Preliminary Cleaning Or Shaping Of Workpiece Patents (Class 205/660)
  • Patent number: 11430673
    Abstract: A substrate processing apparatus includes at least one nozzle unit configured to eject a processing liquid to a substrate. The at least one nozzle unit includes a conductive part for voltage application configured to be brought into contact with the processing liquid, and a voltage detection part or a current detection part configured to be brought into contact with the processing liquid. A non-conductive part is interposed between the conductive part for voltage application and the voltage detection part or between the conductive part for voltage application and the current detection part. A voltage application part is connected to the conductive part for voltage application, and a voltage detector is installed in the voltage detection part or a current detector is installed in the current detection part.
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: August 30, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Yusuke Hashimoto, Jiro Higashijima
  • Patent number: 10648298
    Abstract: A tubular member (1) with a relative rough (1.5-10 ?m) inner surface (5) coated solid lubricating film (10) which is transformed into a substantially viscous rubbery viscoelasto-plastic phase at temperatures in a range between 50° C. and 110° C. is expanded by moving an expansion member (24) with a relatively smooth outer surface (roughness<1.5 ?m) therethrough, such that during expansion a viscous viscoelastoplastic substantially rubbery lubricating film (44) is generated between the tubular member (1) and the expansion mandrel (24), which film remains bonded to the rough inner surface (5) of the expanded tubular (1), but does not stick to the relatively hot and smooth expansion member (24).
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: May 12, 2020
    Assignee: SHELL OIL COMPANY
    Inventors: Daniele Di Crescenzo, Mark Michael Shuster, Djurre Hans Zijsling, Rob Bosman
  • Patent number: 9978530
    Abstract: A method for patterning a metal substrate includes a series of surface treatments to control tunnel initiation at a micron or sub-micron level. In particular, the series of surface treatments include forming a hydration layer which acts as a mask while etching the surface of the metal substrate. The hydration layer mask enables control of the tunnel initiation on a micron or sub-micron level because the etching does not undercut the interface between the metal substrate and the hydration layer. As a result, the tunnels can be initiated in an orthogonal direction and closer together, thereby increasing the tunnel density.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: May 22, 2018
    Assignee: PACESETTER, INC.
    Inventors: Bruce A. Ribble, Ralph Jason Hemphill, David R. Bowen
  • Patent number: 9150980
    Abstract: A method of removing a metal detail from a dielectric material of an article may include placing the article in an electrolyte bath such that at least a portion of the metal detail is submerged. The metal detail may be coupled to a dielectric material. The method may further include positioning at least one cathode in the electrolyte bath in spaced relation to the metal detail, and passing electrical current through the metal detail. The method may additionally include deplating the metal detail from the dielectric material in response to passing the electrical current through the metal detail.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: October 6, 2015
    Assignee: The Boeing Company
    Inventors: Robert T. Loftus, Jr., Robert L. Knicely, Nicklaus C. Kimball
  • Patent number: 8992761
    Abstract: The present disclosure is directed to methods of manufacturing and passivating stents and other implantable medical devices including one or more attached radiopaque markers. In one embodiment, the method includes providing a metallic implantable medical device body without any radiopaque marker(s) attached thereto, primary electropolishing the device body without any markers attached thereto, attaching one or more radiopaque markers to the device body, and lightly electropolishing the device including device body and attached radiopaque markers. Light electropolishing removes no more than about 5 percent by weight of the device (i.e., the device body and attached marker(s)). Light electropolishing passivates the exposed surfaces of the device body and markers, while also providing electropolishing to the region of any welds where the radiopaque marker(s) attach to the device body.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: March 31, 2015
    Assignee: Abbott Cardiovascular Systems, Inc.
    Inventor: Zhicheng Lin
  • Patent number: 8992787
    Abstract: Anode foils suitable for use in electrolytic capacitors, including those having multiple anode configurations, have improved strength, reduced brittleness, and increased capacitance compared to conventional anode foils for electrolytic capacitors. Exemplary methods of manufacturing an anode foil suitable for use in an electrolytic capacitor include disposing a resist material in a predetermined pattern on an exposed surface of an anode foil substrate such that a first portion of the exposed surface of the anode foil substrate is covered by the resist material, and a second portion of the exposed surface remains uncovered; polymerizing the resist material; exposing at least the second portion of the exposed surface to one or more etchants so as to form a plurality of tunnels; stripping the polymerized resist material; and widening at least a portion of the plurality of tunnels. The resist material may be deposited, for example, by ink-jet printing, stamping or screen printing.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: March 31, 2015
    Assignee: Pacesetter, Inc.
