Abstract: Implementations of a method of forming a plurality of semiconductor devices on a semiconductor substrate may include: providing a semiconductor substrate having a first surface, a second surface, a size, and a thickness where the second surface opposes the first surface and the thickness is between the first surface and the second surface. The method may include processing the semiconductor substrate through a plurality of semiconductor device fabrication processes to form a plurality of semiconductor devices on the first surface. The thickness may be between 100 microns and 575 microns and the size may be 150 mm. The semiconductor substrate may not be coupled with a carrier or support.

Abstract: A determination apparatus has a calculation section, where first and second direction pitches intersecting within a predetermined plane of a plurality of detection areas are D1 and D2, respectively, sizes in the first and second directions of each of a plurality of divided areas arranged two-dimensionally along the first and second directions on a substrate are W1 and W2, respectively, and first and second direction pitches of a plurality of marks arranged on the substrate are p1 and p2, respectively, calculates pitch p1 and pitch p2 of the plurality of marks that satisfy formulas (a) and (b) below, based on pitch D1, pitch D2, size W1, and size W2.

Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.

Abstract: A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.

Abstract: There is provided an inspection method including acquiring an inspection image by irradiating a sample with a plurality of electron beams and by simultaneously scanning the sample by the electron beams, performing first correction of a reference image corresponding to the inspection image or second correction of the inspection image based on a plurality of distortions of each of the electron beams and on a position scanned by each of the electron beams in the inspection image, and performing first comparison of the reference image subjected to the first correction with the inspection image or second comparison of the reference image with the inspection image subjected to the second correction.

Abstract: An asymmetric optical interferometry method, comprises the following steps: an incident light is split into two beams, and the two beams are respectively projected onto a surface of an object to be tested and a reference mirror; and then respectively pass through a first imaging lens having a larger area on the side of the object, and a second imaging lens having a smaller area on the side of the reference mirror, and overlap on a photoelectric sensor after passing through a third imaging lens to form at least one interference image (S1); the corresponding interference image is input into a computer to obtain a signal of the corresponding interference image (S2); parse the signal of the corresponding interference image to obtain a three-dimensional shape (S3) of the surface of the object. Also provide an asymmetric optical interferometry device.

Abstract: Disclosed is a machining method by turning at least one surface of an ophthalmic lens, using a turning machine having at least one geometrical defect. The method includes a step (101-104) of determining a turning configuration for machining by turning the at least one surface of the ophthalmic lens, the turning configuration including turning parameters and machine defects parameters associated to the turning parameters.

Abstract: An interferometer measuring device is disclosed which includes a workpiece stage (10), a laser interferometer (20) and a measuring reflector (30) mounted on the workpiece stage. The measuring reflector (30) is comprised of a plurality of planar mirrors (31) that are joined together along a horizontal direction. The laser interferometer (20) includes a first interferometer (21) and a second interferometer (22).

Abstract: Methods, systems and devices for estimating a parameter of interest in a borehole. The method may include generating information from an optical displacement device relating to relative motion between two or more reflective surfaces thereof that is indicative of the parameter of interest; and preventing changes in the information resulting from changes at the optical displacement device in at least one of i) temperature, or ii) pressure, by compensating for the changes. Compensating may include adjusting at least one light source generating an electromagnetic beam at least partly received by the optical displacement device responsive to information relating to a control optical displacement device at the optical displacement device. Compensating may include using an optical displacement device and configuring the optical displacement device such that a difference between a first variable gap and a second variable gap is substantially zero while the apparatus is subject to nominal conditions.

Abstract: Some embodiments of the invention include a calibration method for a coordinate measuring machine. In some embodiments, the method may include emitting and directing the laser beam towards a first of the set of retro-reflectors, whereby a measuring path is defined by the orientation of the laser beam, moving the calibration laser head along the measuring path so that the laser beam is kept directed towards the first retro-reflector according to the measuring path and the reflected laser beam is continuously received at the calibration laser head, measuring the change in distance to the first retro-reflector at a plurality of measuring positions along the measuring path and gathering a machine position for each of the plurality of measuring positions, the machine position relating to a position of the tool carrier relative to the base.

