Abstract: There is provided a technique to correctly select and measure a pattern to be measured even when contours of the pattern are close to each other in a sample including a plurality of patterns on a substantially same plane. A pattern measuring apparatus that scans a sample with charged particles, forms a detected image by detecting secondary charged particles or backscattered charged particles generated from the sample, and measures a pattern imaged on the detected image includes: an image acquiring section acquiring a plurality of detected images taken at a substantially same location on the sample under different imaging conditions; a contour extracting section extracting a plurality of pattern contours from the plurality of detected images; a contour reconstructing section reconstructing a contour to be measured by combining the plurality of pattern contours; and a contour measuring section making a measurement using the reconstructed contour to be measured.

Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

Abstract: A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area.

Abstract: A charged particle microscope corrects distortion in an image caused by effects of drift in the sampling stage by measuring the correction reference image in a shorter time than the observation image, making corrections by comparing the shape of the observation image with the shape of the correction reference image, and reducing distortion in the observation images. The reference image for distortion correction is measured at the same position and magnification as when acquiring images for observation. In order to reduce effects from drift, the reference image is at this time measured within a shorter time than the essential observation image. The shape of the observation image is corrected by comparing the shapes of the reference image and observation image, and correcting the shape of the observation image to match the reference image.

Abstract: In a scanning electron microscope, if a failure is caused to occur in a SEM image by the influence of a disturbance such as magnetic field or vibration inside and from outside the device, the cause is identified simply and accurately using this SEM image. There is provided a measurement technique whose measurement accuracy is not influenced by a roughness of SEM image pattern. A one-dimensional scanning is performed in a scanning-line direction (X direction) by setting the Y-direction scanning gain at zero at the time of acquiring the SEM image, and a two-dimensional image is created by arranging image information, which is obtained by the scanning, in a time-series manner in the Y direction. A shift-amount data on the two-dimensional image is acquired using a correlation function, and the magnetic field or vibration included within the SEM image is measured by a frequency analysis of the data.

Abstract: The present invention provides for separation of bacterial species and serotypes using electrophoretic methods.

Abstract: A charged particle beam device of the present invention has a signal processing function of acquiring a secondary signal obtained when a charged particle beam is caused to scan at a low speed not subjected to a band limitation of an electrical signal path, and a secondary signal obtained when a charged particle beam is caused to scan at a high speed subjected to the band limitation of the electrical signal path, calculating a degradation function (H?1(s)) between the plurality of secondary signals, and using an inverse function thereof as a correction filter; and a function of updating a parameter of the correction filter to an optimal value as needed or at given timing. Accordingly, the charged particle beam device can perform optimum image restoration even when a detector or an amplifier circuit that constitutes the electrical signal path degrades with time.

Abstract: Provided are a high speed circuit pattern inspecting method and inspecting device which have a short preparation time for inspection and are capable of determining a defect by detecting only an image of one die. A coordinate which is expected to obtain the same pattern as a corresponding coordinate and an alignment coordinate are selected by referring to design information. The detected image and the design information are aligned using the alignment coordinate to correct the deviated amount and a pattern of the corresponding coordinate is compared with a pattern of the coordinate which is expected to obtain the same pattern to compare the patterns by detecting only an image of one die.

Abstract: A method for determining a critical angle of total reflection based upon images captured at different angles of incidence of a light beam includes illuminating a sample with an excitation light beam, capturing images of at least part of the sample at a plurality of different angles of incidence of the excitation light beam, and determining a critical angle of total reflection at an interface of the sample based upon analysis of the images. An apparatus for determining a critical angle of total reflection at an interface of a sample includes a light source arrangement to illuminate a sample with an angle of incidence, an image capturing arrangement to capture an image of the sample, and a processing arrangement to determine the critical angle of total reflection at an interface of the sample on the basis of an analysis of images captured at a plurality of different angles of incidence.

Abstract: For inspection of a pattern such as a semiconductor device, it is useful to selectively detect a defect on the specific pattern in order to estimate the cause of the occurrence of the defect. An object of the invention is to provide a charged particle beam apparatus capable of setting, on the basis of the shape of the pattern on a sample, a region to be inspected. The invention is characterized in that the contour of the pattern on the sample is extracted using a template image obtained on the basis of an image of the sample, the region to be inspected is set on the basis of the contour of the pattern, a defect candidate is detected by comparing the image to be inspected with a comparative image, and the sample is inspected using a positional relationship between the region to be inspected and the defect candidate included in the region to be inspected.