    Inventors: David R. Bowen, Ralph Jason Hemphill, Xiaofei Jiang, Corina Geiculescu, Tearl Stocker
  • Publication number: 20140014530
    Abstract: The present disclosure is directed to methods of manufacturing and passivating stents and other implantable medical devices including one or more attached radiopaque markers. In one embodiment, the method includes providing a metallic implantable medical device body without any radiopaque marker(s) attached thereto, primary electropolishing the device body without any markers attached thereto, attaching one or more radiopaque markers to the device body, and lightly electropolishing the device including device body and attached radiopaque markers. Light electropolishing removes no more than about 5 percent by weight of the device (i.e., the device body and attached marker(s)). Light electropolishing passivates the exposed surfaces of the device body and markers, while also providing electropolishing to the region of any welds where the radiopaque marker(s) attach to the device body.
    Type: Application
    Filed: July 13, 2012
    Publication date: January 16, 2014
    Applicant: Abbott Cardiovascular Systems, Inc.
    Inventor: Zhicheng Lin
  • Patent number: 8597490
    Abstract: Methods for manufacturing a gas electron multiplier. One method comprises a step of preparing a blank sheet comprised of an insulating sheet with first and second metal layers on its surface, a first metal layer hole forming step in which the first metal layer is patterned by means of photolithography, such as to form holes through the first metal layer, an insulating sheet hole forming step, in which the holes formed in the first metal layer are extended through the insulating layer by etching from the first surface side only, and a second metal layer hole forming step, in which the holes are extended through the second metal layer. Alternatively, the second metal layer hole forming step is performed by electrochemical etching, such that the first metal layer remains unaffected during etching of the second metal layer.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: December 3, 2013
    Assignee: CERN—European Organization for Nuclear Research
    Inventors: Rui De Oliveira, Serge Duarte Pinto
  • Patent number: 8597489
    Abstract: Conventional electrochemical machining process requires fixed shaped tool cathodes, which makes retooling time consuming and expensive. Flexible tool cathodes include elastically deformable cathodes that can deform in two or three dimensions and can adapt to the contour of the workpiece while the workpiece is moving relative to the flexible tool cathode. That is, the flexible tool cathode can perform tracing. Certain flexible tool cathodes can be also used for special configurations such corners and edges. The flexible tool cathodes can be used to polish, finish, or shape the workpiece through electrochemical processes.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: December 3, 2013
    Assignee: General Electric Company
    Inventors: Yuefeng Luo, William Edward Adis, Laurence Scott Duclos
  • Patent number: 8591714
    Abstract: An apparatus for separating water from a water-in-oil mixture having an elongated inlet vessel with a lower outlet end and an upper inlet end, the length thereof being a multiple of the largest vessel cross-sectional dimension. A separation vessel having an oil outlet and a divergent water outlet has an inlet passageway in communication with the inlet vessel lower outlet end. At least one electrode is positioned within the inlet vessel by which a mixture flowing therethrough is subjected to an electric field.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: November 26, 2013
    Assignee: National Tank Company
    Inventors: Gary W. Sams, Harry G. Wallace, David L. Taggart, David R. Manen
  • Patent number: 8529738
    Abstract: Systems and methods for plating and/or etching of hard-to-plate metals are provided. The systems and methods are designed to overcome the deleterious effect of superficial coating or oxide layers that interfere with the plating or etching of certain metal substrates. The systems and methods involve in situ removal of coating materials from the surfaces of the metal substrates while the substrates are either submerged in plating or etching solutions, or are positioned in a proximate enclosure just prior to submersion in the plating or etching solutions. Further, the substrates can be in contact with a suitable patterning mask to obtain patterned oxide-free regions for plating or etching. This in situ removal of coating layers may be achieved by pulse heating or photoablation of the substrate and the inhibiting coating layers. Electrical energy or laser light energy may be used for this purpose. Additionally or alternatively, the coating materials may be removed by mechanical means.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: September 10, 2013
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Robert J. Von Gutfeld, Alan C. West
  • Patent number: 8506792
    Abstract: The invention concerns a method for the machining of a metallic structural component, particularly a structural component of a gas turbine, by means of finishing with a pulsed electrochemical ablation process, whereby the structural component features a pre-contour, to be finished, with different over-measures. The method is characterized by the following processing steps: a) determination of the different over-measures of the pre-contour, and b) bilateral and simultaneous finishing by means of a simultaneous feed of respectively at least one electrode disposed on different sides of the structural component, whereby the feed velocity of the electrode in the area of the largest over-measure of the pre-contour is higher than the feed velocity in the area of the smaller over-measure of the pre-contour.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: August 13, 2013
