Preliminary Cleaning Or Shaping Of Workpiece Patents (Class 205/660)
  • Patent number: 6103028
    Abstract: A new method of creating thin free-standing pin hole-free hydrogen-selective palladium-bearing membranes that comprises thinning cold-rolled membranes by chemical etching or electrochemically electrolyzing of at least one membrane surface, and novel membranes produced thereby and including membranes with selected portions only thereof so thinned.
    Type: Grant
    Filed: February 18, 1999
    Date of Patent: August 15, 2000
    Assignee: Walter Juda Associates, Inc.
    Inventors: Walter Juda, Charles W. Krueger, R. Todd Bombard
  • Patent number: 6056869
    Abstract: A device for electrochemically deplating metal from side edges and a backside of a semiconductor wafer or substrate. The device includes a shaped cathode having a shape substantially corresponding to a shape of at least a portion of the semiconductor wafer, such that the shaped cathode at least partially covers the backside and at least partially covers the side edges of the semiconductor wafer. The position of at least one of the semiconductor wafer and the shaped cathode is altered by position altering apparatus during the electrochemical deplating.
    Type: Grant
    Filed: June 4, 1998
    Date of Patent: May 2, 2000
    Assignee: International Business Machines Corporation
    Inventor: Cyprian Emeka Uzoh
  • Patent number: 5993636
    Abstract: A method of making a needle electrode is such that a neck portion is formed in a thin wire made of a tungsten single crystal and the thin wire is cut at the neck portion by feeding an electric current in electrolyte.
    Type: Grant
    Filed: June 11, 1997
    Date of Patent: November 30, 1999
    Assignee: Denki Kagaku Kogyo Kabushiki Kaisha
    Inventors: Yoshinori Terui, Katsuyoshi Tsunoda
  • Patent number: 5900134
    Abstract: A method and apparatus is described for producing a large number of identical parts from a bar of material by electrochemical machining without the intervention of an operator. The apparatus comprises a spindle for supporting the bar and periodically feeding it in the direction of its axis, and an electrochemical machining assembly comprising cathodes for shaping the leading end portion of the bar to form the part. After the part has been shaped, it is electrochemically cut from the bar, and the bar is advanced longitudinally by the spindle in order to proceed with the machining of the next part.
    Type: Grant
    Filed: December 31, 1996
    Date of Patent: May 4, 1999
    Assignee: Societe Nationale d'Etude et de Construction de Monteurs d'Aviation "SNECMA"
    Inventors: Jacques Marie Pierre Stenneler, Pierre Marc Serge Lechervy
  • Patent number: 5853561
    Abstract: The present invention teaches a method of producing a textured surface upon an arbitrarily configured titanium or titanium alloy object for the purpose of improving bonding between the object and other materials such as polymer matrix composites and/or human bone for the direct in-growth of orthopaedic implants. The titanium or titanium alloy object is placed in an electrolytic cell having an ultrasonically agitated solution of sodium chloride therein whereby a pattern of uniform "pock mark" like pores or cavities are produced upon the object's surface. The process is very cost effective compared to other methods of producing rough surfaces on titanium and titanium, alloy components. The surface textures produced by the present invention are etched directly into the parent metal at discrete sites separated by areas unaffected by the etching process. Bonding materials to such surface textures on titanium or titanium alloy can thus support a shear load even if adhesion of the bonding material is poor.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: December 29, 1998
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventor: Bruce A. Banks
  • Patent number: 5810994
    Abstract: A silicon on-insulator device wafer having a very thin monocrystalline film with uniform thickness. It is fabricated by vias technique in which a monocrystalline silicon film on an insulator is etched with a base silicon etching solution in an etch apparatus by applying a vias in such a way that the solution may serve as an anode and the substrate of SOI structure as a cathode. The presence of the insulator generates vacancies in a lower region of the monocrystalline silicon film and electrons in the substrate, so that the lower region charged with the vacancies is not removed by the base silicon etching solution, thereby leaving a highly uniform, thin monocrystalline silicon film.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: September 22, 1998
    Assignee: Korea Advanced Institute of Science and Technology
    Inventors: Ho Jun Lee, Choong Ki Kim, Chul Hi Han
  • Patent number: 5755949
    Abstract: A plate-, foil- or web-shaped workpiece of aluminum or an alloy thereof is subjected, in an electrolyte bath, to an alternating current at a frequency of 0.1 to 25 Hz. During the AC treatment, an anodic potential is imposed on the workpiece, in the range of 0 to 5 Volts. The total charge input is 10 to 60 kC/m.sup.2. Prior to the electrochemical graining, the workpiece is mechanically grained. After the graining steps, an etching treatment as well as an anodical oxidation and, thereafter, a hydrophilization are performed.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: May 26, 1998
    Assignee: AGFA-Gevaert AG
    Inventor: Martin Philip Amor
  • Patent number: 5728286
    Abstract: A method of manufacturing an extrusion die for extruding a honeycomb structural body is disclosed. The extrusion die has a plurality of forming channels which have a shape in a traverse cross section corresponding to that of the honeycomb structural body and have a predetermined depth from a front side of the extrusion die toward a back side, and a plurality of opening holes for feeding raw materials which have a cylindrical shape extending independently from the back side toward the front side and are arranged at a cross portion and/or a straight portion of the forming channels in such a manner that each opening hole is opened and connected to the cross portion and/or straight portion of the forming channels.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: March 17, 1998
    Assignees: NGK Insulators, Ltd., Institute of Technology Precision Electrical Discharge Works
    Inventors: Kazuo Suzuki, Shoji Futamura
  • Patent number: 5650059
    Abstract: A carbide substrate including a binder prepared to receive a cutting material such as a diamond coating thereon. The substrate is immersed in an electrolyte solution with the substrate acting as the anode thereby providing for an electro-polished substrate surface. The electro-polished substrate surface is then etched to substantially remove the binder phase of the carbide substrate, the etching being to a depth of up to about 15 microns. The resulting surface is susceptible for receiving a coating of the diamond cutting material.
    Type: Grant
    Filed: August 11, 1995
    Date of Patent: July 22, 1997
    Assignee: Credo Tool Company
    Inventors: Carl Shumaker, Zane D. Lockhart, Jr., Oscar H. Miller
  • Patent number: 5507924
    Abstract: Disclosed herein are methods of measuring, adjusting and uniformalizing a sectional area ratio of a metal-covered electric wire, a method of cleaning an electric wire, a method of manufacturing a metal-covered electric wire, an apparatus for measuring a sectional area ratio of a metal-covered electric wire, and an apparatus for electropolishing a metal-covered electric wire.Electric resistance values of first and second materials are previously stored respectively so that a sectional area ratio of a metal-covered electric wire is calculated on the basis of the as-stored values and an actually measured electric resistance value of the metal-covered electric wire. Measurement and uniformalization of a sectional area ratio of a metal-covered electric wire and cleaning of an electric wire are carried out by dissolving surface layer parts of the electric wires by electropolishing.
    Type: Grant
    Filed: January 31, 1994
    Date of Patent: April 16, 1996
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Akira Mikumo, Kenichi Takahashi, Masanobu Koganeya
  • Patent number: 5507925
    Abstract: A process is set forth for electrochemically machining holes in a workpiece, such as a die, in such a manner so as to virtually eliminate surface finish patterns normally introduced by the electrochemical machining process, by randomly forming sequences of patterns of holes extending in rows across the workpiece along its extent, and then rotating the workpiece 180.degree. and randomly forming additional sequences of patterns of holes across the workpiece adjacent those sequences of holes which were formed prior to rotating the workpiece 180.degree..
    Type: Grant
    Filed: October 28, 1994
    Date of Patent: April 16, 1996
    Assignee: Corning Incorporated
    Inventor: Thomas W. Brew
  • Patent number: 5503718
    Abstract: A method of etching an aluminum foil for electrolytic capacitors, comprising the steps of electrolytically etching an aluminum foil for electrolytic capacitors that has a high cubic texture in an electrolyte containing a chloride to form pits, and enlarging the pits formed in the above step by etching, in which step of forming pits the current density is increased from 0 to a maximum value quickly and then is decreased gradually.
    Type: Grant
    Filed: February 22, 1995
    Date of Patent: April 2, 1996
    Assignee: Nihon Chikudenki Kogyo Kabushiki
    Inventor: Kaoru Kakizakai