Abstract: An adjustable camera assembly mounted within a door of an oven appliance includes a vertical guide rail and a camera movably mounted to the guide rail. A drive mechanism, such as a lead screw driven by a stepper motor, is mechanically coupled to the camera for moving the camera along the guide rail. A heat shield is positioned proximate a bottom of the door and extends around the guide rail to define a protective cavity for receiving the camera and providing a thermal break from a heating element of the oven appliance. A controller is configured for moving the camera into the protective cavity during high temperature operation of the oven appliance, such as during a self-clean cycle.

Abstract: The present invention provides a flame retardant composition including a flame retardant that is extracted from a plant and can exhibit high flame retardancy. The flame retardant composition includes a flame retardant compound represented by Formula (1) and polybutylene terephthalate. The content of the flame retardant compound is 12% by weight or more and 15% by weight or less based on the total weight of the flame retardant compound and the polybutylene terephthalate. In Formula (1), R1 to R3 represent substituents.

Abstract: Provided is a flame retardant composition containing a flame retardant compound and a polymer containing styrene or aromatic polyester represented by General Formula (1) where R1 to R3 in General Formula (1) represent substituents.

Abstract: An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.

Abstract: Provided is a high-voltage direct current (DC) circuit breaker which interrupts a fault current flowing in a power transmission or power distribution DC line when a fault occurs in the DC line. The high-voltage DC circuit breaker includes: a main switch, installed in the DC line, for interrupting a current in the DC line by being opened when a fault occurs in one side or the other side of the DC line; a nonlinear resistor, connected in parallel to the main switch, for consuming overvoltage; and an LC circuit connected in parallel to the main switch and comprising a capacitor and an inductor that are connected to each other in series to generate LC resonance.

Abstract: An illumination optical unit for projection lithography illuminates an object field with illumination light. The illumination optical unit has a collector for collecting the emission of a light source for the illumination light. The collector is arranged such that it transfers the illumination light from the light source into an intermediate focus. The illumination optical unit furthermore has a field facet mirror and a pupil facet mirror, each having a plurality of facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has an individual-mirror array having individual mirrors tiltable in a manner driven individually. The array is arranged upstream of the field facet mirror and downstream of the intermediate focus in an illumination beam path.

Abstract: A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.

Abstract: Disclosed is a focus detection apparatus for a projection lithography system. The apparatus includes: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam, and output a strength signal indicating the strength of the interaction force between the force detection unit and the object; a differential amplifier configured to output a Z-direction differential signal based on the strength signal and a reference signal; a Z-direction feedback control unit configured to perform feedback control; and a scan signal generator configured to output a signal for controlling the movement of the stage in the XY plane. The focus detection apparatus has high precision, efficiency and process applicability.

Abstract: For the use in illumination systems and projection exposure apparatuses for UV or EUV lithography, a reflective optical element is provided for a operating wavelength in the ultraviolet to extreme ultraviolet wavelength ranges. The reflective optical element includes a substrate and a reflective surface on the substrate. The multilayer system has layers of at least two alternating materials having different real parts of the refractive index at the operating wavelength. Radiation in the operating wavelength of a certain incident angle bandwidth distribution can impinge on the reflective optical element. The reflective surface includes one or more first portions, in which the layers have alternating materials of a first period thickness. The reflective surface includes one or more additional portions, in which the layers of alternating materials have a first period thickness and at least one additional period thickness.

Abstract: An exposure apparatus projects a pattern of an original onto a substrate by a projection optical system to expose the substrate, wherein the projection optical system includes a mirror assembly, and the mirror assembly includes a first mirror member which has a first reflecting surface and is configured to bend an optical axis of the projection optical system, a second mirror member which has a second reflecting surface and is configured to bend the optical axis, a supporting mechanism configured to support the first mirror member and the second mirror member, and the supporting mechanism is positioned to position the first mirror member and the second mirror member while a positional relationship between the first mirror member and the second mirror member is maintained.

