Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

Abstract: An image-forming optical system includes a plurality of image-forming lenses that form a final image and at least one intermediate image; a first phase modulator that is disposed closer to an object side than any one of the intermediate images formed by the image-forming lenses and that applies a spatial disturbance to a wavefront of light coming from the object; and a second phase modulator that is disposed at a position that sandwiches at least one of the intermediate images with the first phase modulator and that cancels out the spatial disturbance applied to the wavefront of the light coming from the object by the first phase modulator.

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.

Abstract: An illumination unit for lithographic exposure and a device for lithographic exposure are disclosed. In an embodiment the illumination unit includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens and a field lens.

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last element and a liquid supply system by which an immersion liquid is supplied to form a liquid immersion area under the projection system. The liquid supply system has a first supply port and a second supply port. A position of the first supply port is different from a position of the second supply port, and the liquid supply system is capable of supplying the immersion liquid having a first temperature via the first supply port and supplying the immersion liquid having a second temperature different from the first temperature via the second supply port. The liquid immersion area is formed to cover only a portion of an upper surface of the substrate, and the substrate is exposed with an exposure beam through the immersion liquid in the liquid immersion area.

Abstract: A liquid immersion member forms, in an exposure apparatus, liquid immersion space through which exposure light emitted from an optical member passes, the liquid immersion member includes: a first member that is disposed at at least part of a space around the optical member and that includes a first lower surface facing an object which is movable below the optical member; and a movable second member that includes a second lower surface which is disposed at outer side than the first lower surface viewed from optical axis of the optical member and which faces the object and a third lower surface which is disposed at inner side than the second lower surface viewed from the optical axis and whose at least part is disposed above at least part of the first lower surface.

Abstract: A lithographic apparatus applies a pattern onto a substrate using an optical projection system. The apparatus includes an optical level sensor and an associated processor for obtaining a height map of the substrate surface prior to applying the pattern. A controller uses the height map to control focusing with respect to the projection system when applying the pattern. The processor is further arranged to use information relating to processing previously applied to the substrate to define at least first and second regions of the substrate and to vary the manner in which the measurement signals are used to control the focusing, between the first and second regions. For example, an algorithm to calculate height values from optical measurement signals can be varied according to differences in known structure and/or materials. Measurements from certain regions can be selectively excluded from calculation of the height map and/or from use in the focusing.

Abstract: The present invention relates to a light fixture comprising at least one light source generating light; a light collector configured to collect at least a part of the light and to convert the light into a light beam propagating a long an optical axis, where the light beam is concentrated at an optical gate arranged along the optical axis and an optical assembly comprising at least one optical front lens. The optical assembly is configured to project at least a part of said light beam along said optical axis and the light fixture comprises a prism effect system. The prism effect system comprises said prism effect system comprises a multi-faceted prism and a multi-regional color filter comprising a plurality of color filter regions having at least two different color filtering properties, wherein said multi-faceted prism and said multi-regional color filter are arranged adjacent each other.

Abstract: A measurement apparatus is configured to measure a position of an object based on a first phase signal and a second phase signal whose phases are different from each other and includes a compensator configured to compensate for a fluctuation in a phase difference between the first phase signal and the second phase signal based on a frequency of at least one of the first phase signal and the second phase signal.

Abstract: Method of manufacturing electronic devices using a maskless lithographic exposure system using a maskless pattern writer, wherein beamlet control data is generated for controlling the maskless pattern writer to expose a wafer for creation of the electronic devices. The beamlet control data is generated based on design layout data defining a plurality of structures, such as vias, for the electronic devices to be manufactured from the wafer, and selection data defining which of the structures of the design layout data are applicable for each electronic device to be manufactured from the wafer, the selection data defining a different set of the structures for different subsets of the electronic devices. Exposure of the wafer according to the beamlet control data results in exposing a pattern having a different set of the structures for different subsets of the electronic devices.

Abstract: An illumination intensity correction device serves for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus. The correction device has a plurality of bar-shaped individual stops arranged alongside one another and having bar axes arranged parallel to one another, which are arranged in a manner lined up alongside one another transversely with respect to the bar axes. The individual stops are displaceable into a predefined intensity correction displacement position at least along their respective bar axis with the aid of a displacement drive individually for the purpose of predefining an intensity correction of an illumination of the illumination field.

Abstract: A pattern drawing apparatus includes a first image-pickup device for reading an alignment mark and reading a first pattern image for detecting a positional shift, a second image-pickup device for reading the first pattern image and reading a second pattern image for detecting a positional shift drawn by an irradiation light beam from the optical head while carrying out a relative movement between the table and the optical head, and a positional shift detection unit for obtaining a first coordinate difference between a center of a visual field of the first image-pickup device and a center of the first pattern based on a read image by the first image-pickup device and obtaining a second coordinate difference between the center of the first pattern and a specific position of the second pattern based on a read image by the second image-pickup device.

Abstract: A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.

Abstract: An electronic arrangement for facilitating circuit layout design in connection with three-dimensional (3D) target designs, the arrangement including at least one communication interface for transferring data, at least one processor for processing instructions and other data, and a memory for storing the instructions and other data. The at least one processor being configured, in accordance with the stored instructions, to cause: obtaining and storing information in a data repository hosted by the memory, receiving design input characterizing 3D target design to be produced from a substrate, determining a mapping between locations of the 3D target design and the substrate, and establishing and providing digital output comprising human and/or machine readable instructions indicative of the mapping to a receiving entity, such as a manufacturing equipment, e.g. printing, electronics assembly and/or forming equipment.

Abstract: Provided is a substrate stage apparatus that is provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

Abstract: An apparatus for measuring a mask error and a method for measuring a mask error are provided. The apparatus for measuring a mask error includes a stage configured to accommodate a reference mask having a reference pattern, and a target mask adjacent to the reference mask such that a mask pattern of the target mask faces the reference pattern, a light source configured to irradiate the first beam onto the reference mask and the target mask, a light receiving unit including an image sensor, and the image sensor configured to receive a composite image including a first image generated from the reference pattern and a second image generated from the mask pattern, and generate a third image from the first image and the second image, and a measuring unit configured to measure an error of the mask pattern from the third image.

Abstract: The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

Abstract: In accordance with an embodiment of the present invention, a process tool includes a chuck configured to hold a substrate. The chuck is disposed in a chamber. The process tool further includes a shielding unit with a central opening. The shielding unit is disposed in the chamber over the chuck.

Abstract: An image capturing device comprising, a light source configured to emit light having a predetermined wavelength, a polarization beamsplitter configured to receive the light from the light source, a Faraday rotator configured to rotate a polarization plane of the light via the polarization beamsplitter by changing the intensity of the magnetic field, an objective lens configured to illuminate an inspection target with the light transmitted through the Faraday rotator and a sensor configured to capture an optical image of the inspection target by causing the light reflected by the inspection target to be incident through the objective lens, the Faraday rotator, and the polarization beamsplitter.

Abstract: An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.

Abstract: An image measuring apparatus includes a sample stage having a placement surface on which an object to be measured is placed; an image capture apparatus facing the placement surface of the sample stage and capturing an image of the object to be measured; and a pattern projection apparatus projecting a predetermined pattern onto the sample stage, the predetermined pattern providing a reference for at least one of a placement position and direction of the object to be measured on the placement surface.

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

Abstract: The determination of in-plane distortions of a substrate includes measuring one or more out-of-plane distortions of the substrate in an unchucked state, determining an effective film stress of a film on the substrate in the unchucked state based on the measured out-of-plane distortions of the substrate in the unchucked state, determining in-plane distortions of the substrate in a chucked state based on the effective film stress of the film on the substrate in the unchucked state and adjusting at least one of a process tool or an overlay tool based on at least one of the measured out-of-plane distortions or the determined in-plane distortions.

Abstract: A method of operating a microlithographic projection exposure apparatus includes, in a first step, providing a projection objective that includes a plurality of real manipulators. In a second step, a virtual manipulator is defined that is configured to produce preliminary control signals for at least two of the real manipulators. In a third step, performed during operation of the apparatus, a real image error of the projection objective is determined. In a fourth step, a desired corrective effect is determined. In a fifth step, first virtual control signals for the virtual manipulator are determined. In a sixth step, second virtual control signals for the real manipulators are determined.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, a liquid supply system having a first path through which immersion liquid is supplied to a supply opening, and a liquid removal system having a second path connected to the first path. The liquid removal system removes the immersion liquid from the first path using the second path so that the supply flow path becomes a substantially gas filled space.

Abstract: A multiple field of view dual band optical device with integrated calibration source is disclosed. Such an optical device is modular, and has a rotating electro-mechanical “tumbler” which houses two orthogonal Galilean afocal optical assemblies as well as at least one uniform temperature source. This modular device is intended to be inserted in front of a camera system which already has an imager optical assembly mated to a detector focal plane array. The disclosed modular device thus serves the purpose of providing to an existing dual-band camera imager up to four new optical fields of view as well as an integral calibration source, all of which can be electro-mechanically selected for viewing by a host camera imager.

Abstract: A six-piece microscope lens system includes, in order from the object side to the image side: a first lens element with a positive refractive power, a stop, a second lens element with a positive refractive power, a third lens element with a negative refractive power, a fourth lens element with a positive refractive power, a fifth lens element with a positive refractive power, a sixth lens element with a negative refractive power. Such arrangements can reduce the volume so as to reduce the manufacturing cost, has high pixel and image magnification 4.5×, and can detect biological fluid.

Abstract: The present invention provides an evaluation method of evaluating optical characteristics of a projection optical system by obtaining, by a prediction formula, a predicted value for a fluctuation amount of the optical characteristics relative to an exposure period of a substrate via the projection optical system, the method comprising determining the prediction formula by using a dedicated pattern in which a plurality of marks are arranged in a matrix on an object plane of the projection optical system, wherein the determining includes selecting, from the plurality of marks, at least two marks located in an illuminated region to be formed on the object plane when exposing the substrate, and obtaining the prediction formula based on positions of images of the at least two marks formed on an image plane of the projection optical system.

Abstract: The disclosure relates to a mirror module, in particular for a microlithographic projection exposure apparatus, including a mirror, which has a mirror body and an optically effective surface. The mirror body has a first material, and a supporting structure for connecting the mirror body to an objective structure. The supporting structure has a second material. The first material and the second material differ in terms of their coefficients of thermal expansion by less than 0.5*10?6K?1 in a temperature range around an operating temperature which is reached by the mirror module during operation in the region of the connection of the mirror body to the supporting structure.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: Disclosed is an apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.

Abstract: A lighting apparatus includes: a light modulator which modulates light emitted from a light source, using frames received by a receiver; an illuminator which emits the modulated light; and a controller. The controller periodically performs a storage control which continues for a predetermined period of time and in which, every time the receiver receives a frame, the received frame is stored into a storage. When a detector detects an interruption in the reception of the frames at the receiver, the light modulator modulates the light emitted from the light source, sequentially using two or more consecutive frames stored into the storage.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

Abstract: A microscope for raster-free, confocal imaging of a sample arranged in a sample space has an illumination arrangement comprising a light source group having light sources which can be switched on individually, a detector arrangement, a pinhole arrangement which comprises a pinhole array and which has a plurality of pinhole elements which are adjacent to one another, wherein there is one pinhole element provided for each light source, and optics which irradiate each pinhole element with radiation of an individual light source of the light source group and confocally illuminate an individual spot located in the sample space, wherein one of the individual spots is associated with each pinhole element, and the individual spots are adjacent to one another in the sample space with respect to an incidence direction of the radiation, and the optics image the individual spots through the pinhole arrangement confocally on the detector arrangement.

Abstract: Fringe-projection autofocus system devoid of a reference mirror. Contributions to error in determination of a target surface profile caused by air non-uniformities measured based on multiple measurements of the target surface performed at different wavelengths, and/or angles of incidence, and/or grating pitches and subtracted from the measured profile, rendering the system substantially insensitive to presence of air turbulence. Same optical beams forming a fringe irradiance pattern on target surface are used for measurement of the surface profile and reduction of measurement error by the amount attributed to air turbulence.

Abstract: A lithographic projection apparatus includes a projection system and a liquid confinement member extending along a boundary of a space under the projection system. The liquid confinement member has (i) a first opening facing downwardly via which a liquid is removed from a gap to be formed under the liquid confinement member, and (ii) a second opening facing downwardly via which fluid is removed from the gap to be formed under the liquid confinement member, the second opening being located radially outward of the first opening with respect to the space. The liquid in the space covers a portion of an upper surface of a substrate and the substrate is exposed through the liquid in the space.

Abstract: An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

Abstract: Methods, systems, and apparatus for identifying a non-rectangular shape outline of a first field of a substrate, the first field directly adjacent to a second field; adjusting an exposure profile of an ultraviolet light beam based on the non-rectangular shape outline of the first field to provide a non-rectangular exposure profile of the ultraviolet light beam; disposing a polymerizable composition on the first field of the substrate; contacting the polymerizable composition in the first field with an imprint lithography template; and while contacting the polymerizable composition in the first field with the imprint lithography template, directing the ultraviolet light beam having the non-rectangular exposure profile towards the substrate such that the ultraviolet light beam irradiates only the first field of the substrate.

Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.

Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

Abstract: The invention relates to a lens (1), comprising a first lens unit (3), at least one second lens unit (5), and at least one pupil (7) having a pupil radius. The first lens unit (3) and the second lens unit (5) are arranged at a distance from each other along an optical axis (OA) of the objective, such that an intermediate space is present between the first lens unit (3) and the second lens unit (5). The second lens unit (5) is arranged on the image side with respect to the first lens unit (3). The first lens unit (3) is designed in such a way that the first lens unit produces a collimated beam.

Abstract: A substrate transport apparatus for detecting with high accuracy rubbing between a substrate held in a substrate holding tool, and a support which transports a substrate. The substrate transport apparatus includes: a stage for placing thereon the substrate holding tool; a substrate transport mechanism including the support for the substrate, and a back-and-forth movement mechanism for moving the support, the mechanism configured to transfer a substrate to/from the substrate holding tool; a lifting mechanism for moving the support up and down with respect to the substrate holding tool; a sound amplifying section for amplifying a contact sound generated by contact between a substrate held in the substrate holding tool and the support; and a detection section for detecting rubbing between a substrate and the support based on a detection signal from a vibration sensor which detects a solid-borne sound, propagating through the substrate holding tool, and outputs the detection signal.

Abstract: An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

Abstract: The present disclosure generally relates to a method for performing semiconductor device fabrication, and more particularly, to improvements in lithographic overlay techniques. The method for improved overlay includes depositing a material on a substrate, heating a substrate in a chamber using thermal energy, measuring a local stress pattern of each substrate, wherein measuring the local stress pattern measures an amount of change in a depth of the deposited material on the substrate, plotting a plurality of points on a k map to determine a local stress pattern of the substrate, adjusting the thermal energy applied to the points on the k map, determining a sensitivity value for each of the points on the k map, and applying a correction factor to the applied thermal energy to adjust the local stress pattern.

Abstract: A mark forming method includes: forming recessed portion on a mark formation area of a substrate; coating the recessed portion with a polymer layer containing a block copolymer; allowing the polymer layer in the recessed portion to form a self-assembled area; selectively removing a portion of the self-assembled area; and forming a positioning mark by using the self-assembled area from which the portion thereof has been removed.

Abstract: A liquid immersion exposure method exposes a substrate with exposure light through liquid, and uses a projection system, a stage system having a holder that holds the substrate, a supply port via which the liquid is supplied arranged such that an upper surface of the substrate faces the supply port and that is spaced a first distance from an optical axis of the projection system, and a recovery port via which the liquid is collected arranged such that the upper surface of the substrate faces the recovery port, which is spaced a second distance greater than the first distance from the optical axis of the projection system, and that encircles the supply port. In the method, the substrate held on the holder is positioned based on a detection result of an alignment system that detects an alignment mark of the substrate not through the liquid.

Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.