Dimension Patents (Class 356/625)
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Publication number: 20120257197Abstract: Methods and systems are disclosed of sensing an object. A first radiation is spatially modulated to generate a structured second radiation. The object is illuminated with the structured second radiation such that the object produces a third radiation in response. Apart from any spatially dependent delay, a time variation of the third radiation is spatially independent. With a single-element detector, a portion of the third radiation is detected from locations on the object simultaneously. At least one characteristic of a sinusoidal spatial Fourier-transform component of the object is estimated from a time-varying signal from the detected portion of the third radiation.Type: ApplicationFiled: September 28, 2011Publication date: October 11, 2012Applicant: The Regents of the University of Colorado, a body corporateInventors: Daniel Feldkhun, Kelvin H. Wagner
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Patent number: 8284393Abstract: Disclosed is a tire shape inspection method that can reliably and without misidentification perform accurate shape defect inspection in a short period of time by excluding measurement values in a range in which embossed marks are formed from distribution information for surface height measurement values on the sidewall surface of a tire. In the method, a processor automatically detects the positions of the embossed marks based on sample surface shape information obtained from a sample of the tire, and automatically sets coordinate information for a mask range surrounding the area where said marks are present (S2-S15). The processor also causes a surface shape image based on the sample surface shape information and a mask range image based on the coordinate information for the mask range to be displayed superimposed on a display means, and changes the coordinate information for the mask range according to an operating input (S16).Type: GrantFiled: June 3, 2009Date of Patent: October 9, 2012Assignee: Kobe Steel, Ltd.Inventors: Eiji Takahashi, Naokazu Sakoda
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Patent number: 8284988Abstract: A method and configuration to estimate the dimensions of a cuboid. The configuration includes two image acquisition units offset from each other with at least one of the units positioned at a defined acquisition height above a background surface. Image processing techniques are used to extract a perimeter of a top surface of the cuboid, placed on the background surface, from pairs of acquired images. A height estimation technique is used to calculate an absolute height of the cuboid. The absolute height of the cuboid is used, along with the extracted perimeter of the top surface of the cuboid, to calculate an absolute length and an absolute width of the cuboid. The height, length, and width may be used to calculate an estimated volume of the cuboid.Type: GrantFiled: May 13, 2009Date of Patent: October 9, 2012Assignee: Applied Vision CorporationInventors: Richard A. Sones, Kris Brumbaugh, Michael Leo Kress
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Patent number: 8269985Abstract: Methods of optimizing the diameters of nanowire photodiode light sensors. The method includes comparing the response of nanowire photodiode pixels having predetermined diameters with standard spectral response curves and determining the difference between the spectral response of the photodiode pixels and the standard spectral response curves. Also included are nanowire photodiode light sensors with optimized nanowire diameters and methods of scene reconstruction.Type: GrantFiled: May 26, 2009Date of Patent: September 18, 2012Assignee: Zena Technologies, Inc.Inventor: Munib Wober
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Patent number: 8264697Abstract: An object detecting device for detecting the existence and general placement of an object residing upon a surface. A preferred embodiment of the invention uses a laser measuring scanner operated positioned by a servo motor to allow the laser measuring scanner to generate signals related to the placement of an object on a surface. Those placement signals are then processed by a computer to make a two or three dimensional determination of the object in coordinates that show the object's location in relation to another device such as a robotic depalletizer that can then be moved into position near the object to allow removal of the object by the robotic depalletizer.Type: GrantFiled: July 10, 2008Date of Patent: September 11, 2012Assignee: Intelligrated Headquarters, LLCInventors: Matthew R. Wicks, Christopher S. Maue
