Abstract: An exemplary embodiment of the present invention provides a foreign substance inspection system for a display unit, including: a lighting unit configured to provide incident light to a display unit having an organic light emitting display panel; and a foreign substance detecting unit configured to receive incident light that is reflected by the display unit and detect whether a foreign substance is introduced into the display unit.

Abstract: A method for inspecting printed products of a machine for processing printing substrates includes recording and digitizing produced printed products by using at least one image sensor and analyzing the printed products by using a computer to find potential defects. Defects in the printed products are detected by the computer by comparing the recorded and digitized printed image with a digital reference image, analyzing occurring deviations, and marking defective printed products in a manner suitable for removal. The computer spatially subdivides every digitized printed image into regions with deviations, calculates the time required to analyze every one of the regions, and terminates the analysis of a digitized printed image when the time required to analyze the regions exceeds a predefined value of time per digitized printed image.

Abstract: A camera apparatus is provided for detecting a stream of objects moving relative to the camera apparatus having a plurality of individual cameras that each have an image sensor for recording frames, wherein the frames overlap one another in part, having an evaluation unit for compiling frames, and having a geometry detection sensor for detecting geometrical data of the objects. The evaluation unit is here configured to generate an object image assembled from frames of an individual object of the stream of objects, with the selection of the participating frames and/or the assembly taking place on the basis of the geometrical data.

Abstract: In an embodiment, a system includes: a broadband light source; a wafer with a first side facing the broadband light source; a first light sensor configured to detect reflected light from the broadband light source emanating from the first side; a second light sensor configured to detect emergent light emanating from a second side of the wafer opposite the first side, wherein the emergent light originates from the broadband light source; and a detector module configured to analyze the reflected light and the emergent light to identify wafer defects.

Abstract: Systems for marking a moving film that include a triggering apparatus (140) that repeatedly provides a trigger signal, a controller (120) that receives the trigger signal and generates a marking signal, and a marking device (130) that receives the marking signal and marks the film are provided Also provided are methods for marking a moving film that employ the systems. Apparatuses for marking a moving film that include the triggering apparatus and the controller are also provided. Methods for making metallized marked films that include a film marked by these systems and a metallized layer, in which at least one marking is embedded within the film are also provided. Also provided are methods for making packages and packing a product in these packages, in which the packages include the metallized marked films are also provided.

Abstract: A test apparatus is provided for rapidly detecting abnormal loading of a microfluidic device, and unloading the abnormally-loaded microfluidic device, thereby preventing contamination of the test apparatus by a sample and degradation in reliability of test results. A test system including the test apparatus and a control method for the test apparatus are also provided. The test apparatus includes an optical sensor to photograph an image at a position corresponding to the microfluidic device, and a controller to detect a pattern formed on a surface of the microfluidic device based on the photographed image to determine whether characteristics of the detected pattern are identical to characteristics of a pre-stored pattern, and to determine whether the microfluidic device has not been normally loaded, when the characteristics of the detected pattern are different from the characteristics of the pre-stored pattern.

Abstract: Concepts presented herein relate to approaches for performing substrate inspection. In one aspect, the concepts relate to detecting anomalies or candidate defects on the substrate based on contrast in images obtained of the substrate.

Abstract: An on-vehicle radar device includes a mount and an antenna configured to transmit a transmission wave from an inner side of laminated glass, which includes an innermost glass layer, an outermost glass layer, and an intermediate resin layer, and receive a reflected wave. The antenna includes a transmitting antenna. When the mount is mounted on a bracket, the incident angle of the transmission wave on the innermost glass layer is greater than a Brewster angle on the inner surface of the innermost glass layer, and the incident angle of the transmission wave on the outermost glass layer is less than or equal to a Brewster angle between the outermost glass layer and the intermediate resin layer.

Abstract: A display panel including a first base substrate including a display area and a peripheral area adjacent to the display area, a signal line disposed on the first base substrate and disposed in the display area, a thin film transistor disposed on the first base substrate and disposed in the display area, a verification code part including a metal layer, the metal layer disposed on the first base substrate and disposed in the peripheral area; a second base substrate facing the first base substrate, and a light blocking layer overlapped with the peripheral area in a plan view, in which the metal layer includes a code portion having an identification mark, and a peripheral portion adjacent to the code portion, and the light blocking layer overlaps at least the peripheral portion of the metal layer in a plan view.

Abstract: A dual-function wafer handling apparatus for handling a wafer includes an aligner for rotating the wafer, an ID reader disposed corresponding to an edge of the wafer for reading an ID of the wafer, and an optical defect inspection unit for capturing images to analysis.