    Assignee: MTU Aero Engines GmbH
    Inventors: Erwin Bayer, Martin Bussmann, Albin Platz
  • Patent number: 8449753
    Abstract: The present invention provides an apparatus for plating pretreatment of a cylinder block that includes an electrode performing a plating pretreatment of the cylinder inner wall surface. A gap flow channel communicates with an in-electrode flow channel at a position closest to a seal jig, the gap flow channel being adapted to introduce a treatment liquid to the cylinder inner wall surface, the in-electrode flow channel being adapted to receive the treatment liquid having passed through a communicating hole. The present invention is provided a method for pretreating before plating a cylinder block including disposing an electrode to face the cylinder inner wall surface so as to form a gap flow channel, and introducing a treatment liquid to the gap flow channel thereby flowing through the treatment liquid toward a seal jig and then into an in-electrode flow channel through a communicating hole.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: May 28, 2013
    Assignee: Suzuki Motor Corporation
    Inventors: Hitoshi Muramatsu, Seiya Kunioka, Nobuyuki Suzuki, Naoyuki Suda, Akira Ishibashi, Tomohiro Asou, Minoru Imai, Manabu Suzuki, Masahiro Ogawa
  • Publication number: 20130062218
    Abstract: A method for processing a constructed, liquid-cooled piston of an internal combustion engine, the piston including an upper piston part and a lower piston part, which are supported by a joining plane and are connected to each other in a bonded manner. An electrochemical method, such as electrochemical machining, is used to produce a passage opening or a hole in the piston. By means of the method, material is selectively removed after the completion of the upper part piston, the lower piston part, or the piston after the two piston parts have been joined. The electrochemical machining allows an arbitrarily geometrically designed topography having at least one passage opening, a hollow, or an oil pocket in cooling areas or non-cooling areas to be created on the piston.
    Type: Application
    Filed: February 12, 2011
    Publication date: March 14, 2013
    Applicant: KS KOLBENSCHMIDT GMBH
    Inventors: Janssen Albert Michael, Gniesmer Volker, Karl Diffenbach, Gerhard Luz
  • Publication number: 20130026048
    Abstract: Anode foils suitable for use in electrolytic capacitors, including those having multiple anode configurations, have improved strength, reduced brittleness, and increased capacitance compared to conventional anode foils for electrolytic capacitors. Exemplary methods of manufacturing an anode foil suitable for use in an electrolytic capacitor include disposing a resist material in a predetermined pattern on an exposed surface of an anode foil substrate such that a first portion of the exposed surface of the anode foil substrate is covered by the resist material, and a second portion of the exposed surface remains uncovered; polymerizing the resist material; exposing at least the second portion of the exposed surface to one or more etchants so as to form a plurality of tunnels; stripping the polymerized resist material; and widening at least a portion of the plurality of tunnels. The resist material may be deposited, for example, by ink-jet printing, stamping or screen printing.
    Type: Application
    Filed: July 29, 2011
    Publication date: January 31, 2013
    Inventors: David R. Bowen, Ralph Jason Hemphill, Xiaofei Jiang, Corina Geiculescu, Tearl Stocker
  • Patent number: 8313635
    Abstract: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: November 20, 2012
    Assignee: Lam Research Corporation
    Inventors: Fred D. Egley, Michael S. Kang, Anthony L. Chen, Jack Kuo, Hong Shih, Duane Outka, Bruno Morel
  • Publication number: 20110114508
    Abstract: The present invention relates to an electrolyte and a process for the electrochemical machining of metallic components, wherein the electrolyte comprises a protic solvent.
    Type: Application
    Filed: August 4, 2008
    Publication date: May 19, 2011
    Applicant: EXTRUDE HONE GMBH
    Inventors: Rene Wodrich, Ulrich Franz Burmester
  • Publication number: 20100140105
    Abstract: This invention is directed to an intracorporeal device formed of a high strength Co—Ni—Cr alloy and is particularly suitable for forming a composite product with a pseudoelastic member formed of NiTi alloy. Suitable intracorporeal products include guidewires and stents. The high strength alloy consists essentially of about 28 to about 65% cobalt, about 2 to about 40% nickel, about 5 to about 35% chromium, up to about 12% molybdenum, up to about 20% tungsten, up to about 20% iron and the balance inconsequential amounts of impurities and other alloying constituents, with a preferred alloy composition including about 30 to about 45% cobalt, about 25 to about 37% nickel, about 15 to about 25% chromium and about 5 to about 15% molybdenum. Intravascular devices such as guidewires, stents and the like can be formed of this high strength Co—Ni—Cr alloy.