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Patent number: 8248620Abstract: An object detecting device for detecting the existence and general placement of an object residing upon a surface. A preferred embodiment of the invention uses at least one laser measuring scanner operated positioned by a servo motor to allow the laser measuring scanner to generate signals related to the placement of an object on a surface. Those placement signals are then processed by a computer to make a two or three dimensional determination of the object in coordinates that show the object's location in relation to another device such as a robotic depalletizer that can then be moved into position near the object to allow removal of the object by the robotic depalletizer.Type: GrantFiled: September 29, 2009Date of Patent: August 21, 2012Assignee: Intelligrated Headquarters, LLCInventors: Matthew R. Wicks, Christopher S. Maue
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Patent number: 8248621Abstract: An optical characterization method of repeat units forming a diffraction structure, each repeat unit including a geometric pattern produced, at least in part, using a porous material, the method including: determining the geometric parameters of the patterns; performing a scatterometric acquisition using an optical measurement system of the experimental optical response of the diffraction structure placed in a chamber at a given pressure, a presence of an adsorbable gaseous substance in the chamber causing condensation of the adsorbable gaseous substance in a part of open pores of the patterns; and determining a theoretical optical response of the diffraction structure from the determined geometric parameters and by adjusting an optical index of the material of an area of each of the patterns, in which the adsorbable gaseous substance has condensed, to make a difference between the experimental response and the theoretical response less than or equal to a given threshold.Type: GrantFiled: July 14, 2010Date of Patent: August 21, 2012Assignees: Commissariat à l'énergie atomique et aux énergies alternatives, Centre national de la recherche scientifique (C.N.R.S.)Inventors: Christophe Licitra, Maxime Besacier, Régis Bouyssou, Thierry Chevolleau, Mohamed El Kodadi
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Patent number: 8244022Abstract: A method for measuring a property of a fiber, such as flexibility, collapsibility and moment of inertia. A fiber is wetted and deformed in its wet state, and an optical section image of the deformed fiber is taken. A measurement is made on the image and the desired property is calculated using the measurement.Type: GrantFiled: May 6, 2008Date of Patent: August 14, 2012Assignee: University of New BrunsickInventors: Kecheng Li, Dongbo Yan
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Patent number: 8243290Abstract: A highly accurate three-dimensional measurement base is specified with simple settings. When a peak occurs in the positive Z-axis direction, a hemisphere or semi-spheroid figure (z?0) is placed to contain a position (xi, yi) where a base point should be obtained, scanning is performed such that the bottom of the figure contains the position (xi, yi), and the minimum value lmin of the difference between the Z position of a surface profile image and the height of the hemisphere or semi-spheroid figure at each position, and the height of the hemisphere or semi-spheroid figure at the position (xi, yi) are obtained. The maximum value of the sums is expressed as L(xi, yi), and a base point (Xi, Yi, L(xi,yi)) is specified. Base points are specified throughout the target surface by the same base point setting method, and a three-dimensional measurement base is specified on the basis of the specified base points.Type: GrantFiled: April 13, 2010Date of Patent: August 14, 2012Assignee: JASCO CorporationInventors: Takeo Soejima, Yusei Ohkubo
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Publication number: 20120200862Abstract: A method and apparatus for dimensioning and, optionally, weighing an object. A platform with a surface is used for supporting an object. A user selects between two different dimensioning devices of the apparatus. The first device employs three distance sensors to determine a distance between each of the distance sensors and a side of an object. The second device includes a movable gate which is passed over and about an object or objects on the platform. Sensor arrays, such as paired, aligned light emitter and receiver arrays, are used in combination with a plurality of sensed gate positions to determine the dimensions of the object(s) as the gate passes around the object(s) based on whether or not light from an emitter on one side of the gate reaches a light receiver on another, opposing side of the gate.Type: ApplicationFiled: February 6, 2012Publication date: August 9, 2012Applicant: QUANTRONIX, INC.Inventors: Robert L. Kennington, Eve A. Carlsruh, Craig R. Bailey, Marie L. Midboe, Brandon M. Taylor, Randy Brown Neilson
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Patent number: 8233157Abstract: A portable imaging-based measurement device is developed to perform 2D projection based measurements on an object that is difficult or dangerous to access. This device is equipped with self calibration capability and built-in operating procedures to ensure proper imaging based measurement.Type: GrantFiled: September 28, 2010Date of Patent: July 31, 2012Assignee: OG Technologies, Inc.Inventors: Tzyy-Shuh Chang, Hsun-Hau Huang