Abstract: The invention relates to the field of laser annealing, and discloses a laser annealing device, a production process of a polycrystalline silicon thin film, and a polycrystalline silicon thin film produced by the same. The laser annealing device comprises an annealing chamber, in which a laser generator is provided, wherein an annealing window, through which the laser passes, and two light-cutting plates oppositely provided above the annealing window are also provided in the annealing chamber, wherein the light-cutting end face of each of the light-cutting plates is a wedge-shaped end face. In technical solutions of the invention, since the light-cutting end face is a wedge-shaped end face, the included angle formed by the reflected beam, which is formed by the reflection of the incident beam arriving at the light-cutting end face, and the ingoing beam, which passes through the annealing window, is relatively large, and the vibrating directions of them differ relatively greatly.

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.

Abstract: Maskless digital lithography systems and methods with image motion compensation are disclosed. The systems include an illuminator, an image transducer and a scanning device, wherein the transducer can be upstream or downstream from the scanning device. The illuminator provides illumination light that is modulated by the image transducer. The scanning device, illuminator and image transducer are operated in synchrony so that an image formed in a photoresist layer on a moving substrate forms a photoresist pattern that is not substantially smeared.

Abstract: An angle measuring system including: a rotary encoder including an encoder main body and a rotating shaft which is freely rotatable with respect to the encoder main body, the rotary encoder which detects a relative rotation angle of the rotating shaft with respect to the encoder main body; a regulation member which regulates an absolute rotation angle of the encoder main body about the rotating shaft within a fixed range; an absolute angle detecting device which detects the absolute rotation angle of the encoder main body about the rotating shaft concurrently with detection of the relative rotation angle by the rotary encoder; and a correction device which corrects the rotation angle detected by the rotary encoder based on the rotation angle detected by the absolute angle detecting device.

Abstract: A signal acquisition and distance variation measurement system for laser ranging interferometers comprising a signal acquisition unit. This unit comprises a frequency detection subsystem to detect the frequency of a received laser beam measurement signal which is buried in noise, wherein the subsystem comprises an acquisition subsystem with a wavelet packet decomposition unit and a phase/frequency detector PLL; a main PLL unit being coupled to the frequency detection subsystem for receiving the detected frequency of the measurement signal for phase estimation of the measurement signal; and a phasemeter band detection subsystem for detecting whether the measurement signal frequency is higher or lower than a reference signal frequency of a reference laser beam by operating a known change to the frequency of the reference signal and measuring the consequent change in the frequency of an interference signal for having the phase of reference signal locked to the measurement signal phase.

Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Abstract: A wafer stage is moved while monitoring a position using an X interferometer and a Y interferometer, and a Z position of a Y scale arranged on the wafer stage upper surface is measured using a surface position sensor. In this case, for example, from a difference of measurement results of two surface position sensors, tilt of the Y scale in the Y-axis direction is obtained. By measuring the tilt of the entire surface of a pair of Y scales, two-dimensional unevenness data of the scales are made. By correcting the measurement results of the position surface sensor using the unevenness data, and then using the corrected measurement results, it becomes possible to drive wafer stage WST two-dimensionally with high precision.

Abstract: A measuring method for linear stage used for measuring a displacement volume of a linear stage includes a light source, a two-dimensional grating, a quadrant photodiode and a processor. The light source provides an incident light, and the two-dimensional grating is disposed in light path of the incident light and reflects the incident to form a reflection light. The quadrant photodiode is disposed in light path of the reflection light and receives the reflection light for generating a plurality of sensing signals. The processor receives the sensing signals and utilizes the sensing signals to calculate a slope signal by a slope signal equation of the two-dimensional grating and an initial position signal and an end position signal by a position signal equation of the two-dimensional grating. The processor obtains the displacement volume of the linear stage by the slope signal, the initial position signal and the end position signal.

Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

Abstract: A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.