Abstract: Disclosed is a focus detection apparatus for a projection lithography system. The apparatus comprises: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in position of a light spot formed by the reflected laser beam, and output a strength signal indicating the strength of the interaction force between the force detection unit and the object; a differential amplifier configured to output a Z-direction differential signal based on the strength signal and a reference signal; a Z-direction feedback control unit configured to perform feedback control; and a scan signal generator configured to output a signal for controlling the movement of the stage in the XY plane. The focus detection apparatus has high precision, efficiency and process applicability.

Abstract: A method of defining patterns in a small pitch is described. A substrate having a target layer thereon is provided, and two laterally separate reflective structures with two opposite sidewalls are formed over the target layer. A photoresist layer is formed over the target layer between the two opposite sidewalls. An exposure step is performed allowing light to be reflected by the two opposite sidewalls in the lateral direction, wherein the two opposite sidewalls are spaced by a distance to cause the reflected light to produce a periodical intensity distribution in the photoresist layer in the lateral direction.

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract: In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of ?; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of ?. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.

Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.

Abstract: To detect whether a substrate is in a focal plane of an inspection apparatus, an optical focus sensor is arranged to receive a radiation beam via an objective lens. The optical focus sensor includes a splitter configured to split the radiation beam into a first sub-beam and a second sub-beam. With an aperture and a detector in the light path of each of the sub-beams it is possible to detect whether the substrate is in focus by comparing the amount of radiation received by each of the detectors.

Abstract: In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of ?; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of ?. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.

Abstract: The present invention provides a self-propelled image read module, which comprises a sensor, a guide rod, a motor, a gear set, and a belt. The guide rod is fixed on a base of a scanner. The sensor is slidably matched on the guide rod. The motor is disposed at one side of the sensor. The gear set is connected to the motor. The belt is fixed on the base. The belt passes through between and contacts a transmission wheel and an idle wheel of the gear set. Thereby, a scanner's image read module of simple assembly, low cost, and small size is formed.

Abstract: An incident optical system introduces a plurality of laser beams to an optical deflector from within a scanning range, the width of the plurality of laser beams being larger than the width of a deflection surface of the optical deflector in a main scanning direction. Principal rays of the plurality of laser beams, separated by a predetermined angle, cross each other near the deflection surface in a main scanning cross-section. A scanning optical device satisfies the expression ??<(4?/N)×(1??), where ?? represents the largest angle between principal rays of two of the plurality of laser beams, N represents the number of deflection surfaces of the optical deflector, and ? represents the scanning efficiency of the deflection surface, which is the ratio of an image forming range to the theoretical maximum scanning width on the deflection surface of the optical deflector.

Abstract: The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.

Abstract: An exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.

Abstract: An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.

Abstract: A reflector for EUV has additional multi-layers on the front surface of a base multilayer stack provided selectively to compensate for figure errors in the base multilayer stack or the substrate on which the multilayer stack is provided. A reflective mask for EUV uses two multilayer stacks, one introducing a relative phase shift and/or altered reflectivity with respect to the other one.

Abstract: A lithography system and method for cost-effective device manufacture that can employ a continuous lithography mode of operation is disclosed, wherein exposure fields are formed with single pulses of radiation. The system includes a pulsed radiation source (14), an illumination system (24), a mask (M), a projection lens (40) and a workpiece stage (50) that supports a workpiece (W) having an image-bearing surface (WS). A radiation source controller (16) and a workpiece stage position system (60), which includes a metrology device (62), are used to coordinate and control the exposure of the mask with radiation pulses so that adjacent radiation pulses form adjacent exposure fields (EF). Where pulse-to-pulse uniformity from the radiation source is lacking, a pulse stabilization system (18) may be optionally used to attain the desired pulse-to-pulse uniformity in exposure dose.

