Abstract: A method includes receiving an in-place refresh command to refresh data at a particular location in a non-volatile memory. The method also includes re-writing the data into the particular location of the non-volatile memory to refresh the data at the particular location in response to the in-place refresh command.

Abstract: A method of writing a state to a correlated electron element in a storage circuit, comprising receiving a write command to write the state into the correlated electron element; reading a stored state of the correlated electron element; comparing the state and the stored state; and enabling a write driver to write the state into the correlated electron element when the state and read state are different.

Abstract: A semiconductor memory device and a method of operating the same are provided. The semiconductor memory device includes a plurality of memory layers stacked on a semiconductor substrate, wherein each of the plurality of memory layers includes one or more connection control transistors, one or more drain select transistors, a plurality of memory cells, and a source select transistor electrically coupled in series between a plurality of bit lines and a common source line, and the plurality of memory layers share the plurality of bit lines, and the common source lines electrically coupled to each of the plurality of memory layers are electrically disconnected.

Abstract: A nonvolatile semiconductor storage device a memory cell array including a plurality of memory cell units arranged in a matrix configuration, the memory cell units including a memory string including a series connection of a plurality of memory cells that stores data in accordance with a threshold voltage and is capable of electrical data writing and erasure, a first select gate transistor that connects a first end of the memory string to a bit line and a second select gate transistor that connects a second end of the memory string to a source line. The nonvolatile semiconductor storage device a discharge transistor that is connected between the bit line and the source line and causes discharge of the bit line to the source line.

Abstract: A method and a system for memory cell programming and erasing with refreshing operation are disclosed. The system includes a selecting module, a processing module and a refresh module. In the method, at first, a target memory cell from a plurality of memory cells in a memory device is selected. Thereafter, the target memory cell belonging to a line of the matrix is programmed or erased by applying a selecting voltage on the target memory cell and a location-related memory cell belonging to the line of the matrix. Then, a refreshing operation to refresh the location-related cell is performed.

Abstract: A memory device includes an N-channel transistor and a P-channel transistor. A word line is electrically connected to a drain terminal of the N-channel transistor, and a source terminal of the P-channel transistor. A first bit line is electrically connected to a source terminal of the N-channel transistor. A second bit line is electrically connected to a drain terminal of the P-channel transistor. Gate terminals of the N-channel transistor and the P-channel transistor are electrically connected and floating.

Abstract: A flash memory arrangement includes first memory cells for non-volatile memory of information and a read-write circuit. The read-write circuit includes a write latch, read amplifier, bit circuit pre-charge circuit, and databus interface, with the first memory cell being connected to a first bit circuit, word circuit, VSE circuit, and a select circuit, and the read-write circuit being connected to a column decoder, databus, and a read control signal circuit. A first memory column is arranged such that in a first partial matrix the first memory cell is arranged, in which a first select transistor, a memory transistor, and a second select transistor are arranged between the first bit circuit and a discharge hub. The second select transistor can be controlled by a global, non address-decoded read-write select circuit. At every bit circuit, a reference memory cell is arranged. A second partial matrix is provided equivalent to the first partial matrix.

Abstract: A semiconductor integrated circuit device may include a first circuit, a second circuit, and a delay circuit. The first circuit may include an output node. The second circuit may include an output node. The delay circuit may be coupled between the output node of the first circuit and the output node of the second circuit to selectively delay an output signal from the first circuit and an output signal from the second circuit.

Abstract: A non-volatile memory device using existing row decoding circuitry to selectively provide a global erase voltage to at least one selected memory block in order to facilitate erasing of all the non-volatile memory cells of the at least one selected memory block. More specifically, the erase voltage is coupled to the cell body or substrate of memory cells of the at least one selected memory block, where the cell body is electrically isolated from the cell body of non-volatile memory cells in at least one other memory block. By integrating the erase voltage path with the existing row decoding circuitry used to drive row signals for a selected memory block, no additional decoding logic or circuitry is required for providing the erase voltage to the at least one selected memory block.