Abstract: An image acquisition apparatus includes: an imaging device on which an image of a small area allocated to an area to be imaged is formed; a detection section detecting intensity of light irradiated on the small area from a light source; an integration section integrating the intensity of light detected by the detection section; if an integration value of the intensity of light integrated by the integration section from a point in time when light is emitted from the light source is greater than a predetermined threshold value, a light-source control section terminates light emission; an exposure control section starting exposure of the imaging device before light is emitted from the light source and terminating exposure of the imaging device after emission of light from the light source is terminated; and an image acquisition section acquiring the image of the small area as a divided image from the imaging device.

Abstract: An image processing system includes an image acquisition unit, a candidate value estimation unit, a band characteristics evaluation unit, an effective frequency determination unit and a candidate value modification unit. The acquisition unit acquires images. The estimation unit estimates, for each pixel of the images, a candidate value of a 3D shape. The evaluation unit calculates, for each pixel, a band evaluation value of a band included in the images. The determination unit determines an effective frequency of the pixel based on statistical information of the band evaluation value. The modification unit performs data correction or data interpolation for the candidate value based on the effective frequency and calculates a modified candidate value representing the 3D shape.

Abstract: An image processing apparatus that generates data of a display image from data on layer images having different resolutions includes a detection unit that detects a scroll or magnification change request, and a display image generation unit that generates the display image data based on the request, in which the display image generation unit determines whether the request is a high or low speed request when the display image data having a resolution different from those of the layer images is generated, generates the display image data through enlargement processing on data of any of the layer images having a resolution lower than that of the display image when the request is the high speed request, and generates the display image data through reduction processing on data of any of the layer images having a resolution higher than that of the display image in case of the low speed request.

Abstract: A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.

Abstract: Two-dimensional scanning array microscope system, which has fields of view of individual objectives overlapping at the object, produces a composite image of the object that is devoid of optical distortions caused by such overlapping. Method for processing imaging data with the system includes precise identification of detector pixels corresponding to different portions of multiple image swaths projected on the detector by the system during the scan of the object, and, based on such identification, allocating or assigning of detector pixels that receive light from the object through more than one objective to only one of objectives, thereby correcting imaging data received in real time to remove a portion of data corresponding to image overlaps.

Abstract: A computer-implemented method for recovering a digital image (x) from a sequence of observed digital images (y1, . . . , yT), includes: obtaining an observed digital image (yt); estimating a point spread function (ft) based on the observed image (yt); estimating the recovered digital image (x), based on the estimated point spread function (ft) and the observed image (yt); and repeating the above steps. In order to correct optical aberrations of a lens, a point spread function of the lens may be used.

Abstract: In imaging a sample using an electron microscope, in order to reduce a time for focusing, a scanning range of a Z coordinate is reduced to complete focusing by obtaining SEM images such that: for a first predetermined number of portions, focal positions of an electron beam in obtaining each SEM image are moved in a predetermined range; then, a curved surface shape of the surface of the sample is estimated by using information relating to the focal positions of the electron beam in the first predetermined number of portions; after the images are taken, the range in which the focal positions of the electron beam are moved for scanning the electron beam on the surface of the sample is made to be narrower than the predetermined range by using the curved surface information estimated, thereby performing scanning to take the images of the sample.

Abstract: A method and associated system for imaging high density biochemical arrays comprises one or more imaging channels that share a common objective lens and a corresponding one or more time delay integration-type imaging cameras with optical alignment mechanisms that permit independent inter-channel and intra-channel adjustment of each of four degrees: X, Y, rotation and scale. The imaging channels are configured to independently examine different spectra of the image of the biochemical arrays.

Abstract: An inspection apparatus can comprise at least one light source for illuminating a target. The at least one light source can be disposed and/or controlled in such manner as to reduce a heat generation by the at least one light source and in such manner as to reduce a power consumption of the at least one light source.

Abstract: Imaging systems and methods for generating images of a sample wherein the system comprises an illumination source for illuminating the sample; an image viewing subsystem for capturing images from the sample; one or more liquid crystal panels and one or more birefringent elements, which are positioned between the sample and the image viewing subsystem, so that the images from the sample pass through the liquid crystal panels and the birefringent elements before reaching the image viewing subsystem; a device that changes one or more polarization states of the liquid crystal panels; and a controller that is configured to cause the device to change the polarization states of the liquid crystal panels.

