Abstract: The pattern of a spatial frequency filter including a liquid crystal element (1031-103n) is controlled without removing the filter from a projection lens system. Specifically, a spatial frequency filter (103) is disposed at the pupil surface in a projection lens system (10). A means for controlling the spatial frequency filter (103) includes a liquid crystal element controller (15b) and a filter information storage (16b). A pattern required for the spatial frequency filter (103) is transferred from the filter information storage (16b) to the liquid crystal controller (15b). The transmittance and phase shift of the spatial frequency filter (103) are previously designed by simulation, for example. Based on these data, an aspect of applying a voltage to the liquid crystal element (1031-103n) is stored in the filter information storage (16b).

Abstract: A projection exposure apparatus for illuminating a pattern of a mask with illumination light from an illumination system and for projecting an image of the pattern onto a substrate through a projection optical system. The apparatus includes a masking device included in the illumination system and disposed on a plane optically conjugate with a plane on which the pattern of the mask is disposed, the masking device having a variable-size aperture for defining an exposure area in an image plane of the projection optical system, and an illuminometer disposed at the image plane side of the projection optical system. The illuminometer is movable along the image plane while a light receiving surface thereof is registered with a plane displaced from the image plane to detect a light intensity distribution on the displaced plane when the masking device provides a small aperture. The illumination system includes a movable component for adjusting a light intensity distribution of the displaced plane.

Abstract: There is disclosed a light guide for guiding light from a light source in a longitudinal direction and radiating the light to illuminate an object to be illuminated, which comprises a diffuser for diffusing the light from the light source along the longitudinal direction of the light guide, and a radiator for radiating the light diffused by the diffuser in a predetermined direction. By arranging the diffuser and the radiator so that a normal line passing through the center of the width of the diffuser is different from the predetermined direction at least in the vicinity of the light source when viewed in the longitudinal direction of the light guide, the illuminance distribution of the longitudinal direction of the light guide is uniformed.

Abstract: An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.

Abstract: An object of the invention is to provide an illumination apparatus and exposure apparatus and method employing this, whereby the illumination distribution on a mask or wafer can be compensated to a desired distribution, and whereby it is possible to independently alter the pupil shape (coherence factor) of illuminating light in respect of various image heights above the wafer.

Abstract: A reflective member is fixedly or movably provided near the pupil plane of a projection optical system with which a projection exposure apparatus is equipped. A collimated measuring beam with an exposure wavelength is incident from the object plane side or image plane side of the projection optical system, and the intensity of the beam reflected by the reflective member is detected photoelectrically to measure a value corresponding to the attenuation factor (transmissivity or reflectivity) of the projection optical system or the variation with time of the attenuation factor (transmissivity or reflectivity) of the projection optical system.

Abstract: A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding the mask and moving the mask within a plane perpendicular to the optical axis of the projection optical system, a substrate stage for moving the photosensitive substrate within a plane conjugate to the plane with respect to the projection optical system, and an imaging characteristic correction system for correcting an imaging characteristic of the projection optical system. The apparatus synchronously moves the mask and the photosensitive substrate along the optical axis of the projection optical system so as to expose the entire pattern surface of the mask.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: An exposure apparatus has an illumination system for transferring a reticle pattern formed on a reticle as a master onto a wafer as a photosensitive member by a laser source, a stop for setting an illumination region by the laser source, and a mechanism for synchronously scanning the reticle and wafer in predetermined scanning directions. Exposure processing by synchronous scanning of the reticle and wafer and relative movement of the wafer in a direction crossing the scanning direction are repeated, thereby forming a transfer pattern with connected exposure regions on the wafer. The stop driving mechanism performs exposure while driving a vane of the stop for setting the illumination region in the direction perpendicular to the scanning direction in the direction crossing the scanning direction during the exposure processing.

Abstract: A microlithography projection apparatus comprises an illuminator, for supplying a beam of radiation for illuminating a pattern on a mask, and a projection system for forming an image of the illuminated portion of the mask on a resist-coated substrate. The image is projected off-axis with respect to the optical axis of the projection system and the aperture of the illuminator is minimized to that of the illuminated portion of the mask. The illuminator is provided with a compensator, such as a tiltable mirror or wedge-like transmissive optical element for compensating for telecentricity errors intrinsic to the projection system.