Abstract: A system and method for increasing a scan rate in a photolithography system by increasing a unit travel length while maintaining a minimum resolution is provided. The method includes determining the minimum resolution and a pixel spacing distance equal to the unit travel length. The method also includes calculating a window size based on the minimum resolution and the pixel spacing distance. A plurality of windows of the calculated size are established so that a pixel in a first window is offset from a pixel in a second window by the minimum resolution in a first dimension and the pixel spacing distance in a second dimension, and one of the plurality of windows is selected for projection onto a subject.

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.

Abstract: There is disclosed an exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.

Abstract: The focus controlling system of the present invention can include a calibration paper, an image capturing device, an input interface, and a processing and controlling device. The image capturing device is employed for scanning the calibration paper. The image capturing device has a focus point adjusting mechanism. The input interface is utilized for receiving a location data of a scanning point. The processing and controlling device is responsive to the input interface and the image capturing device to control the focus point adjusting mechanism. The focus controlling method of the present invention includes the following steps. First, a scanning point is set or detected and a compensated magnification ratio for the scanning point is then calculated. A focus point of a image capturing device is adjusted and a calibration paper is scanned. The adjusting step and the scanning step are then repeated until a magnification ratio of the calibration paper is about the value of the compensated magnification ratio.

Abstract: The focus controlling system of the present invention can include a calibration paper, an image capturing device, an input interface, and a processing and controlling device. One or more calibration papers can be employed in the focus controlling system. The image capturing device is employed for scanning the calibration paper. The image capturing device has a focus point adjusting mechanism. The input interface is utilized for receiving a location data of a scanning point. The processing and controlling device is responsive to the input interface and the image capturing device to control the focus point adjusting mechanism by evaluating a resolution index. As an example, the image capturing system can be a flatbed scanning system. One of the focus controlling method of the present invention includes the steps as follows. At first, a scanning point is set or detected and the position of an image capturing device is adjusted to scan a selected calibration paper of two or more calibration papers.

Abstract: In this exposure apparatus, position information such as the position, inclination, or shape of a first mirror, a second mirror, a third mirror, and a fourth mirror constituting a projection optical system PO is measured with a mirror monitor mechanism. Based on the obtained position information, the position or inclination or shape or the like of the first mirror, the second mirror, the third mirror, and the fourth mirror is corrected by actuators serving as a correction mechanism. As a result, in the case where changes occur in the projection optical system, these can be corrected in order to maintain the exposure conditions.

Abstract: When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence &thgr; with respect to a pattern plane of a mask, the illumination light beam is reflected by the pattern plane. The reflected light beam is projected by a projection optical system PO onto a substrate, and a pattern in an area on the mask illuminated with the illumination light beam is transferred onto the substrate. During the transfer, a stage control system is operated to synchronously move a mask stage and a substrate stage in the Y direction, while adjusting a relative position of the mask in the Z direction with respect to the projection optical system, on the basis of predetermined adjusting position information.

Abstract: An image reading apparatus includes a light source for illuminating an original, a plurality of mirrors for reflecting a light beam from the original illuminated with the light source, an imaging lens for forming an image of the light beam reflected by the plurality of mirrors, an image sensor arranged at an image forming position of the imaging lens, and an integrated scanning optical unit movable in a scanning direction. The integrated scanning optical unit integrally accommodate the light source, the plurality of mirrors, the imaging lens, and the image sensor to thereby obtain image information of the original. An optical axis L connecting, of the plurality of mirrors, a mirror B optically closest to an incident surface of the imaging lens, the imaging lens, and the image sensor is substantially parallel to the original surface. The mirror B, the imaging lens, and the image sensor are located at a lowest position of the integrated scanning optical system unit with respect to the original surface.

Abstract: A multiple-resolution optical device used to scan objects of variable sizes in various resolutions and forming corresponding images onto an image sensor is disclosed. The multiple-resolution optical device according to the present invention comprises a light source, a mirror set, and a lens set. The mirror set reflects the light from the light source projected onto the object and provides a plurality of optical paths. The lens set selects one of the optical paths to provide an object distance and an image distance whereby the corresponding image is clearly formed on the image sensor in response to said size. Hence, an optimal resolution is acquired and the optical resolution for optical scan processing is substantially enhanced.

