Abstract: An inspection apparatus for a laser oscillator includes a dimming plate that dims a laser beam immediately after the laser beam is emitted from the laser oscillator; an imaging unit that images, with a plurality of pixels, the laser beam dimmed by the dimming plate; a processing unit that processes an image captured by the imaging unit; and a display unit that displays the image processed by the processing unit. The processing unit has at least two thresholds of an inner ring and an outer ring used for partitioning the intensity of the laser beam.

Abstract: A device may receive document image data that includes an image of a document to be digitized. The device may detect, from the document image data, a table of information that is depicted in the image. The device may determine a data extraction score associated with a table image, wherein the data extraction score is associated with using a data conversion technique to convert the table image to digitized table data. The device may perform, based on the data extraction score not satisfying a threshold, a morphological operation on the table image to generate an enhanced table image that corresponds to an enhanced table of information associated with the table of information. The device may process, using the data conversion technique, the enhanced table image to extract the information from the enhanced table. The device may perform an action associated with the extracted information.

Abstract: According to aspects of the embodiments, there is provided an apparatus and method for driving a laser imaging module (LIM) that includes an adjustment current to have all laser diodes emitting the same amount of output so that the diodes can be connected in series on a single high current power source. Fine tuning can be done by a dedicated low current controllable power source connected directly to each laser diode. A series connected LIM uses only two heavy gauge wires so total power loss and heat stress on the LIM and module drawer connectors will be significantly reduced. Additional fine tuning can include an electronic gate so that individual diodes could be quickly turned off independently from each other.

Abstract: An image generating device includes a support unit configured to support an object, an irradiation unit configured to irradiate the object disposed on the support unit with light, a light receiving unit configured to receive light returning from the object disposed on the support unit, and a control unit configured to generate a light irradiation signal for controlling the irradiation unit and a light-receiving region driving signal for controlling the light receiving unit, wherein the irradiation unit includes a first irradiation unit for irradiating a first region of the object with light and a second irradiation unit for irradiating a second region of the object with light, the light receiving unit includes a first light-receiving region and a second light-receiving region, the first light-receiving region and the second light-receiving region each include a plurality of pixels and are disposed at different positions on the light receiving unit.

Abstract: An image reading apparatus includes a first conveyance roller, a second conveyance roller, a first conveyance guide, a second conveyance guide configured to move between an opposed position being opposed to the first conveyance guide and a retracting position being retracted from the opposed position, and an image reading unit opposed to the first conveyance guide and configured to move in a width direction orthogonal to the sheet conveyance direction and read image information on a sheet. The second conveyance guide is configured to move to the retracting position in response to the image reading unit moving in the width direction and reading the image information on the sheet.

Abstract: A light detection and ranging (LIDAR) system includes a first optical source to provide a first optical beam and a second optical source to provide a second optical beam. A light detection sensor detects a position of the first optical beam and the second optical beam relative to each other and to a reference pattern on a light detection sensor. Alignment optics may be located between the light detection sensor and the first optical source and the second optical source, and may include one or more optical components adjustable to shift each optical beam on the light detection sensor. A control system, including one or more processors, is coupled to the alignment optics and the light detection sensor, and causes the alignment optics to shift the first optical beam and the second optical beam on the light detection sensor according to the reference pattern.

Abstract: A method for restoring an illumination system installed in an EUV apparatus is provided.

Abstract: An extreme ultraviolet lithography method is disclosed. In an example, the EUVL method includes forming a resist layer on a substrate; performing a first exposure process to image a first pattern of a first sub-region of a first mask to the resist layer; performing a second exposure process to image a second pattern of a second sub-region of the first mask to the resist layer; and performing a third exposure process to image a third pattern of a first sub-region of a second mask to the resist layer. The second and third patterns are identical to the first pattern. The first, second and third exposure processes collectively form a latent image of the first pattern on the resist layer.

Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.