Abstract: A scanning exposure system to expose an objective wafer has a light source; a slit-shaped window having a length in a first direction greater than a width in a second direction perpendicular to the first direction; a photomask having an exposure opening therein, the exposure opening having a length along a longer direction greater than a width along a narrower direction perpendicular to the longer direction, the longer direction being aligned parallel to a projection of the first direction on the photomask, the objective wafer being exposed to the light source through the slit-shaped window and the exposure opening during a scanning operation by a relative motion of the photomask with respect to the slit-shaped window in a second direction perpendicular to the first direction.

Abstract: An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical system for projecting an image of the pattern onto a predetermined exposure region on a substrate, and which synchronously scans the mask and the substrate during the projection. The apparatus includes a measuring device for detecting intensities of the light pulses radiated onto the substrate during the scanning and measuring an integrated light quantity on each of a plurality of partial regions in the exposure region on the substrate on the basis of a detection signal of the intensities, wherein the partial regions are defined by a scanning speed of the photosensitive substrate and an oscillation interval of the light pulses.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. At that time, not only fluctuations of the energies of the pulsed lights but also fluctuations of light emission timing of the pulsed lights are taken into consideration.

Abstract: A method for detecting a degraded light source is provided. An exposure time associated with the light source is monitored. The exposure time is compared to at least one control limit. A degraded condition is identified based on the exposure time violating the control limit. A processing tool includes a stepper and an automatic process controller. The stepper has a light source and is adapted to illuminate a wafer for an exposure time. The automatic process controller is adapted to monitor the exposure time, compare the exposure time to at least one control limit, and identify a degraded condition based on the exposure time violating the control limit.

Abstract: An image reading method and an image reading device enable an elongated photographic photosensitive material to always be read well even if the elongated photographic photosensitive material has connected portions or deformed perforations. When a discontinuous portion detecting sensor detects a discontinuous portion such as a connected portion or a deformed perforation, an image frame which will be at a position for reading at a time when the discontinuous portion may interfere with conveying rollers is predicted. While the discontinuous portion is being conveyed between auxiliary conveying rollers and the conveying rollers and after a predetermined amount of time has elapsed before a predicted image frame is read by a CCD line sensor, conveying of the elongated photographic photosensitive material is switched to the auxiliary conveying rollers, and the elongated photographic photosensitive material is read.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter comprises at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.

Abstract: Disclosed is an imaging optical system and an image forming apparatus that provide a small-size design and high resolution. An optical system (telecentric optical system) between the composite focus 4d of an imaging surface side and a laser array 1 is divided into a second lens group 4b and a third lens group 4c and the distance D2 between the third lens group 4c and the laser array 1 is shortened, whereby the spread of incident light into the third lens group 4c is reduced and the aperture of the third lens 4c is reduced. Also, the principal light beam 2a of beam 2 from the laser array 1 is bent at two stages, the second lens group 4b and the third lens group 4c, and the distance D1 between the second lens group 4b and the third lens group 4c is increased, whereby the bend of the principal light beam 2a of the laser beam 2 in the second lens group 4b and the third lens group 4c is reduced, with the result that small aberration is obtained.

Abstract: An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical system for projecting an image of the pattern onto a predetermined exposure region on a substrate, and which synchronously scans the mask and the substrate during the projection. The apparatus includes a measuring device for detecting intensities of the light pulses radiated onto the substrate during the scanning and measuring an integrated light quantity on each of a plurality of partial regions in the exposure region on the substrate on the basis of a detection signal of the intensities, wherein the partial regions are defined by a scanning speed of the photosensitive substrate and an oscillation interval of the light pulses.

Abstract: A scanning exposure method is arranged to illuminate a mask with light pulses and to synchronously scan the mask and a photosensitive substrate so as to effect scanning exposure of a pattern image of the mask on the photosensitive substrate, and includes detecting energy amounts of light pulses illuminating the mask during the scanning exposure, successively calculating an integrated amount of light of the last N pulses (N is an integer more than one) for every unit pulse number, based on the energy amounts thus detected and adjusting an exposure dose on the photosensitive substrate in accordance with a sequence of integrated amounts of light thus calculated.

Abstract: A system for processing a customers order for reprinting uses a plurality of film pieces cut from a film to obtain a predetermined number of frames and is based on reprint order information recorded in a recording medium. The reprint order information includes frame position data concerning the position of a target frame to be printed in association with a condition thereof, and is held in a film piece holder in which the plurality of film pieces are held in an end flush state and according to a predetermined arranging order and print number data concerning the total number of reprints to be obtained from the target frame. Based on this frame position data, one film piece containing the target frame from the plurality of film pieces is determined and the position of the target frame within the specified film piece is also determined.