    Type: Application
    Filed: December 7, 2009
    Publication date: June 10, 2010
    Applicant: ADVANCED CARDIOVASCULAR SYSTEMS, INC.
    Inventor: Sepehr Fariabi
  • Publication number: 20100087916
    Abstract: A method for manufacturing a degradation-inhibiting first layer on the surface of an implant body, in particular an intraluminal endoprosthesis, whereby the body has at least one metallic material, which is at least largely biodegradable, comprising the following steps: preparing the body of the implant, and applying the first layer to at least a portion of the body surface, whereby the first layer contains magnesium stearate. An implant obtainable by such a method.
    Type: Application
    Filed: September 24, 2009
    Publication date: April 8, 2010
    Applicant: BIOTRONIK VI PATENT AG
    Inventors: Ullrich Bayer, Baerbel Becher, Bernd Block
  • Patent number: 7691324
    Abstract: In a reaction chamber, which constitutes a component of a process installation for obtaining foodstuffs or foodstuff components, biological products in harvested form that are whole or in pieces are subjected to pulsed electric fields as they pass through said reaction chamber, said electric fields forming pores in the cell walls so as to irreversibly open the latter, thus making the content of the cells more easily accessible. This is achieved by electrode groups, which can be energized to a high voltage and are located in the wall of a longitudinal passage of the reactor through which the process material is moved past grounded electrodes located in an opposing longitudinal wall area. Each electrode group is connected to an electric energy accumulator such as for example, a Marx generator, by means of a switch, in order to rapidly establish electric fields of multiple directions between the charged and the grounded electrodes.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: April 6, 2010
    Assignees: Südzucker AG, Forschungszentrum Karlsruhe GmbH
    Inventor: Christoph Schultheiss
  • Publication number: 20100012507
    Abstract: A method for manufacturing gear wheels, specifically transmission gear wheels, is disclosed. An embodiment of the method includes the following steps: a) preparation of a base body for a gear wheel, b) electrochemical processing of the base body by a precise electrochemical machining process (PECM process), where several recesses running between the teeth of the gear wheel are made simultaneously electrochemically to manufacture the teeth of the gear wheel.
    Type: Application
    Filed: November 24, 2005
    Publication date: January 21, 2010
    Applicant: MTU Aero Engines GmbH
    Inventors: Erwin Bayer, Martin Bussmann, Thomas Kraenzler, Michael Lahres, Albin Platz
  • Patent number: 7527723
    Abstract: An electrolytic processing apparatus can increase the efficiency of the dissociation reaction of water and efficiently perform electrolytic processing, and can eliminate the need for an operation of a change of ion exchanger. The electrolytic processing apparatus includes: a processing electrode and a feeding electrode; a liquid supply section for supplying a liquid containing an ion-exchange material between the workpiece and at least one of the processing electrode and the feeding electrode; a power source for applying a voltage between the processing electrode and the feeding electrode; and a drive section for moving the workpiece and at least one of the processing electrode and the feeding electrode relative to each other; wherein electrolytic processing of the workpiece is carried out while keeping the workpiece not in contact with but close to the processing electrode at a distance of not more than 10 ?m.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: May 5, 2009
    Assignee: Ebara Corporation
    Inventors: Itsuki Kobata, Yutaka Wada, Hirokuni Hiyama, Takayuki Saito, Yasushi Toma, Tsukuru Suzuki, Akira Kodera
  • Publication number: 20080314760
    Abstract: The present invention relates to the use of an anode suitable for use in inter alia a reactor for elimination or reduction of microbial impurities from liquids, such as inter alia waste water and water intended for human or animal consumption. The anode comprises an expanded metal plate, preferably titanium, covered with a non-corrosive metal layer, preferably a platinum layer.
    Type: Application
    Filed: July 5, 2006
    Publication date: December 25, 2008
    Inventors: David Napper, Martin Ebro
  • Publication number: 20080230396
    Abstract: A method for forming holes in an object is provided. The method includes forming a starter hole in the object, providing an electrochemical machining electrode having at least one insulated section that substantially circumscribes the electrode and at least one uninsulated section, and inserting the electrode into the starter hole to facilitate forming a hole defined by at least one first section having a first cross-sectional area and at least one second section having a second cross-sectional area.