Abstract: A controller includes an acquisition unit that acquires paper type information from each of a plurality of image output devices managed in a management system, a grouping unit that performs grouping of a plurality of managed image output devices based on paper information acquired by the acquisition unit, and a display controller that displays the managed image output devices having undergone the grouping performed by the grouping unit on a display unit. If the acquisition unit acquires current-fed-paper-type information, the grouping unit performs the grouping based on the current-fed-paper-type information. If the acquisition unit does not acquire the current-fed-paper-type information, the grouping unit performs the grouping based on calibration-executable paper type information included in the paper type information acquired by the acquisition unit.

Abstract: An on-vehicle radar device includes a mount and an antenna configured to transmit a transmission wave from an inner side of laminated glass, which includes an innermost glass layer, an outermost glass layer, and an intermediate resin layer, and receive a reflected wave. The antenna includes a transmitting antenna. When the mount is mounted on a bracket, the incident angle of the transmission wave on the innermost glass layer is greater than a Brewster angle on the inner surface of the innermost glass layer, and the incident angle of the transmission wave on the outermost glass layer is less than or equal to a Brewster angle between the outermost glass layer and the intermediate resin layer.

Abstract: A method for designing a filter to image a feature on a surface, comprising: acquiring an image of said feature, with said image of feature comprising information from multiple points of said feature; generating a structural model of said feature by extracting predetermined properties of said feature from said image of feature; computing a scattering model for said feature from said structural model of said feature, with said scattering model for feature having information on scattered electromagnetic field from feature propagating in a plurality of scattering angles, wherein said scattered electromagnetic field from feature is generated by scattering of an electromagnetic radiation by said feature; acquiring an image of said surface, with said image of surface comprising information from multiple points of said surface; generating a structural model of said surface by extracting predetermined properties of said surface from said image of surface; computing a scattering model for said surface from said struct

Abstract: According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.

Abstract: A method for evaluating an output pattern printed on a medium is described. A reference pattern is stored. The output pattern is printed on the medium based correspondingly on the stored reference pattern. A scan based instance of the output pattern is rendered, which has a set of features at least corresponding to the printed output pattern and zero or more features additional thereto. A difference image, having the zero or more features of the rendered scan instance, is computed based on a comparison of the rendered scan instance to the stored reference pattern. Upon the zero or more features including at least one feature, the computed difference image is evaluated in relation to a proximity of at least one feature to locations pixels of the reference pattern.

Abstract: A method of making a semiconductor device can include providing a plurality of semiconductor die, wherein each semiconductor die comprises an active surface and a backside opposite the active surface. The method can include forming a build-up interconnect structure that extends over the active surface of each of the plurality of semiconductor die within the wafer, and forming a unique identifying mark for each of the plurality of semiconductor die as part of a layer within the build-up interconnect structure while simultaneously forming the layer of the build-up interconnect structure. The layer of the build-up interconnect structure can comprise both the unique identifying marks for each of the plurality of semiconductor die and functionality for the semiconductor device. Each unique identifying mark can convey a unique identity of its respective semiconductor die. The method can further include singulating the plurality of semiconductor die into a plurality of semiconductor devices.

Abstract: A tire shape inspection method executes the following steps: first, as a teaching operation step, boundary lines of the bulge and dent marks are detected in a sample source image of a sample tire, a mask image is generated which denotes the boundary lines, regions are removed from the sample source image which correspond to the boundary lines which are denoted in the mask image, and a height offset image is generated which represents the heights of the remaining regions with one or more offset values. Next, as an inspection operation step, the height offset image is subtracted from an inspection image of the inspection tire, the boundary regions which the mask image represents are removed, and, on the basis of the obtained bulge/dent removal image, shape defects of the sidewall surfaces of the inspection tire are inspected.

Abstract: A mark detecting device detects a positioning mark on a transfer medium based on light that is emitted to and then reflected from the transfer medium. The mark detecting device includes a light emitting unit that emits light to a target position on the transfer medium; a light receiving unit that receives light reflected from the target position; and an adjusting unit that rotatably supports a detecting unit including at least one of the light emitting unit and the light receiving unit about a center of rotation, which passes through the target position, on the transfer medium and adjusts the rotation angle of the detecting unit with respect to the center of rotation.

Abstract: The present invention provides a panel alignment apparatus and a panel alignment method. The panel alignment apparatus comprises an image detection device and a first clamp. The method comprises the following steps: utilizing the image detection device to detect a position of a display panel, and to calculate a position adjustment value; and utilizing the first clamp to hold the standing display panel, and to rotate the display panel according to the position adjustment value for adjusting a position of the display panel. The present invention can utilize the clamps to precisely align the standing display panel.

Abstract: A system for performing sample probing. The system including an topography microscope configured to receive three-dimensional coordinates for a sample based on at least three fiducial marks; receive the sample mounted in a holder; and navigate to at least a location on the sample based on the at least three fiducial marks and the three-dimensional coordinates.

Abstract: A sheet feeding machine comprises a housing 1, a feed section for feeding a plurality of sheets 40 in a feed direction 11, and a detecting section 3 having detector 30, 31 for detecting information 41, 42 printed on the sheet 40. The detecting section 3 comprises a support frame 32 for supporting the detector 30, 31, a guide rail 33 mounted on the support frame 32 and extending for guiding the detector 30, 31, and a guide mechanism 35 arranged between the housing 1 and the support frame 32 for guiding the support frame 32. The support frame 32 can be accommodated in the housing 1 when detecting the information 41, 42 of the sheet 40. The support frame 32 can be drawn out of the housing 1 when moving the detector 30, 31 along the guide rail 33.

Abstract: A sensing apparatus operable for sensing top of form indicators on media within a print station is provided. The sensing apparatus generally including a base and a cover hingedly attached to each other and being operable for manipulation between an open and closed position, a flexible circuit affixed to the interior surfaces of the base and cover, the flexible circuit comprising an array of optical sensing devices, and an interface connector integral the base for connection to a control unit of a print station. The optical sensing devices generally include any one of light emitting diodes and photo sensors and are operable for the detection of holes, notches, black marks and gaps located on a media passing through the sensing apparatus.

Abstract: There is described a sensor device for spectrally resolved capture of optical detection radiation which emanates from a value document transported through a capture area of the sensor device in a predefined transport direction, comprising a detection device for spectrally resolved detection of the detection radiation in at least one predefined spectral detection range and emission of detection signals which represent at least one, in particular spectral, property of the detected detection radiation, at least one reference radiation device which emits optical reference radiation which is coupled into a detection beam path of the detection device at least partly in dependence on the position of a value document relative to the capture area, and which has a spectrum with a narrow band which is within the predefined spectral detection range, and/or at least one spectrum with an edge which is within the predefined spectral detection range, and a control and evaluation device which is configured for employing the d

Abstract: A method for matching a precursor ion with one or more related product ions includes providing input data sets obtained from sample injections, each of the data sets including a precursor ion and one or more product ions, normalizing the input data sets in accordance with a single retention time for the precursor ion, determining which product ions are within a predetermined retention time window with respect to the single retention time, and, if a product ion is within the predetermined retention time window for a specified number of the input data sets, determining that the product ion is related to the precursor having the single retention time. An apparatus for analyzing a sample includes a chromatography module, a mass-spectrometry module in communication with the chromatography module, and control unit in communication with the chromatography module and the mass-spectrometry module.

Abstract: A sensing apparatus operable for sensing top of form indicators on media within a print station is provided. The sensing apparatus generally including a base and a cover hingedly attached to each other and being operable for manipulation between an open and closed position, a flexible circuit affixed to the interior surfaces of the base and cover, the flexible circuit comprising an array of optical sensing devices, and an interface connector integral the base for connection to a control unit of a print station. The optical sensing devices generally include any one of light emitting diodes and photo sensors and are operable for the detection of holes, notches, black marks and gaps located on a media passing through the sensing apparatus.

Abstract: An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.

Abstract: A computer-implemented method for performing color registration on template media having template markings thereon.

Abstract: A method for matching a precursor ion with one or more related product ions includes providing input data sets obtained from sample injections, each of the data sets including a precursor ion and one or more product ions, normalizing the input data sets in accordance with a single retention time for the precursor ion, determining which product ions are within a predetermined retention time window with respect to the single retention time, and, if a product ion is within the predetermined retention time window for a specified number of the input data sets, determining that the product ion is related to the precursor having the single retention time. An apparatus for analyzing a sample includes a chromatography module, a mass-spectrometry module in communication with the chromatography module, and a control unit in communication with the chromatography module and the mass-spectrometry module.

Abstract: If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a I00 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements. According to the present invention, IO0-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.

Abstract: The invention concerns a method for marking a material characterized in that it consists in incorporating into the material: either a phosphor capable of producing, following excitation, two light emissions whereof the respective wavelengths and the emission decay times are different, or several phosphors capable of producing, following excitation, a light emission whereof the wavelength and the emission decay time are different from the wavelength and emission decay time of the other or other phosphors. The material can in particular be of the paper, board, paint, textile, ink, glass or macromolecular material type.

