Abstract: A print system and a method for confirming complete curing of a marking material are disclosed. For example, the print system includes a plurality of printheads arranged in a two-dimensional array, a curing light source, a curing confirmation system, a movable member to hold an object and a controller to control movement of the movable member to move the object past the array of printheads, to operate the plurality of printheads to eject the marking material onto the object as the object passes the two-dimensional array of printheads, to operate the curing light source to cure the marking material and to operate the curing confirmation system to confirm that the curing of the marking material is complete.

Abstract: An ashing apparatus includes a treatment chamber having an object to be processed therein, and a lamp chamber having an ultraviolet lamp that radiates the object with an ultraviolet beam. The ashing apparatus is configured to accurately maintain an irradiation distance between a light source and the object. Thus, it is possible to efficiently remove a smear from a wiring board. The treatment chamber and the lamp chamber are moved relative to each other and in parallel to a surface of the object to be processed. The treatment chamber has a stage that supports the object, a gas inlet opening for supplying a treatment gas into the treatment chamber, and a gas outlet opening for discharging the treatment gas. An ultraviolet transmitting window member that partitions the treatment chamber and the lamp chamber from each other is fixed to the treatment chamber.

Abstract: The invention provides an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The apparatus includes means for exposing a photosensitive element having an in-situ mask to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.

Abstract: An oxidation furnace for the oxidative treatment of fibers, in particular for producing carbon fibers, with a housing which is gas-tight, apart from passage areas for the carbon fibers, and a process chamber located in the interior of the housing. Hot air can be blown into the process chamber by at least one air inlet device. Deflecting rollers flanking the process chamber guide the fibers arranged side by side in the form of a carpet through the process chamber in a serpentine manner, wherein each fiber carpet spans a plane between opposite deflecting rollers. The air inlet device allows hot air to be diverted to the side of the deflecting rollers facing away from the process chamber such that hot air flows over the respective deflecting roller and the fibers before it enters the process chamber.

Abstract: Systems and methods for processing a substrate include supplying steam in a chamber, arranging a substrate with a deposited layer that includes silicon in the chamber, and directing UV light onto the deposited layer in the presence of the steam for a predetermined conversion period to at least partially convert the deposited layer. Systems and methods for densifying a deposited layer of a substrate include supplying ammonia in a chamber, arranging the substrate that includes the deposited layer in the chamber, and directing UV light onto the deposited layer in the presence of the ammonia for a predetermined conversion period to at least partially densify the deposited layer.

Abstract: Systems and methods for processing a substrate include supplying steam in a chamber, arranging a substrate with a deposited layer that includes silicon in the chamber, and directing UV light onto the deposited layer in the presence of the steam for a predetermined conversion period to at least partially convert the deposited layer. Systems and methods for densifying a deposited layer of a substrate include supplying ammonia in a chamber, arranging the substrate that includes the deposited layer in the chamber, and directing UV light onto the deposited layer in the presence of the ammonia for a predetermined conversion period to at least partially densify the deposited layer.

Abstract: The invention relates to an exposure chamber (10) for hardening radiation-curable coatings on components (14) having surfaces which are oriented in different directions. The invention also relates to an exposure chamber (10) for hardening motor vehicle bodies coated with UV-paints by means of UV-lamps. According to the invention, at least one reflector (20) is arranged in an inner chamber (18) of the exposure chamber (10). Said type of reflector (20) is preferably spherical or alternatively can be pivoted about three spatial axes in a cardanic manner such that, owing to this reflector (20), shadow zones of the vehicle body which are normally exposed inadequately can be uniformly illuminated. The invention further relates to a hardening system (42, 42?) for motor vehicle bodies which comprises said type of exposure chamber.

Abstract: A method for hardening a coating of an object, more particularly a car body. A conveyor system moves the object to the proximity of a radiator and moves it away from said radiator with at least one transport cart that can be translationally moved on at least one running surface. A support frame for the object is fixed to the transport cart in order to rotate or pivot the object about a rotational or pivoting axis extending crosswise relative to the translational movement and independently thereof so that all areas of the surface can be exposed to approximately the same amount of radiation.

