Abstract: An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels. Processing includes lithography, inspection, metrology, grinding, and the like. The stage includes a chuck that moves over a base relative to a device for processing a substrate. The chuck conforms to a geometry of the base while moving relative to the base.

Abstract: A method for fabricating a wafer includes providing a wafer table, wherein the wafer table includes support pins that are movable with respect to each other; identifying features of a layer to be formed on a wafer, wherein the features have a tolerance for overlay errors below a threshold; moving one or more support pins based on the features; after the moving of the one or more support pins, mounting the wafer on the wafer table; and after the mounting of the wafer on the wafer table, forming the layer on the wafer.

Abstract: A method for semiconductor fabrication includes mounting a wafer onto a first wafer table. The first wafer table includes a first set of pins that support the wafer, the first set of pins having a first pitch between adjacent pins. The method further includes forming a first set of overlay marks on the wafer; and transferring the wafer onto a second wafer table. The second wafer table includes a second set of pins having a second pitch between adjacent pins. The second set of pins are individually and vertically movable, and the second pitch is smaller than the first pitch. The method further includes moving a portion of the second set of pins such that a remaining portion of the second set of pins supports the wafer and the remaining portion has the first pitch between adjacent pins.

Abstract: A method for semiconductor fabrication includes mounting a wafer onto a first wafer table. The first wafer table includes a first set of pins that support the wafer, the first set of pins having a first pitch between adjacent pins. The method further includes forming a first set of overlay marks on the wafer; and transferring the wafer onto a second wafer table. The second wafer table includes a second set of pins having a second pitch between adjacent pins. The second set of pins are individually and vertically movable, and the second pitch is smaller than the first pitch. The method further includes moving a portion of the second set of pins such that a remaining portion of the second set of pins supports the wafer and the remaining portion has the first pitch between adjacent pins.

Abstract: A method for semiconductor fabrication includes mounting a wafer onto a first wafer table. The first wafer table includes a first set of pins that support the wafer, the first set of pins having a first pitch between adjacent pins. The method further includes forming a first set of overlay marks on the wafer; and transferring the wafer onto a second wafer table. The second wafer table includes a second set of pins having a second pitch between adjacent pins. The second set of pins are individually and vertically movable, and the second pitch is smaller than the first pitch. The method further includes moving a portion of the second set of pins such that a remaining portion of the second set of pins supports the wafer and the remaining portion has the first pitch between adjacent pins.

Abstract: A method for semiconductor fabrication includes mounting a wafer onto a first wafer table. The first wafer table includes a first set of pins that support the wafer, the first set of pins having a first pitch between adjacent pins. The method further includes forming a first set of overlay marks on the wafer; and transferring the wafer onto a second wafer table. The second wafer table includes a second set of pins having a second pitch between adjacent pins. The second set of pins are individually and vertically movable, and the second pitch is smaller than the first pitch. The method further includes moving a portion of the second set of pins such that a remaining portion of the second set of pins supports the wafer and the remaining portion has the first pitch between adjacent pins.

Abstract: A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform.

Abstract: The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.

Abstract: The technology is directed to keeping high image quality when a subtitle is superimposed on a video. A reception device includes circuitry configured to receive a video stream and a subtitle stream. The circuitry processes the video stream to obtain video data of a video. The circuitry processes the subtitle stream to obtain subtitle bitmap data of a subtitle bitmap image. The circuitry adjusts a color gamut of the subtitle bitmap data to a color gamut of the video data. The color gamut of the subtitle bitmap data is adjusted based on color gamut identification information of the subtitle bitmap data and color gamut identification information of the video data. The circuitry further superimposes, on the video, the color gamut adjusted subtitle bitmap image.

Abstract: Illumination optical unit for EUV projection lithography guides illumination light to an object field. The illumination optical unit has a first facet mirror, which comprises a multiplicity of individual mirrors which can be switched between at least two tilt positions. A second facet mirror of the illumination optical unit is arranged downstream of the first facet mirror in the beam path of the illumination light. The second facet mirror has a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the first facet mirror into the object field via a group mirror illumination channel. The images of the groups are superposed on one another in the object field. At least some of the individual mirrors belong to at least two different groups of the individual mirror groups, which are respectively associated with a dedicated second facet via a dedicated group mirror illumination channel.