    Type: Application
    Filed: March 22, 2007
    Publication date: September 25, 2008
    Inventors: Ching-Pang Lee, Bin Wei, Chen-Yu Jack Chou
  • Publication number: 20080230379
    Abstract: A method for forming a hole in an object is provided. The method includes forming a starter hole in the object, providing an electrochemical machining electrode that includes insulation that extends only partially around the electrode, and inserting the electrode into the starter hole to form a hole in the object that has an inlet defined by a first cross-sectional area and an outlet defined by a second cross-sectional area.
    Type: Application
    Filed: March 22, 2007
    Publication date: September 25, 2008
    Inventors: Ching-Pang Lee, Bin Wei, Chen-Yu Jack Chou
  • Patent number: 7238294
    Abstract: The invention refers to a procedure for etching of materials at the surface by focussed electron beam induced chemical reactions at said surface. The invention is characterized in that in a vacuum atmosphere the material which is to be etched is irradiated with at least one beam of molecules, at least one beam of photons and at least one beam of electrons, whereby the irradiated material and the molecules of the beam of molecules are excited in a way that a chemical reaction predetermined by said material and said molecules composition takes place and forms a reaction product and said reaction product is removed from the material surface-irradiation and removal step.
    Type: Grant
    Filed: May 2, 2003
    Date of Patent: July 3, 2007
    Assignees: NaWoTec GmbH, University of Maryland
    Inventors: Hans Wilfried Peter Koops, Klaus Edinger
  • Patent number: 7128821
    Abstract: An electropolishing method for removing potential device-contaminating particles from a wafer, is disclosed. The method includes immersing the wafer in an electropolishing electrolyte solution and removing defects and particles from the wafer by rotational friction between the wafer and the electrolyte solution in combination with electrolysis. The method is effective in removing particles from via openings of all sizes, including via openings having a width smaller than about 0.2 ?m.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: October 31, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Ho Lin, Chung-Chang Chen, Kei-Wei Chen, Shih-Tzung Chang, Chao-Lung Chen, Po-Jen Shih, Yu-Ku Lin, Ying-Lang Wang
  • Patent number: 7112271
    Abstract: A method for manufacturing a very low roughness copper foil and an apparatus for manufacturing the copper foil. In the method of the present invention, a pickling process, an electrolytic polishing process and a washing process are successively performed after the copper foil was manufactured. In order to manufacture the very low roughness copper foil, the electrolytic polishing process is accomplished with the copper foil to face a metal cathode plate and supplying a current in order to perform the electrolytic polishing.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: September 26, 2006
    Assignee: LG Cable Ltd.
    Inventors: Cha Jae Jo, Chang Hee Choi, Sangyum Kim, Jeong Ik Kim
  • Patent number: 7094131
    Abstract: A microelectronic substrate and method for removing conductive material from a microelectronic substrate. In one embodiment, the microelectronic substrate includes a conductive or semiconductive material with a recess having an initially sharp corner at the surface of the conductive material. The corner can be blunted or rounded, for example, by applying a voltage to an electrode in fluid communication with an electrolytic fluid disposed adjacent to the corner. Electrical current flowing through the corner from the electrode can oxidize the conductive material at the corner, and the oxidized material can be removed with a chemical etch process.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: August 22, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Whonchee Lee, Scott G. Meikle, Scott E. Moore
  • Patent number: 6932896
    Abstract: Systems and methods to remove or lessen the size of metal particles that have formed on, and to limit the rate at which metal particles form or grow on, workpiece surface influencing devices used during electrodeposition are presented. According to an exemplary method, the workpiece surface influencing device is occasionally placed in contact with a conditioning substrate coated with an inert material, and the bias applied to the electrodeposition system is reversed. According to another exemplary method, the workpiece surface influencing device is conditioned using mechanical contact members, such as brushes, and conditioning of the workpiece surface influencing device occurs, for example, through physical brushing of the workpiece surface influencing device with the brushes. According to a further exemplary method, the workpiece surface influencing device is rotated in different direction during electrodeposition.
    Type: Grant
    Filed: October 17, 2001
    Date of Patent: August 23, 2005
    Assignee: Nutool, Inc.
    Inventors: Bulent M. Basol, Cyprian Uzoh, Homayoun Talieh
  • Patent number: 6797144
    Abstract: A method for in-situ cleaning an electrodeposition surface following an electroplating process including providing a first electrode assembly and a second electrode assembly; applying a first current density across the first electrode assembly and the second electrode assembly for carrying out the electrodeposition process; carrying out the electrodeposition process to electrodeposit a metal onto an electrodeposition surface of the second electrode assembly; and, applying a second current density having a second polarity reversed with reference to the first polarity across the first electrode assembly and the second electrode assembly the second current density having a relatively lower current density compared to the first current density.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: September 28, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Hung-Wen Su, Shih-Wei Chou, Ching-Hua Hsieh, Shau-Lin Shue
  • Patent number: 6780305
    Abstract: The invention provides a method for producing a support for planographic printing plates which comprises a step of roughening the surface of an aluminum plate and in which the surface-roughening step includes (1) a pre-electrolytic surface-roughening step of electrolytically roughening the surface of an aluminum plate in an aqueous hydrochloric acid solution, (2) an alkali-etching step of etching the roughened surface of the aluminum plate with an alkali solution, (3) a desmutting step of contacting the etched aluminum plate with an aqueous sulfuric solution having predetermined sulfuric acid and aluminum ion concentrations at a predetermined temperature for 1 to 180 seconds, and (4) an electrolytic surface-roughening step of processing the desmutted aluminum plate in an aqueous nitric acid solution with an alternating current being applied thereto. The invention enables stable and inexpensive production of planographic printing plate supports even from regenerated aluminum.
    Type: Grant
    Filed: February 12, 2002
    Date of Patent: August 24, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Atsuo Nishino, Yoshitaka Masuda, Hirokazu Sawada, Akio Uesugi
  • Patent number: 6743350
    Abstract: An electrode for rejuvenating a cooling passage within an airfoil, the electrode including a tip, an end, a conductive core extending between the tip and the end, and an insulating coating disposed on the conductive core. The insulating coating exposes a number of conductive strips of the conductive core extending between the tip and the end. The insulating coating forms a number of insulating portions and further exposes a number of spacer portions of the conductive core longitudinally positioned between the insulating portions. The insulating portions substantially span a distance between the tip and the end and are positioned between the conductive strips.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: June 1, 2004
    Assignee: General Electric Company
    Inventors: Ching-Pang Lee, Robert Alan Johnson, Bin Wei, Hsin-Pang Wang, Lawrence Bernard Kool
  • Patent number: 6676826
    Abstract: A method for production of a rotor for centrifugal compressor, wherein the said rotor is produced from a monolithic disc, which is provided with a central hole. The method consists of use, within an isolating medium, of at least one first electrode which has polarity opposite the polarity of the rotor, wherein the said first electrode operates starting from the outer diameter of the monolithic disc, in order to produce the blades and the cavities of the said rotor, and wherein the processing takes place with a continuous path, consisting of a first step of roughing, followed by a second step of finishing with a tool which has a shape similar to that of the electrode used for the first roughing step, in order to produce an accurate geometry of the blades.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: January 13, 2004
    Assignee: Nuovo Pignone Holding S.p.A.
    Inventors: Verter Battistini, Umberto Mariotti
  • Patent number: 6676825
    Abstract: A sacrificial core (304) defining a cavity in a metallic or non-metallic shaped article of manufacture, e.g., a casting (302), is made from a metal that can be electrolytically dissolved. The sacrificial core (304) is removed from the article (302) by electrochemical machining. The sacrificial core (304) may be a hollow shell (306) incorporating an integral electrode (308) within the shell and electrically insulated from the shell.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: January 13, 2004
    Assignee: Faraday Technology Marketing Group, LLC
    Inventor: Lawrence E. Gebhart
  • Publication number: 20030141201
    Abstract: An edge cleaning system and method is disclosed in which a directed stream of a mild etching solution is supplied to an edge area of a rotating workpiece, including the front surface edge and bevel, while a potential difference between the workpiece and the directed stream is maintained. In one aspect, the present invention provides an edge cleaning system that is disposed in the same processing chamber that is used for deposition or removal processing of the workpiece. In another aspect, the mild etching solution used for edge removal is also used to clean the front surface of the wafer, either simultaneously with or sequentially with the edge removal process.