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Publication number: 20120188560Abstract: A probe system includes an imager and an inspection light source. The probe system is configured to operate in an inspection mode and a measurement mode. During inspection mode, the inspection light source is enabled. During measurement mode, the inspection light source is disabled, and a structured-light pattern is projected. The probe system is further configured to capture at least one measurement mode image. In the at least one measurement mode image, the structured-light pattern is projected onto an object. The probe system is configured to utilize pixel values from the at least one measurement mode image to determine at least one geometric dimension of the object. A probe system configured to detect relative movement between a probe and the object between captures of two or more of a plurality of images is also provided.Type: ApplicationFiled: December 22, 2011Publication date: July 26, 2012Inventors: Clark Alexander Bendall, Kevin George Harding, Thomas Karpen, Guiju Song, Li Tao
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Patent number: 8228510Abstract: An improved dimensional detection system is portable and can be used to characterize a workpiece. The dimensional detection system employs as few as a single focused light source and as few as a single camera along with a calibration data set to convert the illuminated pixels of an image of a beam on the workpiece into a cloud of real world points in space on an outer surface of the workpiece. The cloud of points can be processed to characterize the workpiece, such as by determining the right hexahedron that would encompass all of the real world points in space and which could be used to determine a dimensional weight of the workpiece.Type: GrantFiled: December 13, 2011Date of Patent: July 24, 2012Assignee: LTS Scale CompanyInventors: John Gregory Pangrazio, John Alan Pangrazio, Robert Thomas Pangrazio, Kenneth Lloyd Brey, Cesar Pena-Gutierrez
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Publication number: 20120182563Abstract: The sensor comprises a beam of electromagnetic radiation projecting across a gap between the stationary member and the translating member, a reference detector having a reference FOV and a signal detector having a signal FOV. The sensor is to be mounted on the stationary member. The electromagnetic radiation beam, the reference FOV and the signal FOV intersect in a volume including the gap, and the gap is calculated from the reflected electromagnetic radiation received by the reference and signal detectors. The gap can be determined from a ratio between a rise time in the signal pulse and a rise time in the reference pulse, or a ratio between a fall time in the signal pulse and a fall time in the reference pulse, or a ratio between a delay time in the signal pulse and a delay time in the reference pulse, among other features.Type: ApplicationFiled: January 10, 2012Publication date: July 19, 2012Applicant: Prime Photonics, LC.Inventor: Daniel Kominsky
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Patent number: 8218154Abstract: A system and a method of determining a position of a scattering/reflecting element on a surface of a radiation transmissive element adapted to transport scattered/reflected radiation toward one or more detectors. Radiation having different characteristics or properties is transmitted to different areas of the surface whereby the position of the touch may be determined from the radiation scattered/reflected.Type: GrantFiled: March 29, 2007Date of Patent: July 10, 2012Assignee: FlatFrog Laboratories ABInventors: Jens Wagenblast Stubbe Østergaard, Jonas Ove Philip Eliasson, Niels Agersnap Larsen
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Patent number: 8213024Abstract: A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.Type: GrantFiled: July 31, 2007Date of Patent: July 3, 2012Assignee: Applied Materials Israel, Ltd.Inventors: Shmuel Mangan, Boris Goldberg, Ishai Schwarzband, On Haran, Michael Ben-Yishay, Amir Sagiv, Chaim Braude
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Patent number: 8213025Abstract: The present invention relates to a method and an apparatus for determining the amount of light scattered in an object in a machine vision system comprising: a light source illuminating said object with incident light having a limited extension in at least one direction; and, an imaging sensor detecting light emanating from said object, wherein said emanated light is reflected light (R) on the surface of said object and light scattered (S) in said object, said detected light is resulting in at least one intensity distribution curve on said imaging sensor having a peak where said reflected light (R) is detected on said imaging sensor. A width (w) of said at least one intensity distribution curve around said peak is measured, whereby said measured width (w) indicates the amount of light scattered (S) in said object.Type: GrantFiled: April 25, 2008Date of Patent: July 3, 2012Assignee: Sick IVP ABInventors: Mattias Johannesson, Henrik Turbell, Per Holm