Abstract: A fluorescent microscope for observing multiple fluorescent images includes: a first optical module comprising a first light source for supplying first excitation light having a first wavelength, a first excitation filter for selectively transmitting the first excitation light supplied from the first light source, a first dichroic filter for reflecting the first excitation light having passed through the first excitation filter toward the survey object, an objective lens for condensing the first excitation light reflected by the first dichroic filter and transferring the condensed first excitation light to the survey object, a second dichroic filter for reflecting first radiation light radiated from the survey object, a first radiation filter for selectively transmitting the first radiation light reflected by the second dichroic filter, and a first image acquisition unit for acquiring an image by using the first radiation light having passed through the first radiation filter to be supplied; and a second opti

Abstract: A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.

Abstract: The present invention relates to an image stabilization device which is particularly space-efficient and has a quick response time, and which is integrated into an image capture device for an image capture system of a surgical microscope, including a carrier substrate (101, 102) defining a sensor plane, a plurality of optoelectronic image capturing cells (110) arranged, in particular, in a matrix array; and at least one moving means (120) for moving the optoelectronic image capturing cells (110) relative to the carrier substrate (101, 102).

Abstract: An image processing apparatus includes a data acquisition unit configured to acquire data of a virtual slide image, and a display control unit configured to display the virtual slide image and a plurality of annotations added to the virtual slide image on a display apparatus, wherein data pieces of the plurality of annotations include diagnostic criterion information of the plurality of annotations, respectively, and the display control unit groups at least two of the plurality of annotations based on the diagnostic criterion information, causes display forms of the plurality of annotations to differ from each other based on the diagnostic criterion information, and displays the plurality of annotations on the virtual slide image.

Abstract: Repeatability of control items is ensured by improving the precision of time control, and control details for the control items can be changed even when observation is underway. Provided is a laser-scanning microscope system including a microscope apparatus that scans a specimen surface with laser light from a laser light source by using a scanner; a hardware sequencer that controls the microscope apparatus so as to execute a control item that is set in an application program in correspondence with a time axis; and a software sequencer that manages control details for the control item that is set in the application program.

Abstract: Methods and apparatus are provided for computing focus information prior to scanning digital microscope slide data with a line scan camera. The methods include a point-focus procedure that works by moving the slide to the desired measurement location, moving the objective lens through a predefined set of height values, acquiring imagery data at each height, and determining the height of maximum contrast. The methods also include a ribbon-focus procedure whereby imagery data are acquired continuously, while the slide and objective lens are in motion. Both methods may be applied with either a static or a dynamic implementation.

Abstract: A technique for calculating the angle from an auxiliary dot sequence indicating the track of a pattern and for performing pattern measurement is provided, thereby enabling achievement of high-accuracy pattern measurement with reduced influence of the roughness of pattern edges.

Abstract: The image sensing device (1) includes: a vessel holding portion (32) that holds a culture vessel (S); a swing portion (60) in which the vessel holding portion (32) is provided; a vibration application portion (50); an image sensing portion (10) that senses an image of the cells within the culture vessel (S); an image correction portion (4) that uses images at a plurality of image sensing places which include at least one image sensed by the image sensing portion (10) during vibration so as to correct a displacement between the images caused as a result of the image sensing places being different; and an image processing portion (5) that uses the image sensed by the image sensing portion (10) and the image corrected by the image correction portion (4) so as to distinguish between a state of floatation of the cells and a state of adherence thereof.

Abstract: A method for measuring critical dimension (CD) includes steps of: scanning at least one area of interest of a die to obtain at least one scanned image; aligning the scanned image to at least one designed layout pattern to identify a plurality of borders within the scanned image; and averaging distances each measured from the border or the plurality of borders of a pattern associated with a specific type of CD corresponding to the designed layout pattern to obtain a value of CD of the die. The value of critical dimensions of dies can be obtained from the scanned image with lower resolution which is obtained by relatively higher scanning speed, so the above-mentioned method can obtain value of CD for every die within entire wafer to monitor the uniformity of the semiconductor manufacturing process within an acceptable inspection time.

Abstract: A microscope system includes a microscope, a digital camera and a computer system. The microscope has an automatically adjustable subassembly having an adjustable element. The digital camera acquires image data of an image of a specimen. The computer system has a display and a storage unit configured to store the image data and to store, associated with the image data, data defining a setting of the automatically adjustable subassembly corresponding to the image data.

