Abstract: The present invention pertains to steady-state Ion-Beam Sources with an Anode Layer provided by a quadrupole magnetic system formed by a pair of long conductive magnets having U-shape cross-sections and positioned symmetrically above and along a plane and the long anode of nonmagnetic material. The conductive magnets of the quadrupole magnetic system serve as cathodes having an invariable discharge gap with the anode surface faced to the poles of the magnetic system having an invariable magnetic gap defining the width of the generated Ion Beam. The operating configuration of the Ion-Beam Source also comprises a gas-distributing system providing a uniform gas distribution into the gas-discharge gap, an anode water-cooling system (the anode bar has special holes), and a cathode water-cooling system. The Ion-Beam Source may be designed in a long linear style with a quasi-closed and closed electron drift, and in a round style with a closed electron drift.

Abstract: According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over (18). The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.

Abstract: Method and apparatus for use in treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. Ions emitted by an ion source are accelerated away from the ion source to form an ion beam. A magnetic field is created for intercepting the ions in the ion beam exiting the source and selectively deflectiing the ions away from an initial trajectory in a generally arcuate scanning motion. The magnetic field is created by synchronized energization of first and second current carrying coils located along an inner surface of a ferromagnetic support. The beam is deflected away from the initial trajectory by a controlled amount in a time varying manner to cause the beam to sweep through an arcuate path and impact the workpiece.

Abstract: Electrostatic lens for focussing the beams of charged particles, more particularly of ions, which have electrodes being designed as an electric conductor with a ring-shaped section, the inner edge of which is essentially circular, whereas at least one of the electrodes is composed of sector areas (4) succeeding one another along the periphery of an electrode, whereas each sector area is covering one predetermined angle area of the periphery, the sector areas are electrically connected to one another and the sector areas are linked to the holding device via at least one adjusting element per sector area the position of the sector areas may be adjusted irrespective of the other sector areas by means of the adjusting elements during operation of the electrostatic lens. The sector areas may be mechanically separated or extend from one thickness minimum of an electrode cross-section with periodically varying thickness to the next one.