Abstract: The present disclosure provides a method. The method includes patterning a substrate by a patterning tool; collecting a plurality of overlay errors from a plurality of fields on the substrate; identifying noise from the plurality of overlay errors by applying a first filtering operation and a second filtering operation that is different from the first filtering operation. The method further includes grouping the plurality of overlay errors that are not identified as noise into a set of filtered overlay errors; calculating an overlay compensation based on the set of filtered overlay errors; and performing a compensation process to the patterning tool according to the overlay compensation.

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.

Abstract: An optical component for a projection exposure apparatus includes a multiplicity of variably positionable beam-guiding elements which serve as pupil facets. The optical component can be arranged in the beam path of the projection optical unit.

Abstract: According to an embodiment, an image reading device includes a photoelectric conversion unit, a white reference plate, a rotation unit, and a control unit. The photoelectric conversion unit includes an image reading sensor which converts light from an imaging position into image data. The white reference plate has a reading range which is a white reference value. The rotation unit rotates the photoelectric conversion unit so as to come to an angle at which a plurality of portions in the reading range of the white reference plate become imaging positions. The control unit sets a white reference value using a plurality of pixels on the white reference plate which are read using the photoelectric conversion unit which is rotated using the rotation unit.

Abstract: The disclosure provides a system for producing structures in a substrate. The system includes a projection exposure system. The projection exposure system includes a projection optical unit and an illumination system.

Abstract: An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.

Abstract: A method of calculating electromagnetic scattering properties of a structure, the structure including materials of differing properties and the structure being periodic in at least one lateral direction and extending in a vertical direction, comprises: numerically solving a volume integral equation for electromagnetic scattering for a plurality of modes in the at least one lateral direction, by performing, for each respective mode, integration (1350) of a pseudo-spectral polynomial (Chebyshev) expansion in the vertical direction multiplied by a ID Green's function using the same sample points in the orthogonal direction for all of the plurality of modes. The integration is performed by solving a regularized linear system of equations between first (1116) and second (1120) discrete transformation steps to compute (1118) values of a regularized Chebyshev expansion coefficient vector (?). Electromagnetic scattering properties of the structure are calculated using the results of the numerical solution.

Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.

Abstract: According to an embodiment, an image reading device includes a photoelectric conversion unit, a white reference plate, a rotation unit, and a control unit. The photoelectric conversion unit includes an image reading sensor which converts light from an imaging position into image data. The white reference plate has a reading range which is a white reference value. The rotation unit rotates the photoelectric conversion unit so as to come to an angle at which a plurality of portions in the reading range of the white reference plate become imaging positions. The control unit sets a white reference value using a plurality of pixels on the white reference plate which are read using the photoelectric conversion unit which is rotated using the rotation unit.

Abstract: An illumination optical unit for an EUV projection exposure apparatus has a diaphragm comprising a radiation-transmissive region having a discrete symmetry group. The form of the diaphragm is adapted to the form of the facets of a pupil facet mirror or to the form of the radiation source. The diaphragm is preferably arranged in the region of an intermediate focal plane.

Abstract: An input image is partitioned into a plurality of image regions based on color and color differences. The partitioning comprises assigning a color difference value to plurality of locations within the input image. The partitioning further comprises assigning each of the plurality of locations to an image region of the plurality of image regions, where the assigning occurs according to a particular order. The particular order is based at least in part on color difference values associated with the plurality of locations. The input image may comprise markup. Data representing at least a particular portion of the markup in the input image based on the partitioning is identified. Data representing at least the portion of the markup may be used in a visualization of a customizable product or a manufacturing control associated with a customizable product.

Abstract: An illumination optical unit for an EUV projection exposure apparatus has a diaphragm comprising a radiation-transmissive region having a discrete symmetry group. The form of the diaphragm is adapted to the form of the facets of a pupil facet mirror or to the form of the radiation source. The diaphragm is preferably arranged in the region of an intermediate focal plane.