Abstract: An optical length adjusting device provides different optical length for different lenses in a multi-resolution scanner. The optical length adjusting device includes a focus module for focusing the optical image on an image sensor, a first light reflecting device for directing the light from an object to the focus module, a first carrier for fixing the first light reflecting device, a second carrier for fixing the focus module, and a driving module for moving the first and/or second carriers to change the distance between them. Since the distance between the focus module and the first light reflecting module can be adjusted, the light from the object can be guided to the focus module via the same optical path for different resolution.

Abstract: An enlargement lens is moved to a retracted position by driving a lens moving deck, and temporarily transferred onto a lens storing deck. After the lens moving deck is returned to its initial position, the enlargement lens is rotatably supported on support rails and rotated about its rotatable shaft to expose a lens surface to the outside for the cleaning. Accordingly, the enlargement lens can easily be cleaned.

Abstract: Scanning exposure for three pigments by three optical beams is carried out during a single main scanning. An angle of incidence and an angle between respective light beams are determined so as to prevent overlapping of scanning exposure. As a result, a single modulator can be used in modulating light beams. With respect to maximum swing angle of light beam by a flat mirror of a deflecting device, a image can be recorded (scanning exposure) on a sensitive material by a swing angle of about 1/5 by allocating swing width with respect to the center. Thus, a deviation of position of a focusing point and change in speed can be suppressed so that focusing, concentration and the like can be included within an allowable range.

Abstract: A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.

Abstract: A photographic printer has a lamp which projects light through a cut-off filter, a filter unit, and a diffusion plate. The light travels further through a film negative, an objective lens, and to a polarizing beam splitter. The beam splitter provides the light to a spatial light modulator and to an exposing/enlarging lens. The spatial light modulator includes a light modulating layer of a homeotropically oriented nematic liquid crystal having a negative dielectric anisotropy. Layers of transparent electrodes in the spatial light modulator are provided with a predetermined voltage of a predetermined frequency. A write CRT, controlled by a controller and control unit, provides light to the spatial light modulator so that the light from the beam splitter can be modulated with an appropriate correction. The modulated light and the light from the beam splitter are made incident on a photographic color paper. The photographic printer has improved compensation for blur caused by dust on the optical path.

Abstract: In a device for adjusting an optical system arranged in such that a scanning mirror is moved in a direction perpendicular to a main scanning line so as to reflect a line-shaped image light line by line, a first V-mirror is moved in synchronization with the scanning mirror and changes a direction of the line-shaped image light reflected from the scanning mirror toward a lens, a second V-mirror changes a direction of the line shaped image light coming from the lens toward a guide mirror, and a guide mirror projects the line-shaped image light onto a photoreceptor, the device includes a mechanism to change positions of at least two of the first V-mirror, the second V-mirror and the guide mirror so as to place the line-shaped image light at a predetermined position on the photoreceptor; and a mechanism to regulate a tilting angle of the guide mirror so as to make an incident angle of the line-shaped image light on the photoreceptor to a predetermined angle.

Abstract: In an electrostatographic reproduction machine having a charged imaging member and an optics assembly for forming a properly registered latent image on the charged imaging member, a quick and precise optics assembly realignment tool mounted removably within the machine for realigning the optics assembly, after repair or remanufacture of such optics assembly. The realignment tool includes a generally rectangular frame having four sides forming four corners, and three non-adjustable position leg members, that are formed integrally with the frame at three of the four corners for initially locating and referencing the frame relative to a reference surface within the machine. The tool also includes one adjustable position leg member mounted slidably for adjustable movement at a fourth corner for initially compensating for any runout of the reference surface, so as to achieve a properly aligned optics assembly within the machine.