    Type: Application
    Filed: December 20, 2002
    Publication date: July 31, 2003
    Inventor: Bulent M. Basol
  • Patent number: 6596150
    Abstract: Disclosed is a production method of an aluminum support for a lithographic printing plate, capable of stable and low-cost production of an aluminum support for a lithographic printing plate, the support being scarcely subject to generation of treatment unevenness called streaks or grainy unevenness ascribable to the different in the aluminum dissolving rate due to the difference in the orientation of the crystal grain. The aluminum support is produced by surface graining and then polishing an aluminum plate or by polishing an aluminum plate while etching it in an aqueous acid or alkali solution. The aluminum plate may be subjected to polishing and then to anodization or may be subjected to polishing, to surface graining, again to or not to polishing and then to anodization. A production method for producing a high-quality support for a lithographic printing plate, free of local unevenness is also disclosed.
    Type: Grant
    Filed: May 27, 1999
    Date of Patent: July 22, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Atsuo Nishino, Yoshitaka Masuda, Hirokazu Sawada, Akio Uesugi, Masahiro Endo
  • Patent number: 6582585
    Abstract: The method according to the invention comprises a macrographic etching step followed by a “bleaching” step by electrolytic etching by means of a bath containing at least phosphoric acid and a weak acid. This method allows components made of superalloys to be easily and effectively inspected, including when they contain elements such as rhenium or ruthenium.
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: June 24, 2003
    Assignee: SNECMA Moteurs
    Inventors: Michel Ruimi, Sylvie Poutonnet, Philippe Poubanne
  • Patent number: 6582584
    Abstract: A method of enhancing heat transfer and cooling efficiency in a cooling passage includes forming a plurality of turbulator rings in the passage, the rings projecting inwardly, substantially perpendicular to a cooling flow direction in the passage; and using a patterned electrode, forming at least one gap in one or more of the turbulator rings, extending substantially parallel to the flow direction.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: June 24, 2003
    Assignee: General Electric Company
    Inventors: Ching-Pang Lee, Rong-Shi Paul Chiu
  • Publication number: 20030089621
    Abstract: A drive head for a bolt, fastener, coupling, nut or other driveable head made from a less malleable metal such as a powder metal nickel alloy. The drive head has an upper drive portion having at least six convex corners spaced around the outer periphery thereof, each corner terminating in an edge. The drive head also has a lower flange portion adjacent to the drive portion and having an edge extending radially outwardly to at least the edge of each corner. The drive portion and the flange portion of the drive head is formed by subjecting a blank having a generally circular head to electrochemical machining (ECM). A tool is also provided for the ECM method to form the drive portion and flange portion of the drive head.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 15, 2003
    Inventors: William C. Anderson, Edward I. Stamm, Vicky S. Budinger, Terry L. Lievestro
  • Patent number: 6544402
    Abstract: A method and an apparatus for manufacturing a wire, particularly a sawtooth wire for all-steel sawtooth wire card clothings, wherein the surface of a wire-shaped intermediate product, such as a wire already provided with sawteeth, is smoothened in an electropolishing process in an electrolyte bath containing an electrolyte. A relative movement is produced between the electrolyte and the intermediate product during the electropolishing process. The apparatus includes a device for producing a relative movement between the electrolyte and the intermediate product contained in the electrolyte bath.
    Type: Grant
    Filed: February 14, 2001
    Date of Patent: April 8, 2003
    Assignee: Graf &plus; Cie AG
    Inventor: Ralph A. Graf
  • Patent number: 6428682
    Abstract: A process for removing or reducing the directionality or anisotropy of a surface and for making the surface specular on a substrate material consisting of aluminium or an aluminium alloy, by (a) chemically etching the substrate material, (b) subjecting the etched substrate material substrate material to electrochemical polishing by using a solution, and (c) subjecting the substrate material to additional chemical etching and electrochemical polishing directly after step (b), wherein the surface of the substrate material is not exposed to air between the etching and the electrochemical polishing.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: August 6, 2002
    Assignees: Norsk Hydro ASA, Glamox Fabrikker AS
    Inventors: John Erik Lein, Cornelis Spooren, Jostein Mårdalen, Jan Morten Søraker, Merete Hallenstvet
  • Publication number: 20020074238
    Abstract: The present invention pertains to apparatus and methods for planarization of metal surfaces having both recessed and raised features, over a large range of feature sizes. The invention accomplishes this by increasing the fluid agitation in raised regions with respect to recessed regions. That is, the agitation of the electropolishing bath fluid is agitated or exchanged as a function of elevation on the metal film profile. The higher the elevation, the greater the movement or exchange rate of bath fluid. In preferred methods of the invention, this agitation is achieved through the use of a microporous electropolishing pad that moves over (either near or in contact with) the surface of the wafer during the electropolishing process. Thus, methods of the invention are electropolishing methods, which in some cases include mechanical polishing elements.
