Arc Discharge Lamp Or Radiation Source Patents (Class 313/231.71)
  • Patent number: 11977059
    Abstract: A light source emits excitation light to discharge gas that flows through a dielectric tube. A ground electrode unit includes a first ground electrode and a second ground electrode arranged at a distance from each other in an axial direction of the dielectric tube. A high-voltage electrode is provided between the first ground electrode and the second ground electrode. A first distance between the first ground electrode and the high-voltage electrode is shorter than a second distance between the second ground electrode and the high-voltage electrode. A cover is provided on an outer wall of the dielectric tube at a position between the first ground electrode and the high-voltage electrode. The light source is arranged to emit excitation light such that an optical axis thereof is directed toward a position where the cover is not provided on the outer wall of the dielectric tube.
    Type: Grant
    Filed: September 20, 2021
    Date of Patent: May 7, 2024
    Assignees: Shimadzu Corporation, OSAKA UNIVERSITY
    Inventors: Kei Shinada, Satoshi Matsuoka, Katsuhisa Kitano
  • Patent number: 11527390
    Abstract: Cathode structures are disclosed for use with pulsed cathodic arc deposition systems for forming diamond-like carbon (DLC) films on devices, such as on the sliders of hard disk drives. In illustrative examples, a base layer composed of an electrically- and thermally-conducting material is provided between the ceramic substrate of the cathode and a graphitic paint outer coating, where the base layer is a silver-filled coating that adheres to the ceramic rod and the graphitic paint. The base layer is provided, in some examples, to achieve and maintain a relatively low resistance (and hence a relatively high conductivity) within the cathode structure during pulsed arc deposition to avoid issues that can result from a loss of conductivity within the graphitic paint over time as deposition proceeds. Examples of suitable base material compounds are described herein where, e.g., the base layer can withstand temperatures of 1700° F. (927° C.).
    Type: Grant
    Filed: February 3, 2022
    Date of Patent: December 13, 2022
    Assignee: Western Digital Technologies, Inc.
    Inventors: Cherngye Hwang, Reimar Azupardo, Randall Simmons, Mary Agnes Gupit Perez
  • Patent number: 10996197
    Abstract: Embodiments relate generally to systems and methods for shielding electrodes (204,205,504,505) within a photoionization detector (100). A photoionization detector (100) may comprise an ultraviolet radiation source (130); one or more detector electrodes (204,205,504,505); one or more collection surfaces (224,225,524,525) extending vertically from the detector electrodes (204,205,504,505); and a shielding material (206,506) located between the ultraviolet radiation source (130) and the one or more detector electrodes (204,205,504,505), wherein the ultraviolet radiation (130) does not directly impinge on at least a portion of the one or more detector electrodes (204,205,504,505). The one or more collection surfaces (224,225,524,525) may comprise a surface area that is not covered by the shielding material (206,506).
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: May 4, 2021
    Assignee: HONEYWELL INTERNATIONAL INC.
    Inventors: Bo Chen, Qidao Lin, Guangli Xie, Zhanghua Wu
  • Patent number: 9791410
    Abstract: A low-OH-content quartz glass with an OH content equal to or lower than 5 ppm is used as a cylindrical tube (2) covering the surface of metallic plasma generation electrodes (4, 5 and 6) for generating a low-frequency barrier discharge. It has been found that, in the low-frequency barrier discharge, hydrogen and oxygen originating from the OH contained in a dielectric material are released into plasma gas for a long period of time, constituting a primary cause of an increase in the baseline current. The use of a low-OH-content quartz glass dramatically lowers the baseline current and thereby improves the S/N ratio and the detection limit.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: October 17, 2017
    Assignee: Shimadzu Corporation
    Inventors: Kei Shinada, Shigeyoshi Horiike, Takahiro Nishimoto
  • Patent number: 8970099
    Abstract: The present disclosure relates to an ionization chamber with a built-in temperature sensor, which is especially adapted for devices, such as X-ray units, gamma irradiators and linear accelerators, whichever is used for performing radiation dose output measurement accordingly. In an embodiment, the ionization chamber comprises: a cavity, an inner electrode, a chamber wall, an outer electrode, a guard electrode and a calibrated temperature sensor for detecting real-time temperature inside the cavity of ionization chamber to be used in the correction process of radiation dose measurement signals. With the aforesaid device, not only the accuracy of measurement can be improved effectively, but also the time consumed in a radiation dose measurement period can be reduced greatly since it will no longer bear the disadvantage that the radiation dose measurement has to wait until the temperatures inside and outside the cavity of ionization chamber had reached a thermal equilibrium before the measurement.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: March 3, 2015
    Assignee: Institute of Nuclear Energy Research Atomic Energy Council, Executive Yuan
    Inventors: Jeng-Hung Lee, Shi-Hwa Su, Tzeng-Te Huang, Bor-Jing Chang
  • Publication number: 20140319994
    Abstract: An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. Electrically insulating seal element(s) engaging an outer surface of the arc chamber body are provided for impeding material from exiting the chamber interior openings of the arc chamber body. The seal element(s) have a ceramic body that includes an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall. The electrically insulating seal element comprises a Boron Nitride (BN) material.