Abstract: Apparatus and methods are disclosed, including an apparatus having first and second units of vertically arranged strings of memory cells, each unit including multiple tiers of a semiconductor material, each tier including an access line of at least one memory cell and a channel of a decoder transistor, wherein the channel of the decoder transistor of each of the multiple tiers of the first unit of memory cells is coupled to the channel of the decoder transistor of a corresponding tier of the second unit of memory cells. Methods of forming such apparatus are disclosed, as well as methods of operation, and other embodiments.

Abstract: A non-volatile semiconductor memory device having an improved layout structure to achieve low power consumption, high speed and miniaturization is provided. A flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. A plurality of local bit lines are shared by each of the plurality of blocks in one global block, a plurality of global bit lines are shared by the plurality of global blocks, and a connecting element selectively connecting one global bit line to n local bit lines is included. When a read-out operation and program operation are executed, one global bit line is shared by n local bit lines.

Abstract: A method includes forming a shallow trench isolation (STI) region in a substrate, the STI region comprising an etch stop layer; etching the STI region by a first etch to the etch stop layer to form a recess in the STI region; and forming a floating gate, the floating gate comprising a portion that extends into the recess in the STI region, wherein the etch stop layer separates the portion of the floating gate that extends into the recess in the STI region from the substrate.

Abstract: A method is provided for erasing a nonvolatile memory device, including multiple memory blocks formed in a direction perpendicular to a substrate, each memory block having multiple strings connected to a bit line. The method includes selecting a memory block to be erased using a power supply voltage; unselecting a remaining memory block, other than the selected memory block, using a negative voltage; setting a bias condition to reduce leakage currents of the unselected memory block; and performing an erase operation on the selected memory block.

Abstract: Methods of biasing in memory devices facilitate memory device programming operations. In at least one embodiment, a first string of memory cells comprising a selected memory cell and a second string of memory cells are coupled to a common data line and a common source, where the data line is biased to a potential greater than a potential to which the source is biased during a programming operation performed on the selected memory cell.

Abstract: A three-dimensional array adapted for memory elements that reversibly change a level of electrical conductance in response to a voltage difference being applied across them. Memory elements are formed across a plurality of planes positioned different distances above a semiconductor substrate. Bit lines to which the memory elements of all planes are connected are oriented vertically from the substrate and through the plurality of planes.

Abstract: A memory device includes a memory cell array and a control unit. The memory cell array includes a plurality of memory cells arranged in rows and columns, a plurality of word lines extending in a row direction and coupled to respective rows of the memory cells, and a plurality of local bit lines extending in a column direction and coupled to respective columns of the memory cells. The control unit is configured to program a selected one of the rows of memory cells to have a predetermined pattern of digital states, couple selected ones of the local bit lines to a global bit line and couple unselected ones of the local bit lines to ground based on the predetermined pattern, apply a stress voltage to the global bit line, and after a predetermined period of time, sense the digital states of the selected row of memory cells.

Abstract: A nonvolatile memory cell includes an active region extending in a first direction, a selection gate electrode layer intersecting the active region and extending in a second direction, a floating gate electrode layer intersecting the active region, extending in the second direction, wherein the floating gate electrode layer extends in parallel to the selection gate electrode layer and is separated from the selection gate electrode layer, and a dielectric layer disposed between the selection gate electrode layer and the floating gate electrode layer. The selection gate electrode layer, the dielectric layer, and the floating gate electrode layer are located substantially at the same level and, in combination, form a lateral coupling capacitor, and a first end portion of the floating gate electrode layer overlaps the active region.

Abstract: It is an object to provide a semiconductor device in which power consumption can be reduced. It is another object to provide a highly reliable semiconductor device using a programming cell, such as a programmable logic device (PLD). In accordance with a change in a configuration of connections between basic blocks, power supply voltage furnishing to the basic blocks is changed. That is, when the structure of connections between the basic blocks is such that a basic block does not contribute to a circuit, the supply of the power supply voltage to this basic block is stopped. Further, the supply of the power supply voltage to the basic blocks is controlled using a programming cell formed using a field effect transistor whose channel formation region is formed using an oxide semiconductor, the field effect transistor having extremely low off-state current or extremely low leakage current.