Abstract: A first laser light intensity detector is positioned within a stepper or scanner proximate to a reticle so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer as practical. A second light intensity detector is located at the output of the laser. The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.

Abstract: An exposure apparatus with detachable illumination sensor, which is used to calibrate permanently installed illumination sensors such as an integrator sensor that detects the intensity of exposing light IL split by a beam splitter inside the illumination system and a fixed-type illumination sensor 7, which is fastened to the surface of the wafer stage 1. The detachable illumination sensor is installed on the wafer stage 1 in a freely detachable manner and the output signal from this detachable illumination sensor is forwarded to an illumination control unit via a sensor control device. In the calibration of the integrator sensor, the intensity of the exposing light IL is synchronously measured by the integrator sensor and the detachable illumination meter and the output signals from these sensors are processed inside the illumination control unit.

Abstract: An exposure amount control device for controlling an integrated exposure amount of pulsed light to a photosensitive substrate within a predetermined range in which a pattern of a mask is successively exposed on the substrate by synchronously scanning the mask forming the pattern to be exposed and the photosensitive substrate relatively with respect to a predetermined illumination area illuminated with pulsed light from a pulsed light source, satisfies the following relationship:.DELTA.D.sub.12 .gtoreq.D/(2N.sub.min)wherein luminous intensity distribution of the predetermined illumination area in a scan direction is shaped to be a trapezoid, .DELTA.D.sub.12 is an average value of half of the widths of the slope portions on the lateral sides of the trapezoid-shaped luminous intensity distribution in the scan direction, D is the width, at half peak value points, of the luminous intensity distribution on the predetermined illumination area of the substrate in the scan direction and N.sub.

Abstract: A method and apparatus for printing high quality prints from photographic negatives employ a printer with a system that scans the negatives optical densities region by region. Corresponding quantities of light are calculated, the first prints are then printed using these quantities, and thereafter these quantities are stored in a memory to be retrieved at a later time for duplicate prints. To locate the stored values representing the first printing light quantities, the densities employed to calculate the light quantities are associated with those quantities in the memory. The negatives are scanned again when the subsequent prints are to be printed. The measured densities are then compared with the densities stored during the first printing process. If and when the results are similar, the identity of the two negatives is confirmed and the first printing light quantities are obtained from the memory and employed for producing the subsequent prints.

Abstract: In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

Abstract: An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate.

Abstract: A digital electron lithography system includes a plurality of cathodes oriented in a plane and positioned substantially parallel to a substrate surface in a vacuum chamber. The substrate surface is coated with a layer of an electron resist material and, in operation, individual cathodes in the array are selectively activated to emit electrons which alter the resist material. In order to create a predetermined pattern on the substrate, a focusing magnet is provided to direct the electrons from the respective cathodes to be focused on the substrate surface along substantially parallel electron paths. Additionally, a steering magnet is provided to change electron path directions so that electrons are steered to sequentially affect a plurality of pixels in a pixel matrix on the substrate surface. To minimize ion damage to the cathodes the electron paths are oriented at an angle to the perpendicular direction between the plane of the array and the substrate surface.

Abstract: An exposure system and method that can optimize the exposure of an optical resist film independent of the chemical reaction of the resist film due to optical exposure. The optimum exposure time is measured using a first optical resist film and a first semiconductor wafer, and the data thus obtained is stored in a memory. Then, a second optical resist film on a second semiconductor wafer is exposed to the same exposing light, and the intensity of the reflected light for the second resist film and the second wafer at the start of exposing is measured. The stored data of the optimum exposure time for the first resist film and the first wafer is read out, and is used as the optimum exposure time for the second resist film and the second wafer.

Abstract: An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.

Abstract: An imaging apparatus for reading an image recorded on a photographic film includes: a solid-state imaging device on which an image derived from light transmitted through the photographic film is formed; a density-measuring device for receiving the light transmitted through the photographic film and for measuring a large area transmittance density of the image for each color of R, G, and B; and a correcting device for correcting image color signals on the respective colors of R, G, and B outputted from the solid-state imaging device, on the basis of a ratio of large area transmittance densities of the image for the respective colors of R, G, and B determined from an RGB output of the density-measuring device.

Abstract: According to the improve method for use with image inputting apparatus to set the illuminance of reading light, the measurement with the image sensor is performed with the light source stop being adjusted to a specified initial value of degree of opening in the absence of original in an optical path and if an output from the image sensor is not within a specified range, either adjustment of the quantity of the light from the source or readjustment of the light source stop using a light source stop table which represents the relationship between the degree of opening of the light source stop and the output of the image sensor or both the adjustment of the quantity of the light from the source and the readjustment of the light source stop are performed and another measurement with the image sensor is performed in the absence of original in the optical path and these steps are repeated until the output from the image sensor comes to fall within the specified range, and if the output falls within the specified ra

Abstract: In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.