Abstract: The present invention provides a method of curing a coated film which includes irradiating an active ray by a plurality of active ray irradiation devices, wherein the coated film is composed of an active ray-curable resin formed on a surface of a running band-shaped flexible support, including the step of: maintaining the coated film in a deoxidized atmosphere during a period in which the flexible support irradiated with an active ray by the at least one active ray irradiation device is transferred to the active ray irradiation device in a subsequent step.

Abstract: Apparatuses and processes for treating dielectric materials such as low k dielectric materials, premetal dielectric materials, barrier layers, and the like, generally comprise a radiation source module, a process chamber module coupled to the radiation source module; and a loadlock chamber module in operative communication with the process chamber and a wafer handler. The atmosphere of each one of the modules can be controlled as may be desired for different types of dielectric materials. The radiation source module includes a reflector, an ultraviolet radiation source, and a plate transmissive to the wavelengths of about 150 nm to about 300 nm, to define a sealed interior region, wherein the sealed interior region is in fluid communication with a fluid source.

Abstract: A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.

Abstract: By a simple apparatus construction and process, it is made possible to “clean precisely” a surface at the molecular/atomic level, and the purification degree of the surface processed minutely is made into 1012 molecules/cm2 or less. A steam-spraying nozzle is disposed such that a line slit nozzle is in a diameter direction, and mist-containing steam is sprayed onto the surface of a substrate. Thereby, particles in the steam-spraying surface (the particles were made to adhere by dipping the substrate in a solution containing polystyrene (particle diameter of 0.6 &mgr;m) or alumina (particle diameter of 0.3 &mgr;m to 0.5 &mgr;m) particles at 105 particles/ml.) are removed by about 90% to 95% after ten-seconds spraying, and by 99% or more, that is, to less than the detection limit of a wafer inspection device, after twenty-seconds spraying.

Abstract: An apparatus and method for decontaminating chemical and biological agents using the reactive properties of both the single atomic oxygen and the hydroxyl radical for the decontamination of chemical and biological agents. The apparatus is self contained and portable and allows for the application of gas reactants directly at the required decontamination point. The system provides for the use of ultraviolet light of a specific spectral range to photolytically break down ozone into molecular oxygen and hydroxyl radicals where some of the molecular oxygen is in the first excited state. The excited molecular oxygen will combine with water vapor to produce two hydroxyl radicals.

Abstract: A method for processing semiconductor wafers and similar articles has an ozone remover connected to a processing chamber. The ozone remover has a light chamber surrounded by reflectors. Ozone and other processing gases and vapors flow out of the processing chamber and into the light chamber. Ultraviolet lights in the ozone remover flood the light chamber with ultraviolet light, converting ozone into oxygen. The amount of ozone released into the environment is reduced. A recirculation line receives the gases and vapors flowing out of the ozone remover. Oxygen and any remaining ozone are separated from other gas and vapor components and are recycled back to an ozone generator, to increase the ozone generator efficiency in supplying the machine with ozone.

Abstract: The invention relates to a process for treating a hydrocarbonaceous waste material, in particular a rolling scale slurry and/or grinding slurry, the waste material being heated in a dryer, preferably moving, by the indirect supply of heat, and in the process hydrocarbons, if appropriate together with other volatile components, in particular H2O, being removed. In this process, in the dryer, at low temperature, the hydrocarbons are broken down in a specific way, the hydrocarbons being broken down by chemical and/or radiation means, which effect decomposition of the hydrocarbons of low volatility into highly volatile hydrocarbons, preferably decomposing high molecular weight hydrocarbons into lower molecular weight hydrocarbons, and the hydrocarbons, if appropriate together with the other volatile components in particular together with the H2O, are at least partially discharged, in particular by suction, from the vessel. The invention also relates to a apparatus for treating a hydrocarbonaceous waste material.

Abstract: A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The apparatus has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Abstract: A machine for processing semiconductor wafers and similar articles has an ozone remover connected to a processing chamber. The ozone remover has a light chamber surrounded by reflectors. Ozone and other processing gases and vapors flow out of the processing chamber and into the light chamber. Ultraviolet lights in the ozone remover flood the light chamber with ultraviolet light, converting ozone into oxygen. The amount of ozone released into the environment is reduced. A recirculation line receives the gases and vapors flowing out of the ozone remover. Oxygen and any remaining ozone are separated from other gas and vapor components and are recycled back to an ozone generator, to increase the ozone generator efficiency in supplying the machine with ozone.

Abstract: A curing apparatus comprises a curing chamber for accommodating a controlled atmosphere for a product being treated and an irradiator for providing radiation directed at the product. The curing chamber has spaced inlet and outlet openings for the product establishing a path of travel underneath the irradiator. First and second nozzle assemblies are disposed adjacent respective inlet and outlet openings for supplying inert gas into the chamber and maintaining an inert atmosphere within the chamber. The nozzle assemblies are removably secured to the chamber. A pre-chamber is provided in the nozzle assemblies to moderate the pressure distribution of the gas within the nozzle assemblies.

Abstract: A device and method cures an adhesive by means of UV radiation in an inert-gas atmosphere. The adhesive is interposed as an adhesive layer between two superposed layers of a disc-shaped optical information carrier. The device includes a UV source, a supply for an inert gas, and a holder for holding the information carrier in a centered position with respect to a centering axis. The inert-gas supply has discharge openings for inert gas, situated in a circular zone around the centering axis, at a distance from the centering axis which substantially corresponds to the radius of the peripheral edge of the information carrier, so that inert gas flows past the peripheral edge during curing. As a result locally present oxygen which would interfere with curing is expelled.

Abstract: A device for drying substrate disks by irradiation with ultraviolet light, wherein during the irradiation process a glass plate is resting on the substrate disk, has a lower part on which the substrate disk rests during drying and a liftable and lowerable upper part for lowering a glass plate onto the substrate disk resting on the lower part. The upper part has a glass plate holding device that is lowered below the substrate disk upon lowering of the upper part for placement of the glass plate onto the substrate disk.

Abstract: A method of manufacturing an information carrier which cures an adhesive by means of UV radiation in an inert-gas atmosphere. The adhesive is interposed as an adhesive layer between two superposed layers of a disc-shaped information carrier. The device includes a UV source, a supplier for an inert gas, and a holder for holding the information carrier in a centered position with respect to a centering axis. The inert-gas supplier has discharge openings for inert gas, situated in a circular zone around the centering axis, at a distance from the centering axis which substantially corresponds to the radius of the peripheral edge of the information carrier, so as to cause inert gas to flow past the peripheral edge during curing, as a result of which locally present oxygen which would interfere with curing is expelled.

Abstract: To dry semiconductor substrates, especially silicon wafers subsequent to rinsing after etching, the substrate is exposed to the action of radiation which contains an IR portion and a UV portion, the IR portion being greater than the UV portion. The IR-UV radiation quickly dries the substrate and prevents contamination of the substrate with undesirable particles or limits it to a nondisruptive degree. To execute drying with IR-UV radiation, an arrangement is proposed in which the substrate is moved through directly from the treatment liquid (rinsing medium) between two rod-shaped radiators which emit IR-UV radiation.

Abstract: A lamp assembly comprises an elongate lamp 1 which emits both ultraviolet and infrared radiation. The lamp is disposed within a reflective housing which serves to direct radiation from the lamp towards a moving substrate which is to be dried occurred. An infrared radiation filter is provided in the form of a quartz tube containing flowing water. The housing is provided with two reflector elements which can be pivoted about respective axes so as to enable the relative proportions of ultraviolet and infrared components in the radiation which emerges from the lamp assembly to be adjusted.