Abstract: The disclosure provides a NAND flash memory and a reading method thereof, which may read a negative threshold value of a memory cell without using a negative-voltage-generating circuit. The disclosed NAND flash memory includes a sense amplifier, a bit line selecting circuit and an array having a plurality of NAND string units. The disclosed NAND flash memory includes a ?V supplying portion element that applies a positive voltage to a source line, a P well formed with a selected memory cell, and a non-selected bit line which is adjacent to a selected bit line, within a predetermined time period, after the selected bit line is pre-charged and during a reading process.

Abstract: A semiconductor memory device includes a first NAND string and a second NAND string are connected to a bit line. One of the first and second NAND strings is selected by first to fourth select memory cells. At the write time, data is written in a first memory cell of the first NAND string selected by of the first to fourth select memory cells, then data is written in a second memory cell of the second NAND string selected at the same time as the first memory cell, data is written in a third memory cell adjacent to the first memory cell of the first NAND string and finally data is written in a fourth memory cell of the second NAND string selected at the same time as the third memory cell.

Abstract: A memory structure includes N array regions and N page buffers coupled to the N array regions, respectively. N is an integer ?2. Each of the N array regions includes a 3D array of a plurality of memory cells. The memory cells have a lateral distance d between two adjacent memory cells on a horizontal cell plane of the 3D array. Each of the N array regions further includes a plurality of conductive lines. The conductive lines are disposed over and coupled to the 3D array. The conductive lines have a pitch p, and p/d=? to ½. The N array regions and the N page buffers are arranged on one line along an extension direction of the conductive lines.

Abstract: A memory cell includes a floating gate transistor, a word line transistor, a first capacitance element, and a second capacitance element. The floating gate transistor has a first terminal for receiving a bit line signal, a second terminal, and a floating gate. The word line transistor has a first terminal coupled to the second terminal of the floating gate transistor, a second terminal for receiving a third voltage, and a control terminal for receiving a word line signal. A voltage passing device is for outputting a second voltage during an inhibit operation and a first voltage during a program operation or an erase operation. The first capacitance element is coupled to the first voltage passing device and the floating gate, and for receiving a first control signal. The second capacitance element is for receiving at a second control signal.

Abstract: An erase method of a nonvolatile memory device including a plurality of cell strings on a substrate is provided. Each string includes a plurality of memory cells stacked in a direction perpendicular to the substrate, a ground select transistor between the memory cells and the substrate, and string select transistors between the memory cells and a bit line. The erase method includes applying a precharge voltage during a first time to a first string select line, floating the first string select line during a second time after the first time, and applying an erase voltage to the substrate after the first time. The first string select line is connected to the string select transistors at a first height in the cell strings of a same row.

Abstract: A semiconductor device includes memory blocks including a plurality of strings in which memory cells are coupled between select transistors; a peripheral circuit suitable for erasing or programming the select transistors and the memory cells, which are included in a selected memory block among the memory blocks; and a control circuit suitable for controlling the peripheral circuit to erase the select transistors and the memory cells, increasing a threshold voltage of the select transistors within a range below an erase level, and increasing the threshold voltage of the select transistors up to a program level.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors electrically connected in series, a bit line electrically connected to a first end of the memory cell transistors, a source line and a well region electrically connected to a second end of the memory cell transistors, and first and second selection transistors electrically connected in series between the second end of the memory cell transistors and the source line. During programming of a selected memory cell transistor, a first voltage is applied to the source line and the well region, and to a gate of the first selection transistor, and a second voltage smaller than the first voltage is applied to a gate of the second selection transistor.

Abstract: Systems, methods, and apparatus are disclosed for implementing memory cells having common source lines. The methods may include receiving a first voltage at a first transistor. The first transistor may be coupled to a second transistor and included in a first memory cell. The methods include receiving a second voltage at a third transistor. The third transistor may be coupled to a fourth transistor and included in a second memory cell. The first and second memory cells may be coupled to a common source line. The methods include receiving a third voltage at a gate of the second transistor and a gate of the fourth transistor that may cause them to operate in cutoff mode. The methods may include receiving a fourth voltage at a gate of the first transistor. The fourth voltage may cause, via Fowler-Nordheim tunneling, a change in a charge storage layer included in the first transistor.

Abstract: A method of making a flash memory includes providing a substrate. Then, a first insulating layer, a first conductive layer and a second insulating layer are formed to cover the substrate. Later, a first trench is formed in the first conductive layer and the second insulating layer. After that, a second conductive layer and a mask layer are formed to cover the second insulating layer, and the second conductive layer fills up the first trench. Then, the mask layer are patterned to form patterned mask layers. Subsequently, a spacer is formed on the sidewall of the patterned mask layer. Then, an etching process is carried out by using the patterned mask layers and the spacer as a mask so as to form a first gate structure and a second gate structure.

Abstract: A flash memory device is disposed on a semiconductor substrate. The flash memory device includes flash memory cells arranged in rows and columns. Respective flash memory cells include respective access transistors and respective floating gate transistors. The respective access transistors have respective access gates, and the respective floating gate transistors have respective control gates arranged over respective floating gates. First and second wordlines extend substantially in parallel with one another and correspond to first and second rows which neighbor one another. The first wordline is coupled to access gates of access transistors along the first row. The second wordline is coupled to access gates of access transistors along the second row. Nearest edges of the first and second wordlines include at least one wing which extends laterally outward from a sidewall of one of the first and second wordlines towards a sidewall the other of the first and second wordlines.

Abstract: A non-volatile memory has an array of non-volatile memory cells. Each of the non-volatile memory cells includes a coupling device formed on a first well, a read device, a floating gate device formed on a second well and coupled to the coupling device, a program device formed on the second well, and an erase device formed on a third well and coupled to the first floating gate device. The read device, the program device, and the erase device are formed on separate wells so as to separate the cycling counts of a read operation, a program operation and an erase operation of the non-volatile memory cell.

Abstract: A semiconductor device comprises a set of selection transistors, such as in a three-dimensional memory structure or stack having resistance change memory cells arranged along vertical bit lines. Each selection transistor has a non-shared control gate and a shared control gate. The transistor bodies may have an unequal pitch and a common height. Some of the transistor bodies can be misaligned with the vertical bit lines to fit the transistors to the stack. A method for programming the three-dimensional memory structure includes forming one or two channels in a transistor body to provide a current to selected memory cells. Programming can initially use one channel and subsequently use two channels based on a programming progress. A method for fabricating a semiconductor device includes etching a gate conductor material so that shared and non-shared control gates have a common height.

Abstract: An integrated circuit including a link or string of semiconductor memory cells, wherein each memory cell includes a floating body region for storing data. The link or siring includes at least one contact configured to electrically connect the memory cells to at least one control line, and the number of contacts in the string or link is the same as or less than the number of memory cells in the string or link.

Abstract: Apparatus and methods are disclosed, such as an apparatus that includes a string of charge storage devices associated with a pillar (e.g., of semiconductor material), a source gate device, and a source select device coupled between the source gate device and the string. Additional apparatus and methods are described.

Abstract: A system and method for performing three scans for testing an address decoder and word line drive circuits is disclosed. The first scan determines whether only one word line is selected. The second scan determines whether the word line rise time to a target voltage level is within a specified time. Finally, the third scan determines whether the correct word line was selected.

Abstract: A switching device includes a power semiconductor chip, and a drive circuit which drives the power semiconductor chip. In the power semiconductor chip, a path through which a main current flows is connected to a first source terminal, and a ground terminal of the drive circuit is connected to a second source terminal of the power semiconductor chip. As a result, a gate drive path is separated from the path through which the main current flows, and therefore, the influence of induced electromotive force which is generated due to source parasitic inductance, on a gate-source voltage, is reduced.

Abstract: A semiconductor device and method of making a semiconductor device are disclosed. A semiconductor body, a floating gate poly and a source/drain region are provided. A metal interconnect region with a control gate node is provided that capacitively couples to the floating gate poly.

Abstract: A tunnel field-effect transistor (TFET) device includes first and second semiconductor contact regions separated by a semiconductor channel region; a channel gate overlying the channel region; and first and second doping gates overlying the first and second contact regions respectively; wherein application of a positive voltage level at the first doping gate and a negative voltage level at the second doping gate produces an n-type first contact region and a p-type second contact region, and reversing the voltage levels at the doping gates produces a p-type first contact region and an n-type second contact region.