    Type: Application
    Filed: September 28, 2001
    Publication date: June 20, 2002
    Inventors: Steven T. Mayer, Robert J. Contolini, Eliot K. Broadbent, John S. Drewery
  • Patent number: 6376285
    Abstract: An epitaxial layer of silicon is grown on a layer of partially-oxidized porous silicon, then covered by a capping layer which provides structural support and prevents oxidation of the epitaxial layer. A high-temperature anneal allows the partially oxidized silicon layer to separate into distinct layers of silicon and SiO2, producing a buried oxide layer. This method provides a low cost means of producing silicon-on-insulator (SOI) wafers.
    Type: Grant
    Filed: May 20, 1999
    Date of Patent: April 23, 2002
    Assignee: Texas Instruments Incorporated
    Inventors: Keith A. Joyner, Leland S. Swanson
  • Publication number: 20020025378
    Abstract: A method is disclosed for treating the surface of tools made of tool steel, wherein primary carbides are embedded in the tool steel matrix. The thickness of the primary carbides disposed near the surface can be reduced by forming a surface which has point-wise recess; alternatively, the primary carbides can be completely removed. A hard material layer is deposited on this surface. The invention also describes tools made of tool steel, wherein primary carbides are embedded in the tool steel matrix. The primary carbides are significantly recessed, and a hard material layer is deposited thereon.
    Type: Application
    Filed: August 13, 2001
    Publication date: February 28, 2002
    Inventors: Klaus Keller, Fritz Koch
  • Patent number: 6315885
    Abstract: The present invention relates to a method of electropolishing aided by ultrasonic means having the capability of rapidly discharging dregs. More specifically, the invention relates to a method of electrochemical polishing process aided by an auxiliary ultrasonic cleaning device which emits ultrasonic vibrating energy to effectively discharge dregs, shorten the polishing cycle time for each workpiece, and improve the surface roughness of the workpiece. The present invention further provides an electropolishing apparatus that can be easily retrofitted to almost every existing machine tool as an auxiliary unit. Alternately, the ultrasonic apparatus can be installed separately as an independent ultrasonic generating unit.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: November 13, 2001
    Assignee: National Science Council
    Inventor: Hong Hocheng
  • Publication number: 20010025799
    Abstract: In a process for producing an aluminum support of a lithographic printing plate, the desired aluminum support is produced by imparting fine asperities to an aluminum plate and then roughening it electrochemically in an acidic aqueous solution. The roughened aluminum plate may be electropolished or chemically etched.
    Type: Application
    Filed: June 5, 2001
    Publication date: October 4, 2001
    Inventors: Atsuo Nishino, Yoshitaka Masuda, Hirokazu Sawada, Akio Uesugi
  • Patent number: 6267867
    Abstract: A process for coating a tungsten carbide base material substrate with CVD diamond film includes carburization and gas-assisted vaporization of cobalt from the surface with simultaneous recrystallization of surface grains of tungsten carbide to change their stoichiometry for improved adherence. Also disclosed is a WC—Co cutting tool having a relatively fine WC grain size and being coated with adherent CVD diamond.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: July 31, 2001
    Assignee: Saint-Gobain Industrial Ceramics, Inc.
    Inventor: James M. Olson
  • Patent number: 6264821
    Abstract: In a process for producing an aluminum support of a lithographic printing plate, the desired aluminum support is produced by imparting fine asperities to an aluminum plate and then roughening it electrochemically in an acidic aqueous solution. The roughened aluminum plate may be electropolished or chemically etched.
    Type: Grant
    Filed: December 16, 1998
    Date of Patent: July 24, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Atsuo Nishino, Yoshitaka Masuda, Hirokazu Sawada, Akio Uesugi
  • Patent number: 6143158
    Abstract: A method for producing an aluminum support for a lithographic printing plate comprising the steps of (a) electrolytic polishing an aluminum plate in an alkaline aqueous solution; and (b) electrochemically surface roughening the aluminum plate using direct or alternating current in an acidic aqueous solution in this order, and also a method for producing an aluminum support for a lithographic printing plate comprising an electrolytic polishing step of treating an aluminum plate used as an anode in an alkaline aqueous solution at a current density of 5 A/dm.sup.2 to 200 A/dm.sup.2 while allowing the alkaline aqueous solution to flow between the aluminum plate and an electrode at an average flow rate of 10 cm/second to 400 cm/second.
    Type: Grant
    Filed: April 24, 1998
    Date of Patent: November 7, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Atsuo Nishino, Yoshitaka Masuda, Akio Uesugi