Abstract: A display device includes an image acquisition module which has an image sensor and a first focal plane, which captures a picture of an object, and an observation module which images the object such that a user can perceive it with his eye. A second focal plane is set by the observation module and the accommodation state of the eye, and with a measuring module for measuring the accommodation state of the eye. A control unit adjusts the position of the first focal plane on the basis of the measured accommodation state such that it coincides with the second focal plane.

Abstract: In performing a programmed-point inspection of a circuit pattern using a review SEM, stable inspection can be performed while suppressing the generation of a false report even when a variation in a circuit pattern to be inspected is large. SEM images that are obtained by sequentially imaging a predetermined circuit pattern using the review SEM are stored into a storage unit. Images that meet a set condition are selected from the stored SEM images, and averaged to create an average image (GP image). By performing pattern check by GP comparison using this GP image, an inspection can be performed while suppressing the generation of a false report even when a variation in the circuit patterns is large.

Abstract: A method of analyzing a semen sample having living sperm is provided comprising receiving from a remote location a set of digital video clips of a prepared semen sample having living sperm and analyzing a subset of the digital video clips taken from the prepared semen sample using a Computer Assisted Semen Analyzer adapted to analyze the subset of digital video clips received from a remote location. A method of measuring sperm morphology is also provided comprising receiving from a remote location a digital video clip of a prepared semen sample having stained non-living sperm, and, analyzing portions of the digital video clip taken from the prepared semen sample.

Abstract: A microscope system includes a light amount ratio changing unit for changing a ratio of the amount of light directed to a first optical path for directing an optical image of the sample to an eyepiece lens and a second optical path for directing an optical image of the sample to an image capturing unit, an image capturing controlling unit for controlling an exposure time of the image capturing unit, and a controlling unit for obtaining a first exposure time from the image capturing controlling unit, for calculating a second exposure time on the basis of the first exposure time and a second ratio of the amount of light, and for controlling the image capturing controlling unit to set the second exposure time as the exposure time if the light amount ratio changing unit changes to the second ratio of the amount of light.

Abstract: A method of observing a cross-section of a cosmetic material includes a sample forming step of forming a sample by providing a cosmetic material on a sample holder; a freezing step of freezing the sample; a cutting step of forming a cut surface on the sample by processing the frozen sample by a focused ion beam; and a cut surface image processing step of obtaining a cut surface image of the cut surface using a scanning electron microscope.

Abstract: Improved methods and systems for imaging are provided. Specifically, systems and methods for extending the range of a digital zoom are provided in which an imaging system provides continuous magnification over a plurality of interleaved optical pathways and digital zooming imagers. Systems and methods of centering an image as the field of view changes, and for masking out undesirable obstacles from a magnified image are also provided.

Abstract: An image processing device that reproduces under a second observation condition an appearance of a color of a subject as perceived under a first observation condition, includes: a characteristic quantity calculation unit that calculates a characteristic quantity related to a state of visual perception adaptation under an observation condition that is at least one observation condition of the first observation condition and the second observation condition, by taking into consideration information related to an illuminating light source used under another observation condition in addition to information related to an illuminating light source used under the one observation condition; and a color conversion unit that executes color conversion to convert the first image data to second image data to be used to reproduce, under the second observation condition, the appearance of the color of the subject as perceived under the first observation condition, based upon the characteristic quantity having been calculate

Abstract: Stabilization, via active-feedback positional drift-correction, of an optical microscope imaging system in up to 3-dimensions is achieved using the optical measurement path of an image sensor. Nanometer-scale stability of the imaging system is accomplished by correcting for positional drift using fiduciary references sparsely distributed within or in proximity to the experimental sample.

Abstract: A microscope system for obtaining an image having a wide view angle by repeatedly capturing an image with an objective lens having a high magnification while moving a stage, and by connecting captured images having a small view angle including a stage, a stage driving unit, a stage position detecting unit, an image capturing unit, a position to be reached determining unit for determining a position to be reached which is the next image capturing position of the stage on the basis of the state of the captured image and the position of the stage at which the image is captured, and a stage move guiding unit for prompting a user to move the stage to the position to be reached on the basis of the detected position of the stage and the determined position to be reached.

Abstract: An image data processing includes: obtaining first image data; outputting the first image data to the image display devices; obtaining an attention area composed of one or more arbitrarily specified pixels from the first image outputted to the image display devices ; displaying a color chart whose hue and chroma are gradually changed toward around the color corresponding to the image data of the attention area; obtaining arbitrarily selected color information from the displayed color chart; obtaining a plurality of combinations of the attention area and the color information corresponding to the attention area and calculating a color parameter on the basis of the obtained plurality of combinations; converting the color of the obtained image data on the basis of the color parameter; and outputting the image data whose color is converted, to the image display devices as a second image.