Abstract: The present invention relates to semiconductor technology, and provides methods for erasing, reading and programming a flash memory. In the present invention, when an erase operation is performed on the flash memory, for a sector selected for the erase operation, its N-type well is applied with a voltage of 8V˜12V, its bit line is applied with a voltage of 4V˜6V, and its word line is applied with a voltage of ?7V˜?10V. When a read operation is performed on the flash memory, for a sector selected for the read operation, its N-type well is applied with a VCC voltage; for a flash memory cell selected for the read operation, its bit line is applied with the VCC voltage, and its source line is applied with a voltage of 0V. When a program operation is performed on the flash memory, for a flash memory cell selected for the program operation, its bit line is applied with a voltage of VCC?6.5V˜VCC?4.5V, and its bit line is applied with a voltage of VCC+6V˜VCC+9V.

Abstract: A NAND flash memory achieves low read latency and avoidance of inadvertent programming and program disturb so that the random access and initial page read speeds of the NAND flash memory are generally comparable to that of a NOR flash memory, while preserving the higher memory density and lower power operation characteristics of traditional NAND flash memory relative to NOR flash memory. The reduction in latency is achieved by a NAND memory array architecture which employs a small NAND string, a dual plane interleaved memory architecture, a partitioned NAND array, selectively coupled local bit lines per each global bit line, and a counter-biasing mechanism to avoid inadvertent programming and program disturb.

Abstract: A method for processing a carrier accordance with various embodiments may include: forming a structure over the carrier, the structure including at least two adjacent structure elements arranged at a first distance between the same; depositing a spacer layer over the structure, wherein the spacer layer may be deposited having a thickness greater than half of the first distance, wherein the spacer layer may include electrically conductive spacer material; removing a portion of the spacer layer, wherein spacer material of the spacer layer may remain in a region between the at least two adjacent structure elements; and electrically contacting the remaining spacer material.

Abstract: A nonvolatile semiconductor memory device includes: forming a stacked body by alternately stacking a plurality of interlayer insulating films and a plurality of control gate electrodes; forming a through-hole extending in a stacking direction in the stacked body; etching a portion of the interlayer insulating film facing the through-hole via the through-hole to remove the portion; forming a removed portion; forming a first insulating film on inner faces of the through-hole and the portion in which the interlayer insulating films are removed; forming a floating gate electrode in the portion in which the interlayer insulating films are removed; forming a second insulating film so as to cover a portion of the floating gate electrode facing the through-hole; and burying a semiconductor pillar in the through-hole.

Abstract: A memory includes an array of memory cells including a plurality of memory cells with a common source, wherein each of the plurality of memory cells with a common source includes two sub-memory cells, each of the sub-memory cells corresponds to a bit line, and the respective bits are electrically independent. Each of the sub-memory cells in the memory according to the disclosure corresponds to a bit line, and the respective bit lines are electrically independent, thereby effectively avoiding interference to other memory cells which will not be programmed during a program operation.

Abstract: A memory device is provided, which includes a first conductive layer, a second conductive layer, and a memory layer interposed between the first conductive layer and the second conductive layer. The memory layer includes a first portion and a second portion, each of which includes at least a nanoparticle. The nanoparticle includes a conductive material coated with an organic film. The first portion is in contact with the first conductive layer and the second conductive layer, and a side surface of the first portion is surrounded by the second portion.

Abstract: A structure and method provided for integrating SOI CMOS FETs and NVRAM memory devices. The structure includes a SOI substrate containing a semiconductor substrate, a SOI layer, and a BOX layer formed between the semiconductor substrate and the SOI layer. The SOI substrate includes predefined SOI device and NVRAM device regions. A SOI FET is formed in the SOI device region. The SOI FET includes portions of the BOX layer and SOI layers, an SOI FET gate dielectric layer, and a gate conductor layer. The structure further includes a NVRAM device formed in the NVRAM device region. The NVRAM device includes a tunnel oxide, floating gate, blocking oxide, and control gate layers. The tunnel oxide layer is coplanar with the portion of the BOX layer in the SOI device region. The floating gate layer is coplanar with the portion of the semiconductor layer in the SOI device region.