Abstract: A reflection and refraction optical system includes a polarization beam splitter, a concave mirror, a lens group and a quarter waveplate, wherein an additional waveplate is provided to transform S-polarized light from the polarization beam splitter into circularly polarized light.

Abstract: It is an object of the invention to provide a catadioptric optical system with an arrangement for realizing a large numerical aperture and reducing the diameter of a concave mirror while ensuring a sufficient working distance on the image side, and also an exposure apparatus using this catadioptric optical system.A catadioptric optical system according to the invention includes a first imaging optical system for forming an intermediate image of a pattern on a first plane, a second imaging optical system for forming a reduced image of the intermediate image on a second plane, and an optical path deflecting member for guiding a light beam from the first imaging optical system to the second imaging optical system. The first imaging optical system has at least a first optical element group having a positive refracting power, and a second optical element group having a concave mirror and a meniscus lens component with a concave surface facing the first imaging optical system.

Abstract: The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction.

Abstract: An automatic printer for making prints of normal and panoramic format negative filmstrip image frames arbitrarily interspersed in a single filmstrip. Normal and panoramic projection systems are provided for projecting normal and panoramic images onto respective projection planes of the photographic print paper. Normal and panoramic format image frames are distinguished, and the appropriate projection system is employed through the insertion or withdrawal of a first reflective mirror into the projection path of the image bearing light beam. Zoom lens systems in each projection system are set to the appropriate magnifications for the width of print paper employed. The panoramic projection system employs a precision variable conjugate controlled zoom lens in association with a second movable mirror to adjust object plane to image plane distance to avoid overlap of the normal and panoramic projection planes at each magnification for each paper width.

Abstract: A device for assisting a person in focusing a camera on a surface is provided. A mirror at an angle of 45.degree. to the horizontal, and an incandescent filament, are mounted on a device that may rest on the surface to be photographed. The distance from the filament to a point on the mirror equals the distance from that point to the surface. By focusing the camera on the image of the filament that appears in the mirror, the camera will be correctly focused on the surface.

Abstract: There is provided an image forming apparatus having a magnification varying function for adjusting a lateral magnification and focus by varying the positions of a lens and a mirror of an exposure optical system for forming an image of an original on a photosensitive drum.

Abstract: A lens loading apparatus for loading a lens held by a holding member into a lens loading unit disposed in the center of a support plate which extends substantially in a horizontal direction. The lens loading apparatus has a first reference surface formed in the upper surface of the support plate along a lens insertion direction and used for placing the holding member thereon. A second reference surface is formed on the support plate along the lens insertion direction and against which one end surface of the holding member, which extends along the lens insertion direction, abuts. The holding member, which is inserted from a horizontally-extending one end, is guided along the second reference surface by a first pressing member. Further, the holding member is guided along the first reference surface by a second pressing member, thereby making it possible to stably position the lens in a predetermined place.

Abstract: Opposite surfaces or sides of a mirror in an optical system are supported in a spring-biased manner at three points in total. This prevents a shift in position of the mirror that otherwise might occur due to shocks during reciprocal movement of the optical system.

Abstract: When an input reproduction scale m is equal to a value mla which lies in a reproduction scale section ml, rated moving speeds Ula and U2a corresponding to the reproduction scale m and a resonance point avoidance coefficient kl (=1) are read in, and practical moving speeds Vla (=kl.times.Ula=Ula) and V2a (=k1.times.U2a=U2a) of a holder 2 and a cylindrical drum 10 are determined with the above data. On the other hand, when the input reproduction scale m is equal to a value m2b which lies in another reproduction scale section m2, rated moving speeds Ulb and U2b corresponding to the reproduction scale m and a resonance point avoidance coefficient k2 (.noteq.1) are read in, and practical moving speeds Vlb (=k2.times.Ulb.noteq.U1b) and V2b (=k2.times.U2b.noteq.U2b) are determined with the above data.

Abstract: The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction.