Electrostatic Field Or Electrical Discharge Patents (Class 204/164)
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Patent number: 8951602Abstract: A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.Type: GrantFiled: March 7, 2007Date of Patent: February 10, 2015Assignee: Canatu OyInventors: David P. Brown, Albert G. Nasibulin, Esko I. Kauppinen, David Gonzales
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Publication number: 20150030693Abstract: An object of the present invention is to provide an antitumor aqueous solution and an anticancer agent, both of which can kill cancer cells while having virtually no effects on normal cells, and to provide methods for producing the antitumor aqueous solution and the anticancer agent. The method of the invention for producing an antitumor aqueous solution for killing cancer cells includes an aqueous solution preparation step of preparing an aqueous solution through addition, to water, of a solute containing at least one of disodium hydrogen phosphate (Na2HPO4), sodium hydrogen carbonate (NaHCO3), L-glutamine, L-histidine, and L-tyrosine disodium dihydrate (L-tyrosine.2Na.2H2O); and a plasma irradiation step of irradiating the aqueous solution with atmospheric pressure plasma generated in a plasma generation region by means of a plasma generator.Type: ApplicationFiled: February 26, 2013Publication date: January 29, 2015Applicants: c/o NATONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, NU ECO ENGINEEERING CO., LTD.Inventors: Masaru Hori, Masaaki Mizuno, Fumitaka Kikkawa, Hiroaki Kajiyama, Fumi Utsumi, Kae Nakamura, Kenji Ishikawa, Keigo Takeda, Hiromasa Tanaka, Hiroyuki Kano
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Patent number: 8940229Abstract: In various embodiments, a device for irradiating surfaces is provided. The device may include a radiation emitter having a radiation emitter vessel, wherein the radiation emitter vessel has at least one tunnel-like passage; and a structure configured to allow a process gas to flow through the at least one tunnel-like passage.Type: GrantFiled: October 26, 2011Date of Patent: January 27, 2015Assignee: OSRAM AGInventors: Helmut Halfmann, Axel Hombach, Markus Roth
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Publication number: 20150021161Abstract: A liquid thin film is disposed on a conveyor surface (e.g., a roller or belt) that moves the thin film into a precisely controlled gap (or nip) region in which the liquid thin film is subjected to an electric field that causes the liquid to undergo Electrohydrodynamic (EHD) patterning deformation, whereby portions of the liquid thin film form patterned liquid features having a micro-scale patterned shape. A curing mechanism (e.g., a UV laser) is used to solidify (e.g., in the case of polymer thin films, cross-link) the patterned liquid inside or immediately after exiting the gap region. The patterned structures are either connected by an intervening web as part of a polymer sheet, or separated into discreet micro-scale structures. Nanostructures (e.g., nanotubes or nanowires) disposed in the polymer become vertically oriented during the EHD patterning process. Segmented electrodes and patterned charges are utilized to provide digital patterning control.Type: ApplicationFiled: July 17, 2013Publication date: January 22, 2015Inventors: David Mathew Johnson, Armin R. Volkel, John Steven Paschkewitz
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Patent number: 8932435Abstract: A hydrocarbon resource processing device may include a radio frequency (RF) source and an RF applicator coupled to the RF source. The RF applicator may include a base member being electrically conductive, and first and second elongate members being electrically conductive and having proximal ends coupled to the base member and extending outwardly therefrom in a generally parallel spaced apart relation. The first and second elongate members may have distal ends configured to receive the hydrocarbon resource therebetween. In another embodiment, the RF applicator may include an enclosure being electrically conductive and having a passageway therethrough to accommodate a flow of the hydrocarbon resource and a divider being electrically conductive and positioned within the enclosure.Type: GrantFiled: August 12, 2011Date of Patent: January 13, 2015Assignee: Harris CorporationInventor: Francis Eugene Parsche
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Patent number: 8920610Abstract: The invention relates to a method for detecting gases that can be ionized wherein an atmospheric plasma jet is produced, wherein a gas mixture is brought into interaction with the plasma jet, and wherein an electrical quantity is measured as a measure of the concentration of the gas in the gas mixture. The invention further relates to a device for detecting gases that can be ionized, including a gas inlet, means for ionizing a gas, a voltage source, two electrodes, and means for determining an amperage, wherein the two electrodes are connected to the voltage source, wherein the means for determining an amperage are connected to the electrodes in such a way that the magnitude of the current flowing between the electrodes can be measured, and wherein a plasma nozzle is provided to produce an atmospheric plasma jet.Type: GrantFiled: January 22, 2010Date of Patent: December 30, 2014Assignee: PlasmaTreat GmbHInventor: Christian Buske
