Etching To Produce Porous Or Perforated Article Patents (Class 216/56)
  • Patent number: 8293124
    Abstract: A method of multi-stage substrate etching is provided.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: October 23, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chan Wook Baik, Seog Woo Hong, Jong Seok Kim, Seong Chan Jun, Sun Il Kim
  • Patent number: 8294034
    Abstract: A circuit board including a circuit substrate, a first dielectric layer, an antagonistic activation layer, a first conductive layer, a second conductive layer and a second dielectric layer is provided. The circuit substrate has a first surface and a first circuit layer. The first dielectric layer is disposed on the circuit substrate and covers the first surface and the first circuit layer. The first dielectric layer has a second surface, at least a blind via extending from the second surface to the first circuit layer and an intaglio pattern. The antagonistic activation layer is disposed on the second surface of the dielectric layer. The first conductive layer is disposed in the blind via. The second conductive layer is disposed in the intaglio pattern and the blind via and covers the first conductive layer. The second conductive layer is electrically connected with the first circuit layer via the first conductive layer.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: October 23, 2012
    Assignee: Unimicron Technology Corp.
    Inventors: Tzyy-Jang Tseng, Shu-Sheng Chiang, Tsung-Yuan Chen
  • Patent number: 8273665
    Abstract: A method of making a nanoparticle array that includes replicating a dimension of a self-assembled film into a dielectric film, to form a porous dielectric film, conformally depositing a material over said porous dielectric film, and anisotropically and selectively etching said deposited material.
    Type: Grant
    Filed: August 20, 2009
    Date of Patent: September 25, 2012
    Assignee: International Business Machines Corporation
    Inventors: Charles T. Black, Kathryn Wilder Guarini
  • Publication number: 20120234794
    Abstract: A mold of an embodiment of the present invention has a surface that has a shape which is inverse of a surface shape of a moth-eye structure. This surface has a plurality of protrusions, a plurality of ridges extending between the plurality of protrusions via saddle portions, and a plurality of holes, each of which is defined by at least any three of the plurality of protrusions and ridges extending between the at least any three of the plurality of protrusions, and an average distance between centers of adjacent holes, p, and an average depth of the saddle portions, r, satisfy the relationship of 0.15?r/p?0.60.
    Type: Application
    Filed: November 25, 2010
    Publication date: September 20, 2012
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Akinobu Isurugi, Kiyoshi Minoura, Tokio Taguchi, Takao Imaoku
  • Patent number: 8268180
    Abstract: Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: September 18, 2012
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Michael S. Arnold, Padma Gopalan, Nathaniel S. Safron, Myungwoong Kim
  • Publication number: 20120199551
    Abstract: Selective etching techniques are used to manufacture a basic filtration element, which can then be used as a basis for constructing various devices for different applications. In this process, sheets of etchable material are etched from one or both sides of that sheet to form channels in a premasked pattern, which controls the minimum opening of the filtration element. The desired channel opening is only limited by the capability of the photochemical etching system being used. Alternatively, a filter element may be made by rolling or extruding a first sheet to form a plurality of recessed areas bordered by lands, selectively etching or punching through the recessed pattern areas, and bonding a second sheet having a plurality of etched or punched through areas to the first sheet, and, aligning the etched through areas to the second sheet with the recessed areas of the first sheet.
    Type: Application
    Filed: April 18, 2012
    Publication date: August 9, 2012
    Inventor: Kleo Kwok
  • Patent number: 8231797
    Abstract: A process for producing at least one air gap in a microstructure, which includes the supply of a microstructure comprising at least one gap filled with a sacrificial material, this gap being limited over at least part of its surface by an impermeable membrane but which may be rendered permeable by the action of a chemical etchant, this etchant also being capable of degrading the sacrificial material and the contacting of the microstructure with said chemical etchant in order to make the membrane permeable and degrade the sacrificial material, and the removal of the chemical etchant from the microstructure and in which the chemical etchant is a fluid containing hydrofluoric acid and/or ammonium fluoride. Applications include microelectronics and micro-technology.