Abstract: The present disclosure includes a method for modifying an input image to map to a three dimensional shape prior to forming the three dimensional shape. The method includes receiving by a processor at least two pre-forming images of a locally unique non-repeating pattern printed on an input material. The at least two pre-forming images are captured prior to the input material being formed into the three dimensional shape. The method further includes receiving by the processor at least two post-forming images of the pattern printed on the input material, wherein the post-forming images are captured after the input material has been formed into the three dimensional shape and analyzing by the processor the at least pre-forming images and the at least two post-forming images to determine a translation table.

Abstract: Disclosed herein are an obstacle sensing module and a cleaning robot including the same. The cleaning robot includes a body, a driver to drive the body, an obstacle sensing module to sense an obstacle present around the body, and a control unit to control the driver, based on sensed results of the obstacle sensing module. The obstacle sensing module includes at least one light emitter including a light source, and a wide-angle lens to refract or reflect light from the light source so as to diffuse the incident light in the form of planar light, and a light receiver including a reflection mirror to again reflect reflection light reflected by the obstacle so as to generate reflection light, an optical lens spaced from the reflection mirror by a predetermined distance, to allow the reflection light to pass through the optical lens, and an image sensor, and an image processing circuit.

Abstract: A camera rig configured support a video camera or other cinematographic equipment is disclosed. The camera rig includes a first track and a second track movably coupled to the first track. The second track is configured to move along the first track between a first angular position and a second angular position. The camera rig also includes a platform movably coupled to the second track. The platform is configured to support the video camera or the other cinematographic equipment. The platform is configured to move along the second track between a first vertical position and a second vertical position.

Abstract: A 1× Wynne-Dyson optical system for microlithography having a variable magnification is disclosed. The 1× Wynne-Dyson optical system has first and second prisms, and a positive lens group that includes a split lens having first and second split lens elements that reside adjacent the first and second prisms, respectively. The first and second split lens elements are axially movable to change the magnification by up to about 500 parts per million. An adjustable positive lens group for a 1× Wynne-Dyson optical system is also disclosed, wherein the positive lens group allows for small changes in the optical system magnification.

Abstract: An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face of the EUV mirror has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face. The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible.

Abstract: An exposure apparatus is provided. It comprises: a substrate stage on which a holding region is provided to hold a substrate to be exposed, the holding region being provided with a support portion thereon for supporting the substrate to be exposed; a supporter configured to support a mask; a light source system configured to provide an exposure light which is illuminated on the substrate to be exposed via the mask to reproduce a pattern of the mask onto the substrate, wherein the support portion has a height which decreases gradually from an outer periphery of the holding region to a center of the holding region, such that an exposure distance is constant at all of positions on the holding region. With the above structure, the graph dimension may be kept uniform on the substrate even if the mask becomes bent.

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as ?, and circumference ratio is taken as ?, then the conditions for D?(?×L)/? are satisfied.

Abstract: A method and system is provided for forming a three-dimensional image and, more particularly, for making three-dimensional digital image transfer thermoformed objects on, e.g., generic molds. The method includes manipulating digital images of a subject into a single image; printing the single image onto a media; and thermoforming the media with the single image using a generic mold. The system comprises a computer infrastructure operable to: receive images of a subject; display the images; stitch together the images to form a single image; adjust portions of the images or single image to compensate for deformation during thermoforming of the single image; register the single image with points on a mold; and print the single image.