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Patent number: 8920739Abstract: Disclosed is a system or method of increased efficiency in carbon nanomaterial synthesis. In one embodiment, a system or method of automated collection of deposited carbon nanomaterial is disclosed. According to one or more embodiments, a method of automated collection of deposited nanomaterial may comprise using cleaner blades to clean the wall of a deposition chamber and the surface of a central body where carbon nanomaterial has been deposited. The method of automated carbon nanomaterial collection may be used in connection with a method of carbon nanomaterial synthesis, to create a more efficient synthesis process.Type: GrantFiled: June 6, 2011Date of Patent: December 30, 2014Assignee: King Abddulaziz City for Science and TechnologyInventors: Turki Saud Mohammed Al-Saud, Mohammed A. Bin Hussain, Siarhei Alexandrovich Zhdanok, Andrei Vladimirovich Krauklis, Petr Petrovich Samtsou, Anatolij Ivanovich Loznikov
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Patent number: 8911596Abstract: This invention relates to a process and an apparatus for generating hydrogen and synthetic carbon-free gas by plasma reforming-decomposing of Methane and other hydrocarbons for producing hydrogen and synthetic carbon-free gas through plasma discharge in hydrogen medium. The process involves applying an electrical potential between the electrodes while immersed in hydrogen medium. The plasma ionizes the medium, thereby generating hydrogen and synthetic gas by decomposing of hydrogen medium. The process further involves controlling the process by relocating the generated plasma between two or more further electrodes.Type: GrantFiled: February 18, 2013Date of Patent: December 16, 2014Assignee: Hope Cell Technologies Pty LtdInventor: Robert Vancina
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Publication number: 20140360862Abstract: Gas treatment systems and methods are provided. A system includes at least one device defining a space and having a gas inlet and a gas outlet. The device also includes an electrode assembly, where the electrode assembly includes a dielectric plate, at least one first electrode, at least one second electrode, and a conductive layer. The electrodes are elongate electrodes disposed on a first major surface of the dielectric plate and arranged substantially in parallel. Further, the conductive layer extends over a second major surface of the dielectric plate, is electrically coupled to the one of the electrodes, and is electrically isolated from the other electrode. The system includes a circuit configured for generating a pulsed electric field between the electrodes.Type: ApplicationFiled: December 3, 2012Publication date: December 11, 2014Inventors: Muhammad Arif Malik, Karl H. Schoenbach
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Patent number: 8883083Abstract: The present invention is an air cleaner that uses molecular sieves, such as zeolite or other microporous/nanoporous crystalline materials with pore sizes ranging from 4 ? to 20 ?, as a filter to remove contaminant gas. The contaminants are adsorbed into the porous material along with ions clusters, or any other oxidant generated by a generating device within the system. The contaminant gas is then catalytically decomposed in the confined space of the pore. In one embodiment, transition metal is incorporated into the porous material, and a heater is installed to substitute or accompany the oxidant-generating device. When the heater is turned on, the contaminant is decomposed within the pores of the materials with the transition metals acting as catalysts. Ultimately, the non-harmful byproducts are the small sized water molecutes and carbon dioxide molecules. Growth of bacteria is also suppressed under a clean and dry condition.Type: GrantFiled: April 29, 2002Date of Patent: November 11, 2014Assignee: RHT LimitedInventors: Kwok Yung Anthony Law, Yu Hang Christopher Chao, Sui Chun Law, Wan Chung Lam
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Publication number: 20140326594Abstract: An ion source includes an ion source chamber, a cathode disposed within the ion source chamber and configured to emit electrons to generate an arc plasma, and a repeller configured to repell electrons back into the arc plasma. The ion source chamber and cathode may comprise a refractory metal. The ion source chamber further includes a gas source configured to provide a halogen species to the ion source chamber. The reactive insert is interoperative with the halogen species to yield a first etch rate of the refractory metal material within the ion source chamber under a first set of operating conditions that is less than a second etch rate of the refractory metal material within the ion source chamber under the first set of operating conditions when the reactive insert is not disposed within the ion source chamber.Type: ApplicationFiled: May 3, 2013Publication date: November 6, 2014Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Costel Biloiu, David P. Sporleder, Jay Scheuer, Neil Bassom
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Patent number: 8870735Abstract: The waste disposal system disclosed herein includes a chamber operated at high ampere and low voltage, the chamber configured to inject smoke on a stream of free radicals. In one implementation, the stream of free radicals is generated from a plasma igniter and the smoke is generated from waste products, such as hospital waste products.Type: GrantFiled: March 1, 2013Date of Patent: October 28, 2014Assignee: Strategic Environmental & Energy Resources, Inc.Inventor: Fortunato Villamagna
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Patent number: 8871295Abstract: A method for moving high aspect ratio molecular structures (HARMS), which method comprises applying a force upon a dispersion comprising one or more bundled and individual HARM-structures, wherein the force moves the bundled and/or the individual HARM-structure based on one or more physical features and/or properties for substantially separating the bundled and individual HARM-structures from each other.Type: GrantFiled: March 7, 2007Date of Patent: October 28, 2014Assignee: Canatu OyInventors: David P. Brown, Albert G. Nasibulin, Esko I. Kauppinen, David Gonzalez
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Publication number: 20140311891Abstract: Disclosed is a device and method for contacting a biological substrate. A non-thermal plasma device delivers a non-thermal plasma discharge using a dielectric conduit, an igniter electrode and a RF electrode. The dielectric conduit fluidicly communicates a gas therethrough and an igniter electrode ionizes at least a portion of the gas. The RF electrode, disposed circumferentially proximate to the exterior of the dielectric conduit, generates non-thermal plasma from the ionized gas. The non-thermal plasma is discharged from the dielectric conduit and contacts a biological substrate. The non-thermal plasma discharge may be suitable for tissue bonding and sterilization applications.Type: ApplicationFiled: July 2, 2014Publication date: October 23, 2014Inventors: GREGORY FRIDMAN, ALEXANDER FRIDMAN, ALEXANDER F. GUTSOL, GENNADY FRIEDMAN, DAVID STAACK
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Patent number: 8858766Abstract: A system and method for combinatorial processing of substrates in a processing chamber. The system includes a plurality of generators for supplying power into the processing chamber. A plurality of sputter guns provides power to different regions of a substrate. A switchbox switches power from a generator to a sputter gun via a plurality of coaxial switches. A controller positioned within the switchbox automatically distributes power from a specific generator to a specific sputter gun under programmable logic control.Type: GrantFiled: December 27, 2011Date of Patent: October 14, 2014Assignee: Intermolecular, Inc.Inventors: Brian K. Hatcher, Kent Riley Child
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Patent number: 8852521Abstract: The present disclosure is drawn to methods and systems for producing solutions containing ultrafine metal particles. The method for producing ultrafine metal particles in an aqueous medium includes providing a reaction chamber having a transition metal anode and a transition metal cathode disposed therein. The reaction chamber can also contain an aqueous medium. An anode and cathode are associated at a distance with respect to one another such that when activated by a power source, a discharge arc occurs between the anode and cathode within the aqueous medium. Activation of a power source causes the discharge arc to occur between the anode and the cathode, thereby generating ultrafine metal particles suspended within the aqueous medium.Type: GrantFiled: February 17, 2010Date of Patent: October 7, 2014Assignee: Brigham Young UniversityInventors: Robert H. Todd, Christopher J. Lewis, Jonathan George
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Patent number: 8852522Abstract: An apparatus and method to de-activate a plasma from one or more plasma sources in at least one passageway having a tuned LC circuit. A first embodiment of the invention involves a method to de-activate a plasma. A second embodiment of the invention involves an apparatus to de-activate a plasma. Certain embodiments of the invention can also be used to maximize the production of activated neutral atoms and molecules from the de-activation apparatus.Type: GrantFiled: November 26, 2012Date of Patent: October 7, 2014Inventor: Georges J. Gorin
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Patent number: 8852520Abstract: The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.Type: GrantFiled: October 15, 2010Date of Patent: October 7, 2014Assignee: Korea Institute of Machinery & MaterialsInventors: Min Hur, Min-Suk Cha, Young-Hoon Song, Jae-Ok Lee, Dae-Hoon Lee, Kwan-Tae Kim
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Publication number: 20140262746Abstract: An apparatus for abatement of gases is provided. The apparatus includes a toroidal plasma chamber having a plurality of inlets and an outlet, and at least one chamber wall. One or more magnetic cores are disposed relative to the toroidal plasma chamber. The plasma chamber confines a toroidal plasma. A second gas inlet is positioned on the toroidal plasma chamber between a first gas inlet and the gas outlet at a distance d from the gas outlet, such that a toroidal plasma channel volume between the first gas inlet and the second gas inlet in the is substantially filled by the inert gas, the distance d based on a desired residence time of the gas to be abated.Type: ApplicationFiled: March 14, 2014Publication date: September 18, 2014Applicant: MKS Instruments, Inc.Inventors: Xing Chen, IIya Pokidov, Arthur Tian, Ken Tran, David Lam, Kevin W. Wenzel
