of inlet holes and exiting the gap through one or more of the plurality of outlet holes. The gas stream replaces any existing ambient moisture from the gap between the top wafer and the bottom wafer.Type: GrantFiled: May 5, 2014Date of Patent: March 20, 2018Assignee: International Business Machines CorporationInventors: Wei Lin, Spyridon Skordas, Robert R. Young, Jr.
-
Patent number: 9889218Abstract: The invention relates to an electrode arrangement (1) for generating a non-thermal plasma, comprising: a layer-shaped first electrode (2) made of an electrically conductive material, a layer-shaped second electrode (4) made of an electrically conductive material, wherein the second electrode (4) is electrically insulated from the first electrode (2), and a dielectric barrier (3) being arranged between the first electrode (2) and the second electrode (4), so that the non-thermal plasma is generated by a dielectric barrier discharge. The inventive electrode arrangement is characterized in that at least one of the first electrode (2) and the second electrode (4) comprises several perforations which are distributed over the electrode.Type: GrantFiled: March 13, 2009Date of Patent: February 13, 2018Assignee: MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V.Inventors: Gregor Eugen Morfill, Bernd Steffes, Tetsuji Shimizu
-
Patent number: 9887069Abstract: A plasma processing system for processing at least a substrate with plasma. The plasma processing chamber is capable of controlling ion energy distribution. The plasma processing system may include a first electrode. The plasma processing system also includes a second electrode that is different from the first electrode and is configured for bearing the substrate. The plasma processing system may also include a signal source coupled with the first electrode. The signal source may provide a non-sinusoidal signal through the first electrode to control ion energy distribution at the substrate when the substrate is processed in the plasma processing system, wherein the non-sinusoidal signal is periodic.Type: GrantFiled: December 10, 2009Date of Patent: February 6, 2018Assignee: Lam Research CorporationInventors: Andreas Fischer, Eric Hudson
-
Patent number: 9884027Abstract: A system for manufacturing an artificial construct suitable for transplantation into a biological organism that includes a two or three three-dimensional preform that is based on the actual two or three-dimensional structure of a native mammalian tissue; and an electrospinning apparatus, wherein the electrospinning apparatus is operative to deposit at least one layer of polymer fibers on the preform to form a polymer scaffold, and wherein the orientation of the fibers in the scaffold relative to one another is substantially parallel.Type: GrantFiled: January 14, 2013Date of Patent: February 6, 2018Assignee: NANOFIBER SOLUTIONS, INC.Inventor: Jed K. Johnson
-
Patent number: 9887020Abstract: A composition including graphene; and at least one dopant selected from the group consisting of an organic dopant and an inorganic dopant.Type: GrantFiled: July 30, 2010Date of Patent: February 6, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Hyeon-jin Shin, Won-mook Choi, Jae-young Choi, Seon-mi Yoon
-
Patent number: 9869051Abstract: A dryer for a wall-mounted washing machine is disclosed. The dryer provides a duct passage that is curved in multiple ways, and that has a heater and a fan. Therefore, the dryer may be installed in a wall-mounted washing machine having a relatively small or narrow accommodating space. The dryer may have a relatively high gas flow rate and/or flow velocity. That is, the dryer may implement a function for drying laundry.Type: GrantFiled: December 31, 2013Date of Patent: January 16, 2018Assignee: Dongbu Daewoo Electronics CorporationInventor: Seong Bo Hong
-
Patent number: 9855354Abstract: The present invention relates to an apparatus for sterilization which may be applied to a medical dry sterilizer, and more particularly, to an apparatus which injects hydrogen peroxide so as to generate plasma and OH radicals which are effective in sterilization, so as to achieve the sterilization of a treated object. According to the present invention, the apparatus for sterilization comprises: a sterilizing reactor in which sterilization is performed on a treated object; a vacuuming unit which is equipped with a vacuum pump connected to the sterilizing reactor and which vacuumizes the interior of the sterilizing reactor; a hydrogen-peroxide supply unit which supplies hydrogen peroxide in a gas state to the interior of the sterilizing reactor; and a microwave-plasma generating unit which generates plasma using microwaves.Type: GrantFiled: June 4, 2012Date of Patent: January 2, 2018Assignee: KOREA BASIC SCIENCE INSTITUTEInventors: Tai Hyeop Lho, Dong Chan Seok
-
Patent number: 9839908Abstract: A device comprising, a substrate having a droplet thereover, and an electrical source coupleable to the substrate. The electrical source is configured to apply a voltage between the substrate and the droplet using an electrode. The electrode has a first portion and a second portion non-symmetric to the first portion, the first and second portions defined by a plane located normal to a longitudinal axis and through a midpoint of a length of the electrode.Type: GrantFiled: April 8, 2014Date of Patent: December 12, 2017Assignee: Alcatel LucentInventors: Joanna Aizenberg, Paul Robert Kolodner, Thomas Nikita Krupenkin
-
Patent number: 9834442Abstract: A reactor for reforming a liquid hydrocarbon fuel, and associated processes and systems, are described herein. In one example, a two stage process is disclosed in which a first reactor is coupled to a second stage reactor having a reaction volume greater than the first reactor. In the first reactor, the liquid hydrocarbon fuel is partially reformed and thereafter is inputted into the second stage reactor for complete partial oxidation. The reaction product is at last partially synthesis gas, a mixture of carbon monoxide, hydrogen, as well as other low hydrocarbons such as methane, ethylene, ethane, and acetylene. The low hydrocarbons can be reformed further in a solid oxide fuel cell. A portion of the gaseous, rotating contents of the second stage reactor may be input into the first reactor to help generate and sustain rotation within the first reactor.Type: GrantFiled: February 18, 2011Date of Patent: December 5, 2017Assignee: Drexel UniversityInventors: Alexander Rabinovich, Michael Gallagher, Alexander Fridman, Anatoliy Polevich, Alexander F. Gutsol
-
Patent number: RE47582Abstract: A free radical sterilization system having a chamber defining a region, and a generator for generating free radical reach effluent from a free radical electric generator and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the electric generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The free-radical sterilization system is used in sterilizing items in the chamber and, with an open-bottomed wound chamber, in treating wounds on a body.Type: GrantFiled: June 23, 2016Date of Patent: August 27, 2019Assignee: STERIFRE MEDICAL, INC.Inventor: Czeslaw Golkowski