Abstract: A reticle and a wafer are relatively scanned in a scanning exposure type of projection exposure apparatus so that a pattern on the reticle is transferred onto the wafer by exposure. Heat exchangers which has the Peltier device are provided on a side surface of an integrator sensor which measures the quantity of exposure to control temperature of a photosensitive surface of the integrator sensor. In a side of heat irradiation surface of the heat exchangers, cooling water is circulated so that the heat exchangers are cooled. Saturation temperature at which temperature of the photosensitive surface is saturated when an illumination beam is irradiated to the photosensitive surface is determined and then the quantity of light irradiated to the photosensitive surface is measured with the temperature of the photosensitive surface being maintained at the saturation temperature.

Abstract: There is provided a film image detection method, comprising the steps of measuring densities at a large number of measurement points arranged along a first direction and a second direction crossing the first direction in a measurement area including an image recording range on a photographic film on which an image is recorded, calculating density variation amounts at the measurement points along the first and second directions on the basis of the densities at the measurement points in the measured measurement area, accumulating the calculated density variation amounts at the measurement points along the first direction for each of a plurality of first rows of measurement points constituted by a predetermined number of measurement points arranged along the second direction, and for accumulating the density variation amounts at the measurement points along the second direction for each of a plurality of second rows of measurement points constituted by a predetermined number of measurement points arranged along

Abstract: An index printer in which density correction can be reliably effected and in which an appropriate image can be printed is obtained. When a standard image data such as a so-called Bull's eye is input from an image memory to a gray image processing portion of a sub-control portion, data which is greater than a predetermined threshold value Q is extracted from the standard image data and is averaged so as to set a standard gray image. The set standard gray image is displayed on a whole surface of a display surface of a liquid crystal panel via a liquid crystal panel driver, and is printed onto a photographic printing paper by a light source.

Abstract: An apparatus for processing film has two processing units and transport rollers for conveying film past the units. One of the units may include a scanning device and the other unit may include a copying device. Alternatively, the two units can comprise a prescanning device and a main scanning device, respectively. The apparatus further has a receiving station for film cartridges and at least one separate receiving station for film which is not confined in cartridges. Film can be fed to the transport rollers from either station.

Abstract: A scanning exposure apparatus for illuminating an area on a mask has a power supply system for supplying an exposure light source with an electric power regulated to a predetermined state; an illumination intensity varying system provided between the exposure light source and the substrate and adapted to regulate the attenuation rate of the illuminating light; an exposure amount measuring sensor for measuring the exposure energy of the illuminating light emitted from the exposure light source; and a control system for switching a constant power mode for supplying the exposure light source with a predetermined constant electric power through the power supply system, and a constant illumination intensity mode for controlling the function of the power supply system and the illumination intensity varying system in such a manner that the exposure energy measured by the exposure amount measuring sensor is maintained at a predetermined target value.

Abstract: An image printer includes a negative-film projection exposure unit capable of projecting and exposing image information of a negative film on to a photosensitive material adapted for negative films and a positive-film exposure unit capable of exposing image information of a positive film on to the photosensitive material adapted for negative films.

Abstract: An exposure control system for the photographic recording of a microscope image comprises a two dimensional photographic receiver arrangement for detecting the image brightness of the microscope image. The receiver arrangement is a component part of a camera system which is attachable to a standard camera part of a microscope. The receiver arrangement has an interface for transmitting image information of a microscopic object detected by the receiver arrangement to a viewing unit. A first input device is included to which the viewing unit is coupled for manual selection of at least one optical image region on the receiver arrangement. The intensity value of the image region forming a control signal for the exposure time of the photographic recording.

Abstract: A light exposure apparatus used for manufacturing semiconductors, liquid crystal display elements or the like is provided with an illuminating optical system for illuminating a mask formed with a pattern with pulse light from a light source, a mask stage for loading the mask, a substrate stage for loading the photo-sensitive substrate, and a driving system for synchronously scanning the mask stage and a substrate stage.

Abstract: A diffraction grating is set between a light source and a fly-eye lens composed of a plurality of lens elements rectangular in cross section, and using the zeroth order diffraction beam and .+-.first order diffraction beams emergent from the diffraction grating, a plurality of light source images are formed along the longitudinal direction on the exit plane of each lens element in the fly-eye lens.

Abstract: A method for producing copies of photographic originals, wherein an original is scanned regionally. With the aid of measurement data thus obtained, a decision is made in a test step, on the basis of specified criteria, whether the original is worth copying or not. On the basis of this decision, the particular original is or is not copied onto photographic copy material. In the test step, the scanned original is assigned to at least one of at least three categories of originals; namely a first category which includes originals that are unequivocally worth copying, a second category which includes originals that are unequivocally not worth copying, or a third category which includes originals that are neither unequivocally worth copying nor unequivocally not worth copying.

Abstract: A photographic printer includes a light source for radiating light rays for photographic printing to a film; a unit for fixing the film; a unit for providing a film information signal by detecting the light filtered through the film; an image processing unit for processing the film information signal and generating a corresponding control signal; an image display unit located between the light source and the film for displaying an image corresponding to the control signal; and a focusing unit for forming an image on a printing paper according to the light filtered through the image display means and the film.

Abstract: An image exposure system for printing an image, comprised of pixels, on photosensitive media based on image data, includes an exposure unit for converting the image data into a light signal for exposure of each of the pixels, a measuring device and a compensator used to correct exposure levels. The exposure unit has light output elements for outputting the light signal for respective ones of the pixels onto the photosensitive media to effect exposure of the image on the photosensitive media. The measuring device is for measuring a density of each of the pixels of the image on the photosensitive media produced by exposing the photosensitive media with reference image data as the image data.

Abstract: An exposure amount control device for controlling an integrated exposure amount of pulsed light to a photosensitive substrate within a predetermined range in which a pattern of a mask is successively exposed on the substrate by synchronously scanning the mask forming the pattern to be exposed and the photosensitive substrate relatively with respect to a predetermined illumination area illuminated with pulsed light from a pulsed light source, satisfies the following relationship:.DELTA.D.sub.12 .gtoreq.D/(2N.sub.min)wherein luminous intensity distribution of the predetermined illumination area in a scan direction is shaped to be a trapezoid, .DELTA.D.sub.12 is an average value of half of the widths of the slope portions on the lateral sides of the trapezoid-shaped luminous intensity distribution in the scan direction, D is the width, at half peak value points, of the luminous intensity distribution on the predetermined illumination area of the substrate in the scan direction and N.sub.

Abstract: An exposure apparatus for and a method of producing devices, in which an original pattern such as a reticle is projected onto an object such as a wafer to be exposed, through a projection optical system. The projection optical system includes at least one optical element, optical characteristics thereof having been tested using a measuring beam having a first wavelength region. An exposure light source emits a light beam having a second wavelength region, selected independently from the first wavelength region, to irradiate the original pattern with the beam from the exposure light source, so that an image of the pattern is projected onto the object through the projection optical system, thereby exposing the object to produce the device.

Abstract: A photometric system for a photographic printing apparatus having an exposure device for projecting light traveling from a light source (21) through a mirror tunnel (24), along a projection path through a photographic film (2) to printing paper (3). An opening (24b) is formed in a side wall (24d) having a mirror surface for forming the mirror tunnel. The photometric system includes a photometer (60) disposed outside the mirror tunnel for metering only light entering through the opening (24b) from a region of the opening (24b) and a region displaced from the region of the opening (24b) toward the light source, and a reflection mirror (31; 71) for deflecting the light entering through the opening (24b) toward the photometer (60). The reflection mirror (71) is switchable between a first position for deflecting the light entering through the opening (24b) toward the photometer (60), and a second position for covering the opening (24b).

Abstract: A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding the mask and moving the mask within a plane perpendicular to the optical axis of the projection optical system, a substrate stage for moving the photosensitive substrate within a plane conjugate to the plane with respect to the projection optical system, and imaging characteristic correction device for correcting an imaging characteristic of the projection optical system. The apparatus synchronously moves the mask and the photosensitive substrate along the optical axis of the projection optical system so as to expose the entire pattern surface of the mask.

Abstract: In an image reproducing apparatus, an image recorded on a negative film is subjected to optical measurement by an optical measuring device. The data obtained by the optical measurement is stored in a photometric data memory for each type of film which is judged by a DX code reader and a film type detecting device. In the apparatus, a difference in characteristics between a reference film and the negative film is calculated by a film characteristic difference calculating device, and the image characteristic amount of the image is calculated by an image characteristic amount calculating device. In a film type correction amount calculating device, a correction value is calculated based on the calculated difference in the film characteristics and the image characteristic amount to compensate for a decrease in the quality of the printed image due to the difference in the film characteristics.