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Publication number: 20140262747Abstract: Process and apparatus for functionalizing and/or separating graphene particles and other nanomaterials in which graphene and other nanoparticles are placed in a pile on one of two opposing conductive surfaces that are charged with a high D.C. voltage so that material of a certain character is attracted to the other conducting surface. This process takes place in an enclosed chamber that has been flooded with a designated gas at ambient pressure, with the material attracted to the second conducting surface passing through the designated gas. The high energy field creates a condition such that the material remaining on the first conductive surface takes on atoms of the designated gas and material the going to the second surface is further exposed to and characterized by the designated gas.Type: ApplicationFiled: March 17, 2014Publication date: September 18, 2014Applicant: Graphene Technologies, Inc.Inventors: Robert Wayne Dickinson, Donald Brookshire, JR., Lawrence Joseph Musetti, Theodore Joseph Musetti
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Patent number: 8834684Abstract: A method is described to excite molecules at their natural resonance frequencies with sufficient energy to break or form chemical bonds using electromagnetic radiation in the radio frequency (RF) and microwave frequency range. Liquid, solid, or gaseous materials are prepared and injected into a resonant structure where they are bombarded with electromagnetic energy in the RF or microwave range at resonant frequencies of the molecules of the materials. Alternatively, electromagnetic energy tuned to dielectric particles prepared from the materials may also be supplied to further enhance the reaction.Type: GrantFiled: April 13, 2010Date of Patent: September 16, 2014Assignee: RF Thummin Technologies, Inc.Inventors: Vassilli P. Proudkii, Kirk McNeil, Joe Michael Yarborough
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Patent number: 8828257Abstract: In a plasma processing apparatus including a processing chamber in a vacuum container to form plasma in the processing chamber in which pressure is reduced, a sample stage in lower part of inside of the processing chamber and having an upper surface on which a wafer to be processed by plasma is put, a plurality of pins in the sample stage to be moved in vertical direction so that the pins abut against rear side of the wafer to move the wafer up and down over the upper surface of the sample stage, and a plurality of openings formed in the upper surface of the sample stage so that the pins are moved in the openings, gas is fed from supply ports communicating with the openings into the processing chamber through the openings when the wafer is not put on the upper surface of the sample stage.Type: GrantFiled: February 26, 2009Date of Patent: September 9, 2014Assignee: Hitachi High-Technologies CorporationInventors: Hiroho Kitada, Kazunori Nakamoto, Yosuke Sakai
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Publication number: 20140227176Abstract: A process for manufacturing magnetic and/or radioactive metal nanoparticles, the process comprising: preparing an electrolyte solution including metal ions and a stabilizer; generating a plasma at an interface of the electrolyte solution at atmospheric pressure; and recovering magnetic and/or radioactive metal nanoparticles. The magnetic metal nanoparticles can comprise magnetoradioactive nanoparticles. The magnetic metal nanoparticles can be used as MRI contrast agents and the magnetoradioactive nanoparticles can also be used as contrast agents and for dual PET/MRI applications. It also relates to a multi-plasma apparatus for synthesizing nanoparticles.Type: ApplicationFiled: December 20, 2011Publication date: August 14, 2014Inventors: Fortin Marc-Andre, Christian Sarra-Bournet, Mathieu Letourneau, Gaetan Laroche
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Publication number: 20140224643Abstract: A plasma system is disclosed. The system includes: a plasma device including at least one electrode; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; a precursor source configured to supply at least one precursor feedstock to the plasma device, wherein the at least one precursor feedstock includes at least one catalyst material; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media and the at least one precursor feedstock at the plasma device to form a plasma effluent.Type: ApplicationFiled: January 27, 2014Publication date: August 14, 2014Applicant: Colorado State University Research FoundationInventors: GEORGE J. COLLINS, IL-GYO KOO, HEESANG YOUN, MYEONG YEOL CHOI, CARL W. ALMGREN