Abstract: The magnitude (charge quantity) and energy of discharge are obtained by optical measurement based on light emission, and are evaluated. A discharge source is caused to emit discharge light by applying a voltage to the discharge source from a known power supply, the intensity waveform of the discharge light emission is measured using a light receiving element, the waveform of discharge current is simultaneously measured using a current conversion probe or a current waveform detector, and a database is created in which a relation with analysis data sets obtained by analyzing the waveforms is recorded in consideration of applied power information. The intensity waveform of discharge light emission from a piece of equipment under measurement is measured using the light receiving element, and light emission data obtained by analyzing the waveform is compared with the data recorded in the database so as to estimate the magnitude of discharge as a value.

Abstract: The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system connected to the final projection system and arranged for detecting a position mark on a surface.

Abstract: An image scanning apparatus is configured to obtain a greatest gray gradation value when the light source illuminates the gray reference member at a first light quantity value, set a second light quantity value such that a gray signal having the gray gradation value is output by the signal conversion unit based on the analog signal output by the photoelectric conversion element belonging to a block identified by the block information when the light source illuminates the gray reference member at the second light quantity value, calculate a shading correction value, scan the image on the original sheet with controlling the light source to illuminate the original sheet in accordance with the second light quantity value, and apply the shading correction to the digital signal output by the signal conversion unit in accordance with the shading correction value.

Abstract: An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions.

Abstract: An exposure apparatus exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting the image of a pattern onto the substrate through the projection optical system and the liquid, and includes a liquid removing mechanism that intermittently blows a gas against a reference member, movable mirror, and the like, to which the liquid is adhered in order to remove that liquid.

Abstract: A measurement system includes an illumination unit, imaging unit, acquisition unit and correction unit. A measurement target is irradiated with illumination light. The imaging unit captures an image of light reflected by or transmitted through the measurement target. The acquisition unit acquires positional relationship information representing a positional relationship between the illumination unit and the measurement target and between the imaging unit and the measurement target. The correction unit corrects a luminance of at least one of the illumination light emitted by the illumination unit and the captured image based on the positional relationship information in such a way as to correct a luminance change of the measurement target image, wherein at least two of the measurement target, the illumination unit, and the imaging unit are variable in spatial position.

Abstract: A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor. Embodiments of the preferred flux leakage paths are realized by providing a ferromagnetic shield separated by a non-magnetic gap between the permanent magnets and the back-irons. In another embodiment, the ferromagnetic shield separation includes diamagnetic materials.

Abstract: The present invention relates to a maskless exposure apparatus and a maskless exposure method which increase resolution of an exposure pattern and enhance efficiency of an optical system by using a phase shifter. More specifically, according to one aspect of the present invention, the maskless exposure apparatus includes: a lighting unit for outputting predetermined light; a spatial light modulator (SLM) for receiving the light from the lighting unit and outputting a light having a predetermined pattern; a beam expander for expanding the light outputted from the spatial light modulator; a micro lens array (MLA) for dividing the light expanded from the beam expander into a plurality of lights and collecting the lights; and a projection lens for adjusting the resolution of the lights collected through the micro lens array and project the adjusted lights into a target, a spatial filter having a phase shifter pattern being positioned between the micro lens array and the projection lens.

Abstract: An extreme ultraviolet lithography method is disclosed. In an example, the EUVL method comprises providing at least two mask areas having a same pattern, forming a resist layer over a substrate, determining an optimized exposure dose based on an exposure dose for a pre-specified pattern on one of the at least two mask areas to achieve a pre-specified target dimension under a corresponding single exposure process, and performing a multiple exposure process for exposing a same area of the resist layer to the same pattern. The multiple exposure process comprises a plurality of exposure processes, wherein each of the plurality of exposure processes uses an exposure dose that is less than the optimized exposure dose and a sum of the exposure dose of each of the plurality of exposure processes is approximately equal to the optimized exposure dose.