    Type: Application
    Filed: April 25, 2013
    Publication date: October 30, 2014
    Inventors: Neil K. Colvin, Tseh Jen Hsieh
  • Patent number: 8814620
    Abstract: Operation to produce an intermediate product for a crucible for a LUWPL is as follows: a) a body 2 is preheated and placed on a support, with its bore concentric with a tube 4 supported in a chuck and connected to a inflation means; b) the tube is heated with the chuck being rotated for evenness of heating; c) when the temperature of the tube is detected to be the softening point of the quartz of the tube, its rotation is stopped and it is advanced into a bore 3 in the body 2; d) advance is stopped when the distal, sealed end is detected to have reached a determined protrusion 18; e) simultaneously with the advance being stopped, inflation gas is admitted into the tube, to inflate it albeit it marginally, and bring its outer surface 5 into intimate contact with the surface 6 of the bore 4.
    Type: Grant
    Filed: September 19, 2012
    Date of Patent: August 26, 2014
    Assignee: Ceravision Limited
    Inventors: Floyd R. Pothoven, Andrew Simon Neate, Martyn Roscoe, Barry Preston
  • Publication number: 20140117835
    Abstract: The present disclosure relates to an ionization chamber with a built-in temperature sensor, which is especially adapted for devices, such as X-ray units, gamma irradiators and linear accelerators, whichever is used for performing radiation dose output measurement accordingly. In an embodiment, the ionization chamber comprises: a cavity, an inner electrode, a chamber wall, an outer electrode, a guard electrode and a calibrated temperature sensor for detecting real-time temperature inside the cavity of ionization chamber to be used in the correction process of radiation dose measurement signals. With the aforesaid device, not only the accuracy of measurement can be improved effectively, but also the time consumed in a radiation dose measurement period can be reduced greatly since it will no longer bear the disadvantage that the radiation dose measurement has to wait until the temperatures inside and outside the cavity of ionization chamber had reached a thermal equilibrium before the measurement.
    Type: Application
    Filed: October 9, 2013
    Publication date: May 1, 2014
    Applicant: INSTITUTE OF NUCLEAR ENERGY RESEARCH ATOMIC ENERGY COUNCIL, EXECUTIVE YUAN
    Inventors: JENG-HUNG LEE, SHI-HWA SU, TZENG-TE HUANG, BOR-JING CHANG
  • Publication number: 20140103793
    Abstract: In this ion generation apparatus, tip end portions of needle electrodes are aligned in an X direction with being oriented in a Z direction, and protrude from a casing. A protective cover covers the tip end portions of the needle electrodes. The protective cover is provided with holes opened to allow tip ends of the needle electrodes to be seen from the Z direction, and an opening opened to allow the needle electrodes to be seen from a Y direction. Therefore, ions generated at the tip end portions of the needle electrodes can be emitted efficiently out of the casing. Further, a user can be prevented from touching the tip end portion of the needle electrode and injuring his or her finger or the like.
    Type: Application
    Filed: April 18, 2012
    Publication date: April 17, 2014
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Hiromu Nishida, Koichi Izu
  • Patent number: 8563924
    Abstract: An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: October 22, 2013
    Assignee: Agilent Technologies, Inc.
    Inventors: James Edward Cooley, Sameer Kothari
  • Publication number: 20130181598
    Abstract: A discharge element includes a first electrode that is made of a plastically-deformable conductive material and that has an internal space and an opening communicating with the internal space, a base that is made of an insulating material and that is air-tightly joined to the opening so that the internal space of the first electrode becomes an airtight space, and a second electrode that is made of a conductive material and that is inserted into the internal space via the base so as to form a spark gap between itself and the first electrode. Therefore, it is possible to provide the discharge element that realizes a high production yield, a simple structure, and a cost reduction and a simple manufacturing method of the discharge element.