Abstract: An apparatus for forming a thin film pattern according to an aspect of the invention may include: an unwinding roll and a winding roll running a sheet; a rotary drum having an elastic layer provided on a circumferential surface thereof, and disposed between the winding roll and the unwinding roll to run the sheet along the circumferential surface; a source containing unit accommodating a deposition source and mounted such that the deposition source is evaporated and the evaporated deposition source moves toward the sheet located on the rotary drum; a shutter selectively preventing the movement of the deposition source toward the rotary drum from the source containing unit; a mask having a pattern defining a pattern of a thin film to be deposited onto the sheet and making tight contact with the sheet located on the rotary drum during thin-film deposition; and a tensioning unit pressurizing the sheet in a direction of the rotary drum to allow the sheet to run after the thin-film deposition and separating the sh

Abstract: An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: A driving control apparatus for driving a controlled object. The apparatus includes first and second interferometers, each of which (i) detects a position of the controlled object in a predetermined direction and (ii) produces a respective detection value. A control unit obtains a rotation amount of the controlled object based on the detection values produced by the first and second interferometers, at a predetermined measurement timing, to calculate a controlled variable based on the rotation amount and a target value, and to output the controlled variable.

Abstract: A measurement apparatus disclosed that has a radiation source configured to provide a measurement beam of radiation such that an individually controllable element of an array of individually controllable elements capable of modulating a beam of radiation, is illuminated by the measurement beam and redirects the measurement beam, and a detector arranged to receive the redirected measurement beam and determine the position at which the redirected measurement beam is incident upon the detector, the position at which the redirected measurement beam is incident upon the detector being indicative of a characteristic of the individually controllable element.

Abstract: An apparatus for forming a thin film pattern according to an aspect of the invention may include: an unwinding roll and a winding roll running a sheet; a rotary drum having an elastic layer provided on a circumferential surface thereof, and disposed between the winding roll and the unwinding roll to run the sheet along the circumferential surface; a source containing unit accommodating a deposition source and mounted such that the deposition source is evaporated and the evaporated deposition source moves toward the sheet located on the rotary drum; a shutter selectively preventing the movement of the deposition source toward the rotary drum from the source containing unit; a mask having a pattern defining a pattern of a thin film to be deposited onto the sheet and making tight contact with the sheet located on the rotary drum during thin-film deposition; and a tensioning unit pressurizing the sheet in a direction of the rotary drum to allow the sheet to run after the thin-film deposition and separating the sh

Abstract: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.

Abstract: The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.

Abstract: Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

Abstract: A customizing equipment for individualized contact lenses comprises an uniform illumination system, a gray image generation system, a projection optical system, a stage system and an alignment system, among which the uniform illumination system generates uniform parallel illuminative light, which generates gray images through the gray image generator controlled by a computer after going through the gray image generation system according to detection results of aberration of human eyes, and images on the image plane of given radius of curvature with photoresist on the samples' surface, which is fixed on the stage system and adjusted to the correct position through the alignment system, after the gray images are zoomed and the curvature of the image field is corrected through the projection optical system, so that the photoresist on the samples' surface will be exposed according to the gray levels of the gray images, after which the exposed samples are developed and etched to obtain the device with continuous e

Abstract: A flexible substrate, which has a photosensitive agent applied thereon, is continuously supplied from a supply unit to a guide unit where light is irradiated from a light source on a section of the substrate. A mask is positioned between the substrate and the light source so that the light from the light source selectively subjects the section of the substrate to exposure. Hence, it is possible to form a pattern having a continuous slanted structure for a large-area display panel.

Abstract: The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which the final lens of an exposing system is positioned to project electromagnetic radiation through a first side of the transparent substrate and expose a radiation sensitive layer that overlays a second side of the transparent substrate that is opposite the first side. Five alternative embodiments for further treatment to form a radiation opaque layer corresponding to the latent image (the image or its inverse) are described. These methods and corresponding devices are useful for producing masks (sometimes called reticles), for producing latent images in semiconductor devices and for forming features of semiconductor devices using masks.

Abstract: A system and method are used to feed a flexible substrate through a patterned beam to be exposed at target portions by the pattered beam. In one example, the flexible substrate is passed over a chuck (e.g., a vacuum chuck). In one example, the chuck can bias the flexible substrate against a chuck surface during alignment, focus, and exposure operations. By biasing the flexible substrate, the flexible substrate can continuously move while being held against the chuck. In one example, the flexible substrate is fed onto the vacuum chuck from a supply roller and fed off the chuck and wrapped on to a take-up roller. The supply and take-up rollers are rotated to follow the scanning motion, which minimizes or substantially eliminates tension on the flexible substrate during the exposure period.