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns.

Abstract: A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.

Abstract: A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.

Abstract: A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.

Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

Abstract: A system for capturing an image of a document includes an input tray (30) for holding documents (20); an input imaging device (40) that captures an image of a first document in the input tray; wherein the input tray image of the first document is captured as an area image; transmitting the captured input tray image of the first document to an image processor (100); and transporting the first document to an output tray.

Abstract: A document scanner (10) includes an input tray (30) for holding documents (20) and an input image capture device (40) for capturing images of the documents (20)in the input tray (30) prior to transporting the document for imaging; an output tray (150) for holding documents (20) after the documents (20) exit the scanner; an output image capture device (140) for capturing images of the output tray; an image processor for determining characteristics of the output tray or characteristic of the documents (20) before imaging and after the documents (20) exit the scanner; and scanner functions are modified based on the output tray characteristics or the document characteristics.

Abstract: A light source device including a seed light generation device, a light amplification unit which optically amplifies seed light generated by the seed light generation device, and a wavelength conversion unit which converts the wavelength of the light optically amplified by the light amplification unit. The seed light generation device includes a pulsed light generation unit which generates pulsed light having a single wavelength, a pulse modulation unit which selectively passes and extracts a part of the pulsed light, and a timing adjustment unit which relatively adjusts the extracting timing of the pulsed light by the pulse modulation unit during the generation period of the pulsed light by the pulse generation unit, according to an operation.

Abstract: Projection systems and methods with mechanically decoupled metrology plates according to embodiments of the present invention can be used to characterize and compensate for misalignment and aberration in production images due to thermal and mechanical effects. Sensors on the metrology plate measure the position of the metrology plate relative to the image and to the substrate during exposure of the substrate to the production image. Data from the sensors are used to adjust the projection optics and/or substrate dynamically to correct or compensate for alignment errors and aberration-induced errors. Compared to prior art systems and methods, the projection systems and methods described herein offer greater design flexibility and relaxed constraints on mechanical stability and thermally induced expansion. In addition, decoupled metrology plates can be used to align two or more objectives simultaneously and independently.

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract: A method of determining a defect in a grid plate of an encoder-type position measurement system, the method including providing an encoder-type position measurement system to measure a position of a movable object with respect to another object, the encoder-type position measurement system including a grid plate and an encoder head, measuring a quantity of light reflected on each of the two or more detectors, using a combined light intensity of the reflected light on the two or more detectors to determine a reflectivity signal representative for the reflectivity of the grid plate at the measurement location, and determining a presence of a defect at the measurement location on the basis of the reflectivity signal of the grid plate.

Abstract: A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a pre-determined direction of a pre-alignment system when illuminated with light of a wavelength used for the pre-alignment. The diffractive elements may occupy at least half of an area of each alignment feature. The diffractive elements may be configured to enhance first or higher order diffractions, while substantially reducing zeroth diffraction orders and specular reflection when illuminated with a wavelength used for reticle prealignment. The dimensions of each diffractive element may be a function of a diffraction grating period of each alignment feature.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

Abstract: Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device.

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Abstract: A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a controller. The wafer spin device supports a wafer for processing. The optical system directs exposure light on a respective edge portion of the wafer simultaneously to create a dummy track on the edge of the wafer. The scanner interface module sends and/or receives dummy edge exposure information from a scanner via a computer network. The controller receives the dummy edge exposure information from the scanner interface module and uses the exposure information to control the optical system.

Abstract: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.

Abstract: Provided is an information processing apparatus including an input position acquisition unit, a depressing force acquisition unit and an input control unit. An input position acquisition unit obtains an input position detected with respect to an input operation. A depressing force acquisition unit obtains a depressing force detected with respect to the input operation. An input control unit fixes the input position as a position of an input candidate in response to a timing at which an increase amount of the depressing force has exceeded a first threshold value, at a stage prior to an input candidate determination operation of determining the input candidate as input information.