    Type: Application
    Filed: February 2, 2011
    Publication date: July 18, 2013
    Applicant: KONDO ELECTRIC CO., LTD.
    Inventor: Zenichi Kondou
  • Patent number: 8278810
    Abstract: The present invention provides a glow discharge cell comprising an electrically conductive cylindrical vessel having a first end and a second end, and at least one inlet and one outlet; a hollow electrode aligned with a longitudinal axis of the cylindrical vessel and extending at least from the first end to the second end of the cylindrical vessel, wherein the hollow electrode has an inlet and an outlet; a first insulator that seals the first end of the cylindrical vessel around the hollow electrode and maintains a substantially equidistant gap between the cylindrical vessel and the hollow electrode; a second insulator that seals the second end of the cylindrical vessel around the hollow electrode and maintains the substantially equidistant gap between the cylindrical vessel and the hollow electrode; a non-conductive granular material disposed within the gap, wherein the non-conductive granular material (a) allows an electrically conductive fluid to flow between the cylindrical vessel and the hollow electrode
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: October 2, 2012
    Assignee: Foret Plasma Labs, LLC
    Inventor: Todd Foret
  • Patent number: 8154216
    Abstract: Described is a plasma electrode-less lamp. The device comprises an electromagnetic resonator and an electromagnetic radiation source conductively connected with the electromagnetic resonator. The device further comprises a pair of field probes, the field probes conductively connected with the electromagnetic resonator. A gas-fill vessel is formed from a closed, transparent body, forming a cavity. The gas-fill vessel is not contiguous with (detached from) the electromagnetic resonator and is capacitively coupled with the field probes. The gas-fill vessel further contains a gas within the cavity, whereby the gas is induced to emit light when electromagnetic radiation from the electromagnetic radiation source resonates inside the electromagnetic resonator, the electromagnetic resonator capacitively coupling the electromagnetic radiation to the gas, which becomes a plasma and emits light.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: April 10, 2012
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick Matthew Espiau, Mehran Matloubian
  • Patent number: 8040030
    Abstract: The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma (8) emitting EUV radiation or soft X-rays is generated in a gaseous medium formed by an evaporated liquid material in a discharge space, said liquid material being provided on a surface in the discharge space and being at least partially evaporated by an energy beam (9). The invention also refers to a corresponding apparatus for producing EUV radiation and/or soft X-rays. In the method, a gas (11) composed of chemical elements having a lower mass number than chemical elements of the liquid material is supplied through at least one nozzle (10) in a directed manner to the discharge space and/or to the liquid material on a supply path to the discharge space in order to reduce the density of the evaporated liquid material in the discharge space. With the present method and corresponding apparatus the conversion efficiency of the lamp is increased.
    Type: Grant
    Filed: May 8, 2007
    Date of Patent: October 18, 2011
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange
  • Patent number: 8040033
    Abstract: The present invention relates to an electrode device for gas discharge sources, a gas discharge source comprising such an electrode device and to a method of operating the gas discharge source. The electrode device comprises an electrode wheel (1) rotatable around a rotational axis (3) and a wiper unit (11) arranged to limit the thickness of a liquid material film applied to at least a portion of an outer circumferential surface (18) of the electrode wheel (1) during rotation of said electrode wheel (1). The wiper unit (11) is arranged and designed to form a gap (17) between the outer circumferential surface (18) and a wiping edge (19) of the wiper unit (11) and to inhibit or at least reduce a migration of liquid material from side surfaces to the outer circumferential surface (18) of the electrode wheel (1) during rotation.
    Type: Grant
    Filed: September 3, 2008
    Date of Patent: October 18, 2011
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Uladzimir Zhokhavets, Thomas Kruecken, Guenther Hans Derra
  • Patent number: 8007641
    Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: August 30, 2011
    Assignee: HUETTINGER Elektronik GmbH + Co. KG
    Inventors: Markus Winterhalter, Peter Wiedemuth
  • Publication number: 20100276611
    Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.
    Type: Application
    Filed: July 13, 2010
    Publication date: November 4, 2010
    Applicant: Mattson Technology Canada, Inc.
    Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
  • Patent number: 7786455
    Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: August 31, 2010
    Assignee: Energetiq Technology, Inc.
    Inventor: Donald K. Smith
  • Patent number: 7635950
    Abstract: A short-arc type high pressure discharge lamp in which durability is improved and a lamp apparatus including the same is provided. Glass material portions 52A into which glass material enters respectively are provided on both sides of an electrode axis 5402 between the outer circumferential surface 5406 thereof and a curved portion 58 of a sealed metal foil 56, and a gap S3 being continuous with a sealed space 60 remains among the glass material portion 52A, the outer circumferential portion 5406 of the electrode axis 5402, and the curved portion 58. An angle formed by a surface 52-1 of the glass material portion 52A facing the gap S3 and the curved portion 58 is an obtuse angle ?. In other words, an angle formed by the surface 52-1 of the glass material portion 52A facing the gap S3 and a surface 5602 of the curved portion 58 of the sealed metal foil 56 is the obtuse angle ?.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: December 22, 2009
    Assignees: Sony Corporation, Orc Manufacturing Co., Ltd.
    Inventors: Kiyotaka Tanba, Takayuki Kagami, Masaru Mitsui, Nobuo Kanai, Yasuhito Sakai
  • Patent number: 7541604
    Abstract: The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings.
    Type: Grant
    Filed: November 15, 2006
    Date of Patent: June 2, 2009
    Assignee: XTREME techonolgies GmbH
    Inventors: Sven Goetze, Harald Ebel, Juergen Kleinschmidt, Imtiaz Ahmad
  • Patent number: 7381976
    Abstract: Methods, systems and apparatus for photo-processing of fluids, particularly complex fluids, such as blood products, pharmaceuticals, injectables and vaccines, are provided. The disclosed methods and systems employ non-laser light source(s) to generate monochromatic light energy, preferably in the range of 260 nm to 310 nm, for fluid treatment. Advantageous processing regimens and/or adjunct additives and/or agents may also be used to achieve desired and/or enhanced results, e.g., inactivation of pathogens, bacteria and/or viruses, modulation of immune response, and/or leukoreduction. Particularly preferred embodiments include novel temperature control systems and geometric/structural arrangements that provide enhanced processing results and/or efficiencies.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: June 3, 2008
    Assignee: Triton Thalassic Technologies, Inc.
    Inventors: John J. Coogan, Jr., Barry Ressler
  • Patent number: 7291985
    Abstract: Described is a plasma electrode-less lamp. The device comprises an electromagnetic resonator and an electromagnetic radiation source conductively connected with the electromagnetic resonator. The device further comprises a pair of field probes, the field probes conductively connected with the electromagnetic resonator. A gas-fill vessel is formed from a closed, transparent body, forming a cavity. The gas-fill vessel is not contiguous with (detached from) the electromagnetic resonator and is capacitively coupled with the field probes. The gas-fill vessel further contains a gas within the cavity, whereby the gas is induced to emit light when electromagnetic radiation from the electromagnetic radiation source resonates inside the electromagnetic resonator, the electromagnetic resonator capacitively coupling the electromagnetic radiation to the gas, which becomes a plasma and emits light.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: November 6, 2007
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick M. Espiau, Mehran Matloubian
  • Patent number: 7199374
    Abstract: Excimers are formed in a gas (30,130) by applying a pulsed potential between a first electrode (14,114) and a counter electrode (26, 126) so that corona discharge occurs, substantially without arcing, when the potential is on. The pulses or on-times of the potential desirably are about 100 microseconds or less. Use of a pulsed potential provides greater efficiency than a constant potential. Where the excimer-forming gas is a pure inert gas, the gas desirably contains less than 10 ppm water vapor.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: April 3, 2007
    Assignee: Rutgers, The State University
    Inventors: Manfred Salvermoser, Daniel E. Murnick
  • Patent number: 7057189
    Abstract: Methods, systems and apparatus for photo-processing of fluids, particularly complex fluids, such as blood products, pharmaceuticals, injectables and vaccines, are provided. The disclosed methods and systems employ non-laser light source(s) to generate monochromatic light energy, preferably in the range of 260 nm to 310 nm, for fluid treatment. Advantageous processing regimens and/or adjunct additives and/or agents may also be used to achieve desired and/or enhanced results, e.g., inactivation of pathogens, bacteria and/or viruses, modulation of immune response, and/or leukoreduction. Particularly preferred embodiments include specific wavelengths, novel temperature control systems and geometric/structural arrangements that provide enhanced processing results and/or efficiencies.