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Publication number: 20140216920Abstract: A method is provided of producing nanoparticles in the size range 1 nm to 1000 nm through the synthesis of one or more precursor fluids. The method includes providing a fluid medium comprising at least one precursor fluid and generating an electrical spark within said fluid medium to cause pyrolysis of said at least one precursor fluid in a relatively hot plasma zone to produce at least one radical species. Nanoparticles are formed by nucleation in the fluid medium in a cooler reaction zone about the plasma zone, where the radical species acts as a reactant or catalytic agent in the synthesis of material composing the nanoparticles. The spark is created by an electrical discharge having a frequency between 0.01 Hz and 1 kHz, and a total energy between 0.01 J and 10 J. The nanoparticles may comprise silicon, or compounds or alloys of silicon, and are typically useful in electronic and electrical applications.Type: ApplicationFiled: June 15, 2012Publication date: August 7, 2014Applicant: PST Sensors (Proprietary) LimitedInventors: David Thomas Britton, Manfred Rudolf Scriba
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Patent number: 8793896Abstract: A device for controlling the dehydration operation during a freeze-drying treatment comprises a freeze-drying chamber (1) connected to a vacuum line, and a gas analyzer, for analyzing the gases contained in the chamber. The gas analyzer comprises a gas ionization system (8) comprising a plasma source (13) in contact with the gases, which plasma source is combined with a generator (15) capable of generating a plasma from said gases, and a system for analyzing the ionized gases, comprising a radiation sensor (17) located close to the plasma generation zone and connected to an apparatus (18) for analyzing the change in the radiative spectrum emitted by the plasma. According to the invention, the device includes a means (16) for repeatedly turning the plasma source (13) on and off. The device may further include an optical port (25) placed between the gas ionization system (8) and the freeze-drying chamber (1).Type: GrantFiled: February 1, 2011Date of Patent: August 5, 2014Assignee: Adixen Vacuum ProductsInventors: Ketan Patel, Didier Pierrejean, Cyrille Nomine, Aurélie Chapron
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Publication number: 20140209451Abstract: A system comprising: a plasma production chamber configured to produce a plasma; a reaction chamber vaporize a precursor material with the plasma to form a reactive mixture; a quench chamber having a frusto-conical surface and a quench region formed within the quench chamber between an ejection port of the reaction chamber and a cooled mixture outlet, wherein the quench region configured to receive the reactive mixture from the ejection port, to cool the reactive mixture to form a cooled mixture, and to supply the cooled mixture to the cooled mixture outlet; and a conditioning fluid injection ring disposed at the ejection port and configured to flow a conditioning fluid directly into the reactive mixture as the reactive mixture flows through the ejection port, thereby disturbing the flow of the reactive mixture, creating turbulence within the quench region and cooling the reactive mixture to form a cooled mixture comprising condensed nanoparticles.Type: ApplicationFiled: January 27, 2014Publication date: July 31, 2014Inventors: Maximilian A. BIBERGER, Frederick P. LAYMAN
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Patent number: 8790584Abstract: Disclosed is a system for refining UMG Si including a vacuum chamber, a cold crucible disposed within the vacuum chamber, a device disposed within the vacuum chamber to supply Si to the cold crucible, a steam plasma torch disposed above the cold crucible to apply steam plasma formed by introducing a reactive gas into plasma flame by an inert gas to the Si supplied to the cold crucible, and an impurity collector disposed above the cold crucible within the vacuum chamber to collect impurity gas generated in the cold crucible and discharge the collected impurity gas to the outside of the vacuum chamber.Type: GrantFiled: November 3, 2010Date of Patent: July 29, 2014Assignee: Korea Institute of Industrial TechnologyInventors: Byung Moon Moon, Je Sik Shin, Tae U Yu, Hyun Jin Koo, Dong Ho Park, Ho Moon Lee
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Patent number: 8784657Abstract: The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.Type: GrantFiled: August 7, 2008Date of Patent: July 22, 2014Assignee: Drexel UniversityInventors: Young I. Cho, Alexander Fridman, Alexander F. Gutsol, Yong Yang
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Patent number: 8778143Abstract: The silicon purification method uses a silicon purification device including at least a crucible for loading a silicon metal and a plasma torch, and purifies the silicon metal by injecting a plasma gas from the plasma torch toward a melt surface of the silicon metal loaded in the crucible in a state where an angle formed by the melt surface and the plasma gas is set in the range of 20° to 80°.Type: GrantFiled: September 17, 2010Date of Patent: July 15, 2014Assignee: ULVAC, Inc.Inventors: Yasuo Ookubo, Hiroshi Nagata
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Patent number: 8771593Abstract: Disclosed is a method of controlling a real-time oxidation-reduction potential in a hot water system to inhibit corrosion in the hot water system. The method includes defining one or more operational protective zones in the hot water system. One or more of the operational protective zones includes an oxidation-reduction potential probe that is operable to measure a real-time oxidation-reduction potential in the hot water system at operating temperature and pressure. The probe transmits the measured real-time potential to the controller, which assesses and interprets the transmitted potential to determine whether it conforms to an oxidation-reduction potential setting. If the measured potential does not conform the oxidation-reduction potential setting, the controller is operable to feed or remove one or more active chemical species into or from the hot water system and further operable to change at least one system parameter.Type: GrantFiled: April 9, 2012Date of Patent: July 8, 2014Assignee: Nalco CompanyInventors: Peter D. Hicks, David A. Grattan