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Patent number: 8214771Abstract: A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.Type: GrantFiled: January 8, 2009Date of Patent: July 3, 2012Assignee: KLA-Tencor CorporationInventors: Michael Adel, Amnon Manassen, Daniel Kandel
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Patent number: 8189195Abstract: A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.Type: GrantFiled: May 9, 2007Date of Patent: May 29, 2012Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Mircea Dusa, Irwan Dani Setija
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Patent number: 8179530Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including: but not limited to, critical dimension and overlay misregistration; defects and thin film characteristics; critical dimension and defects; critical dimension and thin film characteristics; critical dimension, thin film characteristics and defects; macro defects and micro defects; flatness, thin film characteristics and defects; overlay misregistration and flatness; an implant characteristic and defects; and adhesion and thickness.Type: GrantFiled: July 5, 2010Date of Patent: May 15, 2012Assignee: KLA-Tencor Technologies Corp.Inventors: Ady Levy, Kyle A. Brown, Rodney Smedt, Gary Bultman, Mehrdad Nikoonahad, Dan Wack, John Fielden, Ibrahim Abdul-Halim
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Publication number: 20120113437Abstract: The device comprises a measuring track (17) through which an object (1) is driven or moved, a laser (2) having a telecentric lens/Fresnel lens (3) for producing a perpendicular beam curtain (4) extending transversely to the measuring track (17). Furthermore, a camera (6) with an offset to the laser (2) in the longitudinal direction of the measuring track (17) likewise having a telecentric lens/Fresnel lens (7) placed in front. All light points of the laser light line (5) incident on the floor of the measuring track (17) that are reflected undisturbed on the floor of the measuring track (17) are detected at an acute angle from the beam curtain (4) using said camera. Furthermore, means for detecting and recording the speed of the object (1) moved on the measuring track (17) through the beam curtain (4) are provided so that a distance-time diagram can be created.Type: ApplicationFiled: May 31, 2010Publication date: May 10, 2012Applicant: SKYLINE PARKING AGInventor: Andreas Griesser
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Patent number: 8169624Abstract: There is provided a transmissive dimension measuring device in which a user can intuitively and easily adjust optical axes of a projector and an optical receiver, and in which a suitable action can be immediately taken when contamination is attached to a light projecting surface of the projector and a light receiving surface of the optical receiver. An incident light position display unit provided on the optical receiver expresses a light projecting spot in a pseudo manner by making an LED corresponding to an incident light position turn on, the light projecting spot being incident on the optical receiver arranged with a predetermined interval to the projector which projects light. The incident light position display unit is provided on an upper surface side opposite to a bottom surface that is a surface on which the optical receiver is installed on a base.Type: GrantFiled: March 15, 2010Date of Patent: May 1, 2012Assignee: Keyence CorporationInventors: Tomonari Torii, Noriyoshi Yamane, Ryoichi Tsumori, Kentaro Yamazaki
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Publication number: 20120092680Abstract: This concerns in part the invention disclosed by co-pending application, particularly to robust determination of features in projection patterns. Disclosed are novel methods and apparatus for obtaining range frame coordinates in moving scenes, where optical radiation is projected onto a scene in the form of dots and strips, where reflected radiation is picked up by a camera and range coordinates calculated thereof.Type: ApplicationFiled: December 20, 2011Publication date: April 19, 2012Inventor: Nicolae Teodorescu
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Publication number: 20120081714Abstract: An improved dimensional detection system is portable and can be used to characterize a workpiece. The dimensional detection system employs as few as a single focused light source and as few as a single camera along with a calibration data set to convert the illuminated pixels of an image of a beam on the workpiece into a cloud of real world points in space on an outer surface of the workpiece. The cloud of points can be processed to characterize the workpiece, such as by determining the right hexahedron that would encompass all of the real world points in space and which could be used to determine a dimensional weight of the workpiece.Type: ApplicationFiled: December 13, 2011Publication date: April 5, 2012Inventors: John Gregory Pangrazio, John Alan Pangrazio, Robert Thomas Pangrazio, Kenneth Lloyd Brey, Cesar Pena-Gutierrez
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Publication number: 20120081713Abstract: A method and test block for controlling weld penetration depth in a work piece are disclosed. The test block simulates a work piece relative to a welding process of the work piece. The test block includes a test welding path. The test welding path replicates a production welding path on a weld surface of the work piece. The test block includes a melt-thru surface that underlies the test welding path. The melt-thru surface is spaced apart from the test welding path by a spacing that decreases along a length of the test welding path. The spacing varies from more than a standard weld penetration depth to less than the standard weld penetration depth.Type: ApplicationFiled: October 1, 2010Publication date: April 5, 2012Inventors: Eric P. Petersen, DANIEL S SAMPSON
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Publication number: 20120069355Abstract: A method for use in inspecting a blade tip clearance is provided. The method includes providing a plurality of rotor blades including tips, wherein the plurality of rotor blades are rotatably mounted within a casing such that a blade tip clearance is defined between the rotor blade tips and the casing. The method also includes providing a system for use in inspecting the blade tip clearance by emitting electromagnetic energy toward the tips and detecting electromagnetic energy reflected by the tips. The method further includes positioning the system to facilitate inspection of the blade tip clearance, rotating the plurality of rotor blades within the casing, and simultaneously blending the tips using a blending apparatus and inspecting the blade tip clearance using the system.Type: ApplicationFiled: March 28, 2011Publication date: March 22, 2012Inventor: Andrew Thomas Hynous
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Multiple measurement techniques including focused beam scatterometry for characterization of samples
Patent number: 8139232Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.Type: GrantFiled: July 27, 2007Date of Patent: March 20, 2012Assignee: Rudolph Technologies, Inc.Inventors: Robert Gregory Wolf, Michael J. Kotelyanskii -
Patent number: 8138089Abstract: A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.Type: GrantFiled: July 6, 2011Date of Patent: March 20, 2012Assignee: International Business Machines CorporationInventors: Axel A. Granados, Benjamin A. Fox, Nathaniel J. Gibbs, Andrew B. Maki, Trevor J. Timpane
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Patent number: 8134719Abstract: An apparatus for obtaining 3-D surface contour image data of a tooth has a double telecentric optical system disposed to form an image of the surface of the tooth onto an image detector array. A focus adjustment mechanism is actuable to adjust the position of either or both the double telecentric optical system and the image detector array along an optical axis to each of a sequence of focus positions. A control logic processor is in control signal communication with the focus adjustment mechanism to adjust focus position, and is in image data communication with the image detector array for receiving image data obtained by the image detector array and with a memory for storing the received image data corresponding to each of the sequence of focus positions. The control logic processor is further responsive to stored instructions for computing 3-D surface contour image data from the image data.Type: GrantFiled: March 19, 2010Date of Patent: March 13, 2012Assignee: Carestream Health, Inc.Inventors: Rongguang Liang, Lawrence A. Ray
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Patent number: 8127425Abstract: A gear production plant has, along a gear production path, a station for preparing a number of blanks; a cutting station, where respective teeth are cut on the blanks to obtain a number of semifinished parts; a heat treating station, where the toothed semifinished parts are carburized or nitrided; and a finish station for finish machining the heat treated semifinished parts; the plant also having a check station located along the production path, downstream from the heat treating station or the finish station, and which houses an optical measuring unit for non-destructively determining the effective carburized or nitrided case depth on the teeth.Type: GrantFiled: November 7, 2007Date of Patent: March 6, 2012Assignee: AVIO S.p.A.Inventors: Salvatore Milletari, Giulio Barbato
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Patent number: 8115928Abstract: A box inspector for detecting at an inspection station an unacceptable skew in, an item missing from, and/or an unacceptable gap in a box. The box inspector has pairs of aligned emitters and receivers generating a signal when an unacceptable skew is detected, at least two item present sensors corresponding to the number of items adapted to be located in a single row within the box and generating an item absent signal when an item is missing from the box, a gap detect sensor generating an unacceptable gap signal when the gap is larger than a predetermined gap size, and a box present sensor generating a box present signal when a box arrives at the inspection station. A controller receives signals from these components and generates indications when the box is unacceptably skewed, an item is missing from the box, and/or an unacceptable gap exists in the box.Type: GrantFiled: August 20, 2009Date of Patent: February 14, 2012Assignee: Graham Packaging Company, L.P.Inventors: Aaron C. Johnson, Philip Mutarelli
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Patent number: 8107089Abstract: A surface (104) is detected repeatedly be a detector row (102) of at least one detector (100), the direction of the detector row (102) being the same as the surface's (104) primary direction of movement, and simultaneously a distance between the surface (104) and the detector (100) is detected to produce enlargement data and response rows. Successive response rows are arranged into a response matrix, and the direction of at least one curve in the matrix is determined. Translation of the surface (104) is determined in response matrices formed by means of the direction or directions of at least one curve or curve portion on the basis of enlargement data.Type: GrantFiled: January 30, 2007Date of Patent: January 31, 2012Assignee: Visicamet OyInventor: Hannu Jokinen
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Publication number: 20120019838Abstract: The sensor apparatus is intended to detect the level of a liquid, gel or powder substance contained in a receptacle and includes an emitter able to emit radiation and a receiver able to receive and convert into an electric signal radiation which is emitted by the emitter and the intensity of which is variable depending on the quantity or level of substance present in the receptacle. The emitter is designed to emit visible radiation and the apparatus also includes a visible optical indicator and an optical element able to couple optically the emitter to the optical indicator so that, when the quantity or level of the substance in the receptacle is lower than a predetermined threshold, a fraction of the radiation generated by the emitter is able to light up the optical indicator.Type: ApplicationFiled: March 24, 2010Publication date: January 26, 2012Applicant: ELBI INTERNATIONAL S.P.A.Inventors: Giuseppe Marone, Marco Musso
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Patent number: 8102541Abstract: An apparatus (1) for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer resulting from the structures (3) on the mask (2) is disclosed, wherein the apparatus (1) comprises at least one incident-light illumination means (14) and/or one transmitted-light illumination means (6), wherein the apparatus (1) comprises at least one imaging optics (9) and a detector (11) of a camera (10) for imaging the structures (3) on the mask (2), wherein a first computer program (17) is associated with the detector (11) of the camera (10) and provided for determining the position and/or the dimension of the structure (3) on the mask (2). A method for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer to be expected from the structures (3) on the mask (2) is also disclosed.Type: GrantFiled: January 15, 2008Date of Patent: January 24, 2012Assignee: Vistec Semiconductor Systems GmbHInventor: Michael Heiden
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Patent number: 8102539Abstract: A method for measuring the gap between a multibladed rotatable member and a surrounding housing in a gas turbine engine. In accordance with the method, a blade is removed from the rotatable member and replaced by a distance measuring clearance probe. The distance from the probe to the housing is then measured at a number of axial positions of the rotatable member.Type: GrantFiled: June 22, 2009Date of Patent: January 24, 2012Assignee: Rolls-Royce PLCInventor: Younas Ghulam
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Patent number: 8102542Abstract: A technique for optical measurement of a thickness of a layer on a surface uses diffuse reflections at opposite boundaries of the layer, operates on transparent, or translucent layers. The thickness is determined by computing a separation between the centers of the two diffuse reflections, and using the index of refraction of the layer, and geometric properties of a beam and detector with respect to the surface. The technique is useful for quantifying thickness of a layer of rime ice, glaze ice, frosted ice, or water, for example.Type: GrantFiled: February 25, 2009Date of Patent: January 24, 2012Assignee: National Research Council of CanadaInventor: Robert E. Gagnon
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Publication number: 20120013918Abstract: An optical receiver lens has a three-dimensional lens surface, for receiving the laser radiation of a laser distance measuring device, said laser radiation being reflected at an object, wherein the receiver lens can be described in a three-dimensional coordinate system having three axes x, y, z arranged at right angles with respect to one another and wherein the z-axis coincides with the optical axis of the receiver lens. At least one non-spherical area section of the lens surface can be described by addition of a first area, the flexure of which along the z-axis is a first function (f1) of x and y, in particular of (I) and a second area, the flexure of which along the z-axis is a second function (f2) of x and not of y. A distance measuring device is also described.Type: ApplicationFiled: October 20, 2009Publication date: January 19, 2012Applicant: Robert Bosch GmbHInventors: Matthieu Richard, Cedrie Pahud, Bjoern Haase
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Patent number: 8094322Abstract: In a method for the determination of the 3D coordinates of an object (2), a pattern is projected (1) onto the object (2) and the pattern reflected by the object (2) is taken (3) and evaluated. To improve such a method, a pattern is projected onto a first part region (12) of the object (2) in a first step and the pattern reflected by this part region (12) of the object (2) is taken. In a second step, a pattern is projected onto a second part region of the object (2) and the pattern reflected by this part region of the object (2) is taken. The patterns taken are evaluated.Type: GrantFiled: March 25, 2009Date of Patent: January 10, 2012Assignee: Steinbichler Optotechnik GmbHInventors: Thomas Mayer, Marcus Steinbichler, Alexander Frey
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Publication number: 20110304727Abstract: An apparatus for evaluating the fit of a modular window assembly into a simulated vehicle body opening includes a base member, a vehicle body opening/sheet metal simulator mounted to the base member, one or more light sources disposed in the vehicle body opening/sheet metal simulator and one or more devices for securing the vehicle window to the vehicle body opening/sheet metal simulator. A method of utilizing the apparatus is also a part of the invention.Type: ApplicationFiled: June 3, 2011Publication date: December 15, 2011Applicant: PILKINGTON GROUP LIMITEDInventor: Brian Hertel
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Patent number: 8064071Abstract: A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.Type: GrantFiled: March 12, 2009Date of Patent: November 22, 2011Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Christopher A. Rowland, Peter L. Kellerman, Frank Sinclair, Julian G. Blake, Nicholas P. T. Bateman
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Patent number: 8064072Abstract: The material strength of extensive objects can be determined efficiently by using two distance measures, wherein a first distance measurer determines the distance to a first main surface of the object and a second distance measurer determines the distance to a second main surface object opposing the first main surface. If potential measurement errors due to the extensive geometry are avoided by determining a reference distance between the first distance measurer and the second distance measurer by a reference object, the thickness of the object between the first main surface and the second main surface can be determined with high accuracy and velocity.Type: GrantFiled: December 6, 2007Date of Patent: November 22, 2011Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Peter Schmitt, Guenther Kostka
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Patent number: 8054471Abstract: An optical system including a signal processing unit has been developed to study the contours of objects and/or their deformations. The optical system utilizes projectors comprising an illumination source including those outside the visible range and an observation source such as a digital camera. The optical system provides information regarding the object in such a way that renders a complete description of the surface geometry and/or its deformation. The optical system further facilitates a substantial simplification in obtaining the desired result in the form of eliminating the need for point-wise solution of simultaneous equations. The signal processing unit comprises software that, among others, provides a transformation that mimics projection and observation from infinity. The signal processing unit further reduces data processing by recognizing known geometric shapes, and automatically correcting for discontinuities of the object and/or optical system.Type: GrantFiled: September 11, 2007Date of Patent: November 8, 2011Inventor: Cesar A. Sciammarella
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Patent number: 8054500Abstract: One embodiment relates to a method of acquiring three-dimensional structure of an object using a flatbed scanner. The object is placed with a surface to be scanned facing down on a scanner platen. At least three images are obtained under differing lighting directions. The images are processed to generate the three-dimensional structure. Other features and embodiments are also disclosed.Type: GrantFiled: October 10, 2006Date of Patent: November 8, 2011Assignee: Hewlett-Packard Development Company, L.P.Inventor: Thomas Malzbender
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Publication number: 20110267626Abstract: The invention provides a system and method for inspecting a three-dimensional sensor. According to the invention, a light source is controlled to emit a light of a known phase, and the known phase of the emitted light is altered by at least two known phase values. The three-dimensional sensor is driven in sensing the light reflected by the inspecting space to capture an image. In accordance with the captured image and the relative angle and the active brightness of each pixel thereof and the plurality of reference data, at least two quality data relative to the three-dimensional sensor are calculated.Type: ApplicationFiled: July 20, 2010Publication date: November 3, 2011Applicant: QUANTA COMPUTER, INC.Inventors: Iman Hung, Yu-Chi Chung, Hsin-Hung Lee
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Publication number: 20110268869Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.Type: ApplicationFiled: July 15, 2011Publication date: November 3, 2011Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V., ASML NETHERLANDS B.V.Inventors: Johan Frederik DIJKSMAN, Antonius Johannes Joseph Wismans, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
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Patent number: 8049903Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.Type: GrantFiled: March 28, 2011Date of Patent: November 1, 2011Assignee: KLA-Tencor CorporationInventors: Jon Opsal, Ilya Grodnensky, Heath Pois
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Publication number: 20110258869Abstract: The invention relates to a device for determining measurements of human body parts (B), in particular the leg and hip measurements to be determined for the supply with compression stockings, at which first measuring means (5) are provided for measuring the circumference of said body part (B), whereat the device comprises second measuring means (6, 7), with which the length section (1C) of said body part (B) can be determined from a reference plane up to a circumferential plane (U).Type: ApplicationFiled: February 13, 2007Publication date: October 27, 2011Applicant: GANONI & CIE AGInventor: Erwin Bittkowski
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Patent number: 8040497Abstract: By encoding process-related non-uniformities, such as different height levels, which may be caused by CMP or other processes during the fabrication of complex device levels, such as metallization structures, respective focus parameter settings may be efficiently evaluated on the basis of well-established CD measurement techniques.Type: GrantFiled: May 30, 2007Date of Patent: October 18, 2011Assignee: GLOBALFOUNDRIES Inc.Inventors: Thomas Werner, Frank Feustel, Kai Frohberg
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Patent number: 8035824Abstract: A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern formed on the substrate is then illuminated so that at least one non-zero diffracted order is detected. The response of the non-zero diffracted order to variation in the printed characteristic dimension relative to nominal is used to determine the dimension of interest, such as critical dimension or overlay, on the substrate. An apparatus for performing the method of the present invention includes an illumination source, a detector for detecting a non-zero diffracted order, and means for positioning the source relative to the target so that one or more non-zero diffracted orders from the target are detected at the detector.Type: GrantFiled: October 28, 2009Date of Patent: October 11, 2011Assignee: International Business Machines CorporationInventor: Christopher Ausschnitt
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Publication number: 20110246400Abstract: Provided is a system for determining profile parameters of a sample structure on a workpiece using an optical metrology system optimized to achieve one or more accuracy targets. The optical metrology system comprises an optical metrology tool configured to measure a diffraction signal off a sample structure, an optical metrology tool model configured to model the optical metrology tool using a selected number of rays and selected beam propagation parameters for the illumination beam and the diffraction beam; a signal adjuster configured to adjust the measured diffraction signal off the sample structure using the optical metrology tool model and calibration parameters, the signal adjuster generating an adjusted metrology output signal; and a profile extractor configured to determine one or more profile parameters of the sample structure using the adjusted metrology output signal, a profile model of the sample structure, and one or more extraction modules.Type: ApplicationFiled: March 31, 2010Publication date: October 6, 2011Applicant: TOKYO ELECTRON LIMITEDInventor: SHIFANG LI