Abstract: In a projection optical system for use in an image projection apparatus illuminating an image display panel forming an image in accordance with a modulating signal with illumination light from a light source, the projection optical system includes first and second optical systems arranged along an optical path defining an upstream-downstream direction in the order described from upstream to downstream on the downstream side of the image display panel. The first optical system includes at least one dioptric system and has positive power. The second optical system includes at least one reflecting surface having power and has positive power. The image formed by the image display panel is formed as an intermediate image in the optical path, and the intermediate image is magnified and projected.

Abstract: A projection type image display apparatus includes a lens group, being disposed adjacent to an image display element, which is configured to include a plural number of lenses, and a mirror, which is configured to reflect emission lights from the lens group, so as to project upon the screen obliquely. A ratio (Lo/Lp) between a distance (Lp) from a center of the mirror up to the screen and a diagonal size (Lo) of the screen is at least 2.

Abstract: An object of the invention is to provide a projection lens capable of sufficiently correcting lateral chromatic aberration at both of the wide-angle end and the telephoto end, with an increased zoom ratio, a less number of lens elements, and less variation in telecentricity.

Abstract: A disclosed projection optical system for projecting and forming an enlarged image of an image displayed in a planar manner as an object includes: a lens system including, from an object side, at least a lens group providing telecentricity to an object space side, a lens group controlling divergence of angles of view, a diaphragm, a lens group converging the angles of view, and a lens group converging and subsequently enlarging the angles of view; and a catoptric system disposed on an image side relative to the lens system and including a mirror having negative power. Each lens group of the lens system and the mirror having negative power share an optical axis and the optical axis is shifted relative to a center of an object surface.

Abstract: A projection lens for lighting equipment of an aspect of the present invention is characterized by formed in a shape where N of sector-shaped lens parts each of which corresponds to a central angle 2? degrees (?=180/N, N is an integer more than or equal to 3) and is bilaterally symmetric in a rotationally asymmetric elliptical collimator lens are circumferentially disposed. The projection lens for lighting equipment of such aspect is formed in the shape where N of the sector-shaped lens parts each of which corresponds to a central angle 2? degrees (?=180/N, N is an integer more than or equal to 3) and is bilaterally symmetric in the rotationally asymmetric elliptical collimator lens are circumferentially disposed. Accordingly, the projection lens for lighting equipment with a novel design which has a shape of a N-sided polygon (e.g.

Abstract: An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorphous material (6) and the nanoparticles (7) are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective (2) with at least one optical element (3) which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.

Abstract: A projection lens unit includes a magnifying optical system is provided. A second magnifying lens barrel has a shape of double circular cylinders, and a first magnifying lens barrel is fitted to an outer circular cylinder. Further, a second magnifying lens is in contact with and fixed to a step portion of inner circular cylinder. In a manufacturing step thereof, the second magnifying lens is inserted into the inner circular cylinder of the second magnifying lens barrel to be into contact with the step portion. A front end portion of the inner circular cylinder is plastically deformed by being heated and pressed to fix the second magnifying lens. An outer peripheral edge of the front end portion has a curved surface. The curved surface of the front end portion is made to be smaller in radius of curvature than the second magnifying lens.

Abstract: An optical system includes, in order from an enlargement conjugate side to a reduction conjugate side via a largest air gap, a front unit having a negative power, and a rear unit having positive power. The optical system satisfies 1.75<Ndn1<2.05, 0.02<?gFn1?(0.6438?0.001682×?dn1)<0.08, and 2.5<|fn1/F|<5.0, where fn1 represents a focal length of a negative lens in the front unit, Ndn1 represents a refractive index of a material of the negative lens, ?dn1 represents an Abbe number of the material of the negative lens, ?gFn1 represents a partial dispersion ratio of the material of the negative lens, and F represents a focal length of the optical system.

Abstract: A zoom lens includes, in order from a magnification side, a negative first lens group for focus adjustment adapted to be fixed during power-varying, a positive second lens group adapted to move during power-varying, a negative third lens group, a positive fourth lens group, and a positive fifth lens group, and a positive sixth lens group adapted to be fixed during power-varying, the sixth lens group having a stop arranged nearest to the magnification side. Each lens is a single lens. A ratio of a back focal length of the entire system to a focal length at a wide-angle end of the entire system is larger than 2.5, and Fno. is set constant over the whole region of power-varying.