    Type: Grant
    Filed: September 12, 2003
    Date of Patent: June 6, 2006
    Assignee: Triton Thalassic Technologies, Inc.
    Inventor: John Coogan
  • Patent number: 7023128
    Abstract: A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: April 4, 2006
    Assignee: Applied Process Technologies, Inc.
    Inventor: John Madocks
  • Patent number: 6982421
    Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: January 3, 2006
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Hiroto Sato, Kazunori Bessho, Yusuke Teramoto, Daiki Yamatani
  • Patent number: 6750600
    Abstract: In accordance with one specific embodiment of the present invention, a Hall-current ion source of the end-Hall type has an anode that is contoured with one or more recesses in the electron-collecting surface which have areas that are protected from the deposition of externally generated contamination thereon, as well as one or more protrusions that have higher temperatures than the bulk of the anode, thereby increasing the removal or passivation of coatings during operation by the thermal degradation of the coating and the effects of thermomechanical stresses. In another specific embodiment, which can be combined with the above embodiment, electrically isolated baffle or baffles are located to protect a substantial fraction of the electron-collecting surface of the anode from the deposition of externally generated contamination thereon.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: June 15, 2004
    Assignee: Kaufman & Robinson, Inc.
    Inventors: Harold R. Kaufman, James R. Kahn, Raymond S. Robinson, Viacheslav V. Zhurin
  • Patent number: 6657367
    Abstract: A dielectric barrier discharge lamp device which allows ultraviolet rays to be uniformly radiated onto a workpiece having a large surface area and which can be easily adapted to the size of workpiece. In the dielectric barrier, at least one dielectric barrier discharge lamp is arranged in a hermetically sealed casing which has a hollow longitudinally extending main part that is closed at both ends by end parts, at least a portion of the main part of the casing defining a window allowing light radiated from the at least one dielectric barrier discharge lamp to pass therethrough onto the workpiece. At least one end part of the casing is provided with a passage allowing inert gas to be introduced into the casing, and at least one end part of the casing is adapted to allow loading or unloading of the at least one dielectric barrier discharge lamp. A plurality of casings are arranged side by side with their windows facing the workpiece to be irradiated.
    Type: Grant
    Filed: November 2, 2000
    Date of Patent: December 2, 2003
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Satoru Fukuda, Nobuyuki Hishinuma, Shinji Sugioka
  • Patent number: 6639970
    Abstract: An imaging tube (51) is provided including a cathode (58) and an anode (60). The cathode (58) includes an emission surface (99), which emits a plurality of electrons along an emission axis (56). The anode (60) includes a body (76) having a track (58) on a peripheral section (78) of the body (76). The plurality of electrons are directed to impinge on the track (58) at an impingement angle &agr; approximately equal to or between 15° and 25° relative to the emission axis (56) and are converted into x-rays. A method of generating x-rays within the imaging tube is also provided.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: October 28, 2003
    Assignee: GE Medical Systems Global Technology Co., LLC
    Inventor: Charles B. Kendall
  • Patent number: 6373192
    Abstract: A dielectric barrier discharge lamp with a translucent part made of silica glass which contains OH radicals and in which damage of the silica glass by UV radiation can be suppressed and a sufficient amount of UV radiation can be obtained in a dielectric barrier discharge lamp, in which a silica glass discharge vessel is filled with a discharge gas which forms excimer molecules by a dielectric barrier discharge and which is at least partially provided with a translucent part, by the translucent part having a ratio of non-hydrogen bonding OH radicals to the total number of OH radicals which is less than or equal to 0.36.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: April 16, 2002
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Yukihiro Morimoto, Shigenori Nozawa, Masashi Okamoto
  • Patent number: 6262523
    Abstract: Large area atmospheric-pressure plasma jet. A plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250° C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two planar, parallel electrodes are employed to generate a plasma in the volume therebetween. A “jet” of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly spacing the rf-powered electrode.
    Type: Grant
    Filed: April 21, 1999
    Date of Patent: July 17, 2001
    Assignee: The Regents of the University of California
    Inventors: Gary S. Selwyn, Ivars Henins, Steve E. Babayan, Robert F. Hicks