Abstract: A novel means of provided velocity control of an interferometer wherein one of the moving components includes the beamsplitter element is introduced herein. Using a moving beamsplitter and coupled flexure mounting allows improved velocity control because the low mass of the beamsplitter enables the systems disclosed herein to respond faster than conventional mirror velocity controlled interferometer instruments with a resultant lower velocity error so as to provide a more stable and lower noise spectra from the analytical instrument. The control of the velocity of the beamsplitter and if desired, one or both of the configured mirrors, reduces the time wasted changing velocity at the ends of each scan. The result is an increase in data collection available in any given experiment time frame. Such desirable arrangements of the present invention thus allow scans to be collected at higher rates, which beneficially increase the ability to monitor rapidly changing systems.

Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

Abstract: A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first X-axis interferometer disposed on the stage that is configured to measure an X-axis location of the stage using the X-axis interference reflector, and an optical movable element spaced apart from the stage in the Y-axis direction that is configured to shift in the X-axis direction a path of a light beam propagating in the Y-axis direction according to movement of the stage in the X-axis direction.

Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Abstract: An optical position-measuring device is adapted to detect the position of an object in several spatial degrees of freedom. The object is disposed in a manner allowing it to move at least along a first direction of movement and along a second direction of movement. The position-measuring device includes at least one light source and at least one first and second measuring standard which are located on the object, extend along a first extension direction and a second extension direction and include graduation regions disposed periodically along the first and second extension directions.

Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

Abstract: A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one or more reference targets mounted on the other of the movable object and the other object, each reference target including a planar surface with a grid or grating to cooperate with the two or more one dimensional (1D) encoder heads, and a processor to calculate a position of the object on the basis of outputs of the two or more 1D encoder heads, wherein the measurement direction of each of the two or more 1D encoder heads is non-perpendicular to the planar surface of the respective reference target.

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract: A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction that includes the first direction component, that is substantially symmetric to the first reflecting surface; and a third reflecting surface, which extends in a fourth direction, that is substantially orthogonal to the first direction.

Abstract: A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.

Abstract: On the +X and ?X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair of Y scales. Similarly, on the +Y and ?Y sides of the projection unit, a plurality of X heads are arranged in parallel to the Y-axis by the distance, so that two heads each constantly form a pair and face a pair of X scales. Of the pair of heads consisting of two heads which simultaneously face the scaler measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to dust and the like adhering on the scale surface, measurement values of the other head is used. By using the two pairs of Y heads and the pair of X heads, a position of a stage within a two-dimensional plane is measured in a stable manner and with high precision.

Abstract: A mounting apparatus which mounts on a substrate, a component having an inclined surface which intersects with a contact surface of the substrate and the component, at an acute angle, includes a first light source having an optical path orthogonal to the contact surface, and a camera which picks up an image of the component and an image of the substrate, a second light source which irradiates light on the inclined surface, and a moving means which moves at least one of the component and the substrate relatively, in a plane parallel to the surface of contact, and reflected light which is irradiated from the second light source, and reflected by the inclined surface is incident on the image pickup section.

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of the movable body and measurement results of a second measurement system which measures a variance of the arm member using a laser interferometer. In this case, the drive system corrects measurement errors caused due to a variance of the arm member included in the measurement results of the first measurement system, using the measurement results of the second measurement system.

Abstract: A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein a block defines the plane. At least one optical arrangement is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement comprises an illumination apparatus for reflected light illumination and/or transmitted light illumination and at least one first or second optical element, wherein at least part of the at least one optical element extends into the space between the block and an optical system support. At least one encapsulation is provided, encapsulating at least one optical component of at least one optical arrangement and/or at least one optical element.

Abstract: It is a purpose of this invention to provide a Hover CMM to accurately measure an object. The Hover CMM comprises: a probe, an air vehicle and a localiser. The probe is mounted on the air vehicle. The air vehicle transports the probe around the surface of the object. The localiser tracks the position and orientation of the probe. The air vehicle is capable of hovering, slow and rapid movement. The measurements made by the probe are synchronised with the measurements made by the localiser. In a further embodiment, multiple probes, multiple air vehicles and multiple localisers can be provided in a system. In a further embodiment, the air vehicle has additional propulsion means for reducing wander. In another embodiment, the air vehicle is tethered. In a further embodiment, a gantry is provided for tethering the air vehicle. In another embodiment, a tilting means is provided to incline the probe relative to the air vehicle.

Abstract: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of the movable body and measurement results of a second measurement system which measures a variance of the arm member using a laser interferometer. In this case, the drive system corrects measurement errors caused due to a variance of the arm member included in the measurement results of the first measurement system, using the measurement results of the second measurement system.

Abstract: The invention relates to a grinding machine for grinding a workpiece, which has been set on a chuck top surface, by moving a rotating grinding wheel in relation to the workpiece. The grinding machine includes: a microscope configured to be vertically movable; a CCD camera configured to take an image viewed through the microscope; and an image processor configured to process the image taken by the CCD camera to measure a vertical distance between a reference plane of the microscope and an object of the microscope. The image processor is adapted to measure the vertical distance between the reference plane of the microscope and the object of the microscope based on sharpness of the image, which corresponds to how clear the microscope is focused.

Abstract: A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remain

Abstract: The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable mirror disposed on the stage to reflect light, which is introduced from the interferometer, toward the fixed mirror, and to reflect the light, which is received after being reflected by the fixed mirror, to the interferometer.

Abstract: An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers.

Abstract: A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein a block defines the plane. At least one optical arrangement is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement comprises an illumination apparatus for reflected light illumination and/or transmitted light illumination and at least one first or second optical element, wherein at least part of the at least one optical element extends into the space between the block and an optical system support. At least one encapsulation is provided, encapsulating at least one optical component of at least one optical arrangement and/or at least one optical element.

Abstract: We disclose a method for accurate three-dimensional position measurement in the field of nano-positioning using a single light beam and principles of interferometry to measure position.

Abstract: A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction that includes the first direction component, that is substantially symmetric to the first reflecting surface; and a third reflecting surface, which extends in a fourth direction, that is substantially orthogonal to the first direction.

Abstract: A challenge to be met by the present invention is to provide a component mounting device, a component mounting system, and a component mounting method that make it possible to correctly position a substrate at a working location and mount components on the substrate even when components mounted on the substrate project outside from an end of the substrate in a direction parallel to a substrate conveyance path. When a front end portion (PbT) of a substrate (Pb) conveyed by a substrate conveyance path (13) is detected to have reached inspection light (L), operation of the substrate conveyance path (13) is immediately halted.

Abstract: Methods are disclosed wherein the structural health of a civil structure, such as, but not limited to, a bridge or the like is measured by electronic distance measurement (EDM) from a plurality of stable locations to a plurality of cardinal points on the structure in a methodical manner. By measuring the coordinates of the cardinal points, the dynamic and long-term static behavior of the structure provide an indication of the health of the structure. Analysis includes: comparison to a Finite Element Model (FEM); comparison to historical data; and modeling based on linearity, hysteresis, symmetry, creep, damping coefficient, and harmonic analysis.

Abstract: A measurement system that includes an industrial machine and an interferometer can detect when abnormality has occurred in measurement targeted at a reflector attached to a movable body, for example, in a case where the movable body has moved too close to the interferometer. A judging section of the interferometer judges that there is abnormality in measurement targeted at the reflector on the basis of a received-light signal. Upon such an abnormality judgment, a stop command outputting section of the interferometer outputs a stop command to the industrial machine. A stopping section of the industrial machine stops the driving operation of a moving mechanism upon receiving an input of the stop command, thereby stopping the movement of the movable body. The measurement system makes it possible to prevent the industrial machine, which includes the movable body and the moving mechanism, from colliding with the interferometer.

Abstract: A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction that includes the first direction component, that is substantially symmetric to the first reflecting surface; and a third reflecting surface, which extends in a fourth direction, that is substantially orthogonal to the first direction.

Abstract: Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.