Abstract: In a process of acquiring an image of semiconductor patterns by using a scanning electron microscope (SEM), this invention provides an image generating method and device that allows a high-resolution SEM image to be produced while suppressing damages caused by SEM imaging to a sample as a result of irradiation of an electron beam. A plurality of areas having similarly shaped patterns (similar areas) are extracted from a low-resolution SEM image which has been imaged while suppressing the irradiation energy of electron beam. From the image data of the extracted areas a single high resolution image of the patterns is generated by image restoration processing. Further, the method of this invention also uses design data in determining the similar areas and the SEM imaging position and imaging range for performing the image restoration processing.

Abstract: A microscope system has a VS image generation means for generating a virtual slide image of a specimen which is constructed by mutually connecting a plurality of microscope images with a first photomagnification photographed and acquired whenever an objective lens and the specimen are relatively moved in a direction perpendicular to the optical axis and which represents the entire image of the specimen, an object-of-interest set means setting an object of interest with respect to the entire image of the specimen represented by the VS image, and a three-dimensional VS image generation means for generating a three-dimensional VS image which is constructed by connecting the microscope images at different focal positions in accordance with the same focal position and which is constructed from the microscope images with a second photomagnification higher than the first photomagnification and represents the image of the object of interest.

Abstract: A stage adaptor for imaging a biological specimen is described. The adaptor having a housing; a vented chamber contained within the housing; and a removable lid for covering the vented chamber. A depression is provided on the removable lid for receiving an objective from a microscope. An aperture is also provided at the apex of the depression for viewing inside the vented chamber. Also described is an integrated stage adaptor and imaging system as well as a method for imaging the biological specimen using the stage adaptor.

Abstract: The automatic adjustment method of a microscopic image for automatically adjusting an image on the basis of the lightness of the microscopic image includes distinguishing an observation pixel being an observation target in the image from a non-observation pixel not being an observation target on the basis of the lightness of each pixel of the image, determining a representative value for representing the lightness of the image on the basis of the lightness of a selection pixel identified as the observation pixel and adjusting the lightness of the image on the basis of the representative value.

Abstract: Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308) and at the same time acquires pattern information (314) using components of a frame image, such as a single frame image or subframe image, as a separated image (309, 310).

Abstract: The present invention enables provision of a defect observation device that reduces wait time from an end of pickup of a reference image and accompanying processing to a start of pickup of a defect image compared to conventional ones by making a pixel count resolution of the reference image be low compared to a pixel count of the defect image in an image pickup unit using an electronic microscope for automatic fine defect classification, whereby a throughput enhanced compared to those of conventional ones can be achieved.

Abstract: A signal processing unit (21) of a charged particle microscope calculates a degradation function (H (s)) of an image, on the basis of detection signals (11) obtained by scanning a charged particle beam (2) at two types of scanning speeds, a scanning speed within the bandwidths of a detector (12) and an amplifying circuit at a subsequent stage of the detector, and another scanning speed exceeding the upper limit of the bandwidths. Then, the signal processing unit creates a one-dimensional correction filter for recovering image quality, from an inverse function (H?1 (s)) of the degradation function, and applies the one-dimensional correction filter to the detection signal recorded at the scanning speed exceeding the upper limit of the bandwidths of the detector and the amplifying circuit at a subsequent stage of the detector, or to a two-dimensional image based on the detection signal.

Abstract: With respect to a charged particle beam device, the step size of focal point measure for executing autofocusing is optimized to a value that is optimal with respect to the spread of an approximation curve for a focal point measure distribution. The step size of focal point measure for executing autofocusing is corrected using an image feature obtained based on a layout image derived from an image obtained at a first magnification or from design data. Autofocusing is executed based on the obtained step size to carry out observation, measurement, or to image the sample under inspection.

Abstract: A method for controlling the position of a microscope lens comprising receiving a reference signal corresponding to a reference position of the microscope lens; receiving a measurement signal corresponding to an actual position of the microscope lens; receiving a deviation signal characteristic of a predetermined positional deviation from the reference position; and using the measurement signal, the deviation signal and the reference signal to generate a positional control signal for use in setting the position of the microscope lens.

Abstract: The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate.