Radiation Treatment (epo) Patents (Class 257/E21.471)

E Subclasses

With high-energy radiation (epo) (Class 257/E21.472)
  • Substrate processing method and a computer readable storage medium storing a program for controlling same
    Patent number: 7129185
    Abstract: A substrate processing method includes the steps of removing carbon from a surface of a silicon substrate by irradiating an ultraviolet light on the surface in an essentially ultraviolet nonreactive gas atmosphere and forming an oxide film or an oxynitride film on the surface of the silicon substrate by irradiating an ultraviolet light thereon in an essentially ultraviolet reactive gas atmosphere. Further, a computer readable storage medium stores therein a program for controlling the substrate processing method.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: October 31, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Shintaro Aoyama, Masanobu Igeta, Hiroshi Shinriki