Abstract: A three-dimensional semiconductor device, a resistive variable memory device including the same, and a method of manufacturing the same are provided. The 3D semiconductor device includes a source formed of a first semiconductor material, a channel layer formed on the source and formed of the first semiconductor material, a lightly doped drain (LDD) region formed on the channel layer and formed of a second semiconductor material having a higher oxidation rate than that of the first semiconductor material, a drain formed on the LDD region and formed of the first semiconductor material, and a gate insulating layer formed on outer circumferences of the channel layer, the LDD region, and the drain.

Abstract: A nonvolatile memory device has a combination of FLOTOX EEPROM nonvolatile memory arrays. Each FLOTOX-based nonvolatile memory array is formed of FLOTOX-based nonvolatile memory cells that include at least one floating gate tunneling oxide transistor such that a coupling ratio of the control gate to the floating gate of the floating gate tunneling oxide transistor is from approximately 60% to approximately 70% and a coupling ratio of the floating gate to the drain region of the floating gate tunneling oxide transistor is maintained as a constant of is from approximately 10% to approximately 20% and such that a channel length of the channel region is decreased such that during the programming procedure a negative programming voltage level is applied to the control gate and a moderate positive programming voltage level is applied to the drain region to prevent the moderate positive programming voltage level from exceeding a drain-to-source breakdown voltage.

Abstract: The invention discloses a semiconductor structure comprising: a substrate, a conductor layer, and a dielectric layer surrounding the conductor layer on the substrate; a first insulating layer covering both of the conductor layer and the dielectric layer; a gate conductor layer formed on the first insulating layer, and a dielectric layer surrounding the gate conductor layer; and a second insulating layer covering both of the gate conductor layer and the dielectric layer surrounding the gate conductor layer; wherein a through hole filled with a semiconductor material penetrates through the gate conductor layer perpendicularly, the bottom of the through hole stops on the conductor layer, and a first conductor plug serving as a drain/source electrode is provided on the top of the through hole; and a second conductor plug serving as a source/drain electrode electrically contacts the conductor layer, and a third conductor plug serving as a gate electrode electrically contacts the gate conductor layer.

Abstract: A nonvolatile semiconductor memory device includes a plurality of nonvolatile memory cells formed on a semiconductor substrate, each memory cell including source and drain regions separately formed on a surface portion of the substrate, buried insulating films formed in portions of the substrate that lie under the source and drain regions and each having a dielectric constant smaller than that of the substrate, a tunnel insulating film formed on a channel region formed between the source and drain regions, a charge storage layer formed of a dielectric body on the tunnel insulating film, a block insulating film formed on the charge storage layer, and a control gate electrode formed on the block insulating film.

Abstract: A nonvolatile memory device includes a substrate having active regions that are defined by an isolation layer and that have first sidewalls extending upward from the isolation layer, floating gates adjoining the first sidewalls of the active regions with a tunnel dielectric layer interposed between the active regions and the floating gates and extending upward from the substrate, an intergate dielectric layer disposed over the floating gates, and control gates disposed over the intergate dielectric layer.

Abstract: A nonvolatile memory device includes a substrate, a structure including a stack of alternately disposed layers of conductive and insulation materials disposed on the substrate, a plurality of pillars extending through the structure in a direction perpendicular to the substrate and into contact with the substrate, and information storage films interposed between the layers of conductive material and the pillars. In one embodiment, upper portions of the pillars located at the same level as an upper layer of the conductive material have structures that are different from lower portions of the pillars. In another embodiment, or in addition, upper string selection transistors constituted by portions of the pillars at the level of an upper layer of the conductive material are programmed differently from lower string selection transistors.

Abstract: A three-dimensional (3-D) non-volatile memory device includes a plurality of vertical channel layers protruding from a substrate, a plurality of interlayer insulating layers and a plurality of memory cells stacked alternately along the plurality of vertical channel layers, and an air gap formed in the plurality of interlayer insulating layers disposed between the plurality of memory cells, so that capacitance between word lines is reduced to thus improve a program speed.