Abstract: A pattern shape evaluation method for deciding whether a pair of patterns are disconnected or connected. The method includes extracting a plurality of pattern contour points that make up a contour of a pattern in a measurement region, and creating two pattern contour point sequences based on the plurality of pattern contour points. Each of the two pattern contour point sequences includes a set of the pattern contour points. In the pattern contour point sequence, each of distances between neighboring pattern contour points is equal to or smaller than a predetermined value. The method includes calculating an angle between a line passing through two of the pattern contour points which provide a shortest distance between the two pattern contour point sequences and a reference line arbitrarily defined with respect to the measurement region. The method further includes deciding whether the patterns are disconnected or connected, based on the angle.

Abstract: A semiconductor device and a method for manufacturing such semiconductor device are provided. Specifically, in the semiconductor manufacture, a recessed alignment mark is formed on a front plane of a high distortion point glass substrate as a target for alignment for bonding, and the recessed alignment mark is permitted to have a shape which extends to an external side of the semiconductor device. Thus, excellent bonding between the high distortion point glass substrate and the semiconductor device can be provided, and at the same time, since the recessed alignment mark is not sealed, the bonding state can be maintained even when the high distortion point glass substrate is exposed under the high temperature condition after bonding the semiconductor device.

Abstract: An optoelectronic sensor and method for detecting an object in a three-dimensional monitored region uses a plurality of video sensors. Each sensor has a multiplicity of light-receiving elements that are configured to take a pixel picture of the monitored space, and a control unit identifies an object in the monitored space from video data of the pixel picture. Each video sensor has at least one pixel line that is formed by light-receiving elements. The video sensors are spaced from each other so that each sensor monitors an associated plane of the monitored space.

Abstract: A device that is usable to inspect the surface of a material uses an inspection system which includes an optical unit. That optical unit can register the light which is reflected by the surface to be inspected. An illumination system, that uses at least two light sources, provides the light. The optical unit and the illumination system are connected to a control unit. The at least two light sources are arranged spaced at a distance from each other and both emit light directed to a recording region of the optical unit. The optical unit is oriented toward the surface to be inspected and at least one of the illumination light sources can be subdivided into several individual light sources. The control unit controls at least two of the illumination system light sources that are arranged at a distance from each other or the respective individual light sources of at least one of the illumination sources both selectively and independently of each other.

Abstract: First, an operator inputs various parameters required for a mark recognition operation including a designated position coordinate designated via a mouse and a keyboard (step 201). Then, an edge potential position closest to the designated position is selected (step 205), or an edge potential position within a predetermined range having the designated position as a datum is selected (step 207), and a mark recognition operation is performed at the selected edge potential position (step 209). The recognition results are shown on a display (step 211).

Abstract: A component-embedded board fabrication method includes detecting, before the board is covered with a first insulating layer, the actual position of a first electronic component formed on a surface of the board, calculating a displacement between the design position of the first electronic component on the surface of the board and holding the displacement as first displacement data, and correcting, based on the first displacement data, design data to be used for processing the board after the board is covered with the first insulating layer.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: A system and method for prealigning a substrate. One embodiment provides a rotor configured to rotate a carrier around a rotation axis in response to a rotation signal. The carrier includes a main surface substantially perpendicular to the rotation axis. The substrate is disposable on the carrier. The substrate includes a main surface and a mark such that an orientation of the substrate with respect to the rotation axis is detectable. An electromagnetic radiation source is configured to illuminate the main surface of the substrate with electromagnetic radiation. An optical/electrical converter is responsive to the electromagnetic radiation reflected back from the main surface, detecting the mark of the substrate and providing a sensing signal. A controller is configured to receive the sensing signal and providing the rotation signal.

Abstract: A device (10) is provided for measuring at least one characteristic (12) related to presence of particles. The device (10) includes a light source unit (16) for emitting light into a region (18) containing particles (20), with the light source being configured to emit light from a plurality of locations in a manner so that the emitted light follows a desired intensity distribution (22), the desired intensity distribution (22) being desired for the measurement of the at least one characteristic (12). In preferred embodiments the intensity distribution is Lambertian.

Abstract: An image reading apparatus includes a light source with a first luminescent portion that outputs light with a first wavelength range and a second luminescent portion that outputs light with a second wavelength range, the wavelength ranges being different from each other; a light-receiving portion that receives light reflected from an original irradiated by the light source; a scanning portion that shifts a reading position of the original in a vertical scanning direction by changing a relative position between the original and the light-receiving portion; a switching portion that alternately turns on the first and second luminescent portions when the scanning portion shifts the reading position, wherein a vertical scanning resolution for a first data obtained when the first luminescent portion is turned on is independently set from a vertical scanning resolution for a second data obtained when the second luminescent portion is turned on.

Abstract: A paper sheets feature detector 20, through which a banknote 21 is carried and passed is provided with a carrying-in sensor part 22, a transmissive and reflective line light sensor 23, a magnetic sensor 24, a thickness sensor 27, and a carrying-out sensor part 28. When a watermark part of the banknote 21 is measured by the line light sensor 23, a watermark pattern is detected by a light transmissive sensor, and that pattern is not detected by a light reflective sensor, the banknote 21 is determined to be a true banknote. Watermark braille is similarly processed. When the thread is detected by the light transmissive sensor and the thread is not detected by the light reflective sensor, the banknote 21 is determined to be a true banknote.

Abstract: It is possible to detect with high precision a plurality of types of nonuniformity defects that occur in patterns formed on the surface of an examination object. A device (10) for examination of nonuniformity defects that has a light source (12) for emitting light to a photomask 50 whose surface is provided with a repeating pattern (51) in which unit patterns (53) are arrayed in a regular fashion, and a photodetector (13) for photodetecting and converting into photodetection data scattered light from the photomask, so that the photodetection data is observed to detect nonuniformity defects that have occurred in the repeating pattern, in the device further having a wavelength filter (14) for selecting and extracting one or a plurality of desired wavelength bands from the light of a plurality of wavelength bands, wherein nonuniformity defects of the repeating pattern are detected using the selected and extracted light of the wavelength band.

Abstract: In the case of a method for sensing a marking (2) of a running web of material (3), the web of material is optically scanned by an image recording device (6). This generates in successive measuring cycles image signals which are fed to an image processing device (7). This image processing device (7) determines the positional values of the marking (2) of the web of material (3). A validity signal is generated from these positional values by applying a position-dependent weighting function and is output. This validity signal indicates whether the currently determined positional value is valid.

Abstract: A printed matter inspection device includes a light source that irradiates a color printed matter as an inspection object with illuminating light, a detector that detects the quantity of reflected light of each of a plurality of different color light beams from among reflected light reflected by the inspection object, and a controller that controls a timing of acquiring a detection signal of each of the color light beams from the detector. The controller acquires a detection signal of selected one of the different color light beams for one of a plurality of non-print areas on the inspection object. The controller acquires a detection signal of newly selected one of the different color light beams for another one of the non-print areas.

Abstract: A conversion control system is described that includes a database to store data defining a set of rules and an interface to receive local anomaly information from a plurality of different analysis machines associated with a plurality of manufacturing process lines that perform a plurality of operations on a web of material, and each of the manufacturing process lines includes position data for a set of regions on the web containing anomalies. The system also includes a computer that registers the position data of the local anomaly information for the plurality of manufacturing process lines to produce aggregate anomaly information. The system further includes a conversion control engine that applies the rules to the aggregate anomaly information to determine which anomalies represent actual defects in the web for a plurality of different products.

Abstract: Identifying a test product having a test region includes impinging on the test region a set of test signals at known test wavelengths. An image of the test region is generated from the reflected signals. The image is comprised of a set of reflectance values that are compared against reference reflectance values at the test signal wavelengths to determine the test product type.

Abstract: An apparatus for acquiring and evaluating an image of a predetermined extract of a printed product removes the effects of scattered light to improve the accuracy of image evaluation. The apparatus uses a camera that has an electronic image sensor with a two-dimensional arrangement of sensor elements. An aperture stop is arranged in the beam path of the camera for shadowing a predetermined part of the image sensor. When an acquired image is read from a part of the image sensor that is not shadowed, corresponding readings from the shadowed portion of the sensor are subtracted from the acquired image to obtain intensity signals corrected for scattered light.

Abstract: A method of reducing receipt fraud comprises attempting to detect emission from a receipt associated with one or more luminescent markers that are incorporated in a valid receipt. The receipt is validated when the attempt is successful.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: A method includes simultaneously illuminating a material using multiple first radiances and measuring multiple second radiances from the material. Each second radiance includes at least a portion of two or more first radiances that have interacted with the material. The method also includes determining a structure of the material based on the measurements. The first radiances may be directed at the material from different directions, and the second radiances may be measured at different positions around the material. The structure of the material could be determined by determining at least one of a scattering profile and an absorption profile. If the material includes a sheet of paper, a boundary between two layers in the sheet of paper could be identified by a discontinuity in the scattering profile, and a non-uniform distribution of a filler in the sheet of paper could be identified by a smooth variation in the scattering profile.