Abstract: The invention relates to an optical system for the projection of digital image data comprising a fixed focal length lens and a pivotable focal length extender. The principal field of application of the invention is digital cinema projection, usually employing the wide-screen format 1.9:1 or the Cinemascope format 2.37:1 (width:height). For format changeover during projection, two different fixed focal lengths are realized by the insertion or removal of the focal length extender (1755) into the lens. The projection lens according to the invention has more favorable optical properties than the conventional zoom lenses, such as a minimal chromatic transverse aberration, high telecentricity, very small distortions and a small volume and weight.

Abstract: A small projection lens includes a first lens, which is a biconvex lens, an aperture, an aperture diaphragm (or an aperture), a second lens, which is a negative meniscus lens having a concave surface facing a magnification side, a third lens, which is a positive meniscus lens having a convex surface facing a reduction side, and a fourth lens, which is a biconvex lens having aspheric surfaces at both sides on an optical axis, arranged in this order from the magnification side. A minimum portion of the length of all lens elements of the small projection lens in a diametric direction vertical to the optical axis is equal to or less than 15 mm, and the small projection lens satisfies the following conditional expression: 2.5<?/S<10.0 (where S indicates the maximum length of a magnification-side image (inch) and ? indicates a magnifying power).

Abstract: A projection optical system for projecting, while enlarging, an image formed on an image formation surface onto an image projection surface from an oblique direction relative thereto has at least three optically powered reflective surfaces and a refractive lens surface having a non-rotation-symmetric free-form curved surface and disposed between the first and second reflective surfaces as counted from the image formation surface side.

Abstract: An inexpensive projection variable focus lens includes six lenses and three or less lens groups which are moved when power varies, is telecentric, and is capable of effectively reducing all aberrations including astigmatism. Also, a projection display device includes the projection variable focus lens. The six lenses include a first lens provided closest to a magnification side and having a negative refractive power, and a second lens from the magnification side that has a positive refractive power. The reduction side of a lens system is telecentric. The six lenses are classified into three or more lens groups. Three or less of the three or more lens groups are moved to change a focal length. When the focal length varies from a wide angle end to a telephoto end, at least the second lens is moved from the reduction side to the magnification side along an optical axis.

Abstract: A projection variable focus lens includes seven lenses. The seven lenses include first to seventh lenses in order from a magnification side. The first and second lenses are provided closest to the magnification side and have a negative composite refractive power. The third lens has a positive refractive power. The fifth lens has a negative refractive power. The sixth lens has a positive refractive power. The seventh lens has a positive refractive power. A reduction side of a lens system is telecentric. The seven lenses are classified into three or more lens groups. Three or less lens groups among the three or more lens groups are moved to change a focal length. When the focal length varies from a wide angle end to a telephoto end, at least the third lens is moved from the reduction side to the magnification side along an optical axis.

Abstract: A projection unit is mounted on a projection magnification correcting member, and the projection magnification correcting member includes a first member and a second member. The first member includes a first correction mechanism for correction in a direction parallel to a central light ray, and is supported by a housing. The second member includes a second correction mechanism for correction in a direction parallel to a normal line to an image plane enlarged and projected from the projection unit without passing through a reflection mirror, and is supported by the first member.

Abstract: A front projection display device includes an optical engine including an illumination system, an imaging system, and projection optics. The projection optics include a first lens group of negative refractive power that has at least one aspheric surface. The projection optics output an image at a half field angle of at least 45°, where the image has substantially no distortion. For example, when the first lens group is placed at a distance of less than 1 meter from a viewing screen, the output image has a size of about 40 inches diagonal or greater, and requires substantially no keystone correction. In other aspects, the optical engine can be implemented in a wall-mounted projection system, a multimedia system, a compact integrated monitor system, and a portable projection unit.

Abstract: A projection optical unit for a projection display apparatus, which displays an image upon a projection surface, obliquely, includes a front lens group disposed in a direction from an image display element to a projection surface, a rear lens group, and a reflection mirror formed so that a curvature of a portion for reflecting a light beam incident upon a lower end portion of the projection surface is larger than a curvature of a portion for reflecting a light beam incident upon an upper end of the projection surface. An optical axis of the front lens group and the rear lens group is more inclined with respect to a direction of the portion of the reflection mirror for reflecting the light beam incident upon the lower end portion of the projection surface than a normal line direction of the image display element.

Abstract: A fixed-focus lens includes a first, a second, and a third lens groups arranged in sequence from the enlarged side to the reduced side and having positive refractive powers. The first lens group includes a first, a second, and a third lenses from the enlarged side to the reduced side. The second lens group includes a fourth, a fifth, and a sixth lenses from the enlarged side to the reduced side. The third lens group includes a seventh lens. The lens of the first lens group closest to the enlarged side in the fixed-focus lens has a concave surface. The distance between the lens surface of the second lens group closest to the reduced side and the lens surface of the third lens group closest to the enlarged side is L1. The overall length of the fixed-focus lens is L. The fixed-focus lens satisfies 0.1<L1/L<0.5.

Abstract: A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size.

Abstract: A projection zoom lens includes in order from an enlargement side: a first lens group with negative power; a second lens group with positive power; a third lens group with positive power; a fourth lens group with positive power; and a fifth lens group with positive power, wherein the first and fifth lens groups are fixed and the second, third, and fourth lens groups move when zooming from a wide angle side to a telescopic side, the second lens group includes only a positive lens which is convex toward the enlargement side, and assuming that the focal length at a wide angle end of a whole system including the first to fifth lens groups is F and the focal length of the second lens group is F2, the following conditional expression (1) is satisfied: 0.05<F/F2<0.23??(1).

Abstract: A projection type image display apparatus includes an image display element, a first lens group disposed in a light direction with respect to the image display element and configured to include a plurality of lenses, a second lens group disposed in a light direction with respect to the first lens group and configured to include a plurality of lenses, a reflection mirror, configured to reflect lights emitted from the first and/or second lens groups so as to project upon the screen obliquely, a first mounting base on which the first lens group is mounted, a second mounting base on which the second lens group is mounted, and a chassis configured to store the first and second lens groups, the reflection mirror, and the first and second mounting bases. The first mounting base is fixed at a bottom of the chassis, while the second mounting base is moveable.

Abstract: This invention is a projection optical system which includes a plurality of lens groups and projects an image of a first object onto a second object. A bottom lens group of the plurality of lens groups which is positioned nearest to the second object is made of an isotropic crystal material having a refractive index of 1.6 or more and has a positive focal length. A curvature radius R (mm) of a surface of the bottom lens group which is located on the first object side and a center thickness d (mm) of the bottom lens group satisfy 3.0>R/d>1.6 and d<60.

Abstract: A longitudinal interference fringe pattern projection lens with a lens body is provided. The lens body includes a lens first surface that has two convex portions or two concave portions that extend in parallel to each other in a constant direction and have the same shape, and a lens second surface. Laser light passing through one convex or concave portion interferes with laser light passing through the other convex or concave portion to form a longitudinal interference fringe pattern.

Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: The invention relates to an optical system which is adapted to form an image having a full 360° (panoramic)-direction angle of view on an image plane or project an image located on an image plane in a full 360° (panoramic)-direction angle of view, and which is of small-format size and high resolving power yet without being affected by flare light. The optical system comprises a front unit (10) having two reflecting surfaces and two transmitting surfaces, each rotationally symmetric about a center axis (1), a rear unit (20) that is rotationally symmetric about the center axis and has positive power, and an aperture (5) located coaxially with the center axis.

Abstract: A wide-angle lens and a projection device using the same are provided. The wide-angle lens from an image side sequentially comprises a first lens group, a second lens group and a third lens group. The third lens group comprises an aperture stop. The first lens group has a negative refracting power, the second lens group has a positive refracting power, and the third lens group has a positive refracting power. A focal length f1 of the first lens group and a focal length fw of the wide-angle lens satisfy the following conditions: ?15 mm<f1<?7.5 mm, and 0.5<|f1/fw|<1.5.

Abstract: According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.

Abstract: A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.

Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a?) is produced, wherein before the lens elements (5a, 5a?) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

Abstract: An optical device vibrator has a driving mechanism and a controller. The driving mechanism repeatedly changes position or angle of an optical device in predetermined cycles in order to vibrate the optical device. The controller controls driving of the driving mechanism and changes a setting for the position or angle serving as a reference for the repeated change based on predetermined correction information.

Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.

Abstract: A projection optical unit for obliquely projecting an image displayed on an image display element upon a projection surface, enlargedly, comprises: a lens group, being disposed neighboring to the image display element, and including a plural number of projection lenses therein; and a reflection mirror for reflecting lights emitting from the lens group, to be projected onto the projection surface, obliquely, wherein assuming that a light beam, emitting from a center of the display screen of the image display element, passing through a center of an entrance pupil of the lens group, and entering into a screen center on the projection surface, is a screen center light beam, then the screen center light beam is incident upon the projection surface, obliquely, with respect to a normal line thereon, the lens group comprises a front lens group including a plural number of refraction lenses, being disposed thereafter directing from the image display element to the projection surface and having rotationally symmetric s

Abstract: A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract: A small optical pickup of wide spherical aberration correction range includes a rising mirror for perpendicularly deflecting a light beam and guiding the light beam to an objective lens; a spherical aberration correction lens having one surface formed to a larger curvature than the other surface; a lens holder for holding the correction lens so that the surface of large curvature projects towards the rising mirror side; an axially extending guide member; and a slidable part slidable along the guide member. The projecting portion of the slidable part is configured to be fitted within the side surface of the reflecting surface of the rising mirror, and the projecting portion from the lens holder of the spherical aberration correction lens overlaps the reflecting surface of the rising mirror when the spherical aberration correction lens approaches the rising mirror the most.

Abstract: An image projecting apparatus includes a light source, a relay lens, a reflective light valve, and a projection lens. The light source is capable of emitting a light beam. The relay lens is disposed to permit the light beam provided by the light source to pass therethrough, and has a lens periphery formed with a notch. The reflective light valve is spaced apart from the relay lens, and is disposed to receive and modulate the light beam passing through the relay lens into an image light beam. The projection lens is disposed proximate to the notch of the relay lens, and is capable of projecting the image light from the reflective light valve to display an image onto a screen. The relay lens has a plurality of light-absorbing regions proximate to the notch for reducing a light-splitting effect attributed to the notch.

Abstract: A projection zoom lens device includes, in order from a magnification side, a negative first group G1 and positive second to fifth groups (G2 to G5) and is configured so that the second group G2, the third group G3, and the fourth group G4 are moved along an optical axis toward the magnification side during zooming from a wide-angle end state to a telephoto end state. Also, a lens L4, being closest to the magnification side, of the second group G2 is formed of a negative lens, and the fifth group G5 includes a single positive lens.

Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength ?. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>?.

Abstract: A projection-type image display apparatus for projecting an image, enlargedly, onto a projection surface, comprises: an image display element; a lens group, being disposed behind the image display element, comprising therein, a front lens group made up with a plural number of lenses, including, at least, a refractive lens, having a positive power and being rotationally symmetric in a surface configuration thereof, and a rear lens group made up with a plural number of lenses, including, at least, a lens having a free curved surface configuration and being rotationally asymmetric, thereby emitting the image displayed on the image display element; a reflection mirror for reflecting the light from the lens group, thereby projection onto the projection surface, obliquely; a first mounting base, on which the rear lens group is mounted; and a rod member, which is provided on the mounting base for moving the mounting base.

Abstract: A projection-type image display apparatus for projecting an image, enlargedly, onto a projection surface, comprises: an image display element; a lens group, being disposed behind the image display element, comprising therein, a front lens group made up with a plural number of lenses, including, at least, a refractive lens, having a positive power and being rotationally symmetric in a surface configuration thereof, and a rear lens group made up with a plural number of lenses, including, at least, a lens having a free curved surface configuration and being rotationally asymmetric, thereby emitting the image displayed on the image display element; a reflection mirror for reflecting the light from the lens group, thereby projection onto the projection surface, obliquely; and a movement member for moving the plural number of lenses of the rear lens group.

Abstract: A projector apparatus includes a light source for producing light beams, a micromirror device including an array of micromirrors for modulating and reflecting the light beams into image light beams, and a projection lens unit for magnifying and projecting the image light beams. The projection lens unit includes an optical lens disposed adjacent to the micromirror device, and a light shielding plate mounted on the optical lens or between the micromirror device and the optical lens for covering bias light so as to prevent formation of a ghost image in the projected image.

Abstract: Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KCl, KI, RbI, CsI, and MgO, YAG with refractive indices up to and above 2.0. These crystalline lenses and end plates are placed between the system aperture stop AS and the wafer W, preferably as the last lenses on the image side of the objective.

Abstract: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.

Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size.

Abstract: A projection optical system which projects an image of a first object onto a second object includes a plurality of lenses and a plurality of aperture stops for determining a numerical aperture. The plurality of aperture stops include a first aperture stop having an opening whose size can be changed, and a second aperture stop having an opening whose size can be changed. The first and second aperture stops are positioned nearer to the second object than a lens having the maximum effective diameter among the lenses included in an imaging optical system nearest to the second object. At least one of the first and second aperture stops is positioned at or near the pupil of the imaging optical system. The range of the numerical aperture determined by the first aperture stop is larger than the range of the numerical aperture determined by the second aperture stop.

Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.

Abstract: The invention relates to a projection lens (5) for microlithography, in particular, for immersion lithography, designed to operate at a wavelength of more than 190 nm and comprising an optical element made from quartz glass with an OH content of less than 50 ppm, in particular between 10 ppm and 50 ppm, and a water content of between 1.5×1016 and 2×1018 molecules/cm3, preferably between 2×1016 and 1×1018 molecules/cm3, in particular between 5×1016 and 2×1017 molecules/cm3. The optical element is preferably a terminal element (14) for the projection lens (5) in a microlithography projection illumination unit (1) for immersion lithography.

Abstract: A two-group zoom projection lens is provided and includes: in order from a magnification side, a first lens group having a negative refractive power; and a second lens group having a positive refractive power, the second lens group including a front group and a rear group in order from the magnification side, the front group including a group having at least two positive lenses and a group having at least one negative lens in order from the magnification side, the rear group including a group having at least one negative lenses and a group having at least two positive lenses in order from the magnification side. The front group includes a negative lens having a concave surface directed toward the magnification side, the rear group includes a negative lens having a concave surface directed toward a reduction side, and the projection lens satisfies conditional expressions specified in the specification.

Abstract: There are provided an illumination optical apparatus and an optical apparatus using this illumination optical apparatus that are capable of efficiently collecting light emitted from a light-emitting section for illumination with less illumination nonuniformity, without having to employ a complicated structure. There are provided a light-emitting sections; a lens system for converting a diverging beam emitted from the light-emitting section into a beam of collimated light; an afocal optical system for adjusting the cross-sectional area of a beam of collimated light obtained by the lens array; a fly-eye lens for forming a plurality of light-source images from the collimated light whose cross-sectional area is adjusted by the afocal optical system; and a Koehler illumination optical system that uses the plurality of light-source images formed by the fly-eye lens as a light source.

Abstract: Disclosed are a projecting type hyper-lens and a method of manufacturing the same. The projecting type hyper-lens includes a main lens layer and a substrate layer. A front surface of the main lens layer is recessed. The substrate layer supports the main lens layer. A front central portion of the main lens layer protrudes beyond a surface of the substrate layer. The projecting type hyper-lens allows an object to move towards a front surface of the hyper-lens until a distance between the front surface of the hyper-lens and the object is smaller than a half-wavelength of light, and thus images an object smaller than a half-wavelength of used light. Evanescent waves scattered from an object is used in a manner convenient to a user.