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Patent number: 8771481Abstract: A device for processing a hydrocarbon resource may include a hydrocarbon processing container configured to receive the hydrocarbon resource therein and having a pair of opposing ends with an enlarged width medial portion therebetween. The device may also a spirally wound electrical conductor surrounding the hydrocarbon processing container, and a radio frequency (RF) circuit coupled to the spirally wound electrical conductor and configured to supply RF power to the hydrocarbon resource while tracking a load resonance of the RF circuit. The RF circuit may be configured to generate magnetic fields within the hydrocarbon processing container parallel with an axis thereof.Type: GrantFiled: January 13, 2012Date of Patent: July 8, 2014Assignee: Harris CorporationInventor: Francis Eugene Parsche
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Patent number: 8758697Abstract: The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film. Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the surface having microstructured depressions, a planar high-voltage electrode the surface of which has a shape complementary to that of the cylindrical electrode and can be arranged on a section of the surface of the cylindrical electrode in a substantially form-fit manner, a transport device for transporting the film substrate to be treated between the surface of the cylindrical electrode and the high-voltage electrode, and a device for feeding a process gas to the surface of the cylindrical electrode and to the interspace between the cylindrical electrode and the high-voltage electrode.Type: GrantFiled: June 9, 2009Date of Patent: June 24, 2014Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.Inventors: Michael Thomas, Claus-Peter Klages, Antje Zanker
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Patent number: 8758681Abstract: A free radical sterilization system having a chamber defining a region, and a generator for generating free radical reach effluent from a free radical electric generator and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the electric generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The free-radical sterilization system is used in sterilizing items in the chamber and, with an open-bottomed wound chamber, in treating wounds on a body.Type: GrantFiled: June 15, 2012Date of Patent: June 24, 2014Inventor: Czeslaw Golkowski
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Publication number: 20140162338Abstract: The invention relates to a special plasma source designated as a plasma intractor (PI) for producing a cold, homogeneous plasma under atmospheric pressure conditions, which plasma source can be used advantageously to excite and control reactive processes in flowing media. The device according to the invention is characterized in that the device comprises at least 6 elongated electrodes (2) and a molded body (1) made of insulating material, the molded body (1) being provided with an elongated cylindrical cavity (7) and with additional holes, which are guided parallel to the cavity (7) and arranged symmetrical to the axis of the cavity and equidistant to one another, and the electrodes (2) are embedded in holes of the molded body (1) and are connected to an AC high-voltage supply in such a way that the polarities of respective adjacent electrodes are opposite in each phase of the voltage period.Type: ApplicationFiled: May 29, 2012Publication date: June 12, 2014Applicant: Leibniz-Institut fuer Plasmaforschung und Technologie e.V.Inventors: Jan Schaefer, Stefan Horn, Ronny Brandenburg, Ruediger Foest, Manfred Stieber, Klaus-Dieter Weltmann
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Patent number: 8747763Abstract: In order to provide a plasma sterilization apparatus with high plasma generation efficiency, the apparatus includes first and second electrodes (3, 2), a first dielectric body layer (1), and an insulating spacer (6). The first dielectric body layer (1) is disposed between the first and second electrodes (3, 2). The insulating spacer (6) is disposed between the first electrode (3) and the first dielectric body layer (1). The insulating spacer (6) has a lower permittivity than a permittivity of the first dielectric body layer (1).Type: GrantFiled: April 6, 2012Date of Patent: June 10, 2014Assignee: Hitachi, Ltd.Inventors: Takumi Tandou, Nobuyuki Negishi, Hiroyuki Kobayashi, Keizo Suzuki
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Patent number: 8747625Abstract: A grinding/electrolysis combined multi-wire-slicing processing method for silicon wafers includes the following steps: first, with a metal slicing wire (10) provided on a multi-wire-slicing machine serving as cathode, a silicon rod or a silicon ingot (1) (anode) is processed by grinding/electrolysis combined multi-wire-slicing through application of a voltage; second, during said processing, the metal slicing wire (10) and the silicon rod or a silicon ingot (1) are connected with a low-voltage continuous or pulsed direct current power supply (9); third, an electrolytic liquid is sprayed into the cutting area to ensure cooling and anode erosion. The method reduces macroscopic cutting force and enables a grinding/electrolysis combined multi-wire-slicing processing method for large size ultra-thin silicon wafers.Type: GrantFiled: July 14, 2010Date of Patent: June 10, 2014Assignee: Nanjing University of Aeronautics and AstronauticsInventors: Wei Wang, Zhengxun Liu
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Patent number: 8747762Abstract: Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas upstream of the foreline.Type: GrantFiled: December 1, 2010Date of Patent: June 10, 2014Assignee: Applied Materials, Inc.Inventors: Colin John Dickinson, Mehran Moalem, Daniel O. Clark
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Patent number: 8740600Abstract: An apparatus for charging particles in non-conductive liquids, so they agglomerate and can be removed by filtering, is comprised of a housing which contains a non-conductive insert having a multiplicity of channels. The incoming stream is divided into two halves, each of which is flowed through a set of charging channels which contain electrodes, preferably metal brush-like electrodes. One set of electrodes is charged to a high positive voltage; the other set is charged to a high negative voltage. The liquid streams are then merged and flowed trough a set of mixing channels, along the path of which are one or more reversals in flow direction. The mixing channel path length is substantially longer than the charging channel path length.Type: GrantFiled: July 6, 2009Date of Patent: June 3, 2014Assignee: Isopur Technologies, Inc.Inventor: Raymond K. Gomes
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Patent number: 8734003Abstract: A method comprising, providing a droplet having a first chemical species and a second chemical species on a substrate, and applying a voltage across the droplet to physically repeatedly deform the droplet. In this embodiment, the applying causes the droplet to move with respect to an object located therein and at least partially mix the first chemical species and the second chemical species.Type: GrantFiled: December 27, 2005Date of Patent: May 27, 2014Assignee: Alcatel LucentInventors: Joanna Aizenberg, Paul Robert Kolodner, Thomas Nikita Krupenkin
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Publication number: 20140124357Abstract: The present invention consists of a method of pre-treatment of adulterated water for distillation, including adulterated water produced during hydraulic fracturing (“fracking”) of shale rock during natural gas drilling. In particular, the invention is directed to a method of treating adulterated water, said adulterated water having an initial level of bicarbonate ion in a range of about 250 ppm to about 5000 ppm and an initial level of calcium ion in a range of about 500 ppm to about 50,000 ppm, said method comprising contacting the adulterated water with a non-thermal arc discharge plasma to produce plasma treated water having a level of bicarbonate ion of less than about 100 ppm. Optionally, the plasma treated water may be further distilled.Type: ApplicationFiled: November 5, 2013Publication date: May 8, 2014Applicant: DREXEL UNIVERSITYInventors: YOUNG I. CHO, ALEXANDER FRIDMAN, ALEXANDER RABINOVICH, DANIEL J. CHO
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Patent number: 8709351Abstract: A continuous feed discharge surface treater for treating web materials has a discharge chamber where ionization of a process gas occurs defined and contained by one or more rollers. Enhanced chemical coronas and plasmas are achieved by limiting depletion of the gas chemistry from the discharge chamber and dilution or contamination from mixing with drawn in ambient air. Atmospheric coronas can also be achieved in which minimal or no ozone is exhausted from the treater. Various roller and electrode assemblies, including both fixed and rolling electrodes, can be employed.Type: GrantFiled: October 22, 2008Date of Patent: April 29, 2014Assignee: Enercon Industris CorporationInventors: Richard R. Hammen, Joseph Roethle, Gregory W. Schuelke
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Patent number: 8709230Abstract: An apparatus and method for sorting ions in order to produce gas from liquid. A first electric field source is electrically insulated from the liquid by an insulating layer. A first conductive deionization surface is positioned in the liquid and within a field line of the first electric field source. An electric conductor is connected to the first conductive deionization surface to discharge charge built up due to attracted ions located on the first conductive deionization surface. The gas is produced on said first conductive deionization surface when said first conductive deionization surface is positioned within the water.Type: GrantFiled: November 22, 2012Date of Patent: April 29, 2014Assignee: HPT (Hydrogen Production Technology) AGInventor: David Haitin
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Publication number: 20140102639Abstract: The invention relates to a device and a method for plasma treatment of hollow bodies. The invention is in particular suited for the protective plasma treatment of the inner surface of thermally sensitive hollow bodies such as plastic bottles. The plasma treatment according to the invention can, for example, consist of chemical activation, sterilization, cleaning or coating. One or more hollow bodies are put into a processing chamber for treatment. The processing chamber is in fluid connection with at least one plasma source. An exhaust device on the processing chamber generates a negative pressure in the processing chamber relative to the plasma source so that plasma can expand out of the plasma source into the processing chamber and hollow body.Type: ApplicationFiled: December 23, 2013Publication date: April 17, 2014Applicant: Reinhausen Plasma GmbHInventors: Stefan Nettesheim, Dariusz Korzec
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Publication number: 20140096645Abstract: A method for removing a surfactant from a palladium nanoparticle includes exposing the palladium nanoparticle to hydrogen and removing the surfactant from the palladium nanoparticle. A method includes synthesizing a palladium nanoparticle using a surfactant. The surfactant influences a geometric property of the palladium nanoparticle and bonds to the palladium nanoparticle. The method also includes exposing the palladium nanoparticle to hydrogen to remove the surfactant from the palladium nanoparticle.Type: ApplicationFiled: June 8, 2011Publication date: April 10, 2014Inventor: Minhua Shao
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Patent number: 8685328Abstract: In order to remove a pathogenic effect of a microorganism in a room or a work space in a short period of time, an ion diffusing apparatus, which includes an ion generator (17, 18) for generating positive ions each including H+(H2O)m and negative ions each including O2?(H2O)n, where m and n are arbitrary integers, and a blower for delivering the positive ions and the negative ions, which are generated from the ion generator (17), from a blowout opening, is operated to widely distribute, with a high concentration, the positive ions and the negative ions in the room.Type: GrantFiled: May 21, 2009Date of Patent: April 1, 2014Assignee: Sharp Kabushiki KaishaInventors: Hiroaki Okano, Kazuo Nishikawa, Hisaharu Yagi, Norihiro Matsuoka, Tomonori Akai, Misaki Nakamura, Yoshihiro Shimizu
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Patent number: 8685121Abstract: An optimized gasification/vitrification processing system having a gasification unit which converts organic materials to a hydrogen rich gas and ash in communication with a joule heated vitrification unit which converts the ash formed in the gasification unit into glass, and a plasma which converts elemental carbon and products of incomplete combustion formed in the gasification unit into a hydrogen rich gas.Type: GrantFiled: November 10, 2010Date of Patent: April 1, 2014Assignee: Inentec Inc.Inventors: Jeffrey E. Surma, James A Batdorf
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Patent number: 8685255Abstract: A method of operating a capacitive deionization cell using a regeneration cycle to increase pure flow rate and efficiency of the cell.Type: GrantFiled: September 11, 2009Date of Patent: April 1, 2014Assignee: Voltea B.V.Inventors: Sean Knapp, Marshall L. Leffew, II
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Publication number: 20140076713Abstract: Systems and methods for performing edge ramping are described. A system includes a base RF generator for generating a first RF signal. The first RF signal transitions from one state to another. The transition from one state to another of the first RF signal results in a change in plasma impedance. The system further includes a secondary RF generator for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system includes a controller coupled to the secondary RF generator. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another.Type: ApplicationFiled: October 24, 2012Publication date: March 20, 2014Inventors: John C. Valcore, JR., Bradford J. Lyndaker, Andrew S. Fong
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Patent number: 8669164Abstract: Microelectronic structures and devices, and method of fabricating a three-dimensional microelectronic structure is provided, comprising passing a first precursor material for a selected three-dimensional microelectronic structure into a reaction chamber at temperatures sufficient to maintain said precursor material in a predominantly gaseous state; maintaining said reaction chamber under sufficient pressures to enhance formation of a first portion of said three-dimensional microelectronic structure; applying an electric field between an electrode and said microelectronic structure at a desired point under conditions whereat said first portion of a selected three-dimensional microelectronic structure is formed from said first precursor material; positionally adjusting either said formed three-dimensional microelectronic structure or said electrode whereby further controlled growth of said three-dimensional microelectronic structure occurs; passing a second precursor material for a selected three-dimensional miType: GrantFiled: April 2, 2010Date of Patent: March 11, 2014Assignee: Los Alamos National Security, LLCInventors: James L. Maxwell, Chris R. Rose, Marcie R. Black, Robert W. Springer