    Type: Grant
    Filed: January 14, 2009
    Date of Patent: July 31, 2012
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Vincent Jousseaume, Aziz Zenasni
  • Patent number: 8226836
    Abstract: Described herein are systems, devices, and methods relating to packaging electronic devices, for example, microelectromechanical systems (MEMS) devices, including optical modulators such as interferometric optical modulators. The interferometric modulator disclosed herein comprises a movable mirror. Some embodiments of the disclosed movable mirror exhibit a combination of improved properties compared to known mirrors, including reduced moving mass, improved mechanical properties, and reduced etch times.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: July 24, 2012
    Assignee: Qualcomm MEMS Technologies, Inc.
    Inventors: Clarence Chui, Jeffrey B. Sampsell
  • Publication number: 20120171755
    Abstract: The present invention provides a method of fabricating a device having hollow nanoneedles which extend through a supporting membrane. The device can be used as a molecular delivery system.
    Type: Application
    Filed: December 28, 2011
    Publication date: July 5, 2012
    Applicant: Technion Research and Development Foundation Ltd.
    Inventors: Elad Peer, Uri Sivan
  • Patent number: 8206601
    Abstract: Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: June 26, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Joan K. Bosworth, Elizabeth A. Dobisz, Ricardo Ruiz, Franck D. Rose dit Rose
  • Patent number: 8202439
    Abstract: A diaphragm is formed by etching a substrate. This substrate has a first surface provided with a depression by isotropic dry etching, and a second surface opposite the first surface. Furthermore, a through-hole is formed from the depression to the second surface by anisotropic dry etching. The depression and the through-hole are formed by using one resist mask. The depression has a hemispherical shape or a semi-elliptical spherical shape.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: June 19, 2012
    Assignee: Panasonic Corporation
    Inventors: Masaya Nakatani, Soichiro Hiraoka, Hiroshi Ushio, Akiyoshi Oshima, Hiroaki Oka, Fumiaki Emoto
  • Publication number: 20120148872
    Abstract: An aluminum article includes a substrate comprising a surface having a plurality of pores defined therein by high energy beam etching; and a transparent vacuum deposition layer deposited on the surface and filling the pores.
    Type: Application
    Filed: June 21, 2011
    Publication date: June 14, 2012
    Applicants: HON HAI PRECISION INDUSTRY CO., LTD., HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD.
    Inventors: HSIN-PEI CHANG, WEN-RONG CHEN, HUANN-WU CHIANG, CHENG-SHI CHEN, HUA-YANG XU
  • Publication number: 20120145650
    Abstract: The disclosure relates generally to nano-filters and methods of forming same, and methods of filtration. The nano-filter includes a substrate and at least one nanowire structure located between an inlet and an outlet. The nanowire structure may include a plurality of vertically stacked horizontal nanowires.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 14, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Brent A. Anderson, Andres Bryant, Edward J. Nowak, Jeffrey W. Sleight
  • Publication number: 20120145007
    Abstract: An absorption cell includes a first absorption layer formed of a first absorbent, and a second absorption layer formed of a second absorbent having a higher density than the first absorbent and coated on the surface of the first absorption layer so as to prevent generation of dust particles from the first absorption layer. The upper surface of the first absorption layer is coated with the second absorption layer formed of the high-density absorbent, thereby preventing generation of minute dust particles and thus preventing secondary contamination.
    Type: Application
    Filed: November 1, 2011
    Publication date: June 14, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jee Yong Kim, Rae Eun Park
  • Publication number: 20120141701
    Abstract: A zircon body for use in glass manufacturing is provided containing zircon grains and an intergranular phase present between the zircon grains. The intergranular phase may contain silicon oxide. The body may be exposed to a halide to at least partially remove at least a majority of the silicon oxide contained in the intergranular phase from the outer portion or to at least partially remove the intergranular phase along an outer portion of the component.
    Type: Application
    Filed: December 2, 2011
    Publication date: June 7, 2012
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Julien P. Fourcade, Olivier Citti
  • Publication number: 20120134909
    Abstract: Porous three-dimensional networks of polyimide and porous three-dimensional networks of carbon and methods of their manufacture are described. For example, polyimide aerogels are prepared by mixing a dianhydride and a diisocyanate in a solvent comprising a pyrrolidone and acetonitrile at room temperature to form a sol-gel material and supercritically drying the sol-gel material to form the polyimide aerogel. Porous three-dimensional polyimide networks, such as polyimide aerogels, may also exhibit a fibrous morphology. Having a porous three-dimensional polyimide network undergo an additional step of pyrolysis may result in the three dimensional network being converted to a purely carbon skeleton, yielding a porous three-dimensional carbon network. The carbon network, having been derived from a fibrous polyimide network, may also exhibit a fibrous morphology.