Abstract: The illumination optical system includes an illumination light source and a spatial light modulator having a plurality of elements which reflect incident light from the illumination light source to form outgoing light and which flexibly switch a deflecting direction of a principal ray of the outgoing light between at least two directions including a first deflecting direction and a second deflecting direction, wherein a first angle between an incident direction of a principal ray of the incident light and the first deflecting direction is set to be approximately equal to a second angle between the first deflecting direction and the second deflecting direction and/or the first and second deflecting directions of the principal ray of the outgoing light inclines with reference to a normal line to an element array surface of the spatial light modulator. The image display apparatus and the image exposure apparatus have the above illumination optical system.

Abstract: A semiconductor manufacturing station (50) exposes light on a surface area of a spherical semiconductor device or ball (52). A mask (56) receives light from a light source (54) and passing the light to the surface area of the semiconductor ball according to a pattern of the mask. A lens (62) is positioned between the mask and the semiconductor ball such that a focal distance between the lens and the ball is variable to focus the light passed by the pattern of the mask on surface areas of the object. The pattern of the mask is made a series of concentric circles or rings (74–80) to focus light on desired surfaces of the semiconductor ball. The manufacturing system can be a plurality of optical stations (104–110) each configured to expose a circle or ring on the surface of the semiconductor ball as it passes in proximity to the plurality of optical stations.

Abstract: A semiconductor manufacturing station (50) exposes light on a surface area of a spherical semiconductor device or ball (52). A mask pattern generator (56) provides a pattern of light, which undergoes temporal changes to collectively represent an image. The mask pattern generator has an active exposure contour (80) that provides a portion of the overall image. The pattern of light is directed though a lens (62) to the surface area of the semiconductor device. The semiconductor device rotates in relation to the temporal changes in the pattern of light to expose the pattern of light over a portion of a surface area of the semiconductor device. The exposure contour has a narrower center and becomes wider moving away from the center. The exposure contour may have a curvature.

Abstract: A maskless lithography system including an illuminating system, a SLM having a non-linear shape (e.g., curved, concave, spherical, etc.), an exposure system, and a beam splitter that directs light from the illuminating system to the SLM and from the SLM to the exposure system. In some embodiments, an optical element can be located between the beam splitter and the SLM, possibly to correct for aberrations.

Abstract: A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

Abstract: A light beam modulated with image information is outputted from a light source and supplied to a switcher, which guides the light beam to one of exposure heads that is selected by the switcher. The light beam is applied from the selected exposure head to a photosensitive medium that is mounted on a partly cylindrical inner circumferential surface of a support to record an image thereon. The light beam can continuously be applied to the photosensitive medium from the exposure heads that are alternatively selected as facing the photosensitive medium, so that the image can efficiently be recorded on the photosensitive medium.

Abstract: An imaging apparatus includes a laser to generate a single-mode laser beam of energy, a multichannel spatial light modulator (SLM) accepting a plurality of modulating signals, and a beam multiplier between the radiation source and the SLM. The multiplier accepts the beam and generates from that beam a plurality of beams directed onto the SLM. The beams from the beam multiplier illuminate the active region of the SLM such that the SLM generates a plurality of modulated beams modulated according to the modulating signals. An optical subsystem is located between the SLM and an imaging plane including at least one optical element focusing the modulated beams onto the plane on which recording medium is placed to permanently mark the recording medium in response to incidence of such imaging radiation. Each beam from the SLM is substantially single-mode such that the optical subsystem can be designed using diffraction-limited optics.

Abstract: A method and apparatus that provide multichannel imaging and that allow using diffraction-limited optics. The imaging apparatus includes a laser beam source to generate single-mode laser beam of energy, a multichannel spatial light modulator (SLM) accepting a plurality of modulating signals, and a beam multiplier between the radiation source and the SLM. The beam multiplier accepts the beam generated by the source and generates from that beam a plurality of beams directed onto the SLM. The beams from the beam multiplier illuminate the active region of the SLM such that the SLM generates a plurality of modulated beams modulated according to the modulating signals. The apparatus further includes an optical subsystem located between the SLM and an imaging plane that includes at least one optical element to focus the modulated beams onto an imaging plane. A recording medium sensitive to imaging radiation from the source is placed at the imaging plane.

Abstract: Disclosed is a process of preparing a printing plate from a printing plate material comprising a support, and provided thereon, an image formation layer, the process comprising the steps of fixing the printing plate material onto a fixing member with suction through-holes by suction that evacuates air through the suction through-holes, the surface (rear surface) of the support opposite the image formation layer facing the fixing member, and then imagewise exposing the fixed printing plate material to laser to form an image on image formation portions of the image formation layer, wherein a degree of flatness of the surface on the image formation layer side of the fixed printing plate material is not more than 50 &mgr;m at the image formation portions.

Abstract: An optical scanning apparatus that includes a light source, a polygon mirror for deflecting a plurality of light beams emitted from the light source, and an image focusing system for causing the light beams deflected by the polygon mirror to form spots on surfaces of a plurality of photosensitive drums, wherein the image focusing system is disposed between the polygon mirror and the photosensitive drums, and includes scanning lenses for causing the beams deflected by the polygon mirror to form spots on the respective surfaces of the photosensitive drums, and the central axes of the scanning lenses are spaced a predetermined distance from optical axes extended from the center of the light source.

Abstract: Plate positioning and processing method and apparatus are disclosed. A plate is conveyed in a predetermined first direction so that the plate is in contact with a pair of first positioning pins. The plate is laterally moved contacting with the first positioning pins until reference positions displaced from contacting positions of the plate with the first positioning pins contact with the first positioning pins. A predetermined first processing is applied to the plate. The plate subjected to the first processing is conveyed in a predetermined second direction so that the plate is in contact with a pair of second positioning pins in positions different from the reference positions of front edge of the plate. The plate contacting with the second positioning pins is laterally moved until the same positions as the reference positions contact with the second positioning pins.

Abstract: For dividing an image and recording divided images on a photosensitive film with a plurality of laser beams, an auxiliary scanning speed is reduced in the vicinity of junctions between adjacent ones of the divided images to adjust the intervals between main scanning lines, and each of the main scanning lines is divided into divided main scanning lines in a main scanning direction, and the divided main scanning lines are formed separately in an auxiliary scanning direction. With such a correcting process, a high-quality image free of striped artifacts and inclination differences of main scanning lines can be recorded on the photosensitive film.

Abstract: Rolls include a core and a glass outer coating on the core. The glass can be electrically charged and discharged. The outer coatings have smooth finishes and controlled electrical properties. The outer coatings can also provide selected mechanical, chemical and thermal properties. The rolls can be used in various applications in which controlled electrical properties are desired. For example, the rolls can be used as charge donor rolls in electrostatographic imaging apparatus.

Abstract: An apparatus for transporting single sheets through a device for exposing or printing the single sheets, with a drum and means that press the single sheets against the drum, with a processing station having a processing gap, with the single sheets being exposed or printed in the processing station, includes means that limit the processing gap. According to the invention, a belt unit is provided that presses the single sheets against the drum, with the belt unit having a plurality of parallel extending continuous belts that are mutually decoupled in their movement and can be driven exclusively directly or indirectly through coupling with the drum surface.

Abstract: An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Abstract: A mirror for use in an exposure system of this invention includes a reflection layer for reflecting EUV formed on a mirror substrate and an absorption layer formed on the reflection layer and made from a compound for absorbing infrared light.

Abstract: Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning, surface configuration and tilt. SLMs are on/off devices, either reflective or transmissive, such as digital micromirror devices (DMD) and liquid crystal light modulator arrays (LCLM). High-resolution spatial light modulator arrays currently have no capacity for changing or control of their average surface configurations. It is proposed to segment the SLM into smaller array chips, each mounted on a vertical positioner, such as a piezo-actuator, to provide the desired configuration to the surface defined by the spatial light modulator arrays.

Abstract: A continuously moving object is imaged by a video projector producing a rapid sequence of stationary images. A galvanometer actuated mirror tracks the motion of the moving object and synchronizes it to the sequence of stationary images in order to avoid motion caused blurring of the images. The moving object is flat or is wrapped around a cylinder.

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.