    Type: Application
    Filed: August 22, 2011
    Publication date: May 31, 2012
    Applicant: Aerogel Technologies, LLC
    Inventors: Nicholas Leventis, Chariklia Sotiriou-Leventis, Chakkaravarthy Chidambareswarapattar
  • Publication number: 20120111129
    Abstract: The invention relates to a device for the actively-controlled deposition of microdrops of biological solutions. The inventive device includes at least one flat silicon lever comprising a central body and an end area which forms a point, a slit or groove being disposed in said point. The invention is characterized in that it also comprises at least one metallic track which is disposed on one face of the central body and which runs alongside said slit or groove at least partially. The invention also relates to a method of producing the inventive device and a method for the active-controlled deposition and sampling of microdrops of biological solutions using said device.
    Type: Application
    Filed: November 14, 2011
    Publication date: May 10, 2012
    Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Christian Bergaud, Matthieu Guirardel, Pascal Belaubre, Benoit Belier, Jean-Bernard Pourciel
  • Patent number: 8173033
    Abstract: In a nano filter structure for breathing and a manufacturing method of the nano filter structure, a semiconductor process technology is used for manufacturing a nano filter structure comprising a top gate, a bottom gate, a plurality of sidewall gates and a plurality of supports. The sidewall gates include a plurality of filterable gratings, and the filterable gratings are controlled precisely to a nanoscale by a semiconductor process technology. Therefore, the nano filterable gratings can be manufactured easily and quickly, and the multilayer design of the filterable gratings enhances the aperture ratio of a filter material, such that users can inhale or exhale easily through the filter material.
    Type: Grant
    Filed: December 9, 2011
    Date of Patent: May 8, 2012
    Inventor: Shu-Yuan Chuang
  • Publication number: 20120085734
    Abstract: An expandable stent includes a tubular structure with an outer surface positionable adjacent to a vessel wall and an inner surface facing a lumen of a body passageway. The tubular structure further includes a plurality of expansion struts, connector struts and cells. The tubular structure has a first diameter which permits intraluminal delivery of the tubular structure into the body passageway, and a second expanded and deformed diameter which is achieved upon the application of a radially, outwardly extending force. A plurality of cavities are formed in the outer surface of the stent.
    Type: Application
    Filed: December 14, 2011
    Publication date: April 12, 2012
    Applicant: BOSTON SCIENTIFIC SCIMED, INC.
    Inventor: G. David Jang
  • Publication number: 20120080361
    Abstract: Methods and devices for isolating and sorting nanoparticles are disclosed herein. Nanopores of a desired size can be formed in silicon dioxide membranes and used as filters to separate nanoparticles. Devices are also provided herein for sorting nanoparticles with multiple filters having various sized nanopores.
    Type: Application
    Filed: September 30, 2011
    Publication date: April 5, 2012
    Inventors: Sameer Walavalkar, Aditya Rajagopal, Axel Scherer, Thomas A. Tombrello
  • Patent number: 8142700
    Abstract: Dry adhesives and methods for forming dry adhesives. A method of forming a dry adhesive structure on a substrate, comprises: forming a template backing layer of energy sensitive material on the substrate; forming a template layer of energy sensitive material on the template backing layer; exposing the template layer to a predetermined pattern of energy; removing a portion of the template layer related to the predetermined pattern of energy, and leaving a template structure formed from energy sensitive material and connected to the substrate via the template backing layer.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: March 27, 2012
    Assignee: Carnegie Mellon University
    Inventors: Metin Sitti, Michael Murphy, Burak Aksak
  • Publication number: 20120070752
    Abstract: A membrane humidifier assembly for a membrane humidifier for a fuel cell system and a method for making the same is disclosed, the method comprising the steps of providing a material for forming a diffusion medium; forming a plurality of channels in the material with one of a channel-forming roller, a means for etching the material, and a press for forming the diffusion medium; and providing a pair of membranes, wherein the diffusion medium is disposed between the pair of membranes.
    Type: Application
    Filed: September 17, 2010
    Publication date: March 22, 2012
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
    Inventors: Jeffrey M. Guzda, David A. Martinchek
  • Patent number: 8137569
    Abstract: A method of fabricating a membrane having a tapered pore, a polymeric membrane having a tapered pore, and uses of such polymeric membrane are disclosed. The membrane includes apertures of increasing diameter which are aligned with each other to form the tapered pore.
    Type: Grant
    Filed: March 23, 2009
    Date of Patent: March 20, 2012
    Assignees: Sony Deutschland GmbH, Oxford Nanopore Technologies Limited
    Inventors: Oliver Harnack, Jurina Wessels, Akio Yasuda, James Clarke, Terry Reid
  • Publication number: 20120061349
    Abstract: A method for correcting the critical dimension (CD) of a phase shift mask includes calculating an intensity slope quantifying a slope of an intensity waveform of secondary electrons emitted by scanning an electron beam spot to a hard mask pattern on a phase shift mask on a substrate, extracting a delta critical dimension (CD) value, which is equal to a CD difference between the phase shift pattern and the hard mask pattern, as a delta CD value corresponding to the intensity slope, and correcting the CD of the phase shift mask by using the extracted delta CD value.
    Type: Application
    Filed: September 9, 2011
    Publication date: March 15, 2012
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Choong Han RYU
  • Publication number: 20120058328
    Abstract: The present invention relates to a process for fabricating a porous coatings with controlled structure in the micro and nano-size domain. In particular, but not exclusively, it relates to a process for fabricating coatings with an anisotropic pore size distribution and to coatings obtained using such coatings. It describes in particular the use of ink-jet method to deposit in a controlled way such coatings. It also relates to porous coatings with controlled structure in the micro and nano-size domain. The coating has a thickness between 10 nanometres and 10 millimetres and its porosity is created in such a way that the pore size distribution is anisotropic. It finally describes objects covered with this coating.
    Type: Application
    Filed: May 26, 2009
    Publication date: March 8, 2012
    Inventors: Arnaud Tourvieille, Heinrich Hofmann, Laurent-Dominque Piveteau
  • Patent number: 8123960
    Abstract: Methods for fabricating sublithographic, nanoscale microchannels utilizing an aqueous emulsion of an amphiphilic agent and a water-soluble, hydrogel-forming polymer, and films and devices formed from these methods are provided.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: February 28, 2012
    Assignee: Micron Technology, Inc.
    Inventor: Dan B. Millward
  • Patent number: 8123963
    Abstract: A method for producing a semiconductor component includes forming an n-doped layer in a p-doped layer of the semiconductor component, wherein the n-doped layer comprises at least one of: a sieve-like layer or a network-like layer. The method also includes porously etching the p-doped layer between the material of the n-doped layer to form a top electrode, and forming a cavity below the n-doped layer.
    Type: Grant
    Filed: May 12, 2008
    Date of Patent: February 28, 2012
    Assignee: Robert Bosch GmbH
    Inventors: Hubert Benzel, Heribert Weber, Hans Artmann, Frank Schaefer
  • Publication number: 20120043299
    Abstract: A method for manufacturing a composite of metal and resin including following steps: providing a metal piece; cleaning the metal piece in a degreasing agent solution; etching the surface of the metal piece by focused ion beam to form a pattern of nanopores; inserting the metal piece into a mold and heating the metal piece to reach a temperature in a range of 100° C. to 350° C.; and injecting molten resin material on the metal piece. The resin material is combined with the metal piece when the resin material is cool.
    Type: Application
    Filed: December 26, 2010
    Publication date: February 23, 2012
    Applicants: HON HAI PRECISION INDUSTRY CO., LTD., HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD.
    Inventors: HSIN-PEI CHANG, WEN-RONG CHEN, HUANN-WU CHIANG, CHENG-SHI CHEN, HUA-YANG XU
  • Publication number: 20120018613
    Abstract: A mold of the present invention includes: a base 12 made of glass or plastic; an inorganic underlayer 14 provided on a surface of the base 12; a buffer layer 16 provided on the inorganic underlayer 14, the buffer layer 16 containing aluminum; an aluminum layer 18a provided on a surface of the buffer layer 16; and a porous alumina layer 20 provided on a surface of the aluminum layer 18a. The porous alumina layer 20 has a plurality of recessed portions 22 whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm. The mold of the present invention has excellent adhesion between the aluminum layer and the base.
    Type: Application
    Filed: April 6, 2010
    Publication date: January 26, 2012
    Inventors: Hidekazu Hayashi, Kiyoshi Minoura, Akinobu Surugi
  • Patent number: 8097173
    Abstract: The invention provides porous particles that produce a predetermined optical response and that may be manipulated magnetically. A preferred particle of the invention has a porous structure that produces a predetermined optical response and magnetic material adhered to the particle. Another preferred particle is amphiphilic. The optical response provided by a particle of the invention enables particles of the invention to be used in sensing, labeling, signaling, display and many other applications. The magnetic nature of the present magnetic particles permits the particles themselves to be manipulated, e.g., vibrated, moved and re-oriented. The porous particles can also be used to control, move, and/or deliver small volumes of liquids and solids associated with the particles.
    Type: Grant
    Filed: July 18, 2005
    Date of Patent: January 17, 2012
    Assignee: The Regents of the University of California
    Inventors: Michael J. Sailor, Yang Yang Li, Nathan Trujillo, Jason Dorvee
  • Publication number: 20120007273
    Abstract: A method of molding a polymeric material to create a desired texture therein using an alumina mold having a plurality of cylindrical pores disposed therein, the method comprising the steps of: a) providing a porous alumina master having a plurality of cylindrical pores dispersed therein, said plurality of cylindrical pores corresponding to projections to be imparted to a surface of a film; disposing a polymeric material between a film and the porous alumina master; and c) applying mechanical pressure to roll the porous alumina master into the polymeric material, wherein the texture imparted to the polymeric molding material comprises projections corresponding to the cylindrical pores of the porous alumina master. A release agent is applied to the porous alumina master prior to disposing the polymeric molding material between the porous alumina master and the film.
    Type: Application
    Filed: July 12, 2010
    Publication date: January 12, 2012
    Inventors: Graham J. Hubbard, Keith P. Parsons
  • Publication number: 20110315660
    Abstract: Disclosed are a method for recycling silica waste and a method for preparing nanoporous material and other valuable silica materials. More specifically, a method for preparing a nanoporous material by recycling silica-containing waste produced from a silica etching process in the synthesis of nanoporous carbon is provided. The present disclosure allows recycling of silica waste in an effective and environment-friendly manner, reduction of consumption of chemical materials, and reduction of chemical waste. Accordingly, the present disclosure enables effective preparation of various valuable nanoporous silica and other silica materials from silica waste released for production of various nanoporous materials.
    Type: Application
    Filed: April 29, 2011
    Publication date: December 29, 2011
    Inventor: Jong-Sung Yu
  • Patent number: 8052884
    Abstract: A method of fabricating a microchannel plate includes defining a plurality of pores extending from a top surface of a substrate to a bottom surface of the substrate where the plurality of pores has a resistive material on an outer surface that forms a first emissive layer. A second emissive layer is formed over the first emissive layer. The second emissive layer is chosen to achieve at least one of an increase in secondary electron emission efficiency and a decrease in gain degradation as a function of time. A top electrode is formed on the top surface of the substrate and a bottom electrode is formed on the bottom surface of the substrate.
    Type: Grant
    Filed: February 27, 2008
    Date of Patent: November 8, 2011
    Assignee: Arradiance, Inc.
    Inventors: Neal T. Sullivan, David Beaulieu, Anton Tremsin, Philippe De Rouffignac, Michael D. Potter
  • Patent number: 8047156
    Abstract: The present disclosure is drawn to dice with polymer ribs. In one example, a die structure can comprise a die having a plurality of die slots, the die having polymer ribs attached to one side thereof, wherein the polymer ribs are attached using a polymer film on one side of the die, said polymer film having portions removed along the die slots to form the polymer ribs which bridge the die slots, thereby forming a plurality of polymer bridged die slots.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: November 1, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Manish Giri, Arun K. Agarwal, Bradley D. Chung, Jeremy Harlan Donaldson
  • Publication number: 20110259083
    Abstract: A novel method of manufacturing a hydrogen sensor is disclosed. The method includes the steps of forming a thin film made of a transition metal or an alloy thereof on a surface of an elastic substrate, and forming a plurality of nanogaps in the thin film formed on the surface of the elastic substrate by applying a tensile force to the elastic substrate. The nanogaps are formed as the thin film is stretched in a direction in which the tensile force acts while being contracted in a direction perpendicular to the direction in which the tensile force acts when the tensile force is applied, and is contracted again in the direction in which the tensile force is released while being stretched again in the direction perpendicular to the direction in which the tensile force is released when the tensile force is released.
    Type: Application
    Filed: December 3, 2010
    Publication date: October 27, 2011
    Applicant: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
    Inventors: Woo Young Lee, Jun Min Lee, Eun Yeong Lee
  • Patent number: 8043519
    Abstract: In a through hole closing process, a metal plate is attached to one surface of a conductive base member having a plurality of through holes by the use of a magnet, in a copper plating process, a copper plating layer is formed on the conductive base member and the metal plate exposed within the through holes, from the side of the conductive base member where the metal plate is not attached, thereby to fill up the through holes, in a film forming process, a Pd alloy film is formed by plating on the surface of the conductive base member after removal of the metal plate, and in a removal process, the copper plating layer is removed by selective etching, thereby to produce a hydrogen production filter that is used in a reformer a fuel cell so as to be capable of stably producing high purity hydrogen gas.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: October 25, 2011
    Assignee: Dai Nippon Insatsu Kabushiki Kaisha
    Inventors: Hiroshi Yagi, Takanori Maeda, Yoshinori Oota, Yasuhiro Uchida
  • Patent number: 8043520
    Abstract: A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc?No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: October 25, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
  • Patent number: 8038895
    Abstract: A method for detection of mechanical defects in a semiconductor ingot section which has at least one planar surface, and a thickness at right angles to this surface of 1 cm to 100 cm, involves scanning the planar surface by at least one ultrasound head which is coupled via a liquid coupling medium to the planar surface and, at each measurement point (x,y) producing at least one ultrasound pulse which is directed at the planar surface of the ingot section, recording the ultrasound-pulse echo as a function of time, such that an echo from the planar surface, an echo from a surface opposite the planar surface, and further echoes are detected, with the positions (xp, yp, zp) of mechanical defects in the ingot section being determined from the further echoes.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: October 18, 2011
    Assignee: Siltronic AG
    Inventors: Ludwig Koester, Peter Czurratis, Klaus Kraemer
  • Publication number: 20110233169
    Abstract: A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of nanopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.
    Type: Application
    Filed: March 29, 2011
    Publication date: September 29, 2011
    Applicant: Biomet 3i, LLC
    Inventors: Robert L. Mayfield, Ross W. Towse
  • Publication number: 20110226990
    Abstract: Silica core-shell microparticles are prepared by growing a porous silica shell from a silica precursor onto the surface of non-porous silica particle dispersed in a mixed surfactant solution under basic pH conditions. The particles are hydrothermally treating in an oil-in-water emulsion system and the particles are calcined to remove residual surfactants. Optionally, the particles of may be base etched to expand the size of the pores in the silica shell. Core-shell silica particles with an ordered mesoporous layer are produced.
    Type: Application
    Filed: November 26, 2009
    Publication date: September 22, 2011
    Inventors: Jeremy D. Glennon, Jesse Omamagho
  • Patent number: 8012363
    Abstract: A method of fabricating a printhead having a hydrophobic ink ejection face, the method comprising the steps of: (a) providing a partially-fabricated printhead comprising a plurality of nozzle chambers and a nozzle plate having relatively hydrophilic nozzle surface, the nozzle surface at least partially defining the ink ejection face of the printhead; (b) depositing a hydrophobic polymeric layer onto the nozzle surface; (c) depositing a protective metal film onto at least the polymeric layer; (d) depositing a sacrificial material onto the polymeric layer; (e) patterning the sacrificial material to define a plurality of nozzle opening regions; (f) defining a plurality of nozzle openings through the metal film, the polymeric layer and the nozzle plate; (g) subjecting the printhead to an oxidizing plasma; and (h) removing the protective metal film, thereby providing a printhead having a relatively hydrophobic ink ejection face.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: September 6, 2011
    Assignee: Silverbrook Research Pty Ltd
    Inventors: Gregory John McAvoy, Emma Rose Kerr, Kia Silverbrook
  • Patent number: 7993534
    Abstract: A method for forming a chemical microreactor includes forming at least one capillary microchannel in a substrate having at least one inlet and at least one outlet, integrating at least one heater into the chemical microreactor, interfacing the capillary microchannel with a liquid chemical reservoir at the inlet of the capillary microchannel, and interfacing the capillary microchannel with a porous membrane near the outlet of the capillary microchannel, the porous membrane being positioned beyond the outlet of the capillary microchannel, wherein the porous membrane has at least one catalyst material imbedded therein.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: August 9, 2011
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Jeffrey D. Morse, Alan Jankowski
  • Patent number: 7985686
    Abstract: A floating gate for a field effect transistor (and method for forming the same and method of forming a uniform nanoparticle array), includes a plurality of discrete nanoparticles in which at least one of a size, spacing, and density of the nanoparticles is one of templated and defined by a self-assembled material.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: July 26, 2011
    Assignee: International Business Machines Corporation
    Inventors: Charles T. Black, Kathryn Wilder Guarini
  • Publication number: 20110174728
    Abstract: The invention provides modified polysulfones substituted in one or more of the phenyl rings by functional groups and membranes composed of the modified polysulfones. Also provided are methods for the preparation of monodispersed nanoporous polymeric membranes. The membranes are useful for reverse osmosis, nanofiltration, and ultrafiltration, particularly for purification of water.
    Type: Application
    Filed: August 20, 2008
    Publication date: July 21, 2011
    Applicant: TECHNION RESEARCH AND DEVELOPMENT FOUNDATION LTD.
    Inventors: Moris S. Eisen, Raphael Semiat, Natalia Vainrot
  • Publication number: 20110165382
    Abstract: This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).
    Type: Application
    Filed: June 15, 2009
    Publication date: July 7, 2011
    Applicant: NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS"
    Inventors: Evangelos Gogolides, Aagelike Tserepi, Vassilios Constantoudis, Nikolaos Vourdas, Georgios Boulousis, Maria-Elenma Vlachopoulou LACHOPOULOU, Aikaterini Tsougeni, Dimitrios Kontziampasis
  • Publication number: 20110139707
    Abstract: A method for fabricating isolated pores in an inorganic membrane includes the steps of patterning the inorganic membrane to selectively expose a portion of the membrane, forming a plurality of tracks of material damage in the exposed portion of the inorganic membrane by irradiation with energetic ions, and chemically etching the track damaged material to define the pores through the inorganic membrane with a predetermined geometrically defined cross sectional shape and with a controlled diameter range from less than 1 nanometer and up to micrometer scale.
    Type: Application
    Filed: June 11, 2010
    Publication date: June 16, 2011
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Zuzanna S. Siwy, Ivan V. Vlassiouk, Pavel Yu Apel, Sergey N. Dmitriev
  • Patent number: 7960708
    Abstract: Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: June 14, 2011
    Assignee: University of Houston
    Inventors: John C. Wolfe, Paul Ruchhoeft
  • Patent number: 7955512
    Abstract: Disclosed are medical devices having textured surfaces and related methods for texturing. Methods of surface texturing using gas-phase plasma provide medical devices with myriad complex surface morphologies.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: June 7, 2011
    Assignee: Medtronic, Inc.
    Inventors: Eunsung Park, Catherine E. Taylor, Kevin Casey
  • Publication number: 20110122406
    Abstract: A method is provided to prepare one or more microfluidic channels on a receptive material by applying an image-forming material to a heat sensitive thermoplastic receptive material in a designed pattern and heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%. In an alternative aspect, the microfluidic channels on receptive material are prepared by etching a designed pattern into a heat sensitive thermoplastic material support and then heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%.
    Type: Application
    Filed: November 12, 2008
    Publication date: May 26, 2011
    Inventors: Michelle Khine, Chi-shuo Chen, Anthoy Grimes, David Nate Breslauer, Luke Lee, Michael Dunlap, Ajay Gopinathan, Sayantani Ghosh
  • Publication number: 20110120970
    Abstract: Disclosed herein is a method of producing an antireflection thin film using a block copolymer and an antireflection thin film prepared by the method. Specifically, the present invention relates to a method of producing a nanoporous antireflection film by spin-coating using a block copolymer solution and subsequent processing and a preparation by the method. The antireflection film of the present invention is prepared by coating a substrate with a block copolymer and selectively removing at least one block in the coated block copolymer to produce a nanoporous thin film with a pore size of 5 to 100 nm. When the thin film is applied to a substrate, an antireflection substrate which has a very low reflectance within a broad range of wavelength can be prepared.
    Type: Application
    Filed: November 30, 2007
    Publication date: May 26, 2011
    Applicant: Postech Academy-Industry Foundation
    Inventors: Won Chul Joo, Jin